JP5473645B2 - 感光性樹脂組成物及び液体吐出ヘッド - Google Patents

感光性樹脂組成物及び液体吐出ヘッド Download PDF

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Publication number
JP5473645B2
JP5473645B2 JP2010024683A JP2010024683A JP5473645B2 JP 5473645 B2 JP5473645 B2 JP 5473645B2 JP 2010024683 A JP2010024683 A JP 2010024683A JP 2010024683 A JP2010024683 A JP 2010024683A JP 5473645 B2 JP5473645 B2 JP 5473645B2
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JP
Japan
Prior art keywords
group
resin composition
photosensitive resin
acid
photoacid generator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010024683A
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English (en)
Japanese (ja)
Other versions
JP2011164216A5 (enExample
JP2011164216A (ja
Inventor
健 池亀
まさ子 下村
表 高橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2010024683A priority Critical patent/JP5473645B2/ja
Priority to US13/510,609 priority patent/US8944580B2/en
Priority to PCT/JP2011/052457 priority patent/WO2011096552A1/en
Priority to CN201180008169.6A priority patent/CN102754029B/zh
Publication of JP2011164216A publication Critical patent/JP2011164216A/ja
Publication of JP2011164216A5 publication Critical patent/JP2011164216A5/ja
Application granted granted Critical
Publication of JP5473645B2 publication Critical patent/JP5473645B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/08—Saturated oxiranes
    • C08G65/10—Saturated oxiranes characterised by the catalysts used
    • C08G65/105—Onium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
    • C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
    • C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
    • C08G65/16—Cyclic ethers having four or more ring atoms
    • C08G65/18—Oxetanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L31/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an acyloxy radical of a saturated carboxylic acid, of carbonic acid or of a haloformic acid; Compositions of derivatives of such polymers
    • C08L31/06—Homopolymers or copolymers of esters of polycarboxylic acids
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polyethers (AREA)
JP2010024683A 2010-02-05 2010-02-05 感光性樹脂組成物及び液体吐出ヘッド Expired - Fee Related JP5473645B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2010024683A JP5473645B2 (ja) 2010-02-05 2010-02-05 感光性樹脂組成物及び液体吐出ヘッド
US13/510,609 US8944580B2 (en) 2010-02-05 2011-01-31 Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head
PCT/JP2011/052457 WO2011096552A1 (en) 2010-02-05 2011-01-31 Photosensitive resin composition, method for manufacturing structural body, and liquid discharge head
CN201180008169.6A CN102754029B (zh) 2010-02-05 2011-01-31 感光性树脂组合物、结构体的制造方法和液体排出头

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010024683A JP5473645B2 (ja) 2010-02-05 2010-02-05 感光性樹脂組成物及び液体吐出ヘッド

Publications (3)

Publication Number Publication Date
JP2011164216A JP2011164216A (ja) 2011-08-25
JP2011164216A5 JP2011164216A5 (enExample) 2013-03-21
JP5473645B2 true JP5473645B2 (ja) 2014-04-16

Family

ID=44355545

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010024683A Expired - Fee Related JP5473645B2 (ja) 2010-02-05 2010-02-05 感光性樹脂組成物及び液体吐出ヘッド

Country Status (4)

Country Link
US (1) US8944580B2 (enExample)
JP (1) JP5473645B2 (enExample)
CN (1) CN102754029B (enExample)
WO (1) WO2011096552A1 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5787720B2 (ja) * 2010-12-16 2015-09-30 キヤノン株式会社 感光性ネガ型樹脂組成物
JP6120574B2 (ja) 2012-01-31 2017-04-26 キヤノン株式会社 感光性ネガ型樹脂組成物、微細構造体、微細構造体の製造方法及び液体吐出ヘッド
JP6071718B2 (ja) 2013-04-10 2017-02-01 キヤノン株式会社 感光性ネガ型樹脂組成物
EP3026010A4 (en) * 2013-07-24 2017-04-12 JSR Corporation Microfluidic device and process for producing same, and photosensitive resin composition for forming flow path
JP2016038468A (ja) * 2014-08-07 2016-03-22 キヤノン株式会社 感光性樹脂層のパターニング方法
EP3249469B1 (en) 2015-03-26 2024-09-11 Tokyo Ohka Kogyo Co., Ltd. Negative photosensitive composition and pattern formation method
PH12021553301A1 (en) * 2019-12-23 2022-08-15 Illumina Inc Resin composition and flow cells incorporating the same

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4298414B2 (ja) 2002-07-10 2009-07-22 キヤノン株式会社 液体吐出ヘッドの製造方法
JP4537166B2 (ja) 2004-10-06 2010-09-01 キヤノン株式会社 液体吐出ヘッド
US8157347B2 (en) 2005-07-08 2012-04-17 Canon Kabushiki Kaisha Ink jet recording head and ink jet recording head cartridge
JP4262262B2 (ja) 2006-05-31 2009-05-13 キヤノン株式会社 インクジェット用インク保持容器
JP4789727B2 (ja) * 2006-07-14 2011-10-12 日本化薬株式会社 感光性樹脂組成物、その積層体、その硬化物及び該組成物を用いたパターン形成方法
JP2008065161A (ja) * 2006-09-08 2008-03-21 Fujifilm Corp カラーフィルタ用硬化性組成物、カラーフィルタ、及びその製造方法
JP4564977B2 (ja) 2007-04-05 2010-10-20 東京応化工業株式会社 感光性樹脂組成物、レジストパターンの製造方法、積層体、及びデバイス
US8007069B2 (en) * 2007-05-25 2011-08-30 Canon Kabushiki Kaisha Ink jet recording head
JP5039442B2 (ja) 2007-06-15 2012-10-03 東京応化工業株式会社 感光性樹脂組成物、感光性樹脂積層体、及びパターン形成方法
JP2009244779A (ja) * 2008-03-31 2009-10-22 Fujifilm Corp ネガ型レジスト組成物及びパターン形成方法
JP5247396B2 (ja) * 2008-07-02 2013-07-24 日本化薬株式会社 Ｍｅｍｓ用感光性樹脂組成物及びその硬化物
US8528209B2 (en) 2009-12-15 2013-09-10 Canon Kabushiki Kaisha Method for manufacturing discharge port member and method for manufacturing liquid discharge head
JP5697406B2 (ja) 2010-11-09 2015-04-08 キヤノン株式会社 親水被膜の形成方法および親水被膜、ならびにインクジェット記録ヘッドの製造方法およびインクジェット記録ヘッド
JP5653181B2 (ja) 2010-11-09 2015-01-14 キヤノン株式会社 親水被膜の形成方法および親水被膜、ならびにインクジェット記録ヘッドの製造方法およびインクジェット記録ヘッド

Also Published As

Publication number Publication date
WO2011096552A1 (en) 2011-08-11
JP2011164216A (ja) 2011-08-25
US8944580B2 (en) 2015-02-03
CN102754029B (zh) 2014-07-23
CN102754029A (zh) 2012-10-24
US20120229556A1 (en) 2012-09-13

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