JP5471886B2 - 高温、高圧処理方法及び高温、高圧処理装置並びに記憶媒体 - Google Patents

高温、高圧処理方法及び高温、高圧処理装置並びに記憶媒体 Download PDF

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JP5471886B2
JP5471886B2 JP2010145466A JP2010145466A JP5471886B2 JP 5471886 B2 JP5471886 B2 JP 5471886B2 JP 2010145466 A JP2010145466 A JP 2010145466A JP 2010145466 A JP2010145466 A JP 2010145466A JP 5471886 B2 JP5471886 B2 JP 5471886B2
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裕二 上川
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Tokyo Electron Ltd
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JP2010145466A 2010-06-25 2010-06-25 高温、高圧処理方法及び高温、高圧処理装置並びに記憶媒体 Active JP5471886B2 (ja)

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JP5726784B2 (ja) * 2012-02-24 2015-06-03 東京エレクトロン株式会社 処理液交換方法および基板処理装置
JP6481995B2 (ja) * 2015-01-27 2019-03-13 株式会社Ｓｃｒｅｅｎホールディングス 蒸気供給装置、蒸気乾燥装置、蒸気供給方法および蒸気乾燥方法
JP6543481B2 (ja) * 2015-02-23 2019-07-10 株式会社Ｓｃｒｅｅｎホールディングス 蒸気供給装置、蒸気乾燥装置、蒸気供給方法および蒸気乾燥方法
JP6532835B2 (ja) * 2016-03-02 2019-06-19 東京エレクトロン株式会社 基板処理装置及び基板処理方法並びに記録媒体
US10566182B2 (en) 2016-03-02 2020-02-18 Tokyo Electron Limited Substrate processing apparatus, substrate processing method, and storage medium
JP6532834B2 (ja) * 2016-03-02 2019-06-19 東京エレクトロン株式会社 基板処理装置及び基板処理方法並びに記録媒体
CN110462792B (zh) * 2017-03-21 2023-05-16 东京毅力科创株式会社 基片处理装置和基片处理方法
JP6986933B2 (ja) * 2017-11-08 2021-12-22 株式会社Ｓｃｒｅｅｎホールディングス 基板処理方法および基板処理装置
CN114951095B (zh) * 2022-04-11 2023-04-18 中国电子科技集团公司第三十八研究所 一种用于数字阵列模块的自动清洗方法
JP2025086559A (ja) * 2023-11-28 2025-06-09 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置及び基板処理方法

Family Cites Families (5)

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JPH06142404A (ja) * 1992-11-06 1994-05-24 Olympus Optical Co Ltd 乾燥液の再生方法と再生装置
JP2004335988A (ja) * 2003-03-12 2004-11-25 Nippon Telegr & Teleph Corp <Ntt> 超臨界処理方法及び装置
JP5013567B2 (ja) * 2005-05-24 2012-08-29 オルガノ株式会社 流体供給システム
JP4841484B2 (ja) * 2007-03-27 2011-12-21 大日本スクリーン製造株式会社 基板処理装置
JP2009218402A (ja) * 2008-03-11 2009-09-24 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法

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