JP5459833B2 - ペースト塗布装置 - Google Patents

ペースト塗布装置 Download PDF

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Publication number
JP5459833B2
JP5459833B2 JP2009168404A JP2009168404A JP5459833B2 JP 5459833 B2 JP5459833 B2 JP 5459833B2 JP 2009168404 A JP2009168404 A JP 2009168404A JP 2009168404 A JP2009168404 A JP 2009168404A JP 5459833 B2 JP5459833 B2 JP 5459833B2
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JP
Japan
Prior art keywords
paste
substrate
value
nozzle
distance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009168404A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011020073A (ja
JP2011020073A5 (enExample
Inventor
晃 平岡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Priority to JP2009168404A priority Critical patent/JP5459833B2/ja
Priority to TW099122679A priority patent/TWI451910B/zh
Priority to KR1020100066737A priority patent/KR101264968B1/ko
Priority to CN2010102320468A priority patent/CN101954329B/zh
Publication of JP2011020073A publication Critical patent/JP2011020073A/ja
Publication of JP2011020073A5 publication Critical patent/JP2011020073A5/ja
Application granted granted Critical
Publication of JP5459833B2 publication Critical patent/JP5459833B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • B05C11/1002—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves
    • B05C11/1015—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target
    • B05C11/1018—Means for controlling supply, i.e. flow or pressure, of liquid or other fluent material to the applying apparatus, e.g. valves responsive to a conditions of ambient medium or target, e.g. humidity, temperature ; responsive to position or movement of the coating head relative to the target responsive to distance of target
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C5/00—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work
    • B05C5/02—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work
    • B05C5/0225—Apparatus in which liquid or other fluent material is projected, poured or allowed to flow on to the surface of the work the liquid or other fluent material being discharged through an outlet orifice by pressure, e.g. from an outlet device in contact or almost in contact, with the work characterised by flow controlling means, e.g. valves, located proximate the outlet
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • H10P76/20—

Landscapes

  • Coating Apparatus (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP2009168404A 2009-07-17 2009-07-17 ペースト塗布装置 Expired - Fee Related JP5459833B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2009168404A JP5459833B2 (ja) 2009-07-17 2009-07-17 ペースト塗布装置
TW099122679A TWI451910B (zh) 2009-07-17 2010-07-09 Paste coating device
KR1020100066737A KR101264968B1 (ko) 2009-07-17 2010-07-12 페이스트 도포 장치
CN2010102320468A CN101954329B (zh) 2009-07-17 2010-07-16 糊剂涂敷装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009168404A JP5459833B2 (ja) 2009-07-17 2009-07-17 ペースト塗布装置

Publications (3)

Publication Number Publication Date
JP2011020073A JP2011020073A (ja) 2011-02-03
JP2011020073A5 JP2011020073A5 (enExample) 2013-05-23
JP5459833B2 true JP5459833B2 (ja) 2014-04-02

Family

ID=43482061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009168404A Expired - Fee Related JP5459833B2 (ja) 2009-07-17 2009-07-17 ペースト塗布装置

Country Status (4)

Country Link
JP (1) JP5459833B2 (enExample)
KR (1) KR101264968B1 (enExample)
CN (1) CN101954329B (enExample)
TW (1) TWI451910B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102655331B1 (ko) * 2016-11-30 2024-04-08 주식회사 탑 엔지니어링 토출 헤드의 변위 모니터링이 가능한 도포장치 및 그의 제어방법
JP7347908B2 (ja) * 2019-06-26 2023-09-20 ダイハツ工業株式会社 高粘度材料の塗布方法、及び高粘度材料塗布装置の制御点自動生成プログラム
CN115889082A (zh) * 2022-12-01 2023-04-04 深圳德森精密设备有限公司 Pcb板点胶控制方法、装置、pcb板点胶设备及存储介质

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11262711A (ja) * 1998-03-18 1999-09-28 Murata Mfg Co Ltd 塗布装置
JP4743957B2 (ja) * 2000-12-22 2011-08-10 東レ株式会社 塗液の塗布方法及び装置並びにプラズマディスプレイ部材の製造装置および製造方法
JP2002316082A (ja) * 2001-04-20 2002-10-29 Shibaura Mechatronics Corp ペースト塗布装置
JP4601914B2 (ja) * 2003-04-24 2010-12-22 芝浦メカトロニクス株式会社 接着剤の塗布装置及び接着剤の塗布方法
JP4341324B2 (ja) * 2003-08-01 2009-10-07 株式会社日立プラントテクノロジー 液晶パネルの製造方法及びペースト塗布装置
KR100696932B1 (ko) * 2005-04-15 2007-03-20 주식회사 탑 엔지니어링 페이스트 도포기 및 그 제어방법
JP4668023B2 (ja) * 2005-09-15 2011-04-13 芝浦メカトロニクス株式会社 ペースト塗布装置及びペースト塗布方法
JP2007152261A (ja) 2005-12-06 2007-06-21 Shibaura Mechatronics Corp ペースト塗布装置、ペースト塗布方法及びこれを用いた表示パネルの製造装置
JP2007222762A (ja) * 2006-02-22 2007-09-06 Shibaura Mechatronics Corp ペースト塗布装置
KR100649962B1 (ko) * 2006-06-28 2006-11-29 주식회사 탑 엔지니어링 페이스트 디스펜서의 헤드 유닛
JP4758326B2 (ja) * 2006-11-21 2011-08-24 株式会社アルバック 塗布装置
JP2008146992A (ja) * 2006-12-08 2008-06-26 Toshiba Matsushita Display Technology Co Ltd 表示装置の製造方法
CN101239349A (zh) * 2007-02-06 2008-08-13 芝浦机械电子装置股份有限公司 浆料涂敷装置及浆料涂敷方法
JP2009066576A (ja) 2007-09-18 2009-04-02 Toshiba Corp 塗布装置及び表示装置の製造方法

Also Published As

Publication number Publication date
KR101264968B1 (ko) 2013-05-15
CN101954329A (zh) 2011-01-26
CN101954329B (zh) 2013-05-08
JP2011020073A (ja) 2011-02-03
TW201114504A (en) 2011-05-01
TWI451910B (zh) 2014-09-11
KR20110007952A (ko) 2011-01-25

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