JP5431933B2 - フッ素化オリゴマーシランを含むフッ素性化学物質組成物 - Google Patents
フッ素化オリゴマーシランを含むフッ素性化学物質組成物 Download PDFInfo
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- JP5431933B2 JP5431933B2 JP2009521908A JP2009521908A JP5431933B2 JP 5431933 B2 JP5431933 B2 JP 5431933B2 JP 2009521908 A JP2009521908 A JP 2009521908A JP 2009521908 A JP2009521908 A JP 2009521908A JP 5431933 B2 JP5431933 B2 JP 5431933B2
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- WNAHIZMDSQCWRP-UHFFFAOYSA-N dodecane-1-thiol Chemical compound CCCCCCCCCCCCS WNAHIZMDSQCWRP-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000003682 fluorination reaction Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 150000002432 hydroperoxides Chemical class 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 239000010985 leather Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229940104873 methyl perfluorobutyl ether Drugs 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000011859 microparticle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- PJUIMOJAAPLTRJ-UHFFFAOYSA-N monothioglycerol Chemical compound OCC(O)CS PJUIMOJAAPLTRJ-UHFFFAOYSA-N 0.000 description 1
- OMNKZBIFPJNNIO-UHFFFAOYSA-N n-(2-methyl-4-oxopentan-2-yl)prop-2-enamide Chemical compound CC(=O)CC(C)(C)NC(=O)C=C OMNKZBIFPJNNIO-UHFFFAOYSA-N 0.000 description 1
- 125000006606 n-butoxy group Chemical group 0.000 description 1
- 125000003506 n-propoxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 239000002105 nanoparticle Substances 0.000 description 1
- 125000002560 nitrile group Chemical group 0.000 description 1
- SLYCYWCVSGPDFR-UHFFFAOYSA-N octadecyltrimethoxysilane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OC)(OC)OC SLYCYWCVSGPDFR-UHFFFAOYSA-N 0.000 description 1
- 230000003606 oligomerizing effect Effects 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 239000012074 organic phase Substances 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229960004624 perflexane Drugs 0.000 description 1
- YPJUNDFVDDCYIH-UHFFFAOYSA-N perfluorobutyric acid Chemical compound OC(=O)C(F)(F)C(F)(F)C(F)(F)F YPJUNDFVDDCYIH-UHFFFAOYSA-N 0.000 description 1
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 1
- YVBBRRALBYAZBM-UHFFFAOYSA-N perfluorooctane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YVBBRRALBYAZBM-UHFFFAOYSA-N 0.000 description 1
- 125000000864 peroxy group Chemical group O(O*)* 0.000 description 1
- 125000005634 peroxydicarbonate group Chemical group 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920002285 poly(styrene-co-acrylonitrile) Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- BCWYYHBWCZYDNB-UHFFFAOYSA-N propan-2-ol;zirconium Chemical compound [Zr].CC(C)O.CC(C)O.CC(C)O.CC(C)O BCWYYHBWCZYDNB-UHFFFAOYSA-N 0.000 description 1
- BNMCQIRVFUGISV-UHFFFAOYSA-N propan-2-one;prop-2-enamide Chemical compound CC(C)=O.NC(=O)C=C BNMCQIRVFUGISV-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical compound O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003462 sulfoxides Chemical class 0.000 description 1
- 238000001308 synthesis method Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 1
- 125000004149 thio group Chemical group *S* 0.000 description 1
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 1
- RUELTTOHQODFPA-UHFFFAOYSA-N toluene 2,6-diisocyanate Chemical compound CC1=C(N=C=O)C=CC=C1N=C=O RUELTTOHQODFPA-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- FZMJEGJVKFTGMU-UHFFFAOYSA-N triethoxy(octadecyl)silane Chemical compound CCCCCCCCCCCCCCCCCC[Si](OCC)(OCC)OCC FZMJEGJVKFTGMU-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- NCLFWRGBSGFNNA-UHFFFAOYSA-N trimethoxy-(3-methyloxiran-2-yl)silane Chemical compound CO[Si](OC)(OC)C1OC1C NCLFWRGBSGFNNA-UHFFFAOYSA-N 0.000 description 1
- 238000007039 two-step reaction Methods 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- 150000007934 α,β-unsaturated carboxylic acids Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/2805—Compounds having only one group containing active hydrogen
- C08G18/288—Compounds containing at least one heteroatom other than oxygen or nitrogen
- C08G18/2885—Compounds containing at least one heteroatom other than oxygen or nitrogen containing halogen atoms
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
Description
(a)一般式、
Gは連鎖移動剤の残基を含む一価の有機基であり、nは1〜100の値を表し、mは0〜100の値を表し、rは0〜100の値を表し、n+m+rは少なくとも2であり、
ただし、以下の条件の少なくとも1つを満たす、(i)Gは式、
(b)1分子当たり少なくとも2つの加水分解性基を有するSi、Ti、Zr、B、Al、Ge、V、Pb、Sn、及びZnからなる群から選択される元素Mの非フッ素化化合物と、を含む、フッ素性化学物質組成物を提供する。
Gは連鎖移動剤の残基を含む一価の有機基であり、nは1〜100の値を表し、mは0〜100の値を表し、rは0〜100の値を表し、n+m+rは少なくとも2であり、
ただし、(i)Gは式、
式中、PF1はペルフルオロ脂肪族基を表し、Q1は有機二価又は三価連結基であり、aは1又は2、好ましくは1である。ペルフルオロ脂肪族基PF1は、ペルフルオロ化した、安定な、不活性の、好ましくは飽和の、非極性の、3〜6個の炭素原子を含有する一価脂肪族ラジカルである。それは直鎖又は分枝鎖であることができる。特に好適なフッ素化アルコールは、PF1−基が4〜6個の炭素原子を有し、式C4F9−又はC6F13−であるものである。
CF3CF2CF2CF2CH2CH2OH、
CF3CF2CF2CF2CF2CF2CH2CH2OH、
CF3(CF2)3SO2N(CH3)CH2CH2OH、
CF3(CF2)3SO2N(CH3)CH2CH(OH)CH2OH、
CF3(CF2)3SO2N(C2H5)CH2CH2OH、
CF3(CF2)3SO2N(C2H5)CH2CH(OH)CH2OH、
CF3(CF2)3SO2N(CH3)CH2CH(CH3)OH、及び
(CF3)2CFCF2SO2N(CH3)CH2CH2OHが挙げられる。
式中、PF2はペルフルオロポリエーテル基を表し、Q2は二価又は三価の一般に非フッ素化又は部分的にフッ素化の有機連結基を表し、bは1又は2、好ましくは1である。連結基Q2の例としては、O、N、又はSが割り込んでよく、アルキレン基、オキシ基、チオ基、ウレタン基、カルボキシ基、カルボニル基、アミド基、オキシアルキレン基、チオアルキレン基、カルボキシアルキレン、及び/又はアミドアルキレン基で置換されてよい芳香族又は脂肪族基を含む有機基が挙げられる。
式中、各Rfcは独立して、ペルフルオロアルキレン基を表し、各xは独立して、3以上の整数を表し、dは整数1〜6である。ペルフルオロアルキレン基Rfcは、直鎖又は分枝鎖であってよく、1〜10個の炭素原子、好ましくは1〜6個の炭素原子を含んでよい。ペルフルオロアルキレンオキシ基−RfcO−の例としては、−CF2CF2O−、−CF(CF3)CF2O−、−CF2CF(CF3)O−、−CF2CF2CF2O−、−CF2O−、−CF(CF3)O−、−CF2CF2CF2CF2−O−が挙げられる。ペルフルオロポリエーテル基は、同一のペルフルオロアルキレンオキシ単位、又は異なるペルフルオロアルキレンオキシ単位の混合物からなってよい。ペルフルオロポリエーテル基が、異なるペルフルオロアルキレンオキシ単位からなる場合、それらは、ランダム構成、交互構成で存在することができ、又はブロックとして存在することができる。ペルフルオロポリアルキレンオキシ基の典型例としては、
−[CF2CF2O]r−、−[CF(CF3)CF2O]s−、−[CF2CF2O]i[CF2O]j−、及び−[CF2CF2O]l−[CF(CF3)CF2O]k−が挙げられ、式中、rは整数5〜25、sは整数3〜25、i、j、l、及びkはそれぞれ整数3〜25である。
F(CF(CF3)CF2O)gCF(CF3)−であり、
式中、gは少なくとも3である。上式のペルフルオロポリエーテル基は、ヘキサフルオロプロピレンオキシド(HFPO)のオリゴマー化に好都合に由来する。特に好適な実施形態においては、gは整数3〜25であり、相当するペルフルオロポリエーテル基は、少なくとも約750g/モルの分子量を有する。
F(CF(CF3)CF2O)gCF(CF3)−CONRc−CH2CHOHCH2OHで、式中、Rcは水素又は例えば炭素原子1〜4個のアルキル基、
F(CF(CF3)CF2O)gCF(CF3)−CONH−1,4−ジヒドロキシフェニル、
F(CF(CF3)CF2O)gCF(CF3)−CH2OCH2CHOHCH2OH、
F(CF(CF3)CF2O)gCF(CF3)−COOCH2CHOHCH2OH、
F(CF(CF3)CF2O)gCF(CF3)−CONR”−(CH2)vOH、
F(CF(CF3)CF2O)gCF(CF3)−CONR”−((CH2)v−O)w−H、
F(CF(CF3)CF2O)gCF(CF3)−CONHCH2CH2CH2N(CH2CH2OH)2、
が挙げられ、式中R”は、水素、又はメチル、エチル、プロピル、ブチル、若しくはヘキシルのようなアルキルであり、vは2、3、4、6、8、10、又は11であり、wは1〜4であり、gは少なくとも3である。特に好適な例は、F(CF(CF3)CF2O)gCF(CF3)CONRd(CH2)vOHであり、式中Rdは水素であり、vは2であり、gは少なくとも3である。
(MF)r(MH)s−q3−(OH)c
で表すことができるオリゴマーフッ素化アルコール又はジオールであり得、式中、cは1又は2、好ましくは1であり、(MF)r(MH)sは、第2のフッ素化モノマー由来のr単位と、非フッ素化モノマー、例えば炭化水素モノマー由来のs単位とを含むフッ素化オリゴマーを表し、rは典型的に2〜40の値を表し、sは典型的に0〜20を表し、−Q3−(OH)cは共にアルコール又はジオールで官能化された連鎖移動剤から水素原子を除去することにより得られる有機残基を表す。オリゴマーフッ素化アルコールにおけるrの値は、典型的に2〜40、好ましくは2〜20、より好ましくは3〜15である。2つ以上の異なる第2のフッ素化モノマー及び任意の非フッ素化モノマーに由来するフッ素化オリゴマーも同様に好適である。
Rf−Q−E1
により表すことができ、式中、Rfは少なくとも3個の炭素原子を有するフッ素化脂肪族基を表し、Qは非フッ素化二価結合基を表し、E1はフリーラジカル重合可能なエチレン性不飽和基である。
PF3−Q4−OC(O)−C(R’)=CH2
で表すことができ、式中、PF3は3〜6個の炭素原子を有するペルフルオロ脂肪族基を表し、Q4は有機二価結合基であり、R’は水素、フッ素、又は1〜4個の炭素原子を有する低級アルキル基を表す。
CF3CF2CF2CF2CH2CH2OCOCR1=CH2、
CF3(CF2)5CH2CH2OCOCR1=CH2、
CF3(CF2)3CH2OCOCR1=CH2、
CF3(CF2)3SO2N(CH3)CH2CH2OCOCR1=CH2、
CF3(CF2)3SO2N(C2H5)CH2CH2OCOCR1=CH2、
CF3(CF2)3SO2N(CH3)CH2CH(CH3)OCOCR1=CH2、
(CF3)2CFCF2SO2N(CH3)CH2CH2OCOCR1=CH2、が挙げられ、
式中、R1は水素又はメチルである。
式中、Rhは、水素原子又は非フッ素化有機基、例えば、所望により例えば、ハロゲン、ニトリル基、ヒドロキシル基、アミノ基で置換されてよく、所望によりカテナリーへテロ原子を含有してよい炭化水素基を表し、Lは、例えば−O−、−OOC−、又はアミド基のような有機二価結合基を表し、kは0又は1であり、Eはエチレン性不飽和基を表す。
式中、R2は非加水分解性基を表し、MはSi、Ti、Zr、B、Al、Ge、V、Pb、Sn、及びZnからなる群から選択される元素を表し、jはMの価数に依存して3又は4であり、iは0、1、又は2であり、Y7は加水分解性基を表す。
AIBN:アゾビスイソブチロニトリル
A−174:CH2=C(CH3)C(O)O(CH2)3Si(OCH3)3、アルドリッチ(Aldrich)から入手可能
A−160:HS(CH2)3Si(OCH3)3、アルドリッチ(Aldrich)から入手可能
DBTDL:ジラウリン酸ジブチル錫
MeFBSEA:N−メチルペルフルオロブチルスルホンアミドエチルアクリレート
MeFBSEMA:N−メチルペルフルオロブチルスルホンアミドエチルメタクリレート
MEHQ:メチルヒドロキノン
HOEA:2−ヒドロキシエチルアクリレート
HOPMA:ヒドロキシプロピルメタクリレート
TDI:トルエンジイソシアネート
TEOS:テトラエトキシシラン、アルドリッチ(Aldrich)から入手可能
IPDI:イソホロンジイソシアネート
ODMA:オクタデシルメタクリレート
MeFBSE:N−メチルペルフルオロブチルスルホンアミドエタノール
MDI:4,4’−メチレンジフェニレンジイソシアネート
PAPI:ポリメチレンポリフェニルイソシアネート、バイエル(Bayer)から入手可能
HFPO−alc:F(CF(CF3)CF2O)6.85CF(CF3)C(O)NHCH2CH2OH、様々な鎖長を持つオリゴマーの混合物からなる。指標6.85は、繰り返しHFPO−単位の数の数学的平均を示す。
コーティング方法
第一工程においては、基材を洗浄し、アセトンで脱脂した。洗浄後、それぞれの実施例において示されているようなフッ素化オリゴマーシランの0.1〜1%溶液を、40mL/分でのスプレー塗布により、基材上に適用した。基材を乾燥し、150℃で5分間硬化した。
処理された基材について、オリンパス(Olympus)TGHMゴニオメーターを使用して、水(W)及び
n−ヘキサデカン(O)に対するそれらの接触角を試験した。研磨前(初期)及び研磨直後(研磨)に、接触角を測定した。値は4つの測定値の平均値であり、度で報告される。接触角の測定可能な最低値は20であった。値<20は、液体が表面上に広がることを意味する。
処理した基材を、CIFクリームクリーナー(レバー・ファベルジュ(Lever Faberge))を使用するエリクセン(Erichsen)洗浄機を使用して研磨した。40の研磨サイクルが行われた。
1.(HFPO)−alc:F(CF(CF3)CF2O)6.85CF(CF3)C(O)NHCH2CH2OHの合成
(HFPO)−alcを、対応する(HFPO)−エステル、
F(CF(CF3)CF2O)6.85CF(CF3)COOCH3から調製した。
(HFPO)−エステルを充填した。混合物を40℃に加熱し、43.4gのエタノールアミンを、滴下漏斗を経由して30分間に渡って添加した。反応混合物を65℃に3時間保持した。FTIR分析により、完全な転化が示された。最終製品を以下のように精製した。500mLのエチルアセテートを添加し、有機溶液を200mLのHCl(1N)で洗浄した後、200mLの食塩水で2回洗浄した。有機相をMgSO4上で乾燥させた。ビュッヒ(Buchi)のロータリーエバポレーターを使用して、酢酸エチルを、水流真空で蒸発させた。油ポンプ真空(<100Pa(1mbar))を使用して、生成物を50℃で5時間乾燥した。代わりの精製工程としては、ビュッヒ(Buchi)のロータリーエバポレーター(75℃以下=<13kPa(100mmHg)を使用して、水流真空によって、反応中に形成されたメタノールを蒸発させることを包含した。残留メタノールを、油ポンプ真空(80℃以下、=<1kPa(10mbar))で更に除去した。
a.オリゴマーフッ素化アルコール、ポリイソシアネート及びイソシアネート反応性非フッ素化モノマーから出発する、フッ素化モノマーの合成
いくつかのフッ素化モノマーを、MF−1:(MeFBSEA/HSHCH2CH2OH:4/1)/TDI/HOEA(等モル量)について示された一般手順に従って調製した。
いくつかのフッ素化モノマーを、MF−7:MeFBSE/MDI/HOEA(1/1.1/1)について示された手順に従って調製した。
いくつかのフッ素化オリゴマーシランを、FC−1:MF−1/A−174/ODMA/A−160(等モル量)について以下に概説される手順に従って調製した。
当該技術分野において既知の方法に従って、比較フッ素性化学物質組成物CFC−1〜CFC−3を調製した。これらの組成及び合成のための参考文献を表4に示す。
実施例1〜15並びに比較実施例C−1及びC−2
実施例1〜15においては、フッ素化オリゴマーシランFC−1〜FC−12と金属アルコキシドを、表5に示された量で混合することにより、フッ素性化学物質組成物を調製した。混合物を、1%HCl(37%)を更に含有するエタノール中1%固体まで、希釈した。室温において、組成物を白色艶出しタイルにスプレーした。過剰な生成物を、3M高性能ワイプ(High Performance wipe)にてすぐ除去した。試料を、室温にて24時間硬化した。比較実施例C−1及びC−2を同じ方法で製造したが、それぞれ比較フッ素性化学物質組成物CFC−1及びCFC−2を使用した。初めに、並びにエリクセン(Erichsen)洗浄剤及び洗剤CIF(レバー・ファベルジュ(Lever Faberge)から入手可能)での40サイクルの機械的研磨後に、オリンパス(Olympus)TGHMゴニオメーターを使用して接触角を測定した。結果を表5に要約する。
実施例16〜32においては、フッ素化オリゴマーシランFC−13〜FC−25を60℃まで加熱して完全に溶解し、MEK中1%固体まで更に希釈した。これらの希釈混合物に、4g/100gMEK金属アルコキシド又は表6に示すようなこれらの混合物、及び1%のHCl(37%)を添加した。室温において、組成物を白色艶出しタイルにスプレーした。過剰な生成物を、3M高性能ワイプ(High Performance wipe)にてすぐ除去した。試料を室温にて24時間硬化させた。比較実施例C−3及びC−4を同じ方法で製造したが、それぞれ比較フッ素性化学物質組成物CFC−1及びCFC−2を使用した。初めに、18%HClに16時間接触後、並びにエリクセン(Erichsen)洗浄剤及び洗剤CIF(レバー・ファベルジュ(Lever Faberge)から入手可能)での40サイクルの機械的研磨後に、オリンパス(Olympus)TGHMゴニオメーターを使用して接触角を測定した。結果を表6に要約する。
**=(CH3)2Si(OCH2CH3)2
***=0.5gのC18H37Si(OCH3)3+3.5gのTEOS
本発明の様々な修正及び変更が、本発明の範囲及び趣旨から逸脱することなく、当業者には明らかとなるであろう。
Claims (2)
- フッ素性化学物質組成物であって、
(a)一般式、
ただし、以下の条件の少なくとも1つを満たす、(i)Gは式、
(b)1分子当たり少なくとも2つの加水分解性基を有するSi、Ti、Zr、B、Al、Ge、V、Pb、Sn、及びZnからなる群から選択される元素Mの非フッ素化化合物と、を含み、
前記フッ素化オリゴマーシラン及び前記非フッ素化化合物が、有機溶媒に溶解若しくは分散しており、
前記フッ素化アルコールが、少なくとも1つのヒドロキシル基を有する連鎖移動剤の存在下において、第2のフッ素化モノマー及び所望により非フッ素化モノマーのフリーラジカル重合により得られるオリゴマーフッ素化アルコールであり、又は前記フッ素化アルコールが一官能性ペルフルオロポリエーテルアルコールである、フッ素性化学物質組成物。 - フッ素化オリゴマーシランであって、一般式、
n+m+rは少なくとも2であり、ただし、以下、(i)Gは式、
前記フッ素化アルコールが、少なくとも1つのヒドロキシル基を有する連鎖移動剤の存在下において、第2のフッ素化モノマー及び所望により非フッ素化モノマーのフリーラジカル重合により得られるオリゴマーフッ素化アルコールであり、又は前記フッ素化アルコールが一官能性ペルフルオロポリエーテルアルコールである、フッ素化オリゴマーシラン。
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PCT/US2007/073883 WO2008014174A1 (en) | 2006-07-27 | 2007-07-19 | Fluorochemical composition comprising fluorinated oligomeric silane |
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