JP5422952B2 - 無鉛ガラス - Google Patents
無鉛ガラス Download PDFInfo
- Publication number
- JP5422952B2 JP5422952B2 JP2008241148A JP2008241148A JP5422952B2 JP 5422952 B2 JP5422952 B2 JP 5422952B2 JP 2008241148 A JP2008241148 A JP 2008241148A JP 2008241148 A JP2008241148 A JP 2008241148A JP 5422952 B2 JP5422952 B2 JP 5422952B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- lead
- free glass
- range
- thermal expansion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/062—Glass compositions containing silica with less than 40% silica by weight
- C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
- C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/12—Silica-free oxide glass compositions
- C03C3/14—Silica-free oxide glass compositions containing boron
- C03C3/145—Silica-free oxide glass compositions containing boron containing aluminium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
Description
B2O3源としてほう酸を、Bi2O3源として酸化ビスマスを、Li2O源として炭酸リチウムを、Na2O源として炭酸ナトリウムを、K2O源として炭酸カリウムを、Al2O3源として酸化アルミニウムを、SiO2源として微粉珪砂を、ZnO源として亜鉛華を、MgO源として炭酸マグネシウムを、CaO源として炭酸カルシウムを、SrO源として炭酸ストロンチウムを、BaO源として炭酸バリウムを、CuO源として酸化第二銅を使用した。これらを所望の低融点ガラス組成となるべく調合したうえで、白金ルツボに投入し、電気加熱炉内で1000〜1300℃、1〜2時間で加熱溶融して表1の実施例1〜6、表2の比較例1〜4に示す組成のガラスを得た。
Claims (5)
- 透明絶縁性の無鉛ガラスにおいて、質量%でB2O3を4〜12、Bi2O3を83〜93、R2O(Li2O,Na2O,K2Oより選択される一種類以上の合計)を0.1〜6、Al2O3を0.1〜5含み、Ce 2 Oを含まない組成からなり、30℃〜300℃における平均熱膨張係数が(112〜145)×10 −7 /℃、軟化点が300℃以上420℃以下であることを特徴とするB2O3−Bi2O3−R2O−Al2O3系無鉛ガラス。
- 質量%で、SiO2を0〜8、ZnOを0〜10、RO(MgO,CaO,SrO,BaOより選択される一種類以上の合計)を0〜10、CuOを0〜5含む組成からなることを特徴とする請求項1に記載の無鉛ガラス。
- 請求項1又は2に記載の無鉛ガラスを使用していることを特徴とする電子材料用基板。
- 請求項1又は2に記載の無鉛ガラスを使用していることを特徴とするディスプレイ用パネル。
- 請求項1又は2に記載の無鉛ガラスを使用していることを特徴とするディスプレイ用カバーフィルタ。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008241148A JP5422952B2 (ja) | 2008-09-19 | 2008-09-19 | 無鉛ガラス |
PCT/JP2009/066014 WO2010032706A1 (ja) | 2008-09-19 | 2009-09-14 | 無鉛低融点ガラス |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008241148A JP5422952B2 (ja) | 2008-09-19 | 2008-09-19 | 無鉛ガラス |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010070426A JP2010070426A (ja) | 2010-04-02 |
JP5422952B2 true JP5422952B2 (ja) | 2014-02-19 |
Family
ID=42039530
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008241148A Expired - Fee Related JP5422952B2 (ja) | 2008-09-19 | 2008-09-19 | 無鉛ガラス |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5422952B2 (ja) |
WO (1) | WO2010032706A1 (ja) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4839539B2 (ja) * | 2001-07-24 | 2011-12-21 | 旭硝子株式会社 | 無鉛ガラス、ガラスフリット、ガラスペースト、電子回路部品および電子回路 |
JP4313067B2 (ja) * | 2002-03-29 | 2009-08-12 | パナソニック株式会社 | ビスマス系ガラス組成物、ならびにそれを封着部材として用いた磁気ヘッドおよびプラズマディスプレイパネル |
JP4415535B2 (ja) * | 2002-10-23 | 2010-02-17 | パナソニック株式会社 | 磁気ヘッド用ギャップ接合ガラスおよび磁気ヘッド |
JP4774721B2 (ja) * | 2004-11-12 | 2011-09-14 | 旭硝子株式会社 | 低融点ガラスおよび封着用組成物ならびに封着用ペースト |
JP2006169047A (ja) * | 2004-12-16 | 2006-06-29 | Central Glass Co Ltd | 無鉛低融点ガラス |
-
2008
- 2008-09-19 JP JP2008241148A patent/JP5422952B2/ja not_active Expired - Fee Related
-
2009
- 2009-09-14 WO PCT/JP2009/066014 patent/WO2010032706A1/ja active Application Filing
Also Published As
Publication number | Publication date |
---|---|
WO2010032706A1 (ja) | 2010-03-25 |
JP2010070426A (ja) | 2010-04-02 |
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