JP5411167B2 - 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置 - Google Patents

極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置 Download PDF

Info

Publication number
JP5411167B2
JP5411167B2 JP2010547146A JP2010547146A JP5411167B2 JP 5411167 B2 JP5411167 B2 JP 5411167B2 JP 2010547146 A JP2010547146 A JP 2010547146A JP 2010547146 A JP2010547146 A JP 2010547146A JP 5411167 B2 JP5411167 B2 JP 5411167B2
Authority
JP
Japan
Prior art keywords
getter
processing chamber
radiation
support
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2010547146A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011512684A5 (cg-RX-API-DMAC7.html
JP2011512684A (ja
Inventor
マニーニ，パオロ
コンテ，アンドレア
Original Assignee
サエス ゲッターズ ソチエタ ペル アツィオニ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by サエス ゲッターズ ソチエタ ペル アツィオニ filed Critical サエス ゲッターズ ソチエタ ペル アツィオニ
Publication of JP2011512684A publication Critical patent/JP2011512684A/ja
Publication of JP2011512684A5 publication Critical patent/JP2011512684A5/ja
Application granted granted Critical
Publication of JP5411167B2 publication Critical patent/JP5411167B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Electron Tubes For Measurement (AREA)
JP2010547146A 2008-02-22 2009-02-10 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置 Active JP5411167B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IT000282A ITMI20080282A1 (it) 2008-02-22 2008-02-22 Apparato per litografia con radiazione nell'uv estremo con un elemento assorbitore di idrocarburi comprendente un materiale getter
ITMI2008A000282 2008-02-22
PCT/EP2009/051516 WO2009103631A1 (en) 2008-02-22 2009-02-10 Lithography apparatus using extreme uv radiation and having a volatile organic compounds sorbing member comprising a getter material

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013100962A Division JP5357356B2 (ja) 2008-02-22 2013-05-13 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置

Publications (3)

Publication Number Publication Date
JP2011512684A JP2011512684A (ja) 2011-04-21
JP2011512684A5 JP2011512684A5 (cg-RX-API-DMAC7.html) 2012-01-19
JP5411167B2 true JP5411167B2 (ja) 2014-02-12

Family

ID=40291682

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2010547146A Active JP5411167B2 (ja) 2008-02-22 2009-02-10 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置
JP2013100962A Active JP5357356B2 (ja) 2008-02-22 2013-05-13 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013100962A Active JP5357356B2 (ja) 2008-02-22 2013-05-13 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置

Country Status (10)

Country Link
US (1) US8399861B2 (cg-RX-API-DMAC7.html)
EP (1) EP2255252B1 (cg-RX-API-DMAC7.html)
JP (2) JP5411167B2 (cg-RX-API-DMAC7.html)
KR (1) KR101429440B1 (cg-RX-API-DMAC7.html)
CN (2) CN103345127B (cg-RX-API-DMAC7.html)
AT (1) ATE514973T1 (cg-RX-API-DMAC7.html)
CA (1) CA2711616A1 (cg-RX-API-DMAC7.html)
IT (1) ITMI20080282A1 (cg-RX-API-DMAC7.html)
TW (1) TW200951628A (cg-RX-API-DMAC7.html)
WO (1) WO2009103631A1 (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0696395B2 (ja) 1991-04-30 1994-11-30 工業技術院長 形状可変型多輪全方向移動ビークル

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5315100B2 (ja) * 2009-03-18 2013-10-16 株式会社ニューフレアテクノロジー 描画装置
ITMI20121732A1 (it) 2012-10-15 2014-04-16 Getters Spa Pompa getter
TWI660125B (zh) * 2014-04-03 2019-05-21 義大利商沙斯格特斯公司 吸氣泵
DE102016213830B3 (de) * 2016-07-27 2017-12-07 Carl Zeiss Smt Gmbh Quell-Hohlkörper sowie EUV-Plasma-Lichtquelle mit einem derartigen Quell-Hohlkörper
KR20220076913A (ko) 2020-12-01 2022-06-08 포항공과대학교 산학협력단 나노 리소그래피 장치
CN113042160A (zh) * 2021-03-10 2021-06-29 南京华东电子真空材料有限公司 一种应用于极紫外设备的吸气剂及制备装置
DE102021205985A1 (de) * 2021-06-11 2022-12-15 Carl Zeiss Smt Gmbh Optische Anordnung für die EUV-Lithographie und Verfahren zum Regenerieren eines gasbindenden Bauteils
DE102022102478A1 (de) * 2022-02-02 2023-08-03 Asml Netherlands B.V. EUV-Lithographiesystem mit einem gasbindenden Bauteil
DE102023200375A1 (de) * 2023-01-18 2024-07-18 Carl Zeiss Smt Gmbh Vorrichtung und Verfahren zur Kontaminationsreduzierung in einem optischen System für die Mikrolithographie

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4969556A (en) * 1988-05-10 1990-11-13 Hajime Ishimaru Vacuum container
US5972183A (en) * 1994-10-31 1999-10-26 Saes Getter S.P.A Getter pump module and system
US5911560A (en) * 1994-10-31 1999-06-15 Saes Pure Gas, Inc. Getter pump module and system
IT237018Y1 (it) * 1995-07-10 2000-08-31 Getters Spa Pompa getter perfezionata in particolare per uno strumento dianalisi chimiche portatile
IT1295340B1 (it) * 1997-10-15 1999-05-12 Getters Spa Pompa getter ad elevata velocita' di assorbimento di gas
US6391090B1 (en) 2001-04-02 2002-05-21 Aeronex, Inc. Method for purification of lens gases used in photolithography
JP2004053264A (ja) 2002-07-16 2004-02-19 Konica Minolta Holdings Inc 放射線像変換パネルおよび製造方法
JP2004214480A (ja) * 2003-01-07 2004-07-29 Nikon Corp 露光装置
JP4613167B2 (ja) 2003-05-22 2011-01-12 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 少なくとも一つの光学要素を洗浄する方法および装置
KR100694572B1 (ko) * 2003-11-11 2007-03-13 에이에스엠엘 네델란즈 비.브이. 오염 억제를 위한 리소그래피 장치, 디바이스 제조방법 및 이에 의해 제조된 디바이스
JP2005244016A (ja) * 2004-02-27 2005-09-08 Nikon Corp 露光装置、露光方法、及び微細パターンを有するデバイスの製造方法
JP5122952B2 (ja) * 2004-07-22 2013-01-16 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ クリーニング構成を有する光学システム
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
JP2006245254A (ja) * 2005-03-03 2006-09-14 Nikon Corp 露光装置、露光方法、および微細パターンを有するデバイスの製造方法
JP2007018931A (ja) 2005-07-08 2007-01-25 Canon Inc 光源装置、露光装置及びデバイス製造方法
US7473908B2 (en) * 2006-07-14 2009-01-06 Asml Netherlands B.V. Getter and cleaning arrangement for a lithographic apparatus and method for cleaning a surface
DE102006036488A1 (de) * 2006-08-04 2008-02-07 Carl Zeiss Smt Ag Optisches System, insbesondere Projektionsobjektiv in der Mikrolithographie
US20080050680A1 (en) * 2006-08-24 2008-02-28 Stefan Brandl Lithography systems and methods
US7959310B2 (en) * 2006-09-13 2011-06-14 Carl Zeiss Smt Gmbh Optical arrangement and EUV lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element
DE102006044591A1 (de) 2006-09-19 2008-04-03 Carl Zeiss Smt Ag Optische Anordnung, insbesondere Projektionsbelichtungsanlage für die EUV-Lithographie, sowie reflektives optisches Element mit verminderter Kontamination
US7671348B2 (en) * 2007-06-26 2010-03-02 Advanced Micro Devices, Inc. Hydrocarbon getter for lithographic exposure tools

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0696395B2 (ja) 1991-04-30 1994-11-30 工業技術院長 形状可変型多輪全方向移動ビークル

Also Published As

Publication number Publication date
CN101971098A (zh) 2011-02-09
CN103345127B (zh) 2016-01-20
CN101971098B (zh) 2013-07-10
ATE514973T1 (de) 2011-07-15
US20100309446A1 (en) 2010-12-09
WO2009103631A1 (en) 2009-08-27
CA2711616A1 (en) 2009-08-27
TW200951628A (en) 2009-12-16
CN103345127A (zh) 2013-10-09
JP2013165293A (ja) 2013-08-22
JP2011512684A (ja) 2011-04-21
KR20100119568A (ko) 2010-11-09
US8399861B2 (en) 2013-03-19
KR101429440B1 (ko) 2014-08-12
JP5357356B2 (ja) 2013-12-04
EP2255252B1 (en) 2011-06-29
EP2255252A1 (en) 2010-12-01
ITMI20080282A1 (it) 2009-08-23

Similar Documents

Publication Publication Date Title
JP5357356B2 (ja) 極紫外線放射を使用すると共にゲッター材料を含む揮発性有機化合物吸収部材を有するリソグラフィー装置
US8598550B2 (en) Ex-situ removal of deposition on an optical element
EP3248065B1 (en) Pellicle
US10953441B2 (en) System and method for cleaning optical surfaces of an extreme ultraviolet optical system
US20060072084A1 (en) Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
US20070170379A1 (en) Cooled optical filters and optical systems comprising same
EP2064005B1 (en) Method and unit for cleaning a surface region covered with contaminant or undesirable material
KR102615911B1 (ko) 분자 오염물 및 입자의 경감을 위한 진공 액추에이터 봉쇄
JP5381607B2 (ja) 極端紫外光利用装置
JP2009004647A (ja) 真空容器と真空排気方法及びｅｕｖ露光装置
JP2007027212A (ja) フィルター、露光装置及びデバイス製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20111121

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20111121

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20121107

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20121113

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20130212

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20130219

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130513

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130611

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130821

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20131008

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20131107

R150 Certificate of patent or registration of utility model

Ref document number: 5411167

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250