JP5390075B2 - X線を用いるオーバレイ計測 - Google Patents
X線を用いるオーバレイ計測 Download PDFInfo
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- JP5390075B2 JP5390075B2 JP2007079443A JP2007079443A JP5390075B2 JP 5390075 B2 JP5390075 B2 JP 5390075B2 JP 2007079443 A JP2007079443 A JP 2007079443A JP 2007079443 A JP2007079443 A JP 2007079443A JP 5390075 B2 JP5390075 B2 JP 5390075B2
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70616—Monitoring the printed patterns
- G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70591—Testing optical components
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
Description
当該サンプルの表面上に重畳された第1および第2の薄膜層内に夫々形成された第1および第2特定構造を含むサンプルの領域に衝当する様にX線のビームを導向する段階と、
上記第1および第2特定構造から回折されたX線のパターンを検出する段階と、
上記第1および第2特定構造の整列を評価するために上記パターンを分析する段階と、
を含む、検査のための方法が提供される。
当該サンプルの表面上に重畳された第1および第2の薄膜層内に夫々形成された第1および第2特定構造を含むサンプルの領域に衝当する様にX線のビームを導向すべく構成されたX線源と、
上記第1および第2特定構造から回折されたX線のパターンを検出すべく構成された検出器と、
上記第1および第2特定構造の整列を評価するために上記パターンを分析すべく接続された信号プロセッサと、
を含む、検査のための装置も提供される。
22 半導体ウェハ
24 オーバレイ試験パターン
26 X線源
28 X線管
30 多層湾曲ミラー
32 スリット
34 位置感応検出器
36 検出器要素
38 信号プロセッサ
40 ストライプ
42 トレンチ
44 ストライプ
46 下側位置層
50 X線回折パターン
52 X線回折パターン
54 X線回折パターン
56 X線回折パターン
60 試験パターン
70 試験パターン
62 第1層
64 凹所
66 高位矩形
72 バー
74 バー
Claims (12)
- サンプルの表面上に重畳された第1および第2の薄膜層内に夫々形成された第1および第2特定構造を含むサンプルの領域に衝当する様にX線のビームを導向する段階と、
該サンプルを貫通する該ビームの透過に追随して該第1および第2特定構造から回折されたX線のパターンを検出する段階であって、該検出されたパターンは、角度の範囲にわたって複数個の高次サイドローブを含め、夫々の振幅を有する回折ローブを備える、段階と、
該第1および第2特定構造の整列を評価するために、該検出されたパターンを基準回折パターンと比較し、該基準回折パターンに対する、該検出されたパターンにおける各高次サイドローブ間のエネルギの分布の変動に応じて、該第1および第2特定構造が誤整列されているのを決定することにより、該検出されたパターンを分析する段階と、
を備えて成る、検査のための方法。 - 前記サンプルは対置された第1および第2側面を有し、前記ビームを導向する前記段階は、上記第1側面から上記第2側面へと上記サンプルを貫通通過する様に上記ビームを導向する段階を備え、且つ、前記第1および第2の薄膜層は上記サンプルの上記第2側面上に形成される、請求項1記載の方法。
- 前記X線のビームを導向する前記段階は該ビームを平行化して単色光化する段階を備えて成る、請求項1記載の方法。
- 前記パターンを検出する前記段階は、回折されたX線を前記ビームに対する角度の関数として検出するX線検出器の配列を用いる段階を備えて成る、請求項1記載の方法。
- 前記パターンを検出する前記段階は、2次元回折パターンを検出する段階を備え、且つ、上記パターンを分析する前記段階は、2つの軸心に関する整列を評価する段階を備えて成る、請求項1記載の方法。
- 前記サンプルは半導体ウェハから成り、且つ、前記第1および第2特定構造は、上記ウェハの表面上にフォトリソグラフ的プロセスにより形成された整列目標部から成る、請求項1記載の方法。
- サンプルの表面上に重畳された第1および第2の薄膜層内に夫々形成された第1および第2特定構造を含むサンプルの領域に衝当する様にX線のビームを導向すべく構成されたX線源と、
該サンプルを貫通する該ビームの透過に追随して該第1および第2特定構造から回折されたX線のパターンを検出すべく構成された検出器であって、該検出されたパターンは、角度の範囲にわたって複数個の高次サイドローブを含め、夫々の振幅を有する回折ローブを備える、検出器と、
該第1および第2特定構造の整列を評価するために、該検出されたパターンを基準回折パターンと比較し、該基準回折パターンに対する、該検出されたパターンにおける各高次サイドローブ間のエネルギの分布の変動に応じて、該第1および第2特定構造が誤整列されているのを決定することにより、該検出されたパターンを分析すべく接続された信号プロセッサと、
を備えて成る、検査のための装置。 - 前記サンプルは対置された第1および第2側面を有し、前記X線源は、上記第1側面から上記第2側面へと上記サンプルを貫通通過する様に上記ビームを導向すべく構成され、且つ、前記第1および第2の薄膜層は上記サンプルの上記第2側面上に形成される、請求項7記載の装置。
- 前記X線源は、前記ビームを平行化して単色光化するX線管およびX線光学機器を備えて成る、請求項7記載の装置。
- 前記検出器は、前記ビームに対する角度の関数として回折されたX線を検出すべく配置されたX線検出器の配列から成る、請求項7記載の装置。
- 前記パターンは2次元回折パターンから成り、且つ、前記信号プロセッサは、2つの軸心に関する整列を評価すべく上記パターンを分析し得る、請求項7記載の装置。
- 前記サンプルは半導体ウェハから成り、且つ、前記第1および第2特定構造は、上記ウェハの表面上にフォトリソグラフ的プロセスにより形成された整列目標部から成る、請求項7記載の装置。
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US11/389,490 | 2006-03-27 | ||
US11/389,490 US7481579B2 (en) | 2006-03-27 | 2006-03-27 | Overlay metrology using X-rays |
Publications (2)
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JP2007305971A JP2007305971A (ja) | 2007-11-22 |
JP5390075B2 true JP5390075B2 (ja) | 2014-01-15 |
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JP2007079443A Active JP5390075B2 (ja) | 2006-03-27 | 2007-03-26 | X線を用いるオーバレイ計測 |
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US (1) | US7481579B2 (ja) |
JP (1) | JP5390075B2 (ja) |
KR (1) | KR101341873B1 (ja) |
TW (1) | TWI421642B (ja) |
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