JP5374106B2 - 半導体光機能デバイス - Google Patents
半導体光機能デバイス Download PDFInfo
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- JP5374106B2 JP5374106B2 JP2008247954A JP2008247954A JP5374106B2 JP 5374106 B2 JP5374106 B2 JP 5374106B2 JP 2008247954 A JP2008247954 A JP 2008247954A JP 2008247954 A JP2008247954 A JP 2008247954A JP 5374106 B2 JP5374106 B2 JP 5374106B2
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/12—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/026—Monolithically integrated components, e.g. waveguides, monitoring photo-detectors, drivers
- H01S5/0265—Intensity modulators
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04256—Electrodes, e.g. characterised by the structure characterised by the configuration
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1003—Waveguide having a modified shape along the axis, e.g. branched, curved, tapered, voids
- H01S5/101—Curved waveguide
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2213—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers based on polyimide or resin
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/30—Structure or shape of the active region; Materials used for the active region
- H01S5/32—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures
- H01S5/3211—Structure or shape of the active region; Materials used for the active region comprising PN junctions, e.g. hetero- or double- heterostructures characterised by special cladding layers, e.g. details on band-discontinuities
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Semiconductor Lasers (AREA)
- Optical Integrated Circuits (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Description
of operating conditions for a 1000km -2.5Gb/s transmission with a new WDM
optimized design of integrated laser-electroabsorption modulator", Optical
Fiber Communication 1999, WH1-1)においては、戻り光の量を抑えるために、二つの対策を施している。一つ目は、光導波路をある曲率をもたせて曲げる。二つ目は、光導波路の終端部において、その光導波路の幅を広げた領域(以下、幅広終端領域という)を設ける。これによって、光導波路の終端部で発生する戻り光が、光導波路に結合し難くなる。
"Wide range of operatingconditions for a 1000km -2.5Gb/s transmission with a new WDM optimized designof integrated laser-electroabsorption modulator", Optical FiberCommunication 1999, WH1-1
128,228,328:光導波路
129,229,329:非導波領域
130,230,330:基板端面
132,232,332:半導体界面
Claims (2)
- 基板端面を有する半導体基板と;
前記半導体基板上に形成された光導波路と;
前記半導体基板上において、少なくとも前記光導波路の終端部と前記基板端面との間に形成された非導波領域と;
前記光導波路の周囲に形成され、前記基板端面側に前記非導波領域と接する半導体界面を有する絶縁領域とを備え、
前記光導波路の軸が、前記基板端面に対して、垂直ではなく、所定の角度θを持って延び、
前記絶縁領域は、前記半導体界面と前記基板端面との距離が、前記光導波路から離れるにしたがって大きくなるように、前記半導体界面の前記基板端面に対する傾斜角が所定の角度Zを持って傾斜するように成形され、
前記光導波路から出射された光の一部が前記基板端面から出射され、前記光導波路から出射された光の他の一部が前記基板端面で反射され、且つ、前記基板端面で反射されて前記半導体界面に入射する光が全反射されるように前記角度θおよび前記角度Zが設定されていることを特徴とする半導体光機能デバイス。 - 前記基板端面に対する前記半導体界面の角度を5〜60度に設定したことを特徴とする
請求項1に記載の半導体光機能デバイス。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008247954A JP5374106B2 (ja) | 2008-09-26 | 2008-09-26 | 半導体光機能デバイス |
US12/556,083 US8630516B2 (en) | 2008-09-26 | 2009-09-09 | Semiconductor optical function device |
Applications Claiming Priority (1)
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JP2008247954A JP5374106B2 (ja) | 2008-09-26 | 2008-09-26 | 半導体光機能デバイス |
Publications (2)
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JP2010080707A JP2010080707A (ja) | 2010-04-08 |
JP5374106B2 true JP5374106B2 (ja) | 2013-12-25 |
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JP2008247954A Active JP5374106B2 (ja) | 2008-09-26 | 2008-09-26 | 半導体光機能デバイス |
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US (1) | US8630516B2 (ja) |
JP (1) | JP5374106B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5374106B2 (ja) * | 2008-09-26 | 2013-12-25 | ネオフォトニクス・セミコンダクタ合同会社 | 半導体光機能デバイス |
JP5703915B2 (ja) * | 2011-04-05 | 2015-04-22 | 三菱電機株式会社 | リッジ型半導体レーザ素子 |
JP7192255B2 (ja) * | 2018-05-31 | 2022-12-20 | 富士通オプティカルコンポーネンツ株式会社 | 光デバイス、これを用いた光モジュール、及び光デバイスの試験方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60254006A (ja) * | 1984-05-30 | 1985-12-14 | Nec Corp | 導波型空間フイルタとその製造方法 |
US4872180A (en) * | 1989-06-16 | 1989-10-03 | Gte Laboratories Incorporated | Method for reducing facet reflectivities of semiconductor light sources and device thereof |
JP3070016B2 (ja) | 1990-12-07 | 2000-07-24 | 日本電信電話株式会社 | 光導波路デバイス |
JP3200996B2 (ja) | 1992-08-26 | 2001-08-20 | ソニー株式会社 | 光導波路装置 |
JP4570712B2 (ja) * | 1999-10-14 | 2010-10-27 | Okiセミコンダクタ株式会社 | 半導体導波路素子及びその製造方法 |
JP4618854B2 (ja) * | 2000-08-11 | 2011-01-26 | Okiセミコンダクタ株式会社 | 半導体装置およびその製造方法 |
JP3888080B2 (ja) * | 2001-04-24 | 2007-02-28 | 日亜化学工業株式会社 | 半導体レーザ素子 |
JP3742317B2 (ja) * | 2001-07-02 | 2006-02-01 | アンリツ株式会社 | 半導体発光素子及びその製造方法 |
US6834152B2 (en) * | 2001-09-10 | 2004-12-21 | California Institute Of Technology | Strip loaded waveguide with low-index transition layer |
US6882762B2 (en) * | 2001-09-27 | 2005-04-19 | Intel Corporation | Waveguide in a printed circuit board and method of forming the same |
JP2005327783A (ja) * | 2004-05-12 | 2005-11-24 | Sony Corp | 半導体レーザ |
WO2008061356A1 (en) * | 2006-11-21 | 2008-05-29 | Onechip Photonics Inc. | Integrated optics arrangement for wavelength (de)multiplexing in a multi-guide vertical stack |
JP5374106B2 (ja) * | 2008-09-26 | 2013-12-25 | ネオフォトニクス・セミコンダクタ合同会社 | 半導体光機能デバイス |
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2008
- 2008-09-26 JP JP2008247954A patent/JP5374106B2/ja active Active
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2009
- 2009-09-09 US US12/556,083 patent/US8630516B2/en active Active
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Publication number | Publication date |
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JP2010080707A (ja) | 2010-04-08 |
US20100080506A1 (en) | 2010-04-01 |
US8630516B2 (en) | 2014-01-14 |
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