JP5372726B2 - 回路基板及びその製造方法 - Google Patents
回路基板及びその製造方法 Download PDFInfo
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4007—Surface contacts, e.g. bumps
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- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
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- H05K3/062—Etching masks consisting of metals or alloys or metallic inorganic compounds
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
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- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/421—Blind plated via connections
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
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- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0364—Conductor shape
- H05K2201/0367—Metallic bump or raised conductor not used as solder bump
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0364—Conductor shape
- H05K2201/0376—Flush conductors, i.e. flush with the surface of the printed circuit
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/09372—Pads and lands
- H05K2201/09436—Pads or lands on permanent coating which covers the other conductors
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09545—Plated through-holes or blind vias without lands
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0361—Stripping a part of an upper metal layer to expose a lower metal layer, e.g. by etching or using a laser
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/0554—Metal used as mask for etching vias, e.g. by laser ablation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0562—Details of resist
- H05K2203/0574—Stacked resist layers used for different processes
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1152—Replicating the surface structure of a sacrificial layer, e.g. for roughening
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/30—Details of processes not otherwise provided for in H05K2203/01 - H05K2203/17
- H05K2203/308—Sacrificial means, e.g. for temporarily filling a space for making a via or a cavity or for making rigid-flexible PCBs
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/243—Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49147—Assembling terminal to base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Metallurgy (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Manufacturing Of Printed Wiring (AREA)
Description
Claims (9)
- 回路基板の製造方法であって、
基層、内側パッドを有し前記基層上に配置されるパターン形成された導電層、並びに前記基層上に配置され前記パターン形成された導電層及び前記基層を覆う誘電体層を用意するステップと、
前記誘電体層上に、前記誘電体層の一部を露出させる第1の開口部を有するパターン形成された金属マスクを形成するステップと、
前記第1の開口部により露出された前記誘電体層の一部を除去し、前記内側パッドの上面のみ、又は前記内側パッドの上面及び側面並びに前記基層の一部を露出させる誘電体開口部を該誘電体開口の内径が前記第1の開口部の内径と等しくなるように形成するステップと、
前記パターン形成された金属マスク上に、前記内側パッドを露出させる第2の開口部を有する第1のパターン形成されたマスクを形成するステップと、
前記誘電体開口部を塞ぐ導電性ブロック、前記第1の開口部を塞ぎ前記導電性ブロックと一体的に形成される外側パッド、及び前記第2の開口部を塞ぐ第1の金属層を有し、前記内側パッドを覆う導電構造体を形成するステップと、
前記導電構造体の前記外側パッドが前記誘電体層の表面から突出するように、前記第1のパターン形成されたマスク、前記第1の金属層、及び前記パターン形成された金属マスクを除去するステップとを含む方法。 - 請求項1に記載の回路基板の製造方法であって、
前記パターン形成された金属マスクを形成するステップが、
前記誘電体層上に、電気めっきのためのシード層を形成するステップと、
前記シード層上に、第2の金属層を電気めっきにより形成するステップと、
前記第2の金属層上に、前記第2の金属層の一部を露出させる第3の開口部を有する第2のパターン形成されたマスクを形成するステップと、
前記第3の開口部により露出された前記第2の金属層の一部、及び前記シード層の一部をエッチングし、前記パターン形成された金属マスクを形成するステップと、
前記第2のパターン形成されたマスクを除去するステップとを含むことを特徴とする方法。 - 請求項1に記載の回路基板の製造方法であって、
前記第1の開口部により露出された前記誘電体層の一部を除去するステップが、
レーザ処理、選択性イオンエッチング、または選択性プラズマエッチングを含むことを特徴とする方法。 - 請求項1に記載の回路基板の製造方法であって、
前記導電性構造体を形成するステップが、
前記誘電体開口部の内壁上に、電気めっきのためのシード層を形成するステップと、
前記内側パッドを覆う前記導電体構造体を電気めっきにより形成するステップとを含むことを特徴とする方法。 - 請求項1に記載の回路基板の製造方法であって、
前記第1の金属層を除去するステップが、
ブラッシング処理、研磨処理または化学機械研磨処理を含むことを特徴とする方法。 - 請求項1に記載の回路基板の製造方法であって、
前記内側パッドの外径を前記誘電体開口部の内径よりも大きくしたことを特徴とする方法。 - 請求項1に記載の回路基板の製造方法であって、
前記内側パッドの外径を前記誘電体開口部の内径よりも小さくしたことを特徴とする方法。 - 請求項1に記載の回路基板の製造方法であって、
前記第1のパターン形成されたマスクの形成前に、前記パターン形成された金属マスクをエッチングし、前記パターン形成された金属マスクの前記第1の開口部が前記誘電体開口部及び前記誘電体開口部を取り囲む前記誘電体層の一部を露出させるようにしたことを含むことを特徴とする方法。 - 請求項1に記載の回路基板の製造方法であって、
前記パターン形成された金属マスクの除去後に、前記外側パッド及び前記外側パッドを取り囲む前記誘電体層の一部に対してサンドブラスト処理を施し、前記外側パッドが前記誘電体層上において凸面を形成し、前記外側パッドを取り囲む前記誘電体層の一部が前記誘電体層上において凹面を形成するようにしたことを特徴とする方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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TW098137833 | 2009-11-06 | ||
TW098137833A TWI412308B (zh) | 2009-11-06 | 2009-11-06 | 線路基板及其製程 |
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JP2011100957A JP2011100957A (ja) | 2011-05-19 |
JP5372726B2 true JP5372726B2 (ja) | 2013-12-18 |
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US (2) | US8261436B2 (ja) |
JP (1) | JP5372726B2 (ja) |
TW (1) | TWI412308B (ja) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8302298B2 (en) * | 2009-11-06 | 2012-11-06 | Via Technologies, Inc. | Process for fabricating circuit substrate |
US20120273261A1 (en) * | 2010-10-20 | 2012-11-01 | Taiwan Green Point Enterprises Co., Ltd. | Circuit substrate having a circuit pattern and method for making the same |
TWI436713B (zh) | 2010-07-26 | 2014-05-01 | Via Tech Inc | 線路基板、線路基板製程 |
CN103404244B (zh) * | 2010-12-24 | 2016-12-14 | Lg伊诺特有限公司 | 印刷电路板及其制造方法 |
TWI444123B (zh) | 2012-02-16 | 2014-07-01 | Via Tech Inc | 線路板製作方法及線路板 |
TWI440419B (zh) | 2012-09-14 | 2014-06-01 | Via Tech Inc | 線路基板及線路基板製程 |
JP5913063B2 (ja) * | 2012-11-27 | 2016-04-27 | 日本特殊陶業株式会社 | 配線基板 |
TWI528517B (zh) | 2013-03-26 | 2016-04-01 | 威盛電子股份有限公司 | 線路基板、半導體封裝結構及線路基板製程 |
KR101482429B1 (ko) * | 2013-08-12 | 2015-01-13 | 삼성전기주식회사 | 인쇄회로기판 및 그 제조방법 |
JP2016018806A (ja) * | 2014-07-04 | 2016-02-01 | 新光電気工業株式会社 | 配線基板、配線基板の製造方法 |
JP6696567B2 (ja) | 2016-05-16 | 2020-05-20 | 株式会社村田製作所 | セラミック電子部品 |
KR101944997B1 (ko) * | 2017-01-06 | 2019-02-01 | 조인셋 주식회사 | 금속패드 인터페이스 |
TWI603654B (zh) * | 2017-01-23 | 2017-10-21 | 欣興電子股份有限公司 | 電路板與其製作方法 |
CN107385391A (zh) * | 2017-07-14 | 2017-11-24 | 京东方科技集团股份有限公司 | 掩膜板、oled显示基板及其制作方法、显示装置 |
US10957595B2 (en) | 2018-10-16 | 2021-03-23 | Cerebras Systems Inc. | Systems and methods for precision fabrication of an orifice within an integrated circuit |
US11145530B2 (en) | 2019-11-08 | 2021-10-12 | Cerebras Systems Inc. | System and method for alignment of an integrated circuit |
TWI736207B (zh) * | 2020-04-06 | 2021-08-11 | 欣興電子股份有限公司 | 電路板的製造方法與電路板 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07240568A (ja) * | 1994-02-28 | 1995-09-12 | Mitsubishi Electric Corp | 回路基板およびその製造方法 |
JP3112059B2 (ja) * | 1995-07-05 | 2000-11-27 | 株式会社日立製作所 | 薄膜多層配線基板及びその製法 |
US5673946A (en) * | 1995-07-07 | 1997-10-07 | Ewal Manufacturing Co., Inc. | Gasket assembly for a fluid coupling |
KR100244580B1 (ko) * | 1997-06-24 | 2000-02-15 | 윤종용 | 금속 범프를 갖는 회로 기판의 제조 방법 및 그를 이용한 반도체 칩 패키지의 제조 방법 |
JPH1117340A (ja) * | 1997-06-27 | 1999-01-22 | Kokusai Electric Co Ltd | ブラインドスルーホールの形成方法 |
US6583364B1 (en) * | 1999-08-26 | 2003-06-24 | Sony Chemicals Corp. | Ultrasonic manufacturing apparatuses, multilayer flexible wiring boards and processes for manufacturing multilayer flexible wiring boards |
TW530377B (en) * | 2002-05-28 | 2003-05-01 | Via Tech Inc | Structure of laminated substrate with high integration and method of production thereof |
JP2005332928A (ja) * | 2004-05-19 | 2005-12-02 | Sumitomo Heavy Ind Ltd | プリント配線板の製造方法 |
JP4515177B2 (ja) * | 2004-07-13 | 2010-07-28 | 新光電気工業株式会社 | 配線形成方法 |
TWI299248B (en) * | 2004-09-09 | 2008-07-21 | Phoenix Prec Technology Corp | Method for fabricating conductive bumps of a circuit board |
TWI264257B (en) * | 2004-11-24 | 2006-10-11 | Via Tech Inc | Signal transmission structure and circuit substrate thereof |
CN2755906Y (zh) | 2004-12-06 | 2006-02-01 | 威盛电子股份有限公司 | 讯号传输结构 |
US7323406B2 (en) * | 2005-01-27 | 2008-01-29 | Chartered Semiconductor Manufacturing Ltd. | Elevated bond-pad structure for high-density flip-clip packaging and a method of fabricating the structures |
CN100534263C (zh) | 2005-11-30 | 2009-08-26 | 全懋精密科技股份有限公司 | 电路板导电凸块结构及其制法 |
US7659193B2 (en) * | 2005-12-23 | 2010-02-09 | Phoenix Precision Technology Corporation | Conductive structures for electrically conductive pads of circuit board and fabrication method thereof |
TWI331797B (en) * | 2007-04-18 | 2010-10-11 | Unimicron Technology Corp | Surface structure of a packaging substrate and a fabricating method thereof |
TWI331488B (en) * | 2007-10-09 | 2010-10-01 | Unimicron Technology Corp | Printed circuit board and fabrication method thereof |
TWI357294B (en) * | 2008-02-29 | 2012-01-21 | Unimicron Technology Corp | Wire structure on circuit board and method for fab |
CN101534609B (zh) | 2008-03-12 | 2011-11-16 | 欣兴电子股份有限公司 | 线路板上的线路结构及其制造方法 |
US8302298B2 (en) * | 2009-11-06 | 2012-11-06 | Via Technologies, Inc. | Process for fabricating circuit substrate |
TWI436713B (zh) * | 2010-07-26 | 2014-05-01 | Via Tech Inc | 線路基板、線路基板製程 |
-
2009
- 2009-11-06 TW TW098137833A patent/TWI412308B/zh active
- 2009-12-22 JP JP2009290849A patent/JP5372726B2/ja active Active
- 2009-12-23 US US12/646,384 patent/US8261436B2/en active Active
-
2012
- 2012-07-06 US US13/543,547 patent/US20120267155A1/en not_active Abandoned
Also Published As
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US20110108313A1 (en) | 2011-05-12 |
US8261436B2 (en) | 2012-09-11 |
TWI412308B (zh) | 2013-10-11 |
TW201117689A (en) | 2011-05-16 |
US20120267155A1 (en) | 2012-10-25 |
JP2011100957A (ja) | 2011-05-19 |
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