JP5353313B2 - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP5353313B2 JP5353313B2 JP2009053197A JP2009053197A JP5353313B2 JP 5353313 B2 JP5353313 B2 JP 5353313B2 JP 2009053197 A JP2009053197 A JP 2009053197A JP 2009053197 A JP2009053197 A JP 2009053197A JP 5353313 B2 JP5353313 B2 JP 5353313B2
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Description
1.第1の例
図4を参照して、半導体素子のパッド構造の第1の例について説明する。ここで、図4(a)は、第1の例に係る電極パッドおよび当該電極パッドの近傍の平面図であり、図4(b)は、図4(a)において一点鎖線C−Cで示す箇所の断面図である。
次に、図8を参照して、半導体素子のパッド構造の第2の例について説明する。ここで、図8(a)は、第2の例に係る電極パッドおよび当該電極パッドの近傍の平面図であり、図8(b)は、図8(a)において一点鎖線D−Dで示す箇所の断面図である。なお、図5において、図4に示した箇所と同じ箇所には同じ符号を付して、その説明を省略する。
次に、上述の半導体素子のパッド構造の製造方法について説明する。
配線部23は、炭化シリコン(SiC)膜50上に、絶縁膜として、例えば二酸化シリコン(SiO2)等のシリコン酸化膜(SiO)51が設けられ、当該シリコン酸化膜(SiO)51内にタンタル(Ta)層52に積層形成された銅(Cu)層21が形成されてなる層が複数積層されてなる。
炭化シリコン(SiC)膜24は、例えば約70nmの膜厚を有する。二酸化シリコン(SiO2)膜25は、例えば約1400nm乃至約1500nmの膜厚を有する。窒化シリコン(SiN)膜53は、例えば約50nmの膜厚を有する。
次に、開口形成された孔部55内及び窒化シリコン(SiN)膜53上に、フォトレジスト等の樹脂56を設ける。(図15参照)
次いで、孔部55内に設けられた樹脂56の厚さが、図4に示すビア27の鉛直方向の長さになるように、孔部55内および窒化シリコン(SiN)膜53上に設けられた樹脂56を、酸素(O2)プラズマによりエッチングする。(図16参照)
しかる後、後の工程で形成される銅(Cu)層26(図4参照)に相当する部分を開口させたフォトレジスト57をフォトリソグラフィ技術により、窒化シリコン(SiN)膜53上に形成する。(図17参照)。
次いで、孔55内の樹脂56と、窒化シリコン(SiN)膜53と、フォトレジスト57とを、酸素/四フッ化炭素(O2/CF4)プラズマで剥離する。そして、孔55内から樹脂56を取り除かれるとビア27(図4参照)が形成される。更に、ビア27の底部に位置する炭化シリコン(SiC)膜24をドライエッチングにより取り除く。(図19参照)
しかる後、スパッタリング法により、タンタル(Ta)層28と銅(Cu)のシード層60とをこの順で、二酸化シリコン(SiO2)膜25上と、孔部58とビア27の内壁部および底部とに積層形成する。(図20参照)
タンタル(Ta)層28は、例えば約25nmの膜厚を有する。銅(Cu)のシード層60は、例えば約100nmの膜厚を有する。
次いで、孔部58内の銅(Cu)層の厚さが約800nm乃至約900nmになるように、孔部58の外側および上部に位置する銅(Cu)層26を化学機械研磨(CMP)により除去する。(図22参照)
次に、二酸化シリコン(SiO2)膜25と、タンタル(Ta)層28と、銅(Cu)層26の上面に、プラズマ化学気相成長(PECVD)法により、炭化シリコン(SiC)膜29と二酸化シリコン(SiO2)膜30とをこの順で積層形成し、更に、反射防止膜として窒化シリコン(SiN)膜61を成膜する。(図23参照)
炭化シリコン(SiC)膜29は、例えば約70nmの膜厚を有する。二酸化シリコン(SiO2)膜30は、例えば約730nmの膜厚を有する。窒化シリコン(SiN)膜61は、例えば約50nmの膜厚を有する。
しかる後、スパッタリング法により、シリコン酸化膜(SiO)30の上面と溝部31の内壁部および底部とに、タンタル(Ta)層71、チタン(Ti)層72、窒化チタン(TiN)層73、アルミニウム(Al)層33、および窒化チタン(TiN)層34をこの順で積層形成する。(図26参照)
溝部31内におけるタンタル(Ta)層71、チタン(Ti)層72、窒化チタン(TiN)層73、アルミニウム(Al)層33、および窒化チタン(TiN)層34は、溝部31の形状に沿った形状を有する。タンタル(Ta)層71は例えば約10nm乃至約20nm、チタン(Ti)層72は例えば約40nm、窒化チタン(TiN)層73は例えば約30nmの膜厚を有する。アルミニウム(Al)層33は例えば約1μm、窒化チタン(TiN)層34は例えば約50nmの膜厚を有する。タンタル(Ta)層71、チタン(Ti)層72、および窒化チタン(TiN)層73によりパッド接続層32が形成される。
しかる後、フォトレジスト75をマスクに用いて、タンタル(Ta)層71、チタン(Ti)層72、窒化チタン(TiN)層73、アルミニウム(Al)層33、および窒化チタン(TiN)層34にドライエッチングを施して、図4に示すパッド形成部33が形成される。(図28参照)
次に、化学気相成長(CVD)法により、シリコン酸化膜(SiO)30上と、窒化チタン(TiN)層34上と、タンタル(Ta)層71、チタン(Ti)層72、窒化チタン(TiN)層73、アルミニウム(Al)層33、および窒化チタン(TiN)層34の側面上とに、二酸化シリコン(SiO2)35と、窒化シリコン(SiN)膜36とをこの順に積層形成する。(図29参照)
溝部31上におけるシリコン酸化膜(SiO)35と窒化シリコン(SiN)膜36は、溝部31の形状に大略沿った形状を有する。二酸化シリコン(SiO2)35は、例えば約300nm乃至約500nmの膜厚を有し、窒化シリコン(SiN)膜36は、例えば約500nmの膜厚を有する。
なお、図8に示す本発明の実施の形態の第2の例に係る半導体素子の電極パッド構造の製造にあっては、図30に示す工程において、フォトレジスト80として、パッド形成部33の外周部分およびその近傍以外の箇所を開口させたフォトレジストを窒化シリコン(SiN)膜36上に形成する。そして、当該フォトレジストをマスクに用いて、窒化チタン(TiN)層34、二酸化シリコン(SiO2)35、および窒化シリコン(SiN)膜36にドライエッチングを施す。その結果、上方から溝部31内に設けられたアルミニウム33により、ボンディング領域33aとテスト領域33bとの境界部分が明確となった状態でパッド形成部33の上面が露出した本発明の実施の形態の第2の例に係る半導体素子の電極パッド構造が形成される。
(付記1)
半導体基板上に設けられた第1の金属層と、
前記第1の金属層上に設けられた絶縁層と、
前記絶縁層上に設けられ、外部に露出した電極パッド面を有する第2の金属層と、を含み、
前記第2の金属層及び前記絶縁層に、凹部が形成されており、
前記絶縁層の凹部内に、前記第2の金属層が設けられていることを特徴とする半導体装置。
(付記2)
付記1記載の半導体装置であって、
前記電極パッド面は、ワイヤボンディングが行われるボンディング領域と、プロービング試験を行うためにプローブ針が接触するテスト領域とを含み、
前記絶縁層の凹部内に設けられた前記第2の金属層は、前記ボンディング領域と前記テスト領域との境に設けられていることを特徴とする半導体装置。
(付記3)
付記1又は2記載の半導体装置であって、
前記電極パッド面の外周部分には、絶縁膜が形成されていることを特徴とする半導体装置。
(付記4)
付記1乃至3いずれか一項記載の半導体装置であって、
前記凹部に設けられた前記第2の金属層上に、前記絶縁膜が形成されていることを特徴とする半導体装置。
(付記5)
付記1乃至4いずれか一項記載の半導体装置であって、
前記凹部に設けられた前記第2の金属層上に形成された前記絶縁膜は、前記凹部に沿った断面形状を有することを特徴とする半導体装置。
(付記6)
付記1乃至5いずれか一項記載の半導体装置であって、
前記第1の金属層を構成する材料は、銅(Cu)を含むことを特徴とする半導体装置。
(付記7)
付記1乃至6いずれか一項記載の半導体装置であって、
前記第2の金属層を構成する材料は、アルミニウム(Al)を含むことを特徴とする半導体装置。
(付記8)
付記1乃至7いずれか一項記載の半導体装置であって、
前記電極パッド面は平坦であることを特徴とする半導体装置。
(付記9)
付記1乃至8いずれか一項記載の半導体装置であって、
前記凹部は、複数形成され、
前記複数の凹部は、1列状に形成されていることを特徴とする半導体装置。
(付記10)
付記1乃至8いずれか一項記載の半導体装置であって、
前記凹部は、複数形成され、
前記複数の凹部は、複数列状に形成されていることを特徴とする半導体装置。
(付記11)
付記10記載の半導体装置であって、
前記各列の前記凹部は、前記列の配列方向において互い違いに形成されていることを特徴とする半導体装置。
(付記12)
付記1乃至11記載の半導体装置であって、
前記凹部は、平面視略矩形形状を有することを特徴とする半導体装置。
シリコン酸化膜(SiO) 30、35
溝部 31
パッド形成部 33
ボンディング領域 33a
テスト領域 33b
窒化シリコン膜(SiN) 36
Claims (7)
- 半導体基板上に設けられた第1の金属層と、
前記第1の金属層上に設けられた絶縁層と、
前記絶縁層上に設けられ、外部に露出した電極パッド面を有する第2の金属層と、を含み、
前記第2の金属層及び前記絶縁層のそれぞれに、少なくとも1つの列状に形成された複数の凹部が形成されており、前記第2の金属層の凹部は、前記絶縁層の凹部に沿って形成された前記第2の金属層の部分であり、
前記電極パッド面は、ワイヤボンディングが行われるボンディング領域と、プロービング試験を行うためにプローブ針が接触するテスト領域とを含み、
前記第2の金属層の前記複数の凹部は、前記電極パッド面の前記ボンディング領域と前記テスト領域との境界部に設けられている
ことを特徴とする半導体装置。 - 請求項1記載の半導体装置であって、
前記電極パッド面の外周部分には、絶縁膜が形成されていることを特徴とする半導体装置。 - 請求項2記載の半導体装置であって、
前記絶縁膜は、前記電極パッド面の前記外周部分に加えて、前記電極パッド面の前記境界部上に形成されて、前記ボンディング領域及び前記テスト領域を露出させていることを特徴とする半導体装置。 - 請求項3記載の半導体装置であって、
前記電極パッド面の前記境界部上に形成された前記絶縁膜は、前記第2の金属層の前記複数の凹部に沿った断面形状を有することを特徴とする半導体装置。 - 請求項1乃至4いずれか一項記載の半導体装置であって、
前記第1の金属層を構成する材料は、銅(Cu)を含むことを特徴とする半導体装置。 - 請求項1乃至5いずれか一項記載の半導体装置であって、
前記第2の金属層を構成する材料は、アルミニウム(Al)を含むことを特徴とする半導体装置。 - 請求項1乃至6いずれか一項記載の半導体装置であって、
前記電極パッド面は平坦であることを特徴とする半導体装置。
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