JP5342220B2 - 基板処理装置 - Google Patents

基板処理装置 Download PDF

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Publication number
JP5342220B2
JP5342220B2 JP2008310947A JP2008310947A JP5342220B2 JP 5342220 B2 JP5342220 B2 JP 5342220B2 JP 2008310947 A JP2008310947 A JP 2008310947A JP 2008310947 A JP2008310947 A JP 2008310947A JP 5342220 B2 JP5342220 B2 JP 5342220B2
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Prior art keywords
liquid
microbubbles
generator
breaker
substrate
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JP2008310947A
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Japanese (ja)
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JP2010131544A (ja
JP2010131544A5 (enExample
Inventor
佳大 安藤
正泰 安部
治道 廣瀬
幸伸 西部
勉 菊池
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Shibaura Mechatronics Corp
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Shibaura Mechatronics Corp
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Priority to JP2008310947A priority Critical patent/JP5342220B2/ja
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Publication of JP2010131544A5 publication Critical patent/JP2010131544A5/ja
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JP2008310947A 2008-12-05 2008-12-05 基板処理装置 Expired - Fee Related JP5342220B2 (ja)

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JP2008310947A JP5342220B2 (ja) 2008-12-05 2008-12-05 基板処理装置

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JP2008310947A JP5342220B2 (ja) 2008-12-05 2008-12-05 基板処理装置

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JP2010131544A JP2010131544A (ja) 2010-06-17
JP2010131544A5 JP2010131544A5 (enExample) 2012-01-19
JP5342220B2 true JP5342220B2 (ja) 2013-11-13

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JP2008310947A Expired - Fee Related JP5342220B2 (ja) 2008-12-05 2008-12-05 基板処理装置

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012005344A1 (ja) * 2010-07-08 2012-01-12 株式会社エクサ ウエハ分離装置、ウエハ分離搬送装置、ウエハ分離方法、ウエハ分離搬送方法及び太陽電池用ウエハ分離搬送方法
JP6108209B2 (ja) * 2012-12-11 2017-04-05 株式会社リコー 微細気泡発生ノズル
CN106463387B (zh) * 2014-12-02 2019-06-28 希玛科技有限公司 采用微型纳米气泡的清洗方法和清洗装置
US20210138410A1 (en) * 2017-08-02 2021-05-13 Sigma-Technology Inc. Microbubble generation device and microbubble generation method, and shower apparatus and oil-water separation apparatus having said microbubble generation device

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3762206B2 (ja) * 2000-09-13 2006-04-05 株式会社アスプ 超微細気泡発生装置
JP2003117368A (ja) * 2001-10-11 2003-04-22 Kyowa Eng Kk 気−液または液−液の混合器、混合装置、混合液製造法および微細気泡含有液製造法
JP2006179765A (ja) * 2004-12-24 2006-07-06 Dainippon Screen Mfg Co Ltd 基板処理装置およびパーティクル除去方法
JP4917803B2 (ja) * 2005-12-26 2012-04-18 株式会社ガスター 微細気泡噴出ノズル及びそれを利用した微細気泡発生装置
JP2008080230A (ja) * 2006-09-27 2008-04-10 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法

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JP2010131544A (ja) 2010-06-17

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