JP2010131544A5 - - Google Patents

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Publication number
JP2010131544A5
JP2010131544A5 JP2008310947A JP2008310947A JP2010131544A5 JP 2010131544 A5 JP2010131544 A5 JP 2010131544A5 JP 2008310947 A JP2008310947 A JP 2008310947A JP 2008310947 A JP2008310947 A JP 2008310947A JP 2010131544 A5 JP2010131544 A5 JP 2010131544A5
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JP
Japan
Prior art keywords
microbubbles
bubble
control
microbubble generating
difficult
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Application number
JP2008310947A
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English (en)
Japanese (ja)
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JP2010131544A (ja
JP5342220B2 (ja
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Priority to JP2008310947A priority Critical patent/JP5342220B2/ja
Priority claimed from JP2008310947A external-priority patent/JP5342220B2/ja
Publication of JP2010131544A publication Critical patent/JP2010131544A/ja
Publication of JP2010131544A5 publication Critical patent/JP2010131544A5/ja
Application granted granted Critical
Publication of JP5342220B2 publication Critical patent/JP5342220B2/ja
Expired - Fee Related legal-status Critical Current
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JP2008310947A 2008-12-05 2008-12-05 基板処理装置 Expired - Fee Related JP5342220B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008310947A JP5342220B2 (ja) 2008-12-05 2008-12-05 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008310947A JP5342220B2 (ja) 2008-12-05 2008-12-05 基板処理装置

Publications (3)

Publication Number Publication Date
JP2010131544A JP2010131544A (ja) 2010-06-17
JP2010131544A5 true JP2010131544A5 (enExample) 2012-01-19
JP5342220B2 JP5342220B2 (ja) 2013-11-13

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ID=42343422

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008310947A Expired - Fee Related JP5342220B2 (ja) 2008-12-05 2008-12-05 基板処理装置

Country Status (1)

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JP (1) JP5342220B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5965316B2 (ja) * 2010-07-08 2016-08-03 株式会社渡辺商行 ウエハ分離装置、ウエハ分離搬送装置、ウエハ分離方法、ウエハ分離搬送方法及び太陽電池用ウエハ分離搬送方法
JP6108209B2 (ja) * 2012-12-11 2017-04-05 株式会社リコー 微細気泡発生ノズル
WO2016088731A1 (ja) * 2014-12-02 2016-06-09 シグマテクノロジー有限会社 マイクロ・ナノバブルによる洗浄方法及び洗浄装置
CN110891674A (zh) * 2017-08-02 2020-03-17 希玛科技有限公司 微气泡产生设备和微气泡产生方法，以及具有该微气泡产生设备的淋浴装置和油水分离装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3762206B2 (ja) * 2000-09-13 2006-04-05 株式会社アスプ 超微細気泡発生装置
JP2003117368A (ja) * 2001-10-11 2003-04-22 Kyowa Eng Kk 気−液または液−液の混合器、混合装置、混合液製造法および微細気泡含有液製造法
JP2006179765A (ja) * 2004-12-24 2006-07-06 Dainippon Screen Mfg Co Ltd 基板処理装置およびパーティクル除去方法
JP4917803B2 (ja) * 2005-12-26 2012-04-18 株式会社ガスター 微細気泡噴出ノズル及びそれを利用した微細気泡発生装置
JP2008080230A (ja) * 2006-09-27 2008-04-10 Dainippon Screen Mfg Co Ltd 基板処理装置および基板処理方法

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