JP5336476B2 - Pvd被膜形成方法 - Google Patents
Pvd被膜形成方法 Download PDFInfo
- Publication number
- JP5336476B2 JP5336476B2 JP2010510742A JP2010510742A JP5336476B2 JP 5336476 B2 JP5336476 B2 JP 5336476B2 JP 2010510742 A JP2010510742 A JP 2010510742A JP 2010510742 A JP2010510742 A JP 2010510742A JP 5336476 B2 JP5336476 B2 JP 5336476B2
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- Japan
- Prior art keywords
- deposition method
- pulse
- deposition
- oxide
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Description
コバルトがWC10%の組成の市販グレードH10Fの切削工具インサート及びインサートスタイルSNUN1204(サイズ12×12×4mm)が、以下によって、図1の超高真空蒸着装置内で被覆された。インサート(10)は、標準的な処置手順を利用して清浄化されて、基材ホルダ(4)に搭載され、前記基材ホルダ(4)は、蒸着中に回転操作可能であって、200cm2の面積を有しており、マグネトロン・スパッタ・ターゲット(3)の上方約10cmの位置にあった。基材ホルダ(4)は電気的に浮遊していた。ターゲット(3)は、直径50mmで厚さ3mmのアルミニュウム円板であった。蒸着は真空チャンバ(1)内で実行され、前記真空チャンバ(1)は最初に5×10-7Torrまで排気された。蒸着が開始される前に、インサート(10)は、適切な表面温度の約600℃まで加熱された。アルゴンがスパッタガスとして用いられ、前記スパッタガスは第1質量流量制御器(5)を通してチャンバ(1)内に導入された。100sccmの一定流量のアルゴンが用いられ、前記流量はチャンバ(1)内の6mTorrの全圧を招来した。
Claims (14)
- 結晶性の金属酸化物、窒化物、若しくは炭化物、又はそれらの混合物の被膜の蒸着方法であって、
アルゴンと反応性ガスとの混合ガス中で、少なくとも320Wcm-2 のピークパルス電力で、100μsまでのパルス幅で、及び100Hzからの繰返し周波数で、一個以上のターゲットにおける高電力インパルス・マグネトロン・スパッタリングHIPIMS放電を操作することにより特徴付けられる、蒸着方法。 - 電源によって生み出された200Vから2000Vまでの範囲の負電圧パルスを陽極に対して前記ターゲットに印加することによって蒸着が開始されることを特徴とする、請求項1に記載の蒸着方法。
- 電源によって生み出された500Vから1000Vまでの範囲の負電圧パルスを陽極に対して前記ターゲットに印加することによって蒸着が開始されることを特徴とする、請求項1又は2に記載の蒸着方法。
- 2μsから40μsまでのパルス幅によって特徴付けられる、請求項1〜3のいずれか一項に記載の蒸着方法。
- 10μsから40μsまでのパルス幅によって特徴付けられる、請求項1〜4のいずれか一項に記載の蒸着方法。
- 300Hzから10kHzまでの繰返し周波数によって特徴付けられる、請求項1〜5のいずれか一項に記載の蒸着方法。
- 500Hzから3kHzまでの繰返し周波数によって特徴付けられる、請求項1〜6のいずれか一項に記載の蒸着方法。
- マグネトロン・スパッタ・グロー放電(9)をパルスが点火するパルスユニットを具備する電源(7)を使うことを特徴とする請求項1〜7のいずれか一項に記載の蒸着方法であって、
前記グロー放電(9)は、ピークパルス電力が達せられる各パルス中の最大ピークまで上昇する電流をともない、その後電流は一定であるか又はピーク値の最低でも50%まで低下する、請求項1〜7のいずれか一項に記載の蒸着方法。 - 15mTorr以下の全圧によって特徴付けられる請求項1〜8のいずれか一項に記載の蒸着方法。
- 10mTorr以下の全圧によって特徴付けられる請求項1〜9のいずれか一項に記載の蒸着方法。
- 前記被膜が切削工具に蒸着されることを特徴とする、請求項1〜10のいずれか一項に記載の蒸着方法。
- 前記被膜が、X線回折によって測定されたとき、結晶性酸化物層を含んでいることを特徴とする、請求項1〜11のいずれか一項に記載の蒸着方法。
- 前記被膜が、二相酸化物、又は(Al1-xMex)2O3若しくはスピネル(Me)xAl2O3+xのタイプの混合酸化物を含んでいることを特徴とする請求項12に記載の蒸着方法であって、前記xは、0<x≦1であり、及び前記Meは、Mg、Zn、Mn、Fe、Co、Ni、Zr、Cd、Cu、Cr、及びSnのグループの一つ以上の金属を表している、請求項12に記載の蒸着方法。
- 前記酸化物被膜が、X線回折によって測定されたとき、結晶性アルファAl2O3を含んでいることを特徴とする、請求項12に記載の蒸着方法。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0701435 | 2007-06-08 | ||
SE0701435-0 | 2007-06-08 | ||
SE0701525-8 | 2007-06-20 | ||
SE0701525A SE533395C2 (sv) | 2007-06-08 | 2007-06-20 | Sätt att göra PVD-beläggningar |
PCT/EP2008/056528 WO2008148673A1 (en) | 2007-06-08 | 2008-05-28 | Method for producing pvd coatings |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010529295A JP2010529295A (ja) | 2010-08-26 |
JP5336476B2 true JP5336476B2 (ja) | 2013-11-06 |
Family
ID=39671337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010510742A Expired - Fee Related JP5336476B2 (ja) | 2007-06-08 | 2008-05-28 | Pvd被膜形成方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US8540786B2 (ja) |
EP (1) | EP2167700B1 (ja) |
JP (1) | JP5336476B2 (ja) |
KR (1) | KR20100017702A (ja) |
CN (1) | CN101802247B (ja) |
ES (1) | ES2705198T3 (ja) |
SE (1) | SE533395C2 (ja) |
WO (2) | WO2008148673A1 (ja) |
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CN102107867B (zh) * | 2009-12-29 | 2012-12-19 | 北京富纳特创新科技有限公司 | 碳纳米管膜的制备方法 |
EP2369031B1 (de) | 2010-03-18 | 2016-05-04 | Oerlikon Trading AG, Trübbach | Beschichtung auf nial2o4 basis in spinellstruktur |
JP5765627B2 (ja) * | 2010-09-27 | 2015-08-19 | 日立金属株式会社 | 耐久性に優れる被覆工具およびその製造方法 |
JP5553013B2 (ja) * | 2010-11-25 | 2014-07-16 | 三菱マテリアル株式会社 | 硬質難削材の高速高送り切削加工で硬質被覆層がすぐれた耐剥離性とすぐれた耐チッピング性を発揮する表面被覆切削工具 |
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-
2007
- 2007-06-20 SE SE0701525A patent/SE533395C2/sv not_active IP Right Cessation
-
2008
- 2008-05-28 KR KR1020097025566A patent/KR20100017702A/ko not_active Application Discontinuation
- 2008-05-28 WO PCT/EP2008/056528 patent/WO2008148673A1/en active Application Filing
- 2008-05-28 US US12/602,879 patent/US8540786B2/en not_active Expired - Fee Related
- 2008-05-28 CN CN200880019292.6A patent/CN101802247B/zh not_active Expired - Fee Related
- 2008-05-28 JP JP2010510742A patent/JP5336476B2/ja not_active Expired - Fee Related
- 2008-05-28 ES ES08760124T patent/ES2705198T3/es active Active
- 2008-05-28 WO PCT/EP2008/056529 patent/WO2009010330A1/en active Application Filing
- 2008-05-28 EP EP08760124.1A patent/EP2167700B1/en not_active Not-in-force
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KR20100017702A (ko) | 2010-02-16 |
SE0701525L (sv) | 2008-12-09 |
EP2167700A1 (en) | 2010-03-31 |
ES2705198T3 (es) | 2019-03-22 |
WO2009010330A1 (en) | 2009-01-22 |
CN101802247B (zh) | 2014-02-19 |
WO2008148673A1 (en) | 2008-12-11 |
US8540786B2 (en) | 2013-09-24 |
EP2167700B1 (en) | 2018-10-24 |
US20100183900A1 (en) | 2010-07-22 |
JP2010529295A (ja) | 2010-08-26 |
SE533395C2 (sv) | 2010-09-14 |
CN101802247A (zh) | 2010-08-11 |
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