SE0701525L - Sätt att göra PVD-beläggningar - Google Patents
Sätt att göra PVD-beläggningarInfo
- Publication number
- SE0701525L SE0701525L SE0701525A SE0701525A SE0701525L SE 0701525 L SE0701525 L SE 0701525L SE 0701525 A SE0701525 A SE 0701525A SE 0701525 A SE0701525 A SE 0701525A SE 0701525 L SE0701525 L SE 0701525L
- Authority
- SE
- Sweden
- Prior art keywords
- ways
- reactive gas
- pvd coatings
- make
- make pvd
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title abstract 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract 2
- 239000007789 gas Substances 0.000 abstract 2
- 238000000168 high power impulse magnetron sputter deposition Methods 0.000 abstract 2
- 239000000203 mixture Substances 0.000 abstract 2
- 229910052786 argon Inorganic materials 0.000 abstract 1
- 238000000151 deposition Methods 0.000 abstract 1
- 230000008021 deposition Effects 0.000 abstract 1
- 229910044991 metal oxide Inorganic materials 0.000 abstract 1
- 150000004706 metal oxides Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 150000004767 nitrides Chemical class 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C30/00—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process
- C23C30/005—Coating with metallic material characterised only by the composition of the metallic material, i.e. not characterised by the coating process on hard metal substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3464—Operating strategies
- H01J37/3467—Pulsed operation, e.g. HIPIMS
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Priority Applications (9)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0701525A SE533395C2 (sv) | 2007-06-08 | 2007-06-20 | Sätt att göra PVD-beläggningar |
PCT/EP2008/056528 WO2008148673A1 (en) | 2007-06-08 | 2008-05-28 | Method for producing pvd coatings |
KR1020097025566A KR20100017702A (ko) | 2007-06-08 | 2008-05-28 | Pvd 코팅을 만들기 위한 방법 |
JP2010510742A JP5336476B2 (ja) | 2007-06-08 | 2008-05-28 | Pvd被膜形成方法 |
CN200880019292.6A CN101802247B (zh) | 2007-06-08 | 2008-05-28 | 用于制造pvd涂层的方法 |
ES08760124T ES2705198T3 (es) | 2007-06-08 | 2008-05-28 | Método para producir recubrimientos de DFV |
US12/602,879 US8540786B2 (en) | 2007-06-08 | 2008-05-28 | Method for producing PVD coatings |
EP08760124.1A EP2167700B1 (en) | 2007-06-08 | 2008-05-28 | Method for producing pvd coatings |
PCT/EP2008/056529 WO2009010330A1 (en) | 2007-06-08 | 2008-05-28 | Method of producing oxide coatings |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0701435 | 2007-06-08 | ||
SE0701525A SE533395C2 (sv) | 2007-06-08 | 2007-06-20 | Sätt att göra PVD-beläggningar |
Publications (2)
Publication Number | Publication Date |
---|---|
SE0701525L true SE0701525L (sv) | 2008-12-09 |
SE533395C2 SE533395C2 (sv) | 2010-09-14 |
Family
ID=39671337
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0701525A SE533395C2 (sv) | 2007-06-08 | 2007-06-20 | Sätt att göra PVD-beläggningar |
Country Status (8)
Country | Link |
---|---|
US (1) | US8540786B2 (sv) |
EP (1) | EP2167700B1 (sv) |
JP (1) | JP5336476B2 (sv) |
KR (1) | KR20100017702A (sv) |
CN (1) | CN101802247B (sv) |
ES (1) | ES2705198T3 (sv) |
SE (1) | SE533395C2 (sv) |
WO (2) | WO2008148673A1 (sv) |
Families Citing this family (43)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010127845A1 (en) * | 2009-05-07 | 2010-11-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method for the production of oxide and nitride coatings and its use |
CN102107867B (zh) * | 2009-12-29 | 2012-12-19 | 北京富纳特创新科技有限公司 | 碳纳米管膜的制备方法 |
EP2369031B1 (de) * | 2010-03-18 | 2016-05-04 | Oerlikon Trading AG, Trübbach | Beschichtung auf nial2o4 basis in spinellstruktur |
JP5765627B2 (ja) * | 2010-09-27 | 2015-08-19 | 日立金属株式会社 | 耐久性に優れる被覆工具およびその製造方法 |
JP5553013B2 (ja) * | 2010-11-25 | 2014-07-16 | 三菱マテリアル株式会社 | 硬質難削材の高速高送り切削加工で硬質被覆層がすぐれた耐剥離性とすぐれた耐チッピング性を発揮する表面被覆切削工具 |
BRPI1102335A2 (pt) * | 2011-05-27 | 2013-06-25 | Mahle Metal Leve Sa | elemento dotado de pelo menos uma superfÍcie de deslizamento com um revestimento para uso em um motor de combustço interna ou em um compressor |
WO2012168709A2 (en) * | 2011-06-07 | 2012-12-13 | Power Vision Limited | Improvements to the application of coating materials |
DE102011116576A1 (de) * | 2011-10-21 | 2013-04-25 | Oerlikon Trading Ag, Trübbach | Bohrer mit Beschichtung |
CN102392246B (zh) * | 2011-11-30 | 2013-11-27 | 东莞市泉硕五金加工有限公司 | 一种金属表面处理工艺 |
WO2013083238A1 (de) * | 2011-12-05 | 2013-06-13 | Oerlikon Trading Ag, Trübbach | Reaktiver sputterprozess |
CN103160780A (zh) * | 2011-12-16 | 2013-06-19 | 中国科学院兰州化学物理研究所 | 凸轮轴表面多层纳米复合类金刚石薄膜的制备方法 |
JP5344204B2 (ja) * | 2012-03-05 | 2013-11-20 | 三菱マテリアル株式会社 | 表面被覆切削工具 |
DE102012209293B3 (de) * | 2012-06-01 | 2013-06-20 | Helmholtz-Zentrum Dresden - Rossendorf E.V. | Sputterverfahren |
DE102012013577A1 (de) * | 2012-07-10 | 2014-01-16 | Oerlikon Trading Ag, Trübbach | Hochleistungsimpulsbeschichtungsmethode |
DE102012107163A1 (de) | 2012-08-03 | 2014-05-15 | INI Coatings Ltd. | Verfahren zur Beschichtung eines Substrats mittels Hochenergieimpulsmagnetronsputtern |
DE102012017809A1 (de) * | 2012-09-10 | 2014-03-13 | Oerlikon Trading Ag, Trübbach | Verfahren zur Herstellung einer Metallborocarbidschicht auf einem Substrat |
TWI614360B (zh) * | 2013-02-08 | 2018-02-11 | 瑞士商艾維太克股份有限公司 | 高功率脈衝磁控濺鍍之濺鍍方法及高功率脈衝磁控濺鍍的濺鍍系統 |
DE102013006598A1 (de) * | 2013-04-17 | 2014-10-23 | Oerlikon Trading Ag, Trübbach | Beschichtungssystem mit ZrO₂ für elektrochirurgische Geräte |
DE102013106351A1 (de) | 2013-06-18 | 2014-12-18 | Innovative Ion Coatings Ltd. | Verfahren zur Vorbehandlung einer zu beschichtenden Oberfläche |
US11060181B2 (en) * | 2013-06-26 | 2021-07-13 | Oerlikon Surface Solutions Ag, Pfaffikon | Decorative HIPIMS hard material layers |
US9677168B2 (en) * | 2013-10-08 | 2017-06-13 | TPK America, LLC | Touch panel and method for manufacturing the same |
DE102014104672A1 (de) | 2014-04-02 | 2015-10-08 | Kennametal Inc. | Beschichtetes Schneidwerkzeug und Verfahren zu seiner Herstellung |
CN103956199B (zh) * | 2014-04-28 | 2016-09-07 | 深圳先进技术研究院 | 透明导电薄膜及其制备方法、磁控溅射装置 |
KR20180135120A (ko) * | 2014-06-27 | 2018-12-19 | 플란제 콤포지트 마테리얼스 게엠베하 | 스퍼터링 타겟 |
EP3056587B1 (de) * | 2015-02-13 | 2020-11-18 | Walter AG | VHM-Schaftfräser mit TiAlN-ZrN-Beschichtung |
WO2016168746A1 (en) | 2015-04-15 | 2016-10-20 | Vision Ease, Lp | Ophthalmic lens with graded microlenses |
CN105088163A (zh) * | 2015-09-22 | 2015-11-25 | 苏州格科特真空镀膜技术有限公司 | 一种在硬质合金刀片表面制备晶态Al2O3涂层的方法 |
CN105220122B (zh) * | 2015-10-27 | 2018-06-29 | 中国科学院兰州化学物理研究所 | 具高功率脉冲离子源的磁控溅射装置 |
US10268050B2 (en) | 2015-11-06 | 2019-04-23 | Hoya Lens Thailand Ltd. | Spectacle lens |
CN108368599B (zh) * | 2015-11-10 | 2020-11-06 | 山特维克知识产权股份有限公司 | 一种对用于涂覆的表面进行预处理的方法 |
EP3380645B1 (de) * | 2015-11-27 | 2024-05-01 | CemeCon AG | Beschichtung eines körpers mit diamantschicht und hartstoffschicht |
CN106811726A (zh) * | 2015-11-30 | 2017-06-09 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 溅射沉积工艺及溅射沉积设备 |
CA3021704C (en) * | 2016-04-22 | 2023-11-14 | Oerlikon Surface Solutions Ag, Pfaffikon | Ticn having reduced growth defects by means of hipims |
JP6748512B2 (ja) * | 2016-08-08 | 2020-09-02 | 株式会社アルバック | 半導体デバイス |
JP7292695B2 (ja) * | 2016-08-17 | 2023-06-19 | 地方独立行政法人東京都立産業技術研究センター | 機能性薄膜、その製造方法、積層構造体及びその製造方法 |
EP3406751A1 (en) * | 2017-05-24 | 2018-11-28 | Walter Ag | A coated cutting tool and a method for its production |
US11378818B2 (en) | 2018-03-01 | 2022-07-05 | Essilor International | Lens element |
CN113960808A (zh) | 2018-03-01 | 2022-01-21 | 依视路国际公司 | 镜片元件 |
US20200048760A1 (en) * | 2018-08-13 | 2020-02-13 | Applied Materials, Inc. | High power impulse magnetron sputtering physical vapor deposition of tungsten films having improved bottom coverage |
EP3650584A1 (en) * | 2018-11-08 | 2020-05-13 | Walter Ag | An industrial pvd method for producing a coated cutting tool |
TW202340495A (zh) | 2019-02-11 | 2023-10-16 | 美商應用材料股份有限公司 | 物理氣相沉積方法 |
JP2023029041A (ja) * | 2021-08-20 | 2023-03-03 | 株式会社レゾナック | 積層体の製造方法 |
RU2768092C1 (ru) * | 2021-11-23 | 2022-03-23 | федеральное государственное автономное образовательное учреждение высшего образования "Пермский национальный исследовательский политехнический университет" | Способ получения коррозионностойкого покрытия |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5310607A (en) | 1991-05-16 | 1994-05-10 | Balzers Aktiengesellschaft | Hard coating; a workpiece coated by such hard coating and a method of coating such workpiece by such hard coating |
DE19518779C1 (de) * | 1995-05-22 | 1996-07-18 | Fraunhofer Ges Forschung | Verbundkörper aus vakuumbeschichtetem Sinterwerkstoff und Verfahren zu seiner Herstellung |
JPH10140353A (ja) * | 1996-11-14 | 1998-05-26 | Mitsubishi Materials Corp | 硬質被覆層がすぐれた耐摩耗性を有する表面被覆超硬合金製切削工具 |
SE9704607D0 (sv) * | 1997-12-09 | 1997-12-09 | Chemfilt R & D Ab | A method and apparatus for magnetically enhanced sputtering |
SE520716C2 (sv) * | 1999-05-06 | 2003-08-12 | Sandvik Ab | En process för tillverkning av ett skärverktyg belagt med aluminiumoxid |
US7858143B2 (en) * | 2002-03-15 | 2010-12-28 | Abbott Cardiovascular System Inc. | Apparatus and method for coating stents |
US6808607B2 (en) * | 2002-09-25 | 2004-10-26 | Advanced Energy Industries, Inc. | High peak power plasma pulsed supply with arc handling |
US7081186B2 (en) * | 2003-11-20 | 2006-07-25 | Sheffield Hallam University | Combined coating process comprising magnetic field-assisted, high power, pulsed cathode sputtering and an unbalanced magnetron |
SE0402180D0 (sv) | 2004-09-10 | 2004-09-10 | Sandvik Ab | Deposition of Ti1-xAlxN using Bipolar Pulsed Dual Magnetron Sputtering |
DE102005033769B4 (de) * | 2005-07-15 | 2009-10-22 | Systec System- Und Anlagentechnik Gmbh & Co.Kg | Verfahren und Vorrichtung zur Mehrkathoden-PVD-Beschichtung und Substrat mit PVD-Beschichtung |
US8460519B2 (en) | 2005-10-28 | 2013-06-11 | Applied Materials Inc. | Protective offset sputtering |
DE102006017382A1 (de) * | 2005-11-14 | 2007-05-16 | Itg Induktionsanlagen Gmbh | Verfahren und Vorrichtung zum Beschichten und/oder zur Behandlung von Oberflächen |
GB0608582D0 (en) * | 2006-05-02 | 2006-06-07 | Univ Sheffield Hallam | High power impulse magnetron sputtering vapour deposition |
-
2007
- 2007-06-20 SE SE0701525A patent/SE533395C2/sv not_active IP Right Cessation
-
2008
- 2008-05-28 WO PCT/EP2008/056528 patent/WO2008148673A1/en active Application Filing
- 2008-05-28 US US12/602,879 patent/US8540786B2/en not_active Expired - Fee Related
- 2008-05-28 KR KR1020097025566A patent/KR20100017702A/ko not_active Application Discontinuation
- 2008-05-28 EP EP08760124.1A patent/EP2167700B1/en not_active Not-in-force
- 2008-05-28 ES ES08760124T patent/ES2705198T3/es active Active
- 2008-05-28 WO PCT/EP2008/056529 patent/WO2009010330A1/en active Application Filing
- 2008-05-28 CN CN200880019292.6A patent/CN101802247B/zh not_active Expired - Fee Related
- 2008-05-28 JP JP2010510742A patent/JP5336476B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
ES2705198T3 (es) | 2019-03-22 |
JP2010529295A (ja) | 2010-08-26 |
EP2167700B1 (en) | 2018-10-24 |
SE533395C2 (sv) | 2010-09-14 |
US20100183900A1 (en) | 2010-07-22 |
CN101802247B (zh) | 2014-02-19 |
WO2008148673A1 (en) | 2008-12-11 |
KR20100017702A (ko) | 2010-02-16 |
EP2167700A1 (en) | 2010-03-31 |
JP5336476B2 (ja) | 2013-11-06 |
WO2009010330A1 (en) | 2009-01-22 |
CN101802247A (zh) | 2010-08-11 |
US8540786B2 (en) | 2013-09-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
SE0701525L (sv) | Sätt att göra PVD-beläggningar | |
CA2916769C (en) | Tib2 layers and manufacture thereof | |
ZA200609948B (en) | High oxidation resistant hard coating for cutting tools | |
WO2009151767A3 (en) | Design and use of dc magnetron sputtering systems | |
JP2020023754A (ja) | 基板上に金属ホウ炭化物層を製造する方法 | |
EP2119808A4 (en) | TARGET FORMED OF HIGH-POINT METAL ALLOY SINGING RESISTANT MATERIAL, HIGH-POINT METAL SILICIDE, HIGH-POINT FUSION POINT METAL CARBIDE, HIGH-POINT FUSION METAL NITRIDE, OR HIGH TEMPERATURE METAL BORON | |
WO2010144761A3 (en) | Ionized physical vapor deposition for microstructure controlled thin film deposition | |
Jaroš et al. | Interrelationships among macrostress, microstructure and mechanical behavior of sputtered hard Ti (Al, V) N films | |
CN103918054A (zh) | Hipims层 | |
Zhang et al. | Effect of plasma nitriding ion current density on tribological properties of composite CrAlN coatings | |
US11413695B2 (en) | Tap drill with enhanced performance | |
MX2013012200A (es) | Metodo de pulverizacion catódica por magnetron de impulso de alta potencia que proporciona la ionizacion mejorada de las particulas obtenidas por pulverización catódica y aparato para su implementacion. | |
WO2007053586A3 (en) | Reactive sputter deposition processes and equipment | |
AU2003232242A1 (en) | Sputter method or device for the production of natural voltage optimized coatings | |
Kimura et al. | Preparation of hydrogenated diamond-like carbon films by reactive Ar/CH 4 high power impulse magnetron sputtering with negative pulse voltage | |
Wu et al. | Current-Voltage Characteristics and Deposition of AlTiN Thin Films by High Power Impulse Magnetron Sputtering Process | |
Chennadi et al. | HIPIMS deposition of copper films: Correlation of experiments to model predictions | |
Ehiasariar et al. | Influence of pressure and power on the composition and time evolution of plasmas in high power impulse magnetron sputtering | |
ES2197768B1 (es) | Instalacion para deposicion de peliculas de carbono tipo diamante sobre substratos de acero o de metal endurecido y el correspondiente metodo in situ usando recubrimientos duros de metal/carburo de ese metal como capas intermedias para el mejoramiento de la adherencia entre peli. | |
Kimura et al. | Formation of hydrogenated amorphous carbon films by reactive high power impulse magnetron sputtering containing C 2 H 2 gas | |
UA83263C2 (ru) | Способ ионно-плазменного напыления (варианты) и устройство для его осуществления (варианты) | |
Kim | Novel Design and Syntheses of Hybrid-functional Ceramic Coatings for Structural Applications by Plasma-assisted Vapor Depositions | |
Arndt | AlTiN-Saturn: the high performance coating. | |
UA3644U (uk) | Спосіб отримання зміцнювального покриття на металевій поверхні | |
UA90151C2 (ru) | Способ получения защитных и декоративных покрытий |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
NUG | Patent has lapsed |