JP5328319B2 - テラヘルツ波を用いた検査装置及び検査方法 - Google Patents

テラヘルツ波を用いた検査装置及び検査方法 Download PDF

Info

Publication number
JP5328319B2
JP5328319B2 JP2008301214A JP2008301214A JP5328319B2 JP 5328319 B2 JP5328319 B2 JP 5328319B2 JP 2008301214 A JP2008301214 A JP 2008301214A JP 2008301214 A JP2008301214 A JP 2008301214A JP 5328319 B2 JP5328319 B2 JP 5328319B2
Authority
JP
Japan
Prior art keywords
response signal
terahertz wave
measurement
inspection
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008301214A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009204605A5 (enExample
JP2009204605A (ja
Inventor
健明 井辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008301214A priority Critical patent/JP5328319B2/ja
Publication of JP2009204605A publication Critical patent/JP2009204605A/ja
Publication of JP2009204605A5 publication Critical patent/JP2009204605A5/ja
Application granted granted Critical
Publication of JP5328319B2 publication Critical patent/JP5328319B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3581—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using far infrared light; using Terahertz radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3504—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing gases, e.g. multi-gas analysis
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3563—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing solids; Preparation of samples therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
    • G01N21/3577—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing liquids, e.g. polluted water

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Toxicology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
JP2008301214A 2008-01-29 2008-11-26 テラヘルツ波を用いた検査装置及び検査方法 Expired - Fee Related JP5328319B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008301214A JP5328319B2 (ja) 2008-01-29 2008-11-26 テラヘルツ波を用いた検査装置及び検査方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008017844 2008-01-29
JP2008017844 2008-01-29
JP2008301214A JP5328319B2 (ja) 2008-01-29 2008-11-26 テラヘルツ波を用いた検査装置及び検査方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013117385A Division JP5546669B2 (ja) 2008-01-29 2013-06-03 テラヘルツ波を用いた検査装置及び検査方法

Publications (3)

Publication Number Publication Date
JP2009204605A JP2009204605A (ja) 2009-09-10
JP2009204605A5 JP2009204605A5 (enExample) 2012-01-12
JP5328319B2 true JP5328319B2 (ja) 2013-10-30

Family

ID=40577741

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2008301214A Expired - Fee Related JP5328319B2 (ja) 2008-01-29 2008-11-26 テラヘルツ波を用いた検査装置及び検査方法
JP2013117385A Expired - Fee Related JP5546669B2 (ja) 2008-01-29 2013-06-03 テラヘルツ波を用いた検査装置及び検査方法

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013117385A Expired - Fee Related JP5546669B2 (ja) 2008-01-29 2013-06-03 テラヘルツ波を用いた検査装置及び検査方法

Country Status (4)

Country Link
US (1) US7919752B2 (enExample)
EP (1) EP2085765A1 (enExample)
JP (2) JP5328319B2 (enExample)
CN (1) CN101498654B (enExample)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2202481A1 (en) * 2007-10-16 2010-06-30 Aisin Seiki Kabushiki Kaisha Non-contact film thickness measurement method and device
JP4807707B2 (ja) * 2007-11-30 2011-11-02 キヤノン株式会社 波形情報取得装置
JP4975001B2 (ja) * 2007-12-28 2012-07-11 キヤノン株式会社 波形情報取得装置及び波形情報取得方法
JP5341488B2 (ja) 2008-01-18 2013-11-13 キヤノン株式会社 テラヘルツ波を測定するための装置及び方法
JP5632599B2 (ja) 2009-09-07 2014-11-26 キヤノン株式会社 発振器
JP5615941B2 (ja) * 2011-02-10 2014-10-29 株式会社日立ハイテクノロジーズ 異物検出装置及び異物検出方法
JP5735824B2 (ja) 2011-03-04 2015-06-17 キヤノン株式会社 情報取得装置及び情報取得方法
JP5768429B2 (ja) * 2011-03-23 2015-08-26 セイコーエプソン株式会社 テラヘルツ波検出装置、テラヘルツ波長フィルター、イメージング装置および計測装置
JP2013076618A (ja) * 2011-09-30 2013-04-25 Sony Corp 光伝導素子、レンズ、テラヘルツ放射顕微鏡及びデバイスの製造方法
DE102012215496B4 (de) * 2012-08-31 2022-07-14 Siemens Healthcare Gmbh Verfahren zur automatischen Positionierung eines Aufnahmesystems eines Röntgengerätes und Röntgengerät
JP2014122875A (ja) * 2012-11-26 2014-07-03 Canon Inc 層状物体の測定装置および方法
CN103115893A (zh) * 2013-01-30 2013-05-22 大连理工大学 一种检测托卡马克钨第一壁灰尘沉积层成分及厚度的装置
GB201303324D0 (en) * 2013-02-25 2013-04-10 Subterandt Ltd Passive detection of deformation under coatings
JP2014174082A (ja) * 2013-03-12 2014-09-22 Seiko Epson Corp 標本検査装置
EP2781911B1 (en) * 2013-03-18 2019-10-16 ABB Schweiz AG Sensor system and method for determining paper sheet quality parameters
JP2015099031A (ja) * 2013-11-18 2015-05-28 株式会社東芝 半導体マイクロ分析チップ及びその製造方法
CN103698275A (zh) * 2013-12-12 2014-04-02 北京理工大学 一种在透射和反射测量间切换的测光装置
CN104749110B (zh) * 2013-12-30 2019-04-02 深圳先进技术研究院 光谱检测装置
JP6391278B2 (ja) 2014-04-14 2018-09-19 キヤノン株式会社 測定装置及び測定方法
CN104034690A (zh) * 2014-06-12 2014-09-10 清华大学 一种宽带太赫兹时域光谱的分析方法及便携式分析装置
CN106370109A (zh) * 2016-08-19 2017-02-01 南开大学 一种桥梁基桩钢筋笼长度检测装置及检测方法
JP6428728B2 (ja) * 2016-08-23 2018-11-28 ニプロ株式会社 テラヘルツパルス波を用いた粉末中の異物検出装置および異物検出方法
JP6843600B2 (ja) * 2016-11-28 2021-03-17 キヤノン株式会社 画像取得装置、これを用いた画像取得方法及び照射装置
WO2018105332A1 (ja) * 2016-12-06 2018-06-14 パイオニア株式会社 検査装置、検査方法、コンピュータプログラム及び記録媒体
ES2940671T3 (es) * 2017-10-13 2023-05-10 Abb Schweiz Ag Método y aparato para detectar un haz de THz pulsado con corrección de tiempo de vuelo
CN108279671B (zh) * 2018-01-08 2021-12-14 深圳市易成自动驾驶技术有限公司 基于太赫兹的环境感知方法、装置及计算机可读存储介质
US11143590B2 (en) 2018-03-22 2021-10-12 3M Innovative Properties Company Time-domain terahertz measurement system having a single reference surface
JP7455611B2 (ja) * 2019-03-14 2024-03-26 キヤノン株式会社 処理システム
CN110031416B (zh) * 2019-05-16 2021-07-06 北京印刷学院 气体浓度检测装置及方法
JP7362409B2 (ja) 2019-10-17 2023-10-17 キヤノン株式会社 照明装置およびカメラシステム
JP7365042B2 (ja) * 2019-10-18 2023-10-19 フェムトディプロイメンツ株式会社 電磁波信号解析装置および電磁波信号解析用プログラム
CN111351764B (zh) * 2020-02-27 2024-01-23 云南电网有限责任公司电力科学研究院 一种基于太赫兹技术的材料检测装置及检测方法
US12196670B2 (en) 2020-06-22 2025-01-14 Hitachi High-Tech Corporation Far-infrared spectroscopy device
JP2023157737A (ja) 2022-04-15 2023-10-26 キヤノン株式会社 アンテナ装置、通信装置、及び、撮像システム

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6078047A (en) 1997-03-14 2000-06-20 Lucent Technologies Inc. Method and apparatus for terahertz tomographic imaging
JPH1188091A (ja) * 1997-09-10 1999-03-30 Nippon Telegr & Teleph Corp <Ntt> 音響信号制御装置、その装置およびそのプログラム記録媒体
US6448553B1 (en) 1999-04-26 2002-09-10 Canon Kabushiki Kaisha Signal detector to be used with scanning probe and atomic force microscope
JP2002310882A (ja) 2001-04-17 2002-10-23 Canon Inc 走査型プローブによる信号検出装置、該装置によるプローブ顕微鏡、及び走査型プローブによる信号検出方法、該方法を用いてサンプル表面を観察する観察方法
JP2005504959A (ja) 2001-09-12 2005-02-17 テラビュー リミテッド 画像処理装置及び方法
GB2385415B (en) * 2002-02-15 2005-09-14 Teraview Ltd An analysis apparatus and method
JP2004101510A (ja) * 2002-07-15 2004-04-02 Tochigi Nikon Corp パルス光を用いた分光計測方法および装置
US6983213B2 (en) * 2003-10-20 2006-01-03 Cerno Bioscience Llc Methods for operating mass spectrometry (MS) instrument systems
JP4136858B2 (ja) 2003-09-12 2008-08-20 キヤノン株式会社 位置検出装置、及び情報入力装置
GB2425833B (en) * 2004-01-19 2007-02-21 David Alexander Crawley Terahertz Radiation Sensor and Imaging System
JP4217646B2 (ja) 2004-03-26 2009-02-04 キヤノン株式会社 認証方法及び認証装置
US20050231416A1 (en) * 2004-04-14 2005-10-20 Rowe Richard L Relational millimeter-wave interrogating
JP2006121643A (ja) 2004-09-21 2006-05-11 Canon Inc 平面アンテナ
JP4642458B2 (ja) * 2004-12-28 2011-03-02 富士通株式会社 波長分散発生装置
JP4878180B2 (ja) 2005-03-24 2012-02-15 キヤノン株式会社 電磁波を用いる検査装置
JP2006275867A (ja) * 2005-03-30 2006-10-12 Tochigi Nikon Corp テラヘルツ光検査装置
DE102005023160B4 (de) * 2005-05-19 2007-04-05 Beltz, Robert, Dipl.-Math. Vorrichtung zur Erfassung und Bewertung von hygroskopischen Materialien
JP4535975B2 (ja) * 2005-09-21 2010-09-01 日本電信電話株式会社 表面プラズモン共鳴スペクトル測定装置におけるデータ校正方法
JP2007101189A (ja) * 2005-09-30 2007-04-19 Nippon Telegr & Teleph Corp <Ntt> 透過型電磁波イメージング装置
JP4898472B2 (ja) 2006-04-11 2012-03-14 キヤノン株式会社 検査装置
GB2438215B (en) * 2006-05-19 2011-06-08 Teraview Ltd A THz investigation apparatus and method
US20080161674A1 (en) * 2006-12-29 2008-07-03 Donald Martin Monro Active in vivo spectroscopy
JP4977048B2 (ja) 2007-02-01 2012-07-18 キヤノン株式会社 アンテナ素子
US8067739B2 (en) 2007-06-22 2011-11-29 Canon Kabushiki Kaisha Photoconductive element for generation and detection of terahertz wave

Also Published As

Publication number Publication date
CN101498654B (zh) 2010-11-17
US7919752B2 (en) 2011-04-05
CN101498654A (zh) 2009-08-05
JP2009204605A (ja) 2009-09-10
EP2085765A1 (en) 2009-08-05
US20090189078A1 (en) 2009-07-30
JP2013167649A (ja) 2013-08-29
JP5546669B2 (ja) 2014-07-09

Similar Documents

Publication Publication Date Title
JP5328319B2 (ja) テラヘルツ波を用いた検査装置及び検査方法
JP5717335B2 (ja) 分析装置
US20120176623A1 (en) Apparatus and method for measuring characteristics of multi-layered thin films
JP2009204605A5 (enExample)
JP6044893B2 (ja) 検査装置および検査方法
KR20160080580A (ko) 테라헤르츠파를 이용한 반도체 웨이퍼 분석장치 및 그의 분석방법
GB2445957A (en) A method and apparatus for analysing an LCD
JP2013181929A (ja) 測定装置及び方法、トモグラフィ装置及び方法
TW201925757A (zh) 寬頻晶圓缺陷偵測系統及寬頻晶圓缺陷偵測方法
CN114324329B (zh) 光学元件强激光损伤特性的无损检测与评价方法
Malyuskin et al. Super-resolution defect characterization using microwave near-field resonance reflectometry and cross-correlation image processing
KR20210076598A (ko) 테라헤르츠파를 이용한 검사 시스템
JP6435106B2 (ja) 塗装膜解析方法
US9104912B2 (en) Apparatus and method for measuring electromagnetic wave
JP4534027B1 (ja) 電磁波波面整形素子及びそれを備えた電磁波イメージング装置、並びに電磁波イメージング方法
Altuntaş et al. Direct calibration of laser intensity via Ramsey interferometry for cold atom imaging
KR102648081B1 (ko) 테라헤르츠파를 이용한 검사 시스템
JP4710366B2 (ja) 赤外顕微鏡
CN209102603U (zh) 一种反射式太赫兹时域光谱成像系统
KR20230048655A (ko) 웨이퍼 검사 방법 및 이를 수행하기 위한 장치
JP2007333379A (ja) 高周波電磁波を用いた計測方法
CN115667955A (zh) 半导体器件检查方法及半导体器件检查装置
JP2010243213A (ja) 光量設定方法、検査方法および検査装置
Zheng et al. Enhanced terahertz imaging of electronic packaging materials with deconvolution algorithm
Pakluea et al. Development and optimization of a PCA-based terahertz time-domain spectroscopy system for high-resolution material characterization

Legal Events

Date Code Title Description
RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20100201

RD01 Notification of change of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7421

Effective date: 20100630

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20111024

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20111117

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20130228

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20130402

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20130603

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130625

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130723

R151 Written notification of patent or utility model registration

Ref document number: 5328319

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R151

LAPS Cancellation because of no payment of annual fees