JP5324760B2 - 傾斜側壁表面を備えたソース/ドレイン陥凹部を有するmosfetおよびこれを形成するための方法 - Google Patents
傾斜側壁表面を備えたソース/ドレイン陥凹部を有するmosfetおよびこれを形成するための方法 Download PDFInfo
- Publication number
- JP5324760B2 JP5324760B2 JP2007165646A JP2007165646A JP5324760B2 JP 5324760 B2 JP5324760 B2 JP 5324760B2 JP 2007165646 A JP2007165646 A JP 2007165646A JP 2007165646 A JP2007165646 A JP 2007165646A JP 5324760 B2 JP5324760 B2 JP 5324760B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- semiconductor device
- layer
- semiconductor
- recess
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 32
- 239000004065 semiconductor Substances 0.000 claims description 148
- 239000000758 substrate Substances 0.000 claims description 67
- 239000013078 crystal Substances 0.000 claims description 63
- 238000005530 etching Methods 0.000 claims description 46
- 229910052710 silicon Inorganic materials 0.000 claims description 43
- 239000010703 silicon Substances 0.000 claims description 43
- 230000001939 inductive effect Effects 0.000 claims description 27
- 239000012212 insulator Substances 0.000 claims description 22
- 238000002955 isolation Methods 0.000 claims description 15
- 239000000463 material Substances 0.000 claims description 15
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 13
- 229910021332 silicide Inorganic materials 0.000 claims description 13
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 13
- 125000006850 spacer group Chemical group 0.000 claims description 13
- 229910052751 metal Inorganic materials 0.000 claims description 12
- 239000002184 metal Substances 0.000 claims description 12
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims description 10
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 9
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 9
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 8
- 230000005669 field effect Effects 0.000 claims description 7
- 229910021529 ammonia Inorganic materials 0.000 claims description 4
- 229910044991 metal oxide Inorganic materials 0.000 claims description 4
- 150000004706 metal oxides Chemical class 0.000 claims description 4
- 238000001039 wet etching Methods 0.000 claims description 3
- 230000006698 induction Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 137
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 22
- 239000004020 conductor Substances 0.000 description 13
- 238000012545 processing Methods 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 238000001020 plasma etching Methods 0.000 description 9
- 150000004767 nitrides Chemical class 0.000 description 8
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000002513 implantation Methods 0.000 description 5
- -1 region Substances 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 238000011049 filling Methods 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 238000001459 lithography Methods 0.000 description 4
- 229920002120 photoresistant polymer Polymers 0.000 description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 4
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000001312 dry etching Methods 0.000 description 3
- 230000003647 oxidation Effects 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 2
- 229910000927 Ge alloy Inorganic materials 0.000 description 2
- 229910000673 Indium arsenide Inorganic materials 0.000 description 2
- 229910003811 SiGeC Inorganic materials 0.000 description 2
- 238000000231 atomic layer deposition Methods 0.000 description 2
- ONRPGGOGHKMHDT-UHFFFAOYSA-N benzene-1,2-diol;ethane-1,2-diamine Chemical compound NCCN.OC1=CC=CC=C1O ONRPGGOGHKMHDT-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 125000001475 halogen functional group Chemical group 0.000 description 2
- 239000007943 implant Substances 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 2
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910003465 moissanite Inorganic materials 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000000224 chemical solution deposition Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000280 densification Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052914 metal silicate Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66568—Lateral single gate silicon transistors
- H01L29/66636—Lateral single gate silicon transistors with source or drain recessed by etching or first recessed by etching and then refilled
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
- H01L29/045—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/66742—Thin film unipolar transistors
- H01L29/66772—Monocristalline silicon transistors on insulating substrates, e.g. quartz substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/7842—Field effect transistors with field effect produced by an insulated gate means for exerting mechanical stress on the crystal lattice of the channel region, e.g. using a flexible substrate
- H01L29/7843—Field effect transistors with field effect produced by an insulated gate means for exerting mechanical stress on the crystal lattice of the channel region, e.g. using a flexible substrate the means being an applied insulating layer
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
- H01L29/78618—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66007—Multistep manufacturing processes
- H01L29/66075—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
- H01L29/66227—Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
- H01L29/66409—Unipolar field-effect transistors
- H01L29/66477—Unipolar field-effect transistors with an insulated gate, i.e. MISFET
- H01L29/665—Unipolar field-effect transistors with an insulated gate, i.e. MISFET using self aligned silicidation, i.e. salicide
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S257/00—Active solid-state devices, e.g. transistors, solid-state diodes
- Y10S257/902—FET with metal source region
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Thin Film Transistor (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Description
MOSFETの選択されたソースおよびドレイン領域において半導体基板に結晶エッチングを施して、そこに陥凹部を形成するステップであって、その陥凹部が半導体基板の上部表面に対して傾斜している1つまたは複数の側壁表面を有するステップと、
MOSFETのソースおよびドレイン領域において陥凹部の傾斜側壁表面の上に応力誘導誘電体層を形成するステップと、
を含む。
2C:チャネル領域
2D:ドレイン領域
2S:ソース領域
10:半導体基板
11:分離領域
12:基礎半導体基板層
14:埋め込み絶縁体層
16:半導体デバイス層
16A:上部表面
16B:側壁表面
16C:底面
18:金属シリサイド層
20:金属シリサイド層
22:ゲート誘電体層
24:ゲート導体
26:ゲート・シリサイド層
28:スペーサ
30:応力誘導誘電体層
Claims (13)
- 基礎半導体基板層と当該基礎半導体基板上に配置された埋め込み絶縁体層と当該埋め込み絶縁体層上に配置された半導体デバイス層とを有する半導体基板内に位置するソース領域、チャネル領域、及びドレイン領域を有する金属酸化物半導体電界効果トランジスタ(MOSFET)を有する半導体デバイスであって、前記半導体基板が絶縁体上半導体(SOI)構成を有し、
前記ソース領域及び前記ドレイン領域が前記チャネル領域によって分離されており、
前記チャネル領域はゲート構造をさらに有しており、
前記ソース領域及び前記ドレイン領域がそれぞれ、前記半導体基板の上部表面に対して傾斜している1つまたは複数の側壁表面を備えた陥凹部を有し、前記陥凹部が前記半導体デバイス層内に位置し、前記陥凹部全体は、前記ゲート構造に接する少なくとも1つのスペーサの下方にある前記半導体基板の一部によって前記ゲート構造の下方にある前記半導体基板の一部から分離されており、前記チャネル領域及び前記スペーサ、並びに、前記ソース領域及び前記ドレイン領域の前記陥凹部の前記傾斜側壁表面の上に亘って応力誘導誘電体層が位置しており、前記半導体基板の前記上部表面上における前記応力誘導誘電体層の一部が前記チャネル領域に応力を与える、前記半導体デバイス。 - 前記応力誘導誘電体層が、引張応力または圧縮応力を受けた窒化シリコンを含む、請求項1に記載の半導体デバイス。
- 前記半導体基板の前記上部表面が第1の組の同等結晶面の1つに沿って配向され、前記陥凹部の前記1つまたは複数の側壁表面が第2の異なる組の同等結晶面に沿って配向される、請求項1又は2に記載の半導体デバイス。
- 前記半導体基板が単結晶シリコンを含み、前記第1及び第2の組の同等結晶面が{100}、{110}、及び{111}シリコン面からなるグループから選択される、請求項3に記載の半導体デバイス。
- 前記MOSFETがpチャネルMOSFETであり、前記半導体基板の前記上部表面が前記{110}シリコン面の1つに沿って配向され、前記陥凹部の前記1つまたは複数の側壁表面が前記{111}シリコン面に沿って配向される、請求項4に記載の半導体デバイス。
- 前記MOSFETがnチャネルMOSFETであり、前記半導体基板の前記上部表面が前記{100}シリコン面の1つに沿って配向され、前記陥凹部の前記1つまたは複数の側壁表面が前記{111}シリコン面に沿って配向される、請求項4に記載の半導体デバイス。
- 前記陥凹部のそれぞれが、前記半導体基板の前記上部表面に対して平行である底面を備えた台形断面を有する、請求項1〜6のいずれか一項に記載の半導体デバイス。
- 前記陥凹部のそれぞれが、底面のない三角形の断面を有する、請求項1〜7のいずれか一項に記載の半導体デバイス。
- 前記MOSFETの前記ソース領域及び前記ドレイン領域が、前記陥凹部の前記傾斜側壁表面の上であるが前記応力誘導誘電体層の下に位置する金属シリサイド層をさらに有する、請求項1〜8のいずれか一項に記載の半導体デバイス。
- 前記半導体基板がバルク半導体構造を有する、請求項1〜9のいずれか一項に記載の半導体デバイス。
- 基礎半導体基板層と当該基礎半導体基板上に配置された埋め込み絶縁体層と当該埋め込み絶縁体層上に配置された半導体デバイス層とを有する半導体基板内に位置するソース領域、チャネル領域、及びドレイン領域を有する金属酸化物半導体電界効果トランジスタ(MOSFET)を有する半導体デバイスを形成するための方法であって、前記半導体基板が絶縁体上半導体(SOI)構成を有し、前記方法が、
半導体基板内に第1の分離領域及び第2の分離領域を形成するステップであって、前記第1の分離領域部分と前記第2の分離領域部分との間に平面上部上面を有する半導体デバイス層が用意される、前記形成するステップと、
前記平面上部上面の一部上にゲート構造を形成するステップであって、前記チャネル領域が前記ゲート構造を有する、前記ゲート構造を形成するステップと、
前記ゲート構造に接する少なくとも1つのスペーサを形成するステップと、
前記分離領域と前記スペーサとの間の前記半導体デバイス層に結晶エッチングを施して、そこに陥凹部を形成するステップであって、前記結晶エッチングが高速エッチングが施された結晶面に沿って前記結晶性半導体材料の一部を除去し、且つ、前記陥凹部の傾斜している側壁表面を構成する低速エッチングが施された結晶面で終了され、前記ソース領域及び前記ドレイン領域がそれぞれ、前記半導体基板の上部表面に対して傾斜している1つまたは複数の側壁表面を備えた陥凹部を有し、前記陥凹部が前記半導体デバイス層内に位置し、前記陥凹部全体は、前記ゲート構造に接する少なくとも1つのスペーサの下方にある前記半導体基板の一部によって前記ゲート構造の下方にある前記半導体基板の一部から分離される、前記陥凹部を形成するステップと、
前記チャネル領域及び前記スペーサ、並びに、前記ソース領域及び前記ドレイン領域の前記陥凹部の前記傾斜側壁表面の上に亘って応力誘導誘電体層を形成するステップであって、前記半導体基板の前記上部表面上における前記応力誘導誘電体層の一部が前記チャネル領域に応力を与える、前記応力誘導誘電体層を形成するステップと
を含む、前記方法。 - 前記応力誘導誘電体層の形成前に前記ソース領域及び前記ドレイン領域において前記陥凹部の前記傾斜側壁表面の上に金属シリサイド層を形成するステップをさらに含む、請求項11に記載の方法。
- 前記結晶エッチングが、アンモニア、水酸化テトラメチルアンモニウム、及びこれらの組み合わせからなるグループから選択されたエッチング液を使用するウェット・エッチング・ステップによって実行される、請求項11又は12に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/427,491 US7560758B2 (en) | 2006-06-29 | 2006-06-29 | MOSFETs comprising source/drain recesses with slanted sidewall surfaces, and methods for fabricating the same |
US11/427,491 | 2006-06-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008010871A JP2008010871A (ja) | 2008-01-17 |
JP5324760B2 true JP5324760B2 (ja) | 2013-10-23 |
Family
ID=38875740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007165646A Expired - Fee Related JP5324760B2 (ja) | 2006-06-29 | 2007-06-22 | 傾斜側壁表面を備えたソース/ドレイン陥凹部を有するmosfetおよびこれを形成するための方法 |
Country Status (4)
Country | Link |
---|---|
US (2) | US7560758B2 (ja) |
JP (1) | JP5324760B2 (ja) |
CN (1) | CN100587967C (ja) |
TW (1) | TW200818499A (ja) |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7696019B2 (en) * | 2006-03-09 | 2010-04-13 | Infineon Technologies Ag | Semiconductor devices and methods of manufacturing thereof |
US7485524B2 (en) * | 2006-06-21 | 2009-02-03 | International Business Machines Corporation | MOSFETs comprising source/drain regions with slanted upper surfaces, and method for fabricating the same |
US20080237634A1 (en) * | 2007-03-30 | 2008-10-02 | International Business Machines Corporation | Crystallographic recess etch for embedded semiconductor region |
TW200910470A (en) * | 2007-05-03 | 2009-03-01 | Dsm Solutions Inc | Enhanced hole mobility p-type JFET and fabrication method therefor |
US7825003B2 (en) * | 2007-06-26 | 2010-11-02 | International Business Machines Corporation | Method of doping field-effect-transistors (FETs) with reduced stress/strain relaxation and resulting FET devices |
US7851313B1 (en) * | 2007-11-09 | 2010-12-14 | Xilinx, Inc. | Semiconductor device and process for improved etch control of strained silicon alloy trenches |
US7994014B2 (en) * | 2008-10-10 | 2011-08-09 | Advanced Micro Devices, Inc. | Semiconductor devices having faceted silicide contacts, and related fabrication methods |
JP4875115B2 (ja) * | 2009-03-05 | 2012-02-15 | 株式会社東芝 | 半導体素子及び半導体装置 |
US8143131B2 (en) | 2009-03-31 | 2012-03-27 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of fabricating spacers in a strained semiconductor device |
US8093665B2 (en) * | 2009-05-18 | 2012-01-10 | Macronix International Co., Ltd. | Semiconductor device and method for fabricating the same |
US8105887B2 (en) * | 2009-07-09 | 2012-01-31 | International Business Machines Corporation | Inducing stress in CMOS device |
US7994062B2 (en) * | 2009-10-30 | 2011-08-09 | Sachem, Inc. | Selective silicon etch process |
US9299664B2 (en) * | 2010-01-18 | 2016-03-29 | Semiconductor Components Industries, Llc | Method of forming an EM protected semiconductor die |
US8278164B2 (en) | 2010-02-04 | 2012-10-02 | International Business Machines Corporation | Semiconductor structures and methods of manufacturing the same |
US8716091B2 (en) * | 2010-03-30 | 2014-05-06 | International Business Machines Corporation | Structure for self-aligned silicide contacts to an upside-down FET by epitaxial source and drain |
CN102222692B (zh) | 2010-04-14 | 2013-06-12 | 中国科学院微电子研究所 | 半导体器件及其制造方法 |
US8368147B2 (en) * | 2010-04-16 | 2013-02-05 | Taiwan Semiconductor Manufacturing Company, Ltd. | Strained semiconductor device with recessed channel |
US8222673B2 (en) | 2010-06-08 | 2012-07-17 | International Business Machines Corporation | Self-aligned embedded SiGe structure and method of manufacturing the same |
US9184050B2 (en) * | 2010-07-30 | 2015-11-10 | Taiwan Semiconductor Manufacturing Company, Ltd. | Inverted trapezoidal recess for epitaxial growth |
US8405155B2 (en) | 2010-09-23 | 2013-03-26 | United Microelectronics Corp. | Semiconductor structure with gate structure, source/drain region and recess filling with epitaxial layer |
DE102010063772B4 (de) * | 2010-12-21 | 2016-02-04 | GLOBALFOUNDRIES Dresden Module One Ltd. Liability Company & Co. KG | Verfahren zum Einbetten einer sigma-förmigen Halbleiterlegierung in Transistoren durch Anwenden einer gleichmäßigen Oxidschicht vor dem Ätzen der Aussparungen |
US8669146B2 (en) | 2011-01-13 | 2014-03-11 | International Business Machines Corporation | Semiconductor structures with thinned junctions and methods of manufacture |
CN102709162B (zh) * | 2011-03-28 | 2015-10-14 | 中芯国际集成电路制造(上海)有限公司 | 形成锗硅沟道以及pmos晶体管的方法 |
US8324059B2 (en) | 2011-04-25 | 2012-12-04 | United Microelectronics Corp. | Method of fabricating a semiconductor structure |
US8426284B2 (en) | 2011-05-11 | 2013-04-23 | United Microelectronics Corp. | Manufacturing method for semiconductor structure |
CN102412203A (zh) * | 2011-05-13 | 2012-04-11 | 上海华力微电子有限公司 | 一种提高半导体器件应力记忆技术效果的方法 |
US8481391B2 (en) | 2011-05-18 | 2013-07-09 | United Microelectronics Corp. | Process for manufacturing stress-providing structure and semiconductor device with such stress-providing structure |
US8431460B2 (en) | 2011-05-27 | 2013-04-30 | United Microelectronics Corp. | Method for fabricating semiconductor device |
DE102011076695B4 (de) * | 2011-05-30 | 2013-05-08 | Globalfoundries Inc. | Transistoren mit eingebettetem verformungsinduzierenden Material, das in durch einen Oxidationsätzprozess erzeugten Aussparungen ausgebildet ist |
US8975672B2 (en) * | 2011-11-09 | 2015-03-10 | United Microelectronics Corp. | Metal oxide semiconductor transistor and manufacturing method thereof |
US9847225B2 (en) * | 2011-11-15 | 2017-12-19 | Taiwan Semiconductor Manufacturing Company, Ltd. | Semiconductor device and method of manufacturing the same |
CN102544103B (zh) * | 2012-01-10 | 2014-09-03 | 复旦大学 | 一种InP反型n沟道场效应管及其制备方法 |
US10163724B2 (en) * | 2012-03-01 | 2018-12-25 | Taiwan Semiconductor Manufacturing Company, Ltd. | Integrated circuit device and method of manufacturing same |
US8841190B2 (en) | 2012-03-30 | 2014-09-23 | The Institute of Microelectronics Chinese Academy of Science | MOS device for making the source/drain region closer to the channel region and method of manufacturing the same |
CN103367151B (zh) * | 2012-03-30 | 2015-12-16 | 中国科学院微电子研究所 | 使源/漏区更接近沟道区的mos器件及其制作方法 |
CN103383962B (zh) * | 2012-05-03 | 2016-06-29 | 中国科学院微电子研究所 | 半导体结构及其制造方法 |
CN103545212B (zh) | 2012-07-16 | 2016-09-21 | 中国科学院微电子研究所 | 半导体器件制造方法 |
US9012999B2 (en) * | 2012-08-21 | 2015-04-21 | Stmicroelectronics, Inc. | Semiconductor device with an inclined source/drain and associated methods |
CN104241357A (zh) * | 2013-06-18 | 2014-12-24 | 中芯国际集成电路制造(上海)有限公司 | 一种晶体管、集成电路以及集成电路的制造方法 |
US10903330B2 (en) | 2013-11-27 | 2021-01-26 | General Electric Company | Tapered gate electrode for semiconductor devices |
US9627480B2 (en) * | 2014-06-26 | 2017-04-18 | Globalfoundries Inc. | Junction butting structure using nonuniform trench shape |
US9287377B2 (en) * | 2014-08-04 | 2016-03-15 | Infineon Technologies Ag | Semiconductor device and manufacturing method |
US9536945B1 (en) * | 2015-07-30 | 2017-01-03 | International Business Machines Corporation | MOSFET with ultra low drain leakage |
CN108807176B (zh) * | 2017-05-03 | 2021-07-13 | 中芯国际集成电路制造(北京)有限公司 | 隧穿场效应晶体管及其形成方法 |
CN113097151A (zh) * | 2021-03-31 | 2021-07-09 | 浙江大学 | GaN器件结构及其制备方法 |
US20230178621A1 (en) * | 2021-12-07 | 2023-06-08 | International Business Machines Corporation | Wraparound contact with reduced distance to channel |
CN118043972A (zh) * | 2022-04-14 | 2024-05-14 | 英诺赛科(苏州)半导体有限公司 | 氮化物基半导体装置及其制造方法 |
Family Cites Families (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4877749A (en) * | 1986-02-28 | 1989-10-31 | Polyfet Re Devices, Inc. | Method of forming a low loss FET |
US5323053A (en) * | 1992-05-28 | 1994-06-21 | At&T Bell Laboratories | Semiconductor devices using epitaxial silicides on (111) surfaces etched in (100) silicon substrates |
US5365531A (en) * | 1992-11-24 | 1994-11-15 | Hewlett-Packard Company | Apparatus and method for initializing an optical-fiber laser for mode locking |
JPH06333954A (ja) * | 1993-05-26 | 1994-12-02 | Mitsubishi Electric Corp | 電界効果トランジスタ及びその製造方法 |
US5448579A (en) * | 1993-12-09 | 1995-09-05 | Hewlett-Packard Company | Polarization independent picosecond fiber laser |
US5436925A (en) * | 1994-03-01 | 1995-07-25 | Hewlett-Packard Company | Colliding pulse mode-locked fiber ring laser using a semiconductor saturable absorber |
US5491712A (en) * | 1994-10-31 | 1996-02-13 | Lin; Hong | Integration of surface emitting laser and photodiode for monitoring power output of surface emitting laser |
JPH08340106A (ja) * | 1995-06-12 | 1996-12-24 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
JP2904090B2 (ja) * | 1996-01-10 | 1999-06-14 | 日本電気株式会社 | 単一電子素子 |
US6097741A (en) * | 1998-02-17 | 2000-08-01 | Calmar Optcom, Inc. | Passively mode-locked fiber lasers |
US6100159A (en) * | 1997-11-06 | 2000-08-08 | Advanced Micro Devices, Inc. | Quasi soi device |
US5972762A (en) * | 1998-01-05 | 1999-10-26 | Texas Instruments--Acer Incorporated | Method of forming mosfets with recessed self-aligned silicide gradual S/D junction |
US6291861B1 (en) * | 1998-06-30 | 2001-09-18 | Sharp Kabushiki Kaisha | Semiconductor device and method for producing the same |
US6292549B1 (en) * | 1999-01-13 | 2001-09-18 | Altigen Communications, Inc. | Analog caller identification transmission method and apparatus |
US6480756B1 (en) * | 1999-10-12 | 2002-11-12 | Taiwan Semiconductor Manufacturing Co., Ltd. | Real-time monitor mechanism for heterogeneous production lines |
US6420218B1 (en) * | 2000-04-24 | 2002-07-16 | Advanced Micro Devices, Inc. | Ultra-thin-body SOI MOS transistors having recessed source and drain regions |
US6845108B1 (en) * | 2001-05-14 | 2005-01-18 | Calmar Optcom, Inc. | Tuning of laser wavelength in actively mode-locked lasers |
JP2003060076A (ja) * | 2001-08-21 | 2003-02-28 | Nec Corp | 半導体装置及びその製造方法 |
US6660598B2 (en) * | 2002-02-26 | 2003-12-09 | International Business Machines Corporation | Method of forming a fully-depleted SOI ( silicon-on-insulator) MOSFET having a thinned channel region |
US6743669B1 (en) * | 2002-06-05 | 2004-06-01 | Lsi Logic Corporation | Method of reducing leakage using Si3N4 or SiON block dielectric films |
US6746925B1 (en) * | 2003-03-25 | 2004-06-08 | Lsi Logic Corporation | High-k dielectric bird's beak optimizations using in-situ O2 plasma oxidation |
US6902962B2 (en) * | 2003-04-04 | 2005-06-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Silicon-on-insulator chip with multiple crystal orientations |
US6864152B1 (en) * | 2003-05-20 | 2005-03-08 | Lsi Logic Corporation | Fabrication of trenches with multiple depths on the same substrate |
US6794304B1 (en) * | 2003-07-31 | 2004-09-21 | Lsi Logic Corporation | Method and apparatus for reducing microtrenching for borderless vias created in a dual damascene process |
US20050054210A1 (en) * | 2003-09-04 | 2005-03-10 | Taiwan Semiconductor Manufacturing Co., Ltd. | Multiple exposure method for forming patterned photoresist layer |
US6939751B2 (en) * | 2003-10-22 | 2005-09-06 | International Business Machines Corporation | Method and manufacture of thin silicon on insulator (SOI) with recessed channel |
US7545001B2 (en) * | 2003-11-25 | 2009-06-09 | Taiwan Semiconductor Manufacturing Company | Semiconductor device having high drive current and method of manufacture therefor |
US7923782B2 (en) * | 2004-02-27 | 2011-04-12 | International Business Machines Corporation | Hybrid SOI/bulk semiconductor transistors |
JP4700295B2 (ja) * | 2004-06-08 | 2011-06-15 | 富士通セミコンダクター株式会社 | 半導体装置とその製造方法 |
JP2006024809A (ja) * | 2004-07-09 | 2006-01-26 | Renesas Technology Corp | 半導体装置及びその製造方法 |
US7365015B2 (en) * | 2004-07-13 | 2008-04-29 | Lsi Logic Corporation | Damascene replacement metal gate process with controlled gate profile and length using Si1-xGex as sacrificial material |
US7405131B2 (en) * | 2005-07-16 | 2008-07-29 | Chartered Semiconductor Manufacturing, Ltd. | Method and structure to prevent silicide strapping of source/drain to body in semiconductor devices with source/drain stressor |
US7385258B2 (en) * | 2006-04-25 | 2008-06-10 | International Business Machines Corporation | Transistors having v-shape source/drain metal contacts |
US7485524B2 (en) * | 2006-06-21 | 2009-02-03 | International Business Machines Corporation | MOSFETs comprising source/drain regions with slanted upper surfaces, and method for fabricating the same |
-
2006
- 2006-06-29 US US11/427,491 patent/US7560758B2/en not_active Expired - Fee Related
-
2007
- 2007-03-23 CN CN200710089335A patent/CN100587967C/zh not_active Expired - Fee Related
- 2007-06-15 TW TW096121649A patent/TW200818499A/zh unknown
- 2007-06-22 JP JP2007165646A patent/JP5324760B2/ja not_active Expired - Fee Related
- 2007-10-30 US US11/928,356 patent/US7816261B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
TW200818499A (en) | 2008-04-16 |
CN100587967C (zh) | 2010-02-03 |
CN101097955A (zh) | 2008-01-02 |
US20080057710A1 (en) | 2008-03-06 |
JP2008010871A (ja) | 2008-01-17 |
US20080001260A1 (en) | 2008-01-03 |
US7816261B2 (en) | 2010-10-19 |
US7560758B2 (en) | 2009-07-14 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5324760B2 (ja) | 傾斜側壁表面を備えたソース/ドレイン陥凹部を有するmosfetおよびこれを形成するための方法 | |
JP5443983B2 (ja) | 応力がかけられたチャネル領域を有する改善されたcmosデバイス及びそれを製造する方法(半導体デバイスおよび該半導体デバイスの形成方法) | |
KR100962947B1 (ko) | 고이동도 평면 및 다중-게이트 MOSFETs을 위한 혼성기판 기술 | |
US7312134B2 (en) | Dual stressed SOI substrates | |
CA2501580C (en) | Method of forming strained silicon on insulator (ssoi) and structures formed thereby | |
US9263465B2 (en) | CMOS with dual raised source and drain for NMOS and PMOS | |
KR101208781B1 (ko) | 벌크 기판 상에 제조되는 분리된 트라이-게이트 트랜지스터 | |
US7829407B2 (en) | Method of fabricating a stressed MOSFET by bending SOI region | |
US20040171223A1 (en) | Method of selective removal of SiGe alloys | |
US20070181980A1 (en) | Cmos devices with hybrid channel orientations and method for fabricating the same | |
US20080157200A1 (en) | Stress liner surrounded facetless embedded stressor mosfet | |
JP2004193596A (ja) | 応力チャネルを有する電界効果トランジスタおよびその製造方法 | |
JP2005526385A (ja) | 電界効果トランジスタおよびその製作方法 | |
US20130285117A1 (en) | CMOS WITH SiGe CHANNEL PFETs AND METHOD OF FABRICATION | |
JP2007067118A (ja) | 半導体装置及びその製造方法 | |
JP4406200B2 (ja) | 半導体装置 | |
KR20070101058A (ko) | 핀 전계 효과 트랜지스터의 형성 방법 | |
US20090166813A1 (en) | Method for manufacturing semiconductor device and semiconductor device | |
US20050070070A1 (en) | Method of forming strained silicon on insulator |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100318 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120731 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20121009 Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20121009 |
|
RD12 | Notification of acceptance of power of sub attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7432 Effective date: 20121009 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20121011 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20121212 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20130408 Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20130408 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20130415 |
|
TRDD | Decision of grant or rejection written | ||
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20130628 |
|
RD14 | Notification of resignation of power of sub attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7434 Effective date: 20130628 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130628 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130719 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5324760 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |