JP5317033B2 - アナターゼ型酸化チタン - Google Patents
アナターゼ型酸化チタン Download PDFInfo
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- JP5317033B2 JP5317033B2 JP2008173787A JP2008173787A JP5317033B2 JP 5317033 B2 JP5317033 B2 JP 5317033B2 JP 2008173787 A JP2008173787 A JP 2008173787A JP 2008173787 A JP2008173787 A JP 2008173787A JP 5317033 B2 JP5317033 B2 JP 5317033B2
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- titanium oxide
- boron
- type titanium
- anatase
- anatase type
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すなわち、ITOを用いたパネルが盛んに製造されているが、Inが希少金属であり、資源枯渇問題が深刻化しつつある。また、Inの健康への影響も指摘されている。すなわち、ITO代替の素材が求められている。
ニオブの原子半径は0.145nmであり、チタンの原子半径(0.140nm)とほぼ同じである。このため非特許文献1のように酸化チタンへのニオブドープは技術的にも十分可能であると予見でき、また、得られたものを物性評価するのは自然な流れといえる。
プレート電圧: 200V
RF電力: 200W
なお、アナターゼ型の結晶を形成することを試み、基板は加熱しなかった(ただし、成膜中は80℃程度まで基板温度が上昇した)。
1)ホウ素のドープ量を5×10 20 cm −3 〜5×10 22 cm −3 としたアナターゼ型酸化チタンを用いた透明導電薄膜。
2) 抵抗値が10 −3 [Ω・cm]以下である、ホウ素がドープされたアナターゼ型酸化チタンを用いた透明導電薄膜。
Claims (1)
- ホウ素のドープ量を1×1019cm−3〜5×1022cm−3とした、抵抗値が10−3[Ω・cm]以下である透明導電性アナターゼ型酸化チタン。
Priority Applications (1)
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JP2008173787A JP5317033B2 (ja) | 2008-07-02 | 2008-07-02 | アナターゼ型酸化チタン |
Applications Claiming Priority (1)
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JP2008173787A JP5317033B2 (ja) | 2008-07-02 | 2008-07-02 | アナターゼ型酸化チタン |
Publications (2)
Publication Number | Publication Date |
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JP2010013309A JP2010013309A (ja) | 2010-01-21 |
JP5317033B2 true JP5317033B2 (ja) | 2013-10-16 |
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JP2008173787A Expired - Fee Related JP5317033B2 (ja) | 2008-07-02 | 2008-07-02 | アナターゼ型酸化チタン |
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JP (1) | JP5317033B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5429752B2 (ja) * | 2010-06-02 | 2014-02-26 | 国立大学法人島根大学 | 透明導電薄膜用ターゲット材およびその製造方法 |
CN103074588B (zh) * | 2013-01-15 | 2015-11-18 | 太原民丰金属表面处理科技有限公司 | 一种硼氮共掺杂二氧化钛薄膜的制备方法 |
CN103088286B (zh) * | 2013-01-15 | 2016-01-27 | 太原理工大学 | 一种硼掺杂二氧化钛薄膜的制备方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07331450A (ja) * | 1994-06-06 | 1995-12-19 | Japan Energy Corp | 導電性金属酸化物皮膜の形成方法 |
US20030039843A1 (en) * | 1997-03-14 | 2003-02-27 | Christopher Johnson | Photoactive coating, coated article, and method of making same |
JP3887499B2 (ja) * | 1998-11-10 | 2007-02-28 | シャープ株式会社 | 光触媒体の形成方法 |
JP2008057045A (ja) * | 2007-10-09 | 2008-03-13 | Agc Ceramics Co Ltd | 酸化物焼結体スパッタリングターゲット |
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2008
- 2008-07-02 JP JP2008173787A patent/JP5317033B2/ja not_active Expired - Fee Related
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JP2010013309A (ja) | 2010-01-21 |
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