CN103074588B - 一种硼氮共掺杂二氧化钛薄膜的制备方法 - Google Patents
一种硼氮共掺杂二氧化钛薄膜的制备方法 Download PDFInfo
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- CN103074588B CN103074588B CN201310016009.7A CN201310016009A CN103074588B CN 103074588 B CN103074588 B CN 103074588B CN 201310016009 A CN201310016009 A CN 201310016009A CN 103074588 B CN103074588 B CN 103074588B
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- Prior art keywords
- titanium dioxide
- dioxide film
- preparation
- doped titanium
- metal works
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 title claims abstract description 56
- 239000004408 titanium dioxide Substances 0.000 title claims abstract description 28
- TZHYBRCGYCPGBQ-UHFFFAOYSA-N [B].[N] Chemical compound [B].[N] TZHYBRCGYCPGBQ-UHFFFAOYSA-N 0.000 title claims abstract description 27
- 238000002360 preparation method Methods 0.000 title claims abstract description 19
- 229910052751 metal Inorganic materials 0.000 claims abstract description 50
- 239000002184 metal Substances 0.000 claims abstract description 50
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims abstract description 34
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 28
- 239000007789 gas Substances 0.000 claims abstract description 28
- 229910052786 argon Inorganic materials 0.000 claims abstract description 17
- 150000002500 ions Chemical class 0.000 claims abstract description 16
- 229910033181 TiB2 Inorganic materials 0.000 claims abstract description 14
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 14
- 239000001301 oxygen Substances 0.000 claims abstract description 14
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 14
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 claims abstract description 13
- 239000007787 solid Substances 0.000 claims abstract description 12
- 150000001875 compounds Chemical class 0.000 claims abstract description 11
- 238000009413 insulation Methods 0.000 claims abstract description 10
- 239000008186 active pharmaceutical agent Substances 0.000 claims abstract description 9
- QDMRQDKMCNPQQH-UHFFFAOYSA-N boranylidynetitanium Chemical compound [B].[Ti] QDMRQDKMCNPQQH-UHFFFAOYSA-N 0.000 claims abstract description 8
- 230000001276 controlling effect Effects 0.000 claims abstract description 8
- 230000001105 regulatory effect Effects 0.000 claims abstract description 8
- 229910001220 stainless steel Inorganic materials 0.000 claims description 12
- 238000010849 ion bombardment Methods 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 229910000963 austenitic stainless steel Inorganic materials 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 5
- 229910052796 boron Inorganic materials 0.000 claims description 3
- 239000011343 solid material Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 10
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000010935 stainless steel Substances 0.000 description 7
- 238000005275 alloying Methods 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 238000007747 plating Methods 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- 229910001566 austenite Inorganic materials 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 229910052758 niobium Inorganic materials 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 229910000851 Alloy steel Inorganic materials 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- -1 TiB2 compound Chemical class 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 238000004887 air purification Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910000765 intermetallic Inorganic materials 0.000 description 1
- 230000035800 maturation Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
Description
Claims (10)
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CN201310016009.7A CN103074588B (zh) | 2013-01-15 | 2013-01-15 | 一种硼氮共掺杂二氧化钛薄膜的制备方法 |
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CN201310016009.7A CN103074588B (zh) | 2013-01-15 | 2013-01-15 | 一种硼氮共掺杂二氧化钛薄膜的制备方法 |
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CN103074588A CN103074588A (zh) | 2013-05-01 |
CN103074588B true CN103074588B (zh) | 2015-11-18 |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4731539A (en) * | 1983-05-26 | 1988-03-15 | Plaur Corporation | Method and apparatus for introducing normally solid material into substrate surfaces |
CN101328574A (zh) * | 2008-07-23 | 2008-12-24 | 太原理工大学 | 一种高膜基结合强度光催化TiO2薄膜的制备方法 |
JP2010013309A (ja) * | 2008-07-02 | 2010-01-21 | Shimane Univ | アナターゼ型酸化チタンおよび透明導電薄膜 |
CN101884938A (zh) * | 2010-06-29 | 2010-11-17 | 武汉大学 | 一种制备氮掺杂TiO2光催化薄膜的方法 |
-
2013
- 2013-01-15 CN CN201310016009.7A patent/CN103074588B/zh not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4731539A (en) * | 1983-05-26 | 1988-03-15 | Plaur Corporation | Method and apparatus for introducing normally solid material into substrate surfaces |
JP2010013309A (ja) * | 2008-07-02 | 2010-01-21 | Shimane Univ | アナターゼ型酸化チタンおよび透明導電薄膜 |
CN101328574A (zh) * | 2008-07-23 | 2008-12-24 | 太原理工大学 | 一种高膜基结合强度光催化TiO2薄膜的制备方法 |
CN101884938A (zh) * | 2010-06-29 | 2010-11-17 | 武汉大学 | 一种制备氮掺杂TiO2光催化薄膜的方法 |
Non-Patent Citations (1)
Title |
---|
Effect of boron-doping on thermoelectric properties of rutile-type titanium dioxide sintered materials;Hiroyuki Kitagawa等;《Journal of Alloys and Compounds》;20100928;第508卷(第2期);第582-586页 * |
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Effective date of registration: 20140414 Address after: 75, No. 73, Heping South Road, Wan Berlin District, Shanxi, 030024, 3216, Taiyuan Applicant after: Taiyuan Minfeng Metal Surface Treatment Technology Co.,Ltd. Address before: 030024 School of mechanics, No. 79 West Street, Taiyuan, Shanxi, Yingze Applicant before: Taiyuan University of Technology |
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Effective date of registration: 20200526 Address after: Shop 05, 2f, building 9, Tiantai yuzeyuan, 125 xikuang street, Wanbailin District, Taiyuan City, Shanxi Province Patentee after: Shanxi pinghehai Technology Co.,Ltd. Address before: 75, No. 73, Heping South Road, Wan Berlin District, Shanxi, 030024, 3216, Taiyuan Patentee before: Taiyuan Minfeng Metal Surface Treatment Technology Co.,Ltd. |
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Granted publication date: 20151118 Termination date: 20220115 |