JP5293485B2 - Method for manufacturing plasma display member - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a member used for a plasma display having high productivity, and to provide a plasma display having a high display quality. <P>SOLUTION: In a method of manufacturing a member used for a display, in which a grid-formed partition wall is formed by forming a photosensitive glass paste layer on a substrate, performing exposure operations a plurality of times, and developing and calcining the glass paste layer, an opening width of a subsidiary partition wall positioned on an outermost part, in a longitudinal direction, of a main partition wall of a photo-mask having a light-transmissive pattern formed in a grid is greater than an opening width of an auxiliary partition wall positioned on a center part, in a longitudinal direction, of the main partition wall. From among a plurality of exposure operations, after a predetermined exposure operation is completed, during a period for which a next exposure operation is conducted, a photo-mask displacement operation is performed, in which a photo-mask having a light-transmissive pattern formed in grid and the substrate are displaced relative to each other in parallel with an address electrode. A moving distance in the photo-mask moving operation is an integral multiple of a pitch of: a subsidiary partition wall positioned on an outermost part, in a longitudinal direction, of the main partition wall of the photo-mask having a light-transmissive pattern formed in grid; and a subsidiary partition wall adjacent thereto. <P>COPYRIGHT: (C)2011,JPO&amp;INPIT

Description

  The present invention relates to a method for manufacturing a member for a plasma display.

  Plasma displays are attracting attention as displays that can be used in thin and large televisions. FIG. 12 is a perspective view schematically showing an example of the configuration of one pixel of the plasma display. In the example shown in FIG. 12, a plurality of paired sustain electrodes 15 and scan electrodes 16 are made of a material such as silver, chromium, aluminum, or nickel on the glass substrate 14 on the front plate 19 side serving as a display surface. When the direction of the short side of the region is the vertical direction and the direction of the long side is the horizontal direction, the region is formed in a stripe shape having the horizontal direction as the long direction. Further, a dielectric layer 17 mainly composed of glass is formed to cover the sustain electrode 15 and the scan electrode 16 with a thickness of 20 to 50 μm, and a protective layer 18 is formed to cover the dielectric layer 17.

  On the other hand, on the glass substrate 20 on the back plate 26 side, a plurality of address electrodes 21 are formed in a stripe shape having the longitudinal direction as the longitudinal direction, and the address layer 21 is covered and the dielectric layer 22 mainly composed of glass. Is formed. In order to partition the discharge cells on the dielectric layer 22, a grid-like barrier rib comprising a main barrier rib 23 having a longitudinal direction as a longitudinal direction and an auxiliary barrier rib 24 substantially orthogonal to the main barrier rib 23 is formed, and the barrier rib and the dielectric layer The phosphor layer 25 is formed in the discharge space formed by 22. In a plasma display capable of full color display, the phosphor layer is configured to emit light in each color of red (R), green (G), and blue (B). The front plate and the back plate are sealed so that the sustain electrode 15 on the front plate 19 side and the address electrode 21 on the back plate 26 side are orthogonal to each other, and helium, neon, xenon, etc. are formed in the gap between these substrates. A noble gas is sealed to form a plasma display. Since the pixel cell is formed around the intersection of the scan electrode 16 and the address electrode 21, the plasma display has a plurality of pixel cells and can display an image.

  When performing display on the plasma display, if a voltage higher than the discharge start voltage is applied between the scan electrode 16 and the address electrode 21 from a state where the selected pixel cell is not emitting light, positive ions and electrons generated by ionization are generated. Since the pixel cell has a capacitive load, it moves in the discharge space toward the electrode of the opposite polarity and charges the inner wall of the protective layer 18, and the charge on the inner wall is attenuated due to the high resistance of the protective layer 18. Without remaining as wall charges.

  Next, a sustaining voltage is applied between the scan electrode 16 and the sustain electrode 15. Where there is a wall charge, it can be discharged even at a voltage lower than the discharge start voltage. The xenon gas in the discharge space is excited by the discharge, and ultraviolet light having a wavelength of 147 nm is generated. The ultraviolet light excites the phosphor layer 25, thereby enabling light emission display.

  In the address electrodes, dielectric layers, barrier ribs, and phosphor layers constituting the back plate for plasma display panel, a photosensitive paste is applied or laminated on the substrate, exposed through a photomask having a desired pattern, and then desired. There is known a method of developing using the above developer.

  For example, there is a method of forming a partition wall by forming a photosensitive paste layer made of ceramic powder and an ultraviolet curable resin on a substrate, and exposing, developing, and baking through a photomask having a desired pattern (Patent Document 1). Proposed.

  However, when foreign matter adheres to the photomask, or there are scratches, most of the patterns obtained after exposure, development, and baking have defects such as disconnection or short circuit, resulting in a decrease in yield. there were.

  In order to solve such a problem, a method has been proposed in which a photomask having a photomask opening shorter than the pattern layer is prepared and exposed while moving the substrate or the photomask (Patent Documents 2 and 3). ing. However, in this method, when forming a complicated pattern such as a PDP lattice barrier rib, a barrier rib precursor is formed at the time of firing even if a barrier rib precursor having a good shape can be formed after exposure and development. Shrinkage occurs when the organic component in the photosensitive paste layer is removed. This causes a defect in the shape of the partition, particularly at the edge of the substrate or in the direction of movement of the photomask. There is a problem of degrading the display quality.

JP-A-2-165538 JP 2004-240095 A International Publication Number WO2006 / 025266A1

  The problem to be solved by the present invention is to provide a plasma display member with high productivity and to provide a plasma display with high display quality.

  An object of the present invention is to form a lattice pattern comprising a plurality of substantially striped address electrodes on a substrate, a dielectric layer covering the address electrodes, a main partition substantially parallel to the address electrode, and an auxiliary partition substantially orthogonal to the main partition. In manufacturing a member for a plasma display having a partition wall, an address electrode or an address electrode precursor and a dielectric layer or a dielectric layer precursor are provided on a substrate, and the dielectric layer or the dielectric layer precursor is provided on the substrate. A grid-like light transmission comprising a light-transmitting portion for forming a main barrier rib substantially parallel to the address electrode or the precursor of the address electrode and a light-transmitting portion for forming a auxiliary barrier rib that is substantially orthogonal to the address electrode or the address electrode precursor. A method for producing a display member, wherein a plurality of exposure operations are performed through a photomask having a pattern, developed, and baked to form a grid-shaped partition wall. The opening width of the light transmitting portion for forming the auxiliary barrier rib located at the outermost portion in the longitudinal direction of the light transmitting portion for forming the main barrier rib of the photomask having a light transmitting pattern is the center in the longitudinal direction of the light transmitting portion for forming the main barrier rib This is larger than the opening width of the light transmitting part for forming the auxiliary barrier rib located at the part, and after performing a specific exposure operation among the multiple exposure operations, before performing the next exposure operation, A photomask moving operation is performed in which a photomask having a light pattern and a substrate are moved relative to each other in parallel with the address electrode, and a moving distance in the photomask moving operation is a main partition wall of the photomask having the lattice-like light transmitting pattern. To solve the problem by a method for manufacturing a member for plasma display, characterized in that it is an integral multiple of the pitch of the auxiliary barrier rib transparent portion located at the outermost part in the longitudinal direction of the forming transparent portion and the auxiliary barrier rib transparent portion adjacent thereto. It can be.

  Another object of the present invention is to comprise a plurality of substantially striped address electrodes on a substrate, a dielectric layer covering the address electrodes, a main partition substantially parallel to the address electrode, and an auxiliary partition substantially orthogonal to the main partition. In manufacturing a member for a plasma display having a lattice-shaped partition wall, an address electrode or a precursor of an address electrode, and a dielectric layer or a precursor of a dielectric layer are provided on a substrate, and the dielectric layer or the precursor of the dielectric layer is provided. A first photosensitive glass paste layer is formed on the body, exposed using a first photomask having a translucent portion at a position corresponding to the intersection of the main partition and the auxiliary partition, and the first A second photosensitive glass paste layer is provided on the photosensitive glass paste layer, a light transmitting portion for forming a main partition wall substantially parallel to the address electrode or the address electrode precursor, and an auxiliary member substantially orthogonal thereto. Method for manufacturing display member, wherein a plurality of exposure operations are performed through a second photomask having a lattice-like light-transmitting pattern composed of a wall-forming light-transmitting portion, developed, and baked to form a lattice-shaped partition wall The opening width of the auxiliary partition wall forming light transmitting portion located at the outermost portion in the longitudinal direction of the main partition wall forming light transmitting portion of the second photomask is the center in the longitudinal direction of the main partition wall forming light transmitting portion. After the specific exposure operation is performed among the plurality of exposure operations and before the next exposure operation, the second photo is larger. A photomask moving operation is performed in which the mask and the substrate are moved relative to each other in parallel with the address electrode, and the moving distance in the photomask moving operation is the outermost portion in the longitudinal direction of the light transmitting portion for forming the main partition wall of the second photomask. Auxiliary partition wall translucent part located at and next to it Can also be solved by a manufacturing method of a plasma display member, characterized in that the Hare is an integer multiple of the pitch of the auxiliary barrier transparent portion.

  According to the present invention, it is possible to provide a method for producing a plasma display member with high productivity and to provide a plasma display with high display quality.

It is a schematic diagram which shows the pattern in the upper left part of the photomask which has a lattice-shaped light transmission pattern used for this invention. It is a longitudinal cross-sectional schematic diagram of the conventional back plate for plasma displays. It is a cross-sectional schematic diagram of the conventional back plate for plasma displays. It is a longitudinal cross-sectional schematic diagram of the back plate for plasma displays of this invention. It is a transverse cross-sectional schematic diagram of the back plate for plasma displays of this invention. It is a schematic diagram which shows the pattern in the upper left of an example of the 1st photomask pattern used for this invention. It is a schematic diagram which shows the pattern in the upper left part of the other example of the 1st photomask pattern used for this invention. It is a schematic diagram which shows the pattern in the upper left part of the other example of the 1st photomask pattern used for this invention. It is a schematic diagram which shows the pattern in the upper left part of the other example of the 1st photomask pattern used for this invention. It is a schematic diagram which shows the pattern in the upper left part of the other example of the 1st photomask pattern used for this invention. It is a schematic diagram which shows the pattern in the upper left part of the other example of the 1st photomask pattern used for this invention. It is the perspective view which showed typically the example of a structure of one pixel of a plasma display panel.

  The method for manufacturing a member for a plasma display according to the present invention includes a plurality of substantially striped address electrodes on a substrate, a dielectric layer covering the address electrodes, a main partition substantially parallel to the address electrode, and substantially orthogonal to the main partition. In manufacturing a member for a plasma display having a grid-shaped partition made up of auxiliary partitions, an address electrode or an address electrode precursor, and a dielectric layer or a dielectric layer precursor are provided on a substrate, and the dielectric layer or dielectric Forming a photosensitive glass paste layer on the precursor of the body layer, from the light transmitting portion for forming the main partition wall substantially parallel to the address electrode or the precursor of the address electrode, and the light transmitting portion for forming the auxiliary partition wall substantially orthogonal thereto A display in which a plurality of exposure operations are performed through a photomask having a lattice-like light-transmitting pattern, developed, and baked to form lattice-like partition walls. The opening width of the auxiliary partition wall forming light transmitting portion located on the outermost side in the longitudinal direction of the main partition wall forming light transmitting portion of the photomask having the lattice-shaped light transmitting pattern is After the specific exposure operation is performed among the plurality of exposure operations, the next exposure is performed, which is larger than the opening width of the light transmission portion for auxiliary partition wall formation located in the longitudinal central portion of the light transmission portion for main partition wall formation. During the operation, a photomask moving operation is performed in which the photomask having the lattice-like light-transmitting pattern and the substrate are relatively moved in parallel with the address electrodes, and the moving distance in the photomask moving operation is the lattice-like shape. It is an integral multiple of the pitch between the auxiliary barrier rib transparent portion located at the outermost part in the longitudinal direction of the main barrier rib forming transparent portion of the photomask having the transparent pattern and the auxiliary barrier rib transparent portion adjacent thereto. Plasma display part A method of manufacturing (first aspect of the present invention).

  After performing a specific exposure operation, during a next exposure operation, a photomask moving operation is performed in which the photomask having the lattice-like translucent pattern and the substrate are relatively moved in parallel with the address electrodes. Even when foreign matter adheres to the photomask or there are scratches, it is possible to suppress the occurrence of defects such as disconnection or short circuit, and to manufacture a plasma display member with high productivity.

  The moving distance in the photomask moving operation is such that the auxiliary barrier rib transparent portion located on the outermost side in the longitudinal direction of the main barrier rib forming transparent portion of the photomask having the lattice-like transparent pattern and the auxiliary barrier rib transparent adjacent thereto. Although it is an integral multiple of the pitch of the part, it is preferable that it is the same multiple. By setting the same magnification, it is possible to minimize the positional deviation when the photomask moving operation is performed. If it is not an integer multiple, it becomes difficult to control the shape of the partition. In the present invention, the pitch refers to the distance between the center lines of each pattern, and the integral multiple does not necessarily need to be strictly an integral multiple, and is generally an integer multiple of 0.90. It may be within a range of 1.10 times, preferably 0.95 to 1.05 times.

  FIG. 1 is a schematic diagram showing a pattern in the upper left part of a photomask having a lattice-like light transmission pattern used in the present invention. This photomask has a lattice-like light-transmitting pattern composed of a main barrier rib-forming light-transmitting portion 3 and an auxiliary barrier rib-forming light-transmitting portion 1, and the main barrier rib formation of the photomask having the lattice-like light-transmitting pattern. The opening width W2 of the auxiliary partition wall forming light transmitting portion 2 located at the outermost part in the longitudinal direction of the light transmitting portion for the auxiliary partition wall forming light transmitting portion for the auxiliary partition wall forming light transmitting portion positioned at the center in the longitudinal direction of the main partition wall forming light transmitting portion. It is larger than the opening width W1 (W1 <W2). When W1 = W2 as in the prior art, when the exposure operation is performed by relatively moving the photomask and the substrate in parallel with the direction of the main partition, the exposure amount of the auxiliary partition on the outermost side in the vertical direction becomes the center in the vertical direction. Compared with the auxiliary partition wall. As a result, in the partition wall precursor after exposure and development, as shown in FIG. 2, the width L2 of the auxiliary partition wall 7 positioned at the outermost portion in the longitudinal direction of the main partition wall is positioned at the center in the longitudinal direction of the main partition wall. When the width of the partition wall 6 becomes narrower than that of the partition wall L1 and is fired, the auxiliary partition wall 7 positioned at the outermost portion in the longitudinal direction of the main partition wall is pulled by the contraction stress of the main partition wall, as shown in FIG. By receiving a contraction stress larger than the force, the auxiliary partition 7 positioned at the outermost part in the longitudinal direction of the main partition rises from the substrate. When the auxiliary barrier rib 7 located on the outermost part of the main barrier rib in the longitudinal direction is lifted from the substrate, when the plasma display is manufactured, the lifted portion interferes with the front plate and a gap is formed between the front plate and erroneous discharge, etc. Occurs and the display quality is degraded.

  In order to solve this problem, the opening width W2 of the auxiliary barrier rib forming transparent portion 2 located at the outermost part in the longitudinal direction of the main barrier rib forming transparent portion of the photomask having a lattice-like transparent pattern is set to the main barrier rib. The photomask and the substrate are parallel to the direction of the main partition wall by setting it to be larger than the opening width W1 of the auxiliary partition wall formation light transmission portion located at the longitudinal center of the formation light transmission portion, that is, W1 <W2. In the partition precursor after exposure and development, the width L5 of the auxiliary partition 7 positioned at the outermost portion in the longitudinal direction of the main partition is increased even if the exposure operation is performed with the relative movement of the auxiliary partition 7 as shown in FIG. Therefore, even if firing is performed, the auxiliary partition wall 7 positioned at the outermost part in the longitudinal direction of the main partition wall is not lifted from the substrate as shown in FIG. 5, and the display quality can be degraded when the plasma display is manufactured. Disappear.

  The opening width of the light transmitting portion for forming auxiliary barrier ribs located at the outermost portion in the longitudinal direction of the light transmitting portion for forming main barrier ribs of the photomask and the light transmitting portion for forming auxiliary barrier ribs positioned at the center in the longitudinal direction of the light transmitting portion for forming main barrier ribs. The ratio (W2 / W1) to the aperture width of the optical part is preferably 1.1 to 4.7, and if it is 1.1 or more, the partition wall width at the outermost part in the vertical direction can be sufficiently increased. The outermost auxiliary partition wall in the vertical direction is not lifted from the substrate and the display quality of the plasma display is not deteriorated, and if it is 4.7 or less, the contraction stress in the width direction of the outermost auxiliary partition wall itself is increased and the top is warped. There is nothing.

  FIG. 1 shows a translucent pattern of only the portion corresponding to the upper left portion of the plasma display member, but the translucent portion for forming the main partition wall extends linearly at a position below this portion. The light transmitting portions for forming auxiliary partition walls are arranged at an equal pitch. Further, the light-transmitting portion pattern at the bottom is a pattern obtained by vertically inverting the pattern of FIG. Further, in the position on the left side of the portion in FIG. 1, the light transmitting portions for forming the main barrier ribs are arranged at an equal pitch, the light transmitting portions for forming the auxiliary barrier ribs extend linearly, and the right end portion of FIG. The pattern is a left-right reversed pattern.

  In addition, since the photomask and the substrate are relatively moved during a plurality of exposure operations, an alignment operation for alignment is performed before each of the two exposure operations in order to ensure the exposure position accuracy. Is preferred. However, before the first exposure operation, an alignment operation for alignment between the substrate and the photomask is performed every time, but before the second exposure operation, the alignment operation is performed on the first sheet and the second and subsequent sheets. In one cycle, the exposure operation may be performed by moving the photomask and the substrate relative to each other by a certain distance based on the result of the initial alignment without performing the alignment operation. In this way, the positional accuracy of the exposure operation can be ensured and the exposure operation can be completed in a short time, so that productivity is not sacrificed.

  The method for manufacturing a member for a plasma display according to the present invention includes a plurality of substantially striped address electrodes on a substrate, a dielectric layer covering the address electrodes, a main partition substantially parallel to the address electrodes, and the main partition. In manufacturing a member for a plasma display having a grid-shaped partition wall composed of orthogonal auxiliary partition walls, an address electrode or an address electrode precursor and a dielectric layer or a dielectric layer precursor are provided on a substrate, and the dielectric layer Alternatively, a first photosensitive glass paste layer is formed on the dielectric layer precursor, and exposure is performed using a first photomask having a translucent portion at a position corresponding to the intersection of the main partition and the auxiliary partition. Providing a second photosensitive glass paste layer on the first photosensitive glass paste layer, and forming a main partition wall substantially parallel to the address electrode or address electrode precursor A plurality of exposure operations are carried out through a second photomask having a lattice-like light transmission pattern comprising a light portion and a light transmission portion for forming auxiliary barrier ribs substantially orthogonal to the light portion, and developed and baked to form a lattice-like partition wall. And the opening width of the auxiliary barrier rib forming light-transmitting portion located at the outermost portion in the longitudinal direction of the main barrier rib forming transparent portion of the second photomask is the main barrier rib. After the specific exposure operation is performed among the plurality of exposure operations, the next exposure operation is performed, which is larger than the opening width of the auxiliary partition wall forming translucent portion located at the central portion in the longitudinal direction of the forming translucent portion. While performing, a photomask moving operation is performed in which the second photomask and the substrate are relatively moved in parallel with the address electrode, and the moving distance in the photomask moving operation is the main partition formation of the second photomask. At the outermost part of the translucent part in the longitudinal direction It may be a method for manufacturing a plasma display member, wherein the auxiliary barrier rib is an integral multiple of the pitch of the transparent portion and the auxiliary barrier transparent portion adjacent thereto to (the second embodiment).

  In the second aspect of the present invention, exposure is performed through a first photomask having a light transmitting portion at a position corresponding to the intersection of the main partition and the auxiliary partition. After performing the exposure through the first photomask, the exposure was performed through the first photomask by providing a second photosensitive glass paste layer on the first photosensitive glass paste layer. Since the exposed portion at the time is raised, it can be suppressed that the partition wall is locally lowered at the intersection of the main partition wall and the auxiliary partition wall having a large shrinkage ratio in the height direction during firing. It is possible to prevent the display quality from being deteriorated due to erroneous discharge at the time of panel display, which is caused by the partition wall being locally lowered at the intersection.

  The light transmitting portion pattern of the first photomask having a light transmitting portion at a position corresponding to the intersection between the main partition and the auxiliary partition is not particularly limited. For example, the intersection between the main partition and the auxiliary partition shown in FIG. 8 is a square as the translucent portion 4 at a position corresponding to the above, a rectangle is at the translucent portion 4 at a position corresponding to the intersection of the main partition wall and the auxiliary partition wall shown in FIG. 7, and the main partition wall and the auxiliary partition wall illustrated in FIG. A polygon such as the transparent portion 4 at a position corresponding to the intersection, a circle such as the transparent portion 4 at a position corresponding to the intersection of the main partition and the auxiliary partition shown in FIG. 9, and a main partition shown in FIG. Although it may be oval like the translucent portion 4 at a position corresponding to the intersection of the auxiliary partition walls, it is particularly preferable that the rhombus is as shown in FIG. In the case of a shape other than the rhombus, for example, a square having sides parallel to the longitudinal direction of the main partition wall and the longitudinal direction of the auxiliary partition wall as shown in FIG. 6, the portion protruding from the lattice pattern protrudes in the height direction during firing. Although the formation of the phosphor layer may be difficult or the display quality of the panel may be lowered, the occurrence of such a problem can be eliminated by using a rhombus.

  The size of the rhombus is preferably 30 to 150 μm diagonally, and if it is 30 μm or more, it is possible to sufficiently obtain an effect of suppressing the local partition wall from being locally lowered at the intersection of the main partition wall and the auxiliary partition wall, and 150 μm or less. If this is the case, the pattern is buried and formation of the phosphor layer does not become difficult.

  Similar to FIG. 1, FIGS. 6 to 11 show only the translucent part pattern corresponding to the upper left part of the plasma display member, but the transparent parts of the same shape are also formed in the part outside the region of FIGS. The light part patterns are arranged at an equal pitch.

  In addition, when performing exposure using the first photomask, a plurality of exposure operations can be performed as in the case of performing exposure using a second photomask described later. Among the multiple exposure operations, after performing a specific exposure operation, a photomask moving operation for relatively moving the first photomask and the substrate in parallel with the address electrode during the next exposure operation In this case, the movement distance in the photomask moving operation is such that the auxiliary barrier rib transparent portion located on the outermost part in the longitudinal direction of the main barrier rib forming transparent portion of the second photomask and the auxiliary barrier rib transparent adjacent thereto are transmitted. It is preferably an integral multiple of the part pitch. When performing a photomask movement operation in which the first photomask and the substrate are moved relative to each other perpendicular to the address electrode, the movement distance in the photomask movement operation is the transmission distance for forming the main partition wall of the second photomask. It is preferably an integer multiple of the pitch of the optical part. If it is not an integer multiple, it becomes difficult to control the shape of the partition.

  Since the photomask and the substrate are relatively moved during a plurality of exposure operations, it is preferable to perform an alignment operation for alignment before each of the two exposure operations in order to ensure the exposure position accuracy. . However, before the first exposure operation, an alignment operation for alignment between the substrate and the photomask is performed every time, but before the second exposure operation, the alignment operation is performed on the first sheet and the second and subsequent sheets. In one cycle, the exposure operation may be performed by moving the photomask and the substrate relative to each other by a certain distance based on the result of the initial alignment without performing the alignment operation.

  After performing exposure using the first photomask, a second photosensitive glass paste layer is provided on the first photosensitive glass paste layer, and in the same manner as in the first aspect of the present invention, address electrodes or addresses are provided. Multiple exposures through a second photomask having a light transmission pattern in the form of a main barrier rib forming light-transmitting portion substantially parallel to the electrode precursor and an auxiliary barrier rib forming light-transmitting portion substantially orthogonal thereto Operation is performed, development is performed, and baking is performed to form grid-like partition walls. At this time, the opening width of the light transmitting portion for forming the auxiliary barrier rib located at the outermost portion in the longitudinal direction of the light transmitting portion for forming the main barrier rib of the second photomask is positioned at the center in the longitudinal direction of the light transmitting portion for forming the main barrier rib. The second photomask and the substrate are placed after performing a specific exposure operation among a plurality of exposure operations and performing the next exposure operation. By moving relative to the address electrodes in parallel, as in the first aspect of the present invention, the auxiliary barrier ribs located on the outermost part in the longitudinal direction of the main barrier ribs are not lifted from the substrate after firing, and the plasma display is manufactured. There is an extraordinary effect that the display quality is not degraded.

  The photomask having a lattice-like light transmission pattern in the first aspect of the present invention and the second photomask having the lattice-like light transmission pattern in the second aspect are both a photomask and a substrate. When moving the photomask, the photomask and the substrate are moved in parallel with the address electrodes. In such a case, the main partition parallel to the moving direction can easily secure the positional accuracy of the substrate and the photomask before and after the movement. The variation in the width of the partition can be reduced. If the variation in the width of the main partition is small, it will not be difficult to form the phosphor layer, and the productivity of the plasma display member will not be reduced. On the other hand, when a photomask moving operation is performed in which the photomask and the substrate are moved relative to each other in the direction perpendicular to the address electrodes, it is difficult to ensure the positional accuracy between the substrate and the photomask before and after the movement in the main partition perpendicular to the moving direction. In addition, the variation of the main partition wall is increased, and it is difficult to form the phosphor layer, so that the productivity of the plasma display member may be lowered. Similarly, when the photomask moving operation is performed in a direction other than parallel or perpendicular to the address electrodes, the variation in the width of the main barrier ribs increases, which makes it difficult to apply the phosphor layer and may reduce the productivity of the plasma display member. is there.

  As shown in FIG. 1, the photomask having the lattice-like light transmission pattern in the first embodiment and the second photomask having the lattice-like light transmission pattern in the second embodiment are used. Preferably protrudes in the longitudinal direction of the main partition wall forming light transmitting portion from the auxiliary partition wall forming light transmitting portion located at the outermost portion in the longitudinal direction of the main partition wall forming light transmitting portion, and the main partition wall forming light transmitting portion. The length in the longitudinal direction of the part is preferably longer than the length in the longitudinal direction of the main partition wall, that is, longer than the length in the longitudinal direction of the photosensitive glass paste layer provided to form the partition wall. The main partition wall forming light transmitting portion protrudes beyond the auxiliary partition wall forming light transmitting portion located at the outermost portion in the longitudinal direction of the main partition wall forming light transmitting portion, and the length of the main partition wall forming light transmitting portion in the longitudinal direction is set. By making it sufficiently longer than the length of the main partition wall in the longitudinal direction, exposure is performed in the entire longitudinal direction of the pattern that becomes the precursor of the main partition wall after development in all exposure operations performed using a photomask having a lattice-like light-transmitting pattern. Therefore, even if the photomask and the substrate are moved relative to each other in parallel with the address electrode, there is no underexposure at the main partition longitudinal end, and the main partition end is prevented from peeling off after development. I can do it.

  The photomask having the lattice-like light transmission pattern in the first aspect and the second photomask having the lattice-like light transmission pattern in the second aspect are such that the auxiliary barrier rib formation light-transmitting portion is for the auxiliary barrier rib formation. It is preferable that it does not protrude from the light transmitting part for forming the main partition located at the outermost part in the longitudinal direction of the light transmitting part. When the auxiliary partition forming light transmitting portion protrudes beyond the main partition forming light transmitting portion located at the outermost part in the longitudinal direction of the auxiliary partition forming light transmitting portion, the auxiliary partition longitudinal end of the auxiliary partition due to the firing shrinkage stress of the auxiliary partition The part is pulled and floats up from the substrate. When the auxiliary partition longitudinal end of the auxiliary partition lifts from the substrate, when the plasma display is manufactured, the lifted part interferes with the front plate, and a gap is formed between the front plate and misdischarge occurs. The display quality may be degraded.

  Hereinafter, the manufacturing method of the member for plasma displays of the present invention is explained.

  As the substrate used for the plasma display member in the present invention, soda glass or the like can be used. Specifically, the heat-resistant glass for plasma display is PD200 manufactured by Asahi Glass Co., Ltd. or Nippon Electric Glass Co., Ltd. PP8 etc. are mentioned.

  Striped address electrodes are formed on the substrate with a metal such as silver, aluminum, chromium, or nickel. As a forming method, a metal paste mainly composed of these metal powders and an organic binder is printed by screen printing, and heated and baked at 400 to 600 ° C. to form a metal pattern, After applying a photosensitive metal paste containing a photosensitive organic component, after pattern exposure using a photomask, unnecessary portions are dissolved and removed in a development process, and further heated and baked at 400 to 600 ° C. to form a metal pattern. A photosensitive paste method can be used. Alternatively, an etching method may be used in which a resist is applied after sputtering a metal such as chromium or aluminum on a glass substrate, and after the resist is subjected to pattern exposure and development, an unnecessary portion of the metal is removed by etching. The electrode thickness is preferably 1.0 to 10 μm, and more preferably 1.5 to 5 μm. If the electrode thickness is too thin, the resistance value tends to be large and accurate driving tends to be difficult, and if it is too thick, a large amount of material is required, which tends to be disadvantageous in terms of cost. The width of the address electrode is preferably 30 to 240 μm, more preferably 35 to 150 μm. If the width of the address electrode is too narrow, the resistance value tends to be high and accurate driving tends to be difficult. Further, the address electrodes are formed at a pitch corresponding to the display cell (region where each RGB of the pixel is formed). It is preferable to form at a pitch of 100 to 500 μm for a normal plasma display and 100 to 400 μm for a high definition plasma display.

  A dielectric layer is formed to cover the address electrodes. The dielectric layer can be formed by applying a glass paste mainly composed of glass powder and an organic binder so as to cover the address electrodes, and then baking at 400 to 600 ° C. The glass paste used for the dielectric layer preferably includes a low melting glass powder containing at least one of lead oxide, bismuth oxide, zinc oxide and phosphorus oxide, and containing 10 to 80% by mass in total. it can. By setting the blend to 10% by mass or more, firing at 600 ° C. or less is facilitated, and by setting it to 80% by mass or less, crystallization is prevented and a decrease in transmittance is prevented.

  A paste is prepared by kneading the low-melting glass powder and an organic binder. As the organic binder to be used, cellulose compounds typified by ethyl cellulose, methyl cellulose and the like, acrylic compounds such as methyl methacrylate, ethyl methacrylate, isobutyl methacrylate, methyl acrylate, ethyl acrylate and isobutyl acrylate can be used. Moreover, you may add additives, such as a solvent and a plasticizer, in glass paste. As the solvent, general-purpose solvents such as terpineol, butyrolactone, toluene and methyl cellosolve can be used. As the plasticizer, dibutyl phthalate, diethyl phthalate, or the like can be used. By adding a filler component having a high softening temperature and not softening during firing, in addition to the low-melting glass powder, a PDP having a high reflectance and a high luminance can be obtained. As the filler, titanium oxide, aluminum oxide, zirconium oxide and the like are preferable, and it is particularly preferable to use titanium oxide having a 50% particle diameter in a volume distribution curve of 0.05 to 3 μm. The filler content is preferably a glass powder: filler mass ratio of 1: 1 to 10: 1. By making the filler content 1/10 or more of the glass powder content by weight ratio, the effect of improving the luminance can be obtained. Moreover, sinterability can be maintained by setting it as the same amount or less of content of glass powder.

  Further, by adding conductive fine particles to the glass paste used for the dielectric layer, a plasma display with high reliability during driving can be produced. The conductive fine particles are preferably metal powders such as nickel and chromium, and the 50% particle diameter in the volume distribution curve is preferably 1 to 10 μm. When the thickness is 1 μm or more, a sufficient effect can be exhibited, and when the thickness is 10 μm or less, unevenness on the dielectric can be suppressed, and formation of a partition wall described later on the dielectric layer can be facilitated. As content in which these electroconductive fine particles are contained in a dielectric material layer, 0.1-10 mass% is preferable. When the content is 0.1% by mass or more, conductivity can be obtained, and when the content is 10% by mass or less, a short circuit between adjacent address electrodes in the horizontal direction can be prevented. The thickness of the dielectric layer is preferably 3 to 30 μm, more preferably 3 to 15 μm. If the thickness of the dielectric layer is too thin, pinholes tend to occur frequently, and if it is too thick, the discharge voltage tends to be high and the power consumption tends to increase.

  Next, the formation method of the main partition and the auxiliary partition in this invention is demonstrated. The main partition wall and the auxiliary partition wall are formed by forming a pattern by a photosensitive paste method (photolithography method) and baking it.

  The photosensitive paste method will be described in detail below.

  The photosensitive paste for forming a partition used in the photosensitive paste method is mainly composed of inorganic fine particles and a photosensitive organic component, and if necessary, a photopolymerization initiator, a light absorber, a sensitizer, an organic solvent, and a sensitization aid. Contains a polymerization inhibitor.

  As the inorganic fine particles of the barrier rib forming photosensitive paste, glass, ceramic (alumina, cordierite, etc.) and the like can be used. In particular, glass or ceramics containing silicon oxide, boron oxide, or aluminum oxide as an essential component is preferable.

The particle diameter of the inorganic fine particles is selected in consideration of the shape of the pattern to be produced, but the 50% particle diameter in the volume distribution curve is preferably 1 to 10 μm, more preferably 1 to 5 μm. . By setting the 50% particle diameter in the volume distribution curve to 10 μm or less, it is possible to prevent surface irregularities from occurring. Moreover, the viscosity adjustment of a paste can be made easy by setting it as 1 micrometer or more. Furthermore, it is particularly preferable in the pattern formation to use glass fine particles having a specific surface area of 0.2 to ³ m ² / g.

Since the main partition wall and the auxiliary partition wall are preferably patterned on a glass substrate having a low heat softening point, inorganic particles containing 60% by mass or more of low melting glass particles having a heat softening temperature of 350 to 600 ° C. are used as the inorganic particles. It is preferable to use it. Further, by adding a filler component composed of high melting point glass fine particles or ceramic fine particles having a heat softening temperature higher than 600 ° C., the shrinkage rate at the time of firing can be suppressed, but the amount is equal to the total amount of inorganic fine particles. The amount is preferably 40% by mass or less. The low-melting glass fine particles have a linear expansion coefficient of 50 × 10 ^{−7 to} 90 × 10 ⁻⁷ K ⁻¹ , and further 60 × 10 ^{−7 to} 90 × 10 in order to prevent warping of the glass substrate during firing. It is preferable to use low-melting glass particles of ⁻⁷ K ⁻¹ .

  As the low-melting glass fine particles, glass containing silicon and / or boron oxide is preferably used.

  The silicon oxide is preferably blended in the range of 3 to 60% by mass. By setting the content to 3% by mass or more, the denseness, strength and stability of the glass layer are improved, and the thermal expansion coefficient is set within a desired range to prevent the problem of warpage due to the difference in thermal expansion coefficient with the glass substrate. be able to. Moreover, by setting it as 60 mass% or less, there exists an advantage that a thermal softening point becomes low and baking to a glass substrate is attained.

  Boron oxide can improve electrical, mechanical, and thermal characteristics such as electrical insulation, strength, thermal expansion coefficient, and denseness of the insulating layer by blending in the range of 5 to 50% by mass. The stability of glass can be maintained by setting it as 50 mass% or less.

Furthermore, by containing at least one of bismuth oxide, lead oxide, and zinc oxide in a total amount of 5 to 50% by mass, a glass paste having temperature characteristics suitable for patterning on a glass substrate can be obtained. it can. In particular, when glass fine particles containing 5 to 50% by mass of bismuth oxide are used, advantages such as a long pot life of the paste can be obtained. As the bismuth-based glass fine particles, glass powder having the following composition is preferably used.
Bismuth oxide: 10 to 40% by mass
Silicon oxide: 3-50 mass%
Boron oxide: 10 to 40% by mass
Barium oxide: 8-20% by mass
Aluminum oxide: 10-30% by mass
Moreover, you may use the glass fine particle which contains 3-20 mass% of at least 1 sort (s) among lithium oxide, sodium oxide, and potassium oxide. By adding the alkali metal oxide in an amount of 20% by mass or less, preferably 15% by mass or less, the stability of the paste can be improved. Of the above three types of alkali metal oxides, lithium oxide is particularly preferred from the viewpoint of paste stability. As the lithium glass fine particles, for example, glass powder containing the following composition is preferably used.
Lithium oxide: 2 to 15% by mass
Silicon oxide: 15-50 mass%
Boron oxide: 15-40% by mass
Barium oxide: 2 to 15% by mass
Aluminum oxide: 6-25% by mass
If glass particles containing both metal oxides such as lead oxide, bismuth oxide and zinc oxide and alkali metal oxides such as lithium oxide, sodium oxide and potassium oxide are used, the alkali metal content can be reduced. In addition, the heat softening temperature and the linear expansion coefficient can be easily controlled.

  Also, workability is improved by adding aluminum oxide, barium oxide, calcium oxide, magnesium oxide, titanium oxide, zinc oxide, zirconium oxide, etc., especially aluminum oxide, barium oxide, zinc oxide, etc. to the glass fine particles. However, from the viewpoint of the thermal softening point and the thermal expansion coefficient, the content is preferably 40% by mass or less, more preferably 25% by mass or less.

  The photosensitive organic component preferably contains at least one of a photosensitive monomer, a photosensitive oligomer, and a photosensitive polymer.

  The photosensitive monomer is a compound containing a carbon-carbon unsaturated bond, and specific examples thereof include monofunctional and polyfunctional (meth) acrylates, vinyl compounds, allylic compounds such as allyl compounds. It is preferable to use a monomer. These can be used alone or in combination of two or more.

  As the photosensitive oligomer and photosensitive polymer, an oligomer or polymer obtained by polymerizing at least one of monomers having a carbon-carbon double bond can be used. Preferably, it is an oligomer or polymer obtained by polymerizing at least one of the acrylic monomers, and the content of the monomer is 10% by mass or more, more preferably 35% by mass or more. It can be copolymerized with a photosensitive monomer. By copolymerizing an unsaturated acid such as an unsaturated carboxylic acid with a polymer or oligomer, the developability after exposure can be improved. Specific examples of the unsaturated carboxylic acid include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, and acid anhydrides thereof. The acid value (AV) of the polymer or oligomer having an acidic group such as a carboxyl group in the side chain thus obtained is preferably in the range of 50 to 180, and more preferably in the range of 70 to 140. By adding a photoreactive group to the side chain or molecular end to the polymer or oligomer shown above, it can be used as a photosensitive polymer or photosensitive oligomer having photosensitivity. Preferred photoreactive groups are those having an ethylenically unsaturated group. Examples of the ethylenically unsaturated group include a vinyl group, an allyl group, an acrylic group, and a methacryl group.

  Specific examples of the photopolymerization initiator include benzophenone, methyl O-benzoylbenzoate, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 4,4-dichlorobenzophenone, 4- Examples include benzoyl-4-methylphenyl ketone, dibenzyl ketone, fluorenone, 2,3-diethoxyacetophenone, 2,2-dimethoxy-2-phenyl-2-phenylacetophenone, and the like. One or more of these can be used. The photopolymerization initiator is preferably added in a range of 0.05 to 10% by mass, and more preferably in a range of 0.1 to 5% by mass with respect to the photosensitive component. If the amount of the polymerization initiator is too small, the photosensitivity tends to decrease, and if the amount of the photopolymerization initiator is too large, the residual ratio of the exposed portion tends to be too small.

  It is also effective to add a light absorber. By adding a compound having a high absorption effect of ultraviolet light or visible light, a high aspect ratio, high definition, and high resolution can be obtained. As the light absorber, those composed of organic dyes are preferably used. Specifically, azo dyes, aminoketone dyes, xanthene dyes, quinoline dyes, anthraquinone dyes, benzophenone dyes, diphenylcyanoacrylate dyes are used. Dyes, triazine dyes, p-aminobenzoic acid dyes, and the like can be used. Since organic dye does not remain in the insulating film after baking, it is preferable because the deterioration of the insulating film characteristics due to the light absorber can be reduced. Among these, azo dyes and benzophenone dyes are preferable. The addition amount of the organic dye is preferably 0.05 to 5% by mass, and more preferably 0.05 to 1% by mass. When the addition amount is less than the above range, the effect of adding the light absorber tends to be reduced, and when it is more than the above range, the insulating film characteristics after firing tend to be lowered.

  A sensitizer is preferably added in order to improve sensitivity. Specific examples of the sensitizer include 2,4-diethylthioxanthone, isopropylthioxanthone, 2,3-bis (4-diethylaminobenzal) cyclopentanone, 2,6-bis (4-dimethylaminobenzal) cyclohexanone, and the like. Is mentioned. One or more of these can be used. When adding a sensitizer to a photosensitive paste, the addition amount is 0.05-10 mass% normally with respect to the photosensitive component, More preferably, it is 0.1-10 mass%. If the amount of the sensitizer is less than the above range, the effect of improving the sensitivity tends not to be exhibited.

  Examples of the organic solvent include methyl cellosolve, ethyl cellosolve, butyl cellosolve, propylene glycol monomethyl ether acetate, methyl ethyl ketone, dioxane, acetone, cyclohexanone, cyclopentanone, isobutyl alcohol, isopropyl alcohol, tetrahydrofuran, dimethyl sulfoxide, and γ-butyllactone. , N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, bromobenzene, chlorobenzene, dibromobenzene, dichlorobenzene, bromobenzoic acid, chlorobenzoic acid and the like, and one or more of these An organic solvent mixture is used.

  The partition-forming photosensitive paste is usually prepared by mixing the above-mentioned inorganic fine particles and organic components so as to have a predetermined composition, and then uniformly mixing and dispersing them with a three roller or kneader. Next, a photosensitive paste is applied, dried, exposed, developed, and the like.

  As a method for applying the barrier rib forming photosensitive paste, a screen printing method, a bar coater, a roll coater, a die coater, a blade coater or the like can be used.

  In addition, a drying oven, a hot plate, an IR (infrared) furnace or the like can be used for drying after application.

Examples of the active light source used for exposure include visible light, near ultraviolet light, ultraviolet light, electron beam, X-ray, and laser light. Among these, ultraviolet rays are most preferable, and as the light source, for example, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a halogen lamp, or a germicidal lamp can be used. Among these, an ultrahigh pressure mercury lamp is suitable. Exposure conditions vary depending on the coating thickness, but exposure is performed for 0.1 to 10 minutes using an ultrahigh pressure mercury lamp with an output of 1 to 100 mW / cm ² .

  Here, the distance between the photomask and the surface of the photosensitive paste coating film (hereinafter referred to as the gap amount) is preferably adjusted to 50 to 500 μm, more preferably 70 to 400 μm. By setting the gap amount to 50 μm or more, more preferably 70 μm or more, contact between the photosensitive paste coating film and the photomask can be prevented, and destruction or contamination of both can be prevented. Moreover, sharp patterning is attained by setting it as 500 micrometers or less, More preferably, it is 400 micrometers or less.

  Development is performed using the difference in solubility in the developer between the exposed and unexposed areas. Development can be performed by a dipping method, a spray method, a brush method, or the like.

  Developer can dissolve organic components in the photosensitive paste, that is, photosensitive organic components before exposure in the case of negative photosensitive paste, and organic components after exposure in the case of positive photosensitive paste. Is used. When a compound having an acidic group such as a carboxyl group is present in the organic component to be dissolved, development can be performed with an alkaline aqueous solution. As the alkaline aqueous solution, an inorganic alkaline aqueous solution such as sodium hydroxide, sodium carbonate, sodium carbonate aqueous solution or calcium hydroxide aqueous solution is preferably used, but an organic alkaline aqueous solution can also be used. As the organic alkali, a general amine compound can be used. Specific examples include tetramethylammonium hydroxide, trimethylbenzylammonium hydroxide, monoethanolamine, and diethanolamine. The density | concentration of aqueous alkali solution is 0.01-10 mass% normally, More preferably, it is 0.1-5 mass%. If the alkali concentration is too low, the soluble portion tends to be difficult to remove, and if the alkali concentration is too high, the pattern portion tends to be peeled off or the insoluble portion tends to be corroded. The development temperature during development is preferably 20 to 50 ° C. in terms of process control.

  Next, the pattern of the main partition and the auxiliary partition obtained by development is fired in a firing furnace. The firing atmosphere and temperature vary depending on the type of paste and substrate, but firing is performed in an atmosphere of air, nitrogen, hydrogen, or the like. As the firing furnace, a batch-type firing furnace or a roller hearth-type continuous firing furnace can be used. The firing temperature is preferably 400 to 800 ° C. In the case where the partition wall is directly formed on the glass substrate, it is preferable to perform baking while maintaining the temperature at 450 to 620 ° C. for 10 to 60 minutes.

  Next, phosphor layers that emit light of red (R), green (G), and blue (B) colors are formed between main barrier ribs formed in a direction parallel to predetermined address electrodes. The phosphor layer can be formed by applying a phosphor paste mainly composed of phosphor powder, an organic binder, and an organic solvent between predetermined main partition walls, drying, and firing if necessary.

  As a method of applying the phosphor paste between predetermined main partition walls, a screen printing method in which a pattern is printed using a screen printing plate, a dispenser method in which a phosphor paste is discharged from the tip of a discharge nozzle, and a phosphor paste The phosphor paste of each color can be applied to a predetermined place by the above-described photosensitive paste method using the photosensitive organic component. However, the screen printing method and the dispenser method are preferably applied in the present invention for cost reasons. The

When the thickness of the red phosphor layer is T _r (μm), the thickness of the green phosphor layer is T _g (μm), and the thickness of the blue phosphor layer is T _b (μm), equations (2) and (3 ) Is preferably satisfied.
10 ≦ T _r ≦ T _b ≦ 50 (2),
10 ≦ T _g ≦ T _b ≦ 50 (3)
That is, a plasma display having a better color balance (high color temperature) can be produced by making the thickness of blue with low emission luminance thicker than green and red. A sufficient luminance can be obtained by setting the thickness of the phosphor layer to 10 μm or more. Further, by setting the thickness to 50 μm or less, it is possible to obtain a wide brightness and high brightness. The thickness of the phosphor layer in this case is measured as the thickness after firing at the midpoint between the adjacent main barrier ribs and the adjacent auxiliary barrier ribs. That is, it is measured as the thickness of the phosphor layer formed at the bottom of the discharge space (in the pixel cell surrounded by the main barrier rib and the auxiliary barrier rib).

  A back plate can be produced by firing the applied phosphor layer at 400 to 550 ° C., if necessary.

  After sealing with the front plate using this back plate, a discharge gas composed of helium, neon, xenon, etc. is sealed in the space formed between the front and back substrates, and a drive circuit is attached to the plasma display Can be produced. The front plate is a member in which a transparent electrode, a bus electrode, a dielectric, and a protective layer are formed in a predetermined pattern on a substrate. You may form a color filter layer in the part corresponding to the RGB each color phosphor layer formed on the back plate. Further, a black stripe may be formed in order to improve contrast.

  Hereinafter, the present invention will be specifically described by way of examples. However, the present invention is not limited to this.

First, the evaluation method will be described. The partition wall formation failure was evaluated on the back plate, and the erroneous discharge was evaluated on the plasma display panel.
<Defective partition formation>
The produced back plate was visually confirmed with transmitted light, and the presence or absence of disconnection and peeling of the partition wall pattern was examined.

○: No disconnection or peeling (good product level)
×: Disconnection or peeling (defective product level)
<Error discharge>
A voltage of 140 V was applied to the scan electrode of the manufactured PDP, a voltage of 200 V was applied to the sustain electrode, and a voltage of 70 V was applied to the address electrode, and R, G, and B were sequentially turned on in a single color. Count the number of cells lit in the colors that should not have been lit due to erroneous discharge (G and B when R is lit, B and R when G is lit, and R and G when B is lit). did.

○: Number of erroneously lit cells is 5 or less per panel (non-defective product level)
Δ: Number of erroneously lit cells is 6 to 10 per panel (slightly inferior but good product level)
×: 11 or more erroneously lit cells per panel (defective product level)
Next, a formation method is demonstrated in order.
(Example 1, Comparative Examples 1 and 2)
As a glass substrate, PD-200 (manufactured by Asahi Glass Co., Ltd.) of 590 × 964 × 1.8 mm and 42 inch size was used. On this substrate, as a writing electrode, 70 parts by weight of silver powder having an average particle diameter of 2.0 μm, Bi ₂ O ₃ / SiO ₂ / Al ₂ O ₃ / B ₂ O ₃ = 69/24/4/3 (mass %) Glass powder having an average particle diameter of 2.2 μm, acrylic acid, methyl methacrylate, styrene copolymer 8 parts by weight, trimethylolpropane triacrylate 7 parts by weight, benzophenone 3 parts by weight, butyl carbitol acrylate A striped electrode having a pitch of 240 μm, a line width of 100 μm, and a thickness of 3 μm after firing was formed by photolithography using a photosensitive silver paste comprising 7 parts by weight and 3 parts by weight of benzyl alcohol.

On this substrate, low-melting glass particles having a volume average particle diameter of 2 μm composed of Bi ₂ O ₃ / SiO ₂ / Al ₂ O ₃ / ZnO / B ₂ O ₃ = 78/14/3/3/2 (mass%) are formed. A dielectric paste consisting of 60 parts by weight, 10 parts by weight of titanium oxide powder having an average particle size of 0.3 μm, 15 parts by weight of ethyl cellulose, and 15 parts by weight of terpineol, and then firing at 580 ° C. to form a dielectric having a thickness of 10 μm A layer was formed.

The photosensitive paste for forming the partition wall was used by blending and dispersing the following components.
Glass powder: Bi ₂ O ₃ / SiO ₂ / Al ₂ O ₃ / ZnO / B ₂ O ₃ = 82/6/3/6/3 (mass%) glass powder having an average particle diameter of 2 μm 67 parts by weight filler: Titanium oxide having an average particle size of 0.2 μm 3 parts by weight Polymer: “Cyclomer” P (ACA250, manufactured by Daicel Chemical Industries) 10 parts by weight Organic solvent (1): Benzyl alcohol 4 parts by weight Organic solvent (2): Butylcarb Tall acetate 3 parts by weight Monomer: Dipentaerythritol hexaacrylate 8 parts by weight Photopolymerization initiator: Benzophenone 3 parts by weight Antioxidant: 1,6-hexanediol-bis [(3,5-di-t-butyl-4- Hydroxyphenyl) propionate] 1 part by weight Organic dye: Basic Blue 26 0.01 part by weight Thixotropic agent: N, N′-12-hydride Roxystearic butylenediamine: 0.5 parts by weight Surfactant: polyoxyethylene cetyl ether: 0.49 parts by weight.

  The partition wall forming photosensitive paste was applied to a thickness of 250 μm with a die coater, and then dried in a clean oven at 100 ° C. for 40 minutes to form a coating film, thereby forming a coating film. The position of the first photomask having a translucent portion is aligned with the position corresponding to the intersection of the main partition wall and the auxiliary partition wall with respect to the formed coating film, once exposed (exposure operation 1), and further, as shown in Table 1 The substrate or the photomask was moved in a direction parallel to the auxiliary partition wall by the movement distance S1 (μm), and alignment was performed again for exposure (exposure operation 2). A photomask having the pattern shown in FIG. 11 was used. On top of that, a photosensitive paste for barrier rib formation was applied to a thickness of 50 μm with a die coater, and then dried in a clean oven at 100 ° C. for 30 minutes to form a coating film. The position of the second photomask having a desired lattice pattern is aligned with the formed coating film, and once exposed (exposure operation 1). The mask was moved in a direction parallel to the auxiliary partition wall, and again aligned and exposed (exposure operation 2). A photomask having the pattern shown in FIG. 1 was used.

Further, in both exposure using the first photomask and exposure using the second photomask, the gap with the photomask is set to 150 μm, and the sum of the integrated exposure amounts in exposure operation 1 and exposure operation 2 is 400 mJ / cm ² . The exposure was carried out as follows.

  The moving distance S1 (μm) of the first photomask, the pitch (μm) of the light transmitting portions for forming the main partition walls of the second photomask, the opening width (μm), the outermost portion in the longitudinal direction of the light transmitting portions for forming the main partition walls The pitch Pm (μm) between the auxiliary barrier rib forming light-transmitting portion positioned adjacent to and the auxiliary barrier rib forming light transmitting portion adjacent thereto, and the auxiliary barrier rib forming transparent light beam positioned at the outermost portion in the longitudinal direction of the main barrier rib forming transparent portion Table 1 shows the opening width W2 (μm) of the part, the opening width W1 (μm) of the light transmitting part for auxiliary partition wall located in the center in the longitudinal direction of the light transmitting part for partition wall formation, and the moving distance S2 (μm).

  The exposed substrate formed as described above was developed with a 0.5% by mass aqueous sodium carbonate solution to form a partition pattern. The substrate on which pattern formation was completed was baked at 560 ° C. for 15 minutes. The pitch Pk (μm) between the auxiliary partition located at the outermost part in the longitudinal direction of the main partition and the adjacent auxiliary partition, the width of the auxiliary partition located at the outermost part in the longitudinal direction of the main partition (μm), the center in the longitudinal direction of the main partition Table 1 shows the measurement results of the width (μm) of the auxiliary partition located in the section.

  Each color phosphor paste was applied between the formed barrier ribs by screen printing and baked (500 ° C., 30 minutes) to form phosphor layers on the side and bottom portions of the barrier ribs.

  Next, the front plate was produced by the following steps. First, a 590 × 964 × 2.8 mm 42-inch PD-200 (manufactured by Asahi Glass Co., Ltd.) was used as a glass substrate, ITO was formed on this glass substrate by sputtering, resist was applied, exposure, development A transparent electrode having a thickness of 0.1 μm and a line width of 200 μm was formed by the treatment and the etching treatment. Further, a scan electrode and a sustain electrode having a thickness of 5 μm were formed by photolithography using a photosensitive silver paste made of black silver powder. Electrodes having a pitch of 500 μm and a line width of 80 μm were prepared.

  Next, a glass paste obtained by kneading 70 parts by weight of low melting point glass powder containing 75% by weight of lead oxide, 20 parts by weight of ethyl cellulose, and 10 parts by weight of terpineol was screen-printed to obtain a bus electrode for the display part. After coating with a thickness of 50 μm so as to be covered, baking was performed at 570 ° C. for 15 minutes to form a front dielectric.

  A magnesium oxide layer having a thickness of 0.5 μm was formed as a protective film on the substrate on which the dielectric was formed by electron beam vapor deposition to produce a front plate.

  The produced front plate and the back plate are sealed with sealing glass, Ne gas containing Xe 5% is sealed so as to have an internal gas pressure of 66500 Pa, and a plasma display panel is manufactured by mounting a drive circuit. did.

The evaluation results are shown in Table 1. In Example 1, a plasma display panel with good productivity and high display quality could be obtained, but in Comparative Examples 1 and 2, either the productivity or the display quality was inferior.
(Example 2)
In the same manner as in Example 1 and Comparative Examples 1 and 2, the partition-forming photosensitive paste was applied to a thickness of 250 μm with a die coater, and then dried in a clean oven at 100 ° C. for 40 minutes. Further, the barrier rib forming photosensitive paste was applied to a thickness of 50 μm with a die coater, and then dried in a clean oven at 100 ° C. for 30 minutes to form a coating film. The position of a photomask having a desired grid pattern is aligned with the formed coating film, once exposed (exposure operation 1), and further, the substrate or photomask is assisted with a desired moving distance S2 (μm) shown in Table 1. The film was moved in a direction parallel to the partition walls, aligned again, and exposed (exposure operation 2). A photomask having the pattern shown in FIG. 1 was used.

In addition, in the exposure using the photomask, the gap with the photomask was set to 150 μm, and the exposure operation 1 and the exposure operation 2 were performed so that the sum of the integrated exposure amounts was 400 mJ / cm ² .

  The pitch Pm (μm) between the auxiliary barrier rib forming light transmitting portion located on the outermost part in the longitudinal direction of the main barrier rib forming transparent portion of the photomask and the auxiliary barrier rib forming light transmission adjacent thereto, and the main barrier rib transmitting light The opening width W2 (μm) of the auxiliary partition wall forming translucent portion located at the outermost part in the longitudinal direction of the portion, and the opening width W1 of the auxiliary partition wall forming light transmitting portion positioned at the longitudinal center of the partition forming light transmitting portion ( μm) and moving distance S2 (μm) are shown in Table 1.

  The exposed substrate formed as described above was developed with a 0.5% by mass aqueous sodium carbonate solution to form a partition pattern. The substrate on which pattern formation was completed was baked at 560 ° C. for 15 minutes. The pitch Pk (μm) between the auxiliary partition located at the outermost part in the longitudinal direction of the main partition and the adjacent auxiliary partition, the width of the auxiliary partition located at the outermost part in the longitudinal direction of the main partition (μm), the center in the longitudinal direction of the main partition Table 1 shows the measurement results of the width (μm) of the auxiliary partition located in the section.

  The phosphor layer formation, front plate production, and panel production were carried out in the same manner as in Example 1 and Comparative Examples 1 and 2. The evaluation results are shown in Table 1. In Example 2, the display quality was slightly inferior, but the product was not defective.

1: Auxiliary partition forming translucent part 2: Auxiliary partition forming translucent part located at the outermost part in the longitudinal direction of the main partition forming translucent part 3: A main partition forming translucent part 4: between the main partition and the auxiliary partition Translucent part 5 at a position corresponding to the intersecting part: main partition 6: auxiliary partition 7: auxiliary partition located at the outermost part in the longitudinal direction of the main partition 8: auxiliary adjacent to the auxiliary partition located at the outermost part in the longitudinal direction of the main partition Partition 14: Glass substrate 15: Sustain electrode 16: Scan electrode 17: Dielectric layer 18: Protective layer 19: Front plate 20: Glass substrate 21: Address electrode 22: Dielectric layer 23: Main partition 24: Auxiliary partition 25: Fluorescence Body layer 26: Back plate Pk: Auxiliary partition wall pitch L1: Auxiliary partition wall width L2: Auxiliary partition wall width L3: Auxiliary partition wall width L4: Main partition wall length L4 Width L5 of the auxiliary partition adjacent to the positioned auxiliary partition: Width of the auxiliary barrier rib positioned longitudinally outermost bulkhead Pm: pitch of the auxiliary barrier rib forming translucent portions of the photomask

Claims (6)

A plasma display having a plurality of substantially stripe-shaped address electrodes on a substrate, a dielectric layer covering the address electrodes, a main partition substantially parallel to the address electrode, and a grid-like partition composed of an auxiliary partition substantially orthogonal to the main partition In manufacturing a member, an address electrode or a precursor of an address electrode and a dielectric layer or a precursor of a dielectric layer are provided on a substrate, and a photosensitive glass paste layer is formed on the dielectric layer or the precursor of the dielectric layer. And a photomask having a lattice-like translucent pattern comprising a main partition-forming translucent portion substantially parallel to the address electrode or the address electrode precursor and an auxiliary partition-form translucent portion substantially orthogonal to the address electrode or the address electrode precursor. A display member having a lattice-shaped partition wall, wherein a plurality of exposure operations are performed, developed, and baked to form lattice-shaped partition walls. The opening width of the auxiliary barrier rib forming light transmitting portion located at the outermost portion in the longitudinal direction of the main barrier rib forming light transmitting portion of the photomask having an auxiliary is positioned at the central portion in the longitudinal direction of the main barrier rib forming light transmitting portion. Photo having the lattice-like light-transmitting pattern is larger than the opening width of the light-transmitting part for forming the partition wall, and after performing a specific exposure operation among the plurality of exposure operations and performing the next exposure operation. A photomask moving operation for relatively moving the mask and the substrate in parallel with the address electrode, and a moving distance in the photomask moving operation is a light transmitting portion for forming a main partition wall of the photomask having the lattice-like light transmitting pattern A method for producing a member for a plasma display, wherein the pitch is an integral multiple of the pitch of the auxiliary barrier rib transparent portion located on the outermost part in the longitudinal direction and the auxiliary barrier rib transparent portion adjacent thereto. The opening width of the auxiliary partition wall forming light transmitting portion located at the outermost portion in the longitudinal direction of the main partition wall forming light transmitting portion of the photomask having the lattice-shaped light transmitting pattern is the longitudinal direction of the main partition wall forming light transmitting portion. The method for manufacturing a member for a plasma display according to claim 1, which is 1.1 to 4.7 times the opening width of the light transmitting part for forming an auxiliary partition located in the central part. The movement distance in the photomask moving operation is such that the auxiliary barrier rib transparent portion located at the outermost part in the longitudinal direction of the main barrier rib forming transparent portion of the photomask having the lattice-like transparent pattern and the auxiliary barrier rib transparent adjacent thereto The method for producing a member for a plasma display according to claim 1 or 2, wherein the pitch is equal to the pitch of the part. A plasma display having a plurality of substantially stripe-shaped address electrodes on a substrate, a dielectric layer covering the address electrodes, a main partition substantially parallel to the address electrode, and a grid-like partition composed of an auxiliary partition substantially orthogonal to the main partition In manufacturing the member, an address electrode or a precursor of the address electrode and a dielectric layer or a precursor of the dielectric layer are provided on the substrate, and the first photosensitive property is provided on the dielectric layer or the precursor of the dielectric layer. A glass paste layer is formed, exposed using a first photomask having a translucent portion at a position corresponding to the intersection of the main partition wall and the auxiliary partition wall, and a first paste is formed on the first photosensitive glass paste layer. Two photosensitive glass paste layers are provided, and the main barrier rib forming light transmitting portion is substantially parallel to the address electrode or the address electrode precursor, and the auxiliary barrier rib forming light transmitting portion is substantially orthogonal thereto. A method for manufacturing a display member, wherein a plurality of exposure operations are performed through a second photomask having a lattice-like light-transmitting pattern, developed, and baked to form a lattice-shaped partition wall. Auxiliary partition wall forming light whose opening width of the auxiliary partition wall forming light transmitting portion located at the outermost portion in the longitudinal direction of the main partition wall forming light transmitting portion of the photomask is positioned at the longitudinal center portion of the main partition wall forming light transmitting portion. The second photomask and the substrate are connected to the address electrode during the next exposure operation after performing a specific exposure operation among the plurality of exposure operations. The auxiliary barrier rib translucent portion is moved in parallel with the photomask, and the moving distance in the photomask moving operation is located at the outermost portion in the longitudinal direction of the main barrier rib forming translucent portion of the second photomask. And the auxiliary partition light-transmitting part adjacent to it. Method of manufacturing a plasma display member, which is a integral multiple of the switch. The method for producing a member for a plasma display according to claim 4, wherein the light transmission pattern of the intersecting portion of the first photomask is a rhombus. 6. The method for manufacturing a member for a plasma display according to claim 5, wherein the size of the rhombus translucent pattern at the intersection of the one photomask is 30 to 150 [mu] m diagonally.

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