JP5404499B2 - Back plate for plasma display - Google Patents

Description

  The present invention relates to a back plate for a plasma display.

  Plasma displays are attracting attention as displays that can be used in thin and large televisions.

  As a method of manufacturing electrodes, barrier ribs, and phosphor layers constituting the back plate for a plasma display panel, a photosensitive paste is applied or laminated on a substrate, exposed through a photomask having a desired pattern, and then desired developed. A method of developing using a liquid is known.

  For example, there is a method of forming a partition wall by forming a photosensitive paste layer made of ceramic powder and an ultraviolet curable resin on a substrate, and exposing, developing, and baking through a photomask having a desired pattern (Patent Document 1). Proposed.

  However, when manufacturing a back plate for a high-definition plasma display, the pitch between the back plate electrodes becomes narrow as the pixel cells are narrowed, and there is a problem that sufficient space between the electrodes cannot be taken.

  In order to deal with such a problem, a method of changing the length of the terminal electrode (Patent Document 2) has been proposed. However, this method is problematic because the arrangement of the address electrode and the terminal electrode is restricted.

JP-A-2-165538 JP 2006-286252 A

  The problem to be solved by the present invention is to provide a plasma display back plate with high productivity and to provide a plasma display with high display quality.

In order to solve such a problem, the present invention is a back plate for a plasma display in which an electrode block composed of a plurality of electrode patterns is divided into a plurality of blocks on a substrate, and each of the electrode patterns includes: A linear address electrode provided in parallel on the substrate, a terminal electrode electrically connected to the address electrode and connected to an external drive circuit, and a lead connecting the terminal electrode and the address electrode The lead electrode has an extension part that forms an extension line of the terminal electrode, and a connection part that connects the extension part and the address electrode, and each electrode block has a position other than both ends. Each electrode block has an electrode pattern having the longest extension portion, and the electrode pattern having the longest extension portion is arranged in the arrangement direction of the electrode patterns. The deviation between the address electrode position and the terminal electrode position is the smallest in the electrode block, and the extension of the other electrode pattern is longer than the extension of the adjacent electrode pattern on one side, and the other The length L1 of the connecting portion in the substrate short direction of the electrode pattern having the longest extension portion is in the range of 0.5 to 5 mm, which is shorter than the extension portion of the electrode pattern adjacent to the side. This can be solved by a back plate for a plasma display.

  According to the present invention, a plasma display back plate with high productivity can be provided, and a plasma display with high display quality can be provided.

It is the perspective view which showed typically the example of a structure of one pixel of a plasma display panel. It is a schematic diagram which shows the structure of the electrode block of the backplate for plasma displays by the Example of this invention. It is a schematic diagram of the backplate electrode pattern for plasma displays of the present invention. It is a schematic diagram of the extraction electrode part of the backplate electrode pattern for plasma displays when the length of the connection part in the substrate lateral direction is short in the electrode pattern having the longest extension part. It is a schematic diagram which shows the shape of the extraction electrode part of the backplate electrode pattern for plasma displays of this invention. It is a schematic diagram which shows the shape of the extraction electrode part of the backplate electrode pattern for the conventional plasma display.

  FIG. 1 is a perspective view schematically showing an example of the configuration of one pixel of a plasma display. In FIG. 1, a plurality of paired sustain electrodes 2 and scan electrodes 3 are made of a material such as silver, chromium, aluminum, nickel, etc. on a glass substrate 1 on the front plate 6 side serving as a display surface. When the direction of the side is the vertical direction and the direction of the long side is the horizontal direction, it is formed in a stripe shape having the horizontal direction as the longitudinal direction. Further, a dielectric layer 8 mainly composed of glass is formed to cover the sustain electrode 2 and the scan electrode 3 with a thickness of 20 to 50 μm, and a protective layer 5 is formed to cover the dielectric layer 4.

  On the other hand, on the glass substrate 7 on the back plate 13 side, a plurality of address electrodes 8 are formed in stripes having the longitudinal direction as the longitudinal direction, and the address layers 8 are covered and the dielectric layer 9 mainly composed of glass. Is formed. In order to partition the discharge cells on the dielectric layer 9, a grid-like barrier rib is formed which includes a main barrier rib 10 having a longitudinal direction as a longitudinal direction and an auxiliary barrier rib 11 substantially orthogonal to the main barrier rib 10. The barrier rib and the dielectric layer The phosphor layer 12 is formed in the discharge space formed by 9. In a plasma display capable of full color display, the phosphor layer is configured to emit light in each color of red (R), green (G), and blue (B). The front plate 6 and the back plate 13 are sealed so that the sustain electrode 2 on the front plate 6 side and the address electrode 8 on the back plate 13 side are orthogonal to each other, and helium, neon, xenon, etc. are placed in the gap between these substrates. A plasma display is formed by sealing the rare gas to be formed. Since the pixel cell is formed around the intersection of the scan electrode 3 and the address electrode 8, the plasma display has a plurality of pixel cells and can display an image.

  FIG. 2 is a schematic diagram showing the configuration of the electrode block of the back plate for plasma display according to the embodiment of the present invention. As shown in FIG. 2, a plurality of electrode patterns are formed on the glass substrate 7 of the back plate 13. The electrode blocks B1 to B10 made of are arranged in a state of being divided into a plurality of blocks. Although not shown, each of the electrode blocks B1 to B10 is connected to a driver IC for applying a driving voltage to the electrode pattern.

  FIG. 3 is a schematic diagram showing a configuration of an electrode pattern in one electrode block shown in FIG. Each of the electrode patterns of the electrode blocks B1 to B10 has a linear address electrode 8 provided in parallel on the substrate, and a terminal electrically connected to the address electrode 8 and connected to an external drive circuit. An electrode 22 and an extraction electrode 23 connecting the terminal electrode 22 and the address electrode 8 are configured.

  As shown in FIG. 4, the extraction electrode 23 has an extension portion 24 that forms an extension line of the terminal electrode 22 and a connection portion 25 that connects the extension portion 24 and the address electrode 8.

  4 is a schematic diagram showing an enlarged portion A of the electrode pattern of FIG. 3, and FIG. 5 is a schematic diagram showing an enlarged portion B of the electrode pattern of FIG. As shown in FIG. 4, each electrode block has an electrode pattern having the longest extension 24 in each electrode block at a position other than both ends, and the electrode pattern having the longest extension 24 is an electrode pattern. The shift between the position of the address electrode 8 and the position of the terminal electrode 22 in the arrangement direction is minimized within the electrode block. The other electrode pattern extensions 24 are longer than the electrode pattern extensions 24 adjacent to one side and shorter than the electrode pattern extensions 24 adjacent to the other side. Is formed.

  Note that the length L1 of the connecting portion in the substrate short direction in the electrode pattern having the longest extension is set in the range of 0.5 to 5 mm. This is because if the length is shorter than 0.5 mm, the address electrode 8 and the connecting portion 25 cannot be smoothly connected as shown in FIG. It becomes a problem in performing accurate inspection. This is because if it is longer than 5 mm, the effect of preventing the distance between the extraction electrodes 22 from becoming narrower becomes insufficient.

  When the address electrodes 8 (address electrode pitch P1) and the terminal electrodes 22 (address electrode pitch P2) having different pitches are linearly connected by the extraction electrode 23, the distance between the extraction electrodes P3 as shown in FIG. However, as shown in FIG. 5, by providing the extension part 24 that is an extension line of the terminal electrode 22 in the extraction electrode 23, the distance P3 between the extraction electrodes is reduced. Can be prevented, and an electrode short circuit or the like can be prevented. In particular, as shown in FIG. 3, when the address electrode 8 and the terminal electrode 22 are arranged to be shifted in the arrangement direction of the electrode pattern, the distance between the extraction electrodes is reduced by forming the electrode pattern as in the present invention. Can be prevented.

Hereinafter, the manufacturing method of the member for plasma displays of the present invention is explained.
As the substrate used for the plasma display member in the present invention, soda glass or the like can be used. Specifically, the heat-resistant glass for plasma display is PD200 manufactured by Asahi Glass Co., Ltd. or Nippon Electric Glass Co., Ltd. PP8 etc. are mentioned.

  Striped address electrodes are formed on the substrate with a metal such as silver, aluminum, chromium, or nickel. As a forming method, a metal paste mainly composed of these metal powders and an organic binder is printed by screen printing, and heated and baked at 400 to 600 ° C. to form a metal pattern, After applying a photosensitive metal paste containing a photosensitive organic component, after pattern exposure using a photomask, unnecessary portions are dissolved and removed in a development process, and further heated and baked at 400 to 600 ° C. to form a metal pattern. A photosensitive paste method can be used. Alternatively, an etching method may be used in which a resist is applied after sputtering a metal such as chromium or aluminum on a glass substrate, and after the resist is subjected to pattern exposure and development, an unnecessary portion of the metal is removed by etching. The electrode thickness is preferably 1.0 to 10 μm, and more preferably 1.5 to 5 μm.

  A dielectric layer is formed to cover the address electrodes. The dielectric layer can be formed by applying a glass paste mainly composed of glass powder and an organic binder so as to cover the address electrodes, and then baking at 400 to 600 ° C. The glass paste used for the dielectric layer preferably includes a low melting glass powder containing at least one of lead oxide, bismuth oxide, zinc oxide and phosphorus oxide, and containing 10 to 80% by mass in total. it can. By setting the blend to 10% by mass or more, firing at 600 ° C. or less is facilitated, and by setting it to 80% by mass or less, crystallization is prevented and a decrease in transmittance is prevented.

  A paste is prepared by kneading the low-melting glass powder and an organic binder. As the organic binder to be used, cellulose compounds typified by ethyl cellulose, methyl cellulose and the like, acrylic compounds such as methyl methacrylate, ethyl methacrylate, isobutyl methacrylate, methyl acrylate, ethyl acrylate and isobutyl acrylate can be used. Moreover, you may add additives, such as a solvent and a plasticizer, in glass paste. As the solvent, general-purpose solvents such as terpineol, butyrolactone, toluene and methyl cellosolve can be used. As the plasticizer, dibutyl phthalate, diethyl phthalate, or the like can be used. By adding a filler component having a high softening temperature and not softening during firing, in addition to the low-melting glass powder, a PDP having a high reflectance and a high luminance can be obtained. As the filler, titanium oxide, aluminum oxide, zirconium oxide and the like are preferable, and it is particularly preferable to use titanium oxide having a 50% particle diameter in a volume distribution curve of 0.05 to 3 μm. The filler content is preferably a glass powder: filler mass ratio of 1: 1 to 10: 1. By making the filler content 1/10 or more of the glass powder content by weight ratio, the effect of improving the luminance can be obtained. Moreover, sinterability can be maintained by setting it as the same amount or less of content of glass powder.

  Next, the formation method of the main partition and the auxiliary partition in this invention is demonstrated. The main partition wall and the auxiliary partition wall are formed by forming a pattern by a photosensitive paste method (photolithography method) and baking it.

The photosensitive paste method will be described in detail below.
The photosensitive paste for forming a partition used in the photosensitive paste method is mainly composed of inorganic fine particles and a photosensitive organic component, and if necessary, a photopolymerization initiator, a light absorber, a sensitizer, an organic solvent, and a sensitization aid. Contains a polymerization inhibitor.

  As the inorganic fine particles of the barrier rib forming photosensitive paste, glass, ceramic (alumina, cordierite, etc.) and the like can be used. In particular, glass or ceramics containing silicon oxide, boron oxide, or aluminum oxide as an essential component is preferable.

The particle diameter of the inorganic fine particles is selected in consideration of the shape of the pattern to be produced, but the 50% particle diameter in the volume distribution curve is preferably 1 to 10 μm, more preferably 1 to 5 μm. . By setting the 50% particle diameter in the volume distribution curve to 10 μm or less, it is possible to prevent surface irregularities from occurring. Moreover, the viscosity adjustment of a paste can be made easy by setting it as 1 micrometer or more. Furthermore, it is particularly preferable in the pattern formation to use glass fine particles having a specific surface area of 0.2 to ³ m ² / g.

Since the main partition wall and the auxiliary partition wall are preferably patterned on a glass substrate having a low heat softening point, inorganic particles containing 60% by mass or more of low melting glass particles having a heat softening temperature of 350 to 600 ° C. are used as the inorganic particles. It is preferable to use it. Further, by adding a filler component composed of high melting point glass fine particles or ceramic fine particles having a heat softening temperature higher than 600 ° C., the shrinkage rate at the time of firing can be suppressed, but the amount is equal to the total amount of inorganic fine particles. The amount is preferably 40% by mass or less. The low-melting glass fine particles have a linear expansion coefficient of 50 × 10 ^{−7 to} 90 × 10 ⁻⁷ K ⁻¹ , and further 60 × 10 ^{−7 to} 90 × 10 in order to prevent warping of the glass substrate during firing. It is preferable to use low-melting glass particles of ⁻⁷ K ⁻¹ .

  As the low-melting glass fine particles, glass containing silicon and / or boron oxide is preferably used.

  Furthermore, by containing at least one of bismuth oxide, lead oxide, and zinc oxide in a total amount of 5 to 50% by mass, a glass paste having temperature characteristics suitable for patterning on a glass substrate can be obtained. it can.

The photosensitive organic component preferably contains at least one of a photosensitive monomer, a photosensitive oligomer, and a photosensitive polymer.
The photosensitive monomer is a compound containing a carbon-carbon unsaturated bond, and specific examples thereof include monofunctional and polyfunctional (meth) acrylates, vinyl compounds, allylic compounds such as allyl compounds. It is preferable to use a monomer. These can be used alone or in combination of two or more.

  As the photosensitive oligomer and photosensitive polymer, an oligomer or polymer obtained by polymerizing at least one of monomers having a carbon-carbon double bond can be used. Preferably, it is an oligomer or polymer obtained by polymerizing at least one of the acrylic monomers, and the content of the monomer is 10% by mass or more, more preferably 35% by mass or more. It can be copolymerized with a photosensitive monomer. By copolymerizing an unsaturated acid such as an unsaturated carboxylic acid with a polymer or oligomer, the developability after exposure can be improved. Specific examples of the unsaturated carboxylic acid include acrylic acid, methacrylic acid, itaconic acid, crotonic acid, maleic acid, fumaric acid, vinyl acetic acid, and acid anhydrides thereof. The acid value (AV) of the polymer or oligomer having an acidic group such as a carboxyl group in the side chain thus obtained is preferably in the range of 50 to 180, and more preferably in the range of 70 to 140. By adding a photoreactive group to the side chain or molecular end to the polymer or oligomer shown above, it can be used as a photosensitive polymer or photosensitive oligomer having photosensitivity. Preferred photoreactive groups are those having an ethylenically unsaturated group. Examples of the ethylenically unsaturated group include a vinyl group, an allyl group, an acrylic group, and a methacryl group.

  Specific examples of the photopolymerization initiator include benzophenone, methyl O-benzoylbenzoate, 4,4-bis (dimethylamino) benzophenone, 4,4-bis (diethylamino) benzophenone, 4,4-dichlorobenzophenone, 4- Examples include benzoyl-4-methylphenyl ketone, dibenzyl ketone, fluorenone, 2,3-diethoxyacetophenone, 2,2-dimethoxy-2-phenyl-2-phenylacetophenone, and the like. One or more of these can be used. The photopolymerization initiator is preferably added in a range of 0.05 to 10% by mass, and more preferably in a range of 0.1 to 5% by mass with respect to the photosensitive component. If the amount of the polymerization initiator is too small, the photosensitivity tends to decrease, and if the amount of the photopolymerization initiator is too large, the residual ratio of the exposed portion tends to be too small.

  It is also effective to add a light absorber. By adding a compound having a high absorption effect of ultraviolet light or visible light, a high aspect ratio, high definition, and high resolution can be obtained. As the light absorber, those composed of organic dyes are preferably used. Specifically, azo dyes, aminoketone dyes, xanthene dyes, quinoline dyes, anthraquinone dyes, benzophenone dyes, diphenylcyanoacrylate dyes are used. Dyes, triazine dyes, p-aminobenzoic acid dyes, and the like can be used. Since organic dye does not remain in the insulating film after baking, it is preferable because the deterioration of the insulating film characteristics due to the light absorber can be reduced. Among these, azo dyes and benzophenone dyes are preferable. The addition amount of the organic dye is preferably 0.05 to 5% by mass, and more preferably 0.05 to 1% by mass. When the addition amount is less than the above range, the effect of adding the light absorber tends to be reduced, and when it is more than the above range, the insulating film characteristics after firing tend to be lowered.

  A sensitizer is preferably added in order to improve sensitivity. Specific examples of the sensitizer include 2,4-diethylthioxanthone, isopropylthioxanthone, 2,3-bis (4-diethylaminobenzal) cyclopentanone, 2,6-bis (4-dimethylaminobenzal) cyclohexanone, and the like. Is mentioned. One or more of these can be used. When adding a sensitizer to a photosensitive paste, the addition amount is 0.05-10 mass% normally with respect to the photosensitive component, More preferably, it is 0.1-10 mass%. If the amount of the sensitizer is less than the above range, the effect of improving the sensitivity tends not to be exhibited.

  Examples of the organic solvent include methyl cellosolve, ethyl cellosolve, butyl cellosolve, propylene glycol monomethyl ether acetate, methyl ethyl ketone, dioxane, acetone, cyclohexanone, cyclopentanone, isobutyl alcohol, isopropyl alcohol, tetrahydrofuran, dimethyl sulfoxide, and γ-butyllactone. , N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, bromobenzene, chlorobenzene, dibromobenzene, dichlorobenzene, bromobenzoic acid, chlorobenzoic acid and the like, and one or more of these An organic solvent mixture is used.

  The partition-forming photosensitive paste is usually prepared by mixing the above-mentioned inorganic fine particles and organic components so as to have a predetermined composition, and then uniformly mixing and dispersing them with a three roller or kneader. Next, a photosensitive paste is applied, dried, exposed, developed, and the like.

  As a method for applying the barrier rib forming photosensitive paste, a screen printing method, a bar coater, a roll coater, a die coater, a blade coater or the like can be used.

  In addition, a drying oven, a hot plate, an IR (infrared) furnace or the like can be used for drying after application.

Examples of the active light source used for exposure include visible light, near ultraviolet light, ultraviolet light, electron beam, X-ray, and laser light. Among these, ultraviolet rays are most preferable, and as the light source, for example, a low-pressure mercury lamp, a high-pressure mercury lamp, an ultrahigh-pressure mercury lamp, a halogen lamp, or a germicidal lamp can be used. Among these, an ultrahigh pressure mercury lamp is suitable. Exposure conditions vary depending on the coating thickness, but exposure is performed for 0.1 to 10 minutes using an ultrahigh pressure mercury lamp with an output of 1 to 100 mW / cm ² .

  Development is performed using the difference in solubility in the developer between the exposed and unexposed areas. Development can be performed by a dipping method, a spray method, a brush method, or the like.

  Developer can dissolve organic components in the photosensitive paste, that is, photosensitive organic components before exposure in the case of negative photosensitive paste, and organic components after exposure in the case of positive photosensitive paste. Is used. When a compound having an acidic group such as a carboxyl group is present in the organic component to be dissolved, development can be performed with an alkaline aqueous solution. As the alkaline aqueous solution, an inorganic alkaline aqueous solution such as sodium hydroxide, sodium carbonate, sodium carbonate aqueous solution or calcium hydroxide aqueous solution is preferably used, but an organic alkaline aqueous solution can also be used. As the organic alkali, a general amine compound can be used. Specific examples include tetramethylammonium hydroxide, trimethylbenzylammonium hydroxide, monoethanolamine, and diethanolamine. The density | concentration of aqueous alkali solution is 0.01-10 mass% normally, More preferably, it is 0.1-5 mass%.

  Next, the pattern of the main partition and the auxiliary partition obtained by development is fired in a firing furnace. The firing atmosphere and temperature vary depending on the type of paste and substrate, but firing is performed in an atmosphere of air, nitrogen, hydrogen, or the like. As the firing furnace, a batch-type firing furnace or a roller hearth-type continuous firing furnace can be used. The firing temperature is preferably 400 to 800 ° C. In the case where the partition wall is directly formed on the glass substrate, it is preferable to perform baking while maintaining the temperature at 450 to 620 ° C. for 10 to 60 minutes.

  Next, phosphor layers that emit light of red (R), green (G), and blue (B) colors are formed between main barrier ribs formed in a direction parallel to predetermined address electrodes. The phosphor layer can be formed by applying a phosphor paste mainly composed of phosphor powder, an organic binder, and an organic solvent between predetermined main partition walls, drying, and firing if necessary.

  As a method of applying the phosphor paste between predetermined main partition walls, a screen printing method in which a pattern is printed using a screen printing plate, a dispenser method in which a phosphor paste is discharged from the tip of a discharge nozzle, and a phosphor paste The phosphor paste of each color can be applied to a predetermined place by the above-described photosensitive paste method using the photosensitive organic component. However, the screen printing method and the dispenser method are preferably applied in the present invention for cost reasons. The

  A back plate can be produced by firing the applied phosphor layer at 400 to 550 ° C., if necessary.

  After sealing with the front plate using this back plate, a discharge gas composed of helium, neon, xenon, etc. is sealed in the space formed between the front and back substrates, and a drive circuit is attached to the plasma display Can be produced. The front plate is a member in which a transparent electrode, a bus electrode, a dielectric, and a protective layer are formed in a predetermined pattern on a substrate. You may form a color filter layer in the part corresponding to the RGB each color phosphor layer formed on the back plate. Further, a black stripe may be formed in order to improve contrast.

  The present invention is widely used as a back plate for a plasma display that requires high display quality.

DESCRIPTION OF SYMBOLS 1 Glass substrate 2 Sustain electrode 3 Scan electrode 4 Dielectric layer 5 Protective layer 6 Front plate 7 Glass substrate 8 Address electrode 9 Dielectric layer 10 Main partition 11 Auxiliary partition 12 Phosphor layer 13 Back plate 22 Terminal electrode 23 Lead electrode 24 Extension Part 25 connection part B1-B10 electrode block

Claims (1)

A back plate for a plasma display in which an electrode block composed of a plurality of electrode patterns is divided into a plurality of blocks and arranged on a substrate, wherein each of the electrode patterns is a linear address electrode provided in parallel on the substrate And a terminal electrode that is electrically connected to the address electrode and connected to an external drive circuit, and an extraction electrode that connects the terminal electrode and the address electrode, and the extraction electrode includes: An electrode having an extension part that forms an extension line of the terminal electrode and a connection part that connects the extension part and the address electrode, and each electrode block has the longest extension part in each electrode block at a position other than both ends. The electrode pattern having a pattern and having the longest extension is located between the address electrode position and the terminal electrode position in the arrangement direction of the electrode pattern. The displacement is minimal within the electrode block, and the other electrode pattern extension is longer than the electrode pattern extension adjacent to one side and shorter than the electrode pattern extension adjacent to the other side. The back plate for a plasma display is characterized in that the length L1 of the connecting portion of the electrode pattern having the longest extension in the short-side direction of the substrate is in the range of 0.5 to 5 mm. .

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