JP5292112B2 - 基板上にパターンを印刷する方法 - Google Patents

基板上にパターンを印刷する方法 Download PDF

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Publication number
JP5292112B2
JP5292112B2 JP2009013435A JP2009013435A JP5292112B2 JP 5292112 B2 JP5292112 B2 JP 5292112B2 JP 2009013435 A JP2009013435 A JP 2009013435A JP 2009013435 A JP2009013435 A JP 2009013435A JP 5292112 B2 JP5292112 B2 JP 5292112B2
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JP
Japan
Prior art keywords
printing
area
layer
ink
dot
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2009013435A
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English (en)
Japanese (ja)
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JP2009276745A (ja
JP2009276745A5 (enExample
Inventor
リー ルドルフ マイケル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
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Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2009276745A publication Critical patent/JP2009276745A/ja
Publication of JP2009276745A5 publication Critical patent/JP2009276745A5/ja
Application granted granted Critical
Publication of JP5292112B2 publication Critical patent/JP5292112B2/ja
Expired - Fee Related legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/02—Letterpress printing, e.g. book printing
    • B41M1/04—Flexographic printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M3/00—Printing processes to produce particular kinds of printed work, e.g. patterns
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
    • G03F7/2018—Masking pattern obtained by selective application of an ink or a toner, e.g. ink jet printing

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Methods (AREA)
JP2009013435A 2008-01-23 2009-01-23 基板上にパターンを印刷する方法 Expired - Fee Related JP5292112B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US6221808P 2008-01-23 2008-01-23
US61/062,218 2008-01-23
US12/349,608 US8236479B2 (en) 2008-01-23 2009-01-07 Method for printing a pattern on a substrate
US12/349,608 2009-01-07

Publications (3)

Publication Number Publication Date
JP2009276745A JP2009276745A (ja) 2009-11-26
JP2009276745A5 JP2009276745A5 (enExample) 2011-12-15
JP5292112B2 true JP5292112B2 (ja) 2013-09-18

Family

ID=40876750

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2009013435A Expired - Fee Related JP5292112B2 (ja) 2008-01-23 2009-01-23 基板上にパターンを印刷する方法

Country Status (3)

Country Link
US (2) US8236479B2 (enExample)
EP (1) EP2083325B1 (enExample)
JP (1) JP5292112B2 (enExample)

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US8198013B2 (en) 2010-05-05 2012-06-12 E. I. Du Pont De Nemours And Company Method for preparing a printing form
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EP3487706A4 (en) 2016-07-20 2020-04-08 Ball Corporation SYSTEM AND METHOD FOR ALIGNING AN INK MARKER OF A DECORATOR
CN114683675B (zh) 2020-12-28 2023-11-14 乐凯华光印刷科技有限公司 一种表面自带纹理的平顶网点的柔性树脂版及其制版方法
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Also Published As

Publication number Publication date
EP2083325A2 (en) 2009-07-29
JP2009276745A (ja) 2009-11-26
US20090186308A1 (en) 2009-07-23
EP2083325B1 (en) 2013-12-11
US8236479B2 (en) 2012-08-07
EP2083325A3 (en) 2010-01-13
US20120255454A1 (en) 2012-10-11

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