JP5282895B2 - 露光装置、露光方法、およびデバイス製造方法 - Google Patents

露光装置、露光方法、およびデバイス製造方法 Download PDF

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JP5282895B2
JP5282895B2 JP2009052773A JP2009052773A JP5282895B2 JP 5282895 B2 JP5282895 B2 JP 5282895B2 JP 2009052773 A JP2009052773 A JP 2009052773A JP 2009052773 A JP2009052773 A JP 2009052773A JP 5282895 B2 JP5282895 B2 JP 5282895B2
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pattern
axis
mask
substrate
along
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JP2010204588A5 (enExample
JP2010204588A (ja
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雅人 熊澤
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Nikon Corp
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JP2009052773A 2009-03-06 2009-03-06 露光装置、露光方法、およびデバイス製造方法 Active JP5282895B2 (ja)

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JP2010204588A5 JP2010204588A5 (enExample) 2012-08-16
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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014010274A1 (ja) * 2012-07-13 2014-01-16 株式会社ニコン 基板処理装置、及びデバイス製造方法
WO2014024594A1 (ja) * 2012-08-06 2014-02-13 株式会社ニコン 処理装置およびデバイス製造方法
JP6069941B2 (ja) * 2012-08-08 2017-02-01 株式会社ニコン 投影露光装置及びデバイス製造方法
KR101973349B1 (ko) * 2012-09-14 2019-04-26 가부시키가이샤 니콘 기판 처리 장치 및 디바이스 제조 방법
TWI683345B (zh) * 2012-11-06 2020-01-21 日商尼康股份有限公司 偏光分束器、使用該偏光分束器之曝光裝置、以及元件製造方法
CN107908083B (zh) * 2013-04-18 2020-09-18 株式会社尼康 扫描曝光方法以及电子器件的制造方法
WO2015060972A1 (en) * 2013-10-22 2015-04-30 Applied Materials, Inc. Roll to roll mask-less lithography with active alignment

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001313241A (ja) * 2000-04-28 2001-11-09 Canon Inc 露光装置および露光方法
JP3652329B2 (ja) * 2002-06-28 2005-05-25 キヤノン株式会社 走査露光装置、走査露光方法、デバイス製造方法およびデバイス
JP2006098719A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 露光装置

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