JP5279694B2 - リードフレームに対するマイクロブラスト処理 - Google Patents
リードフレームに対するマイクロブラスト処理 Download PDFInfo
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- JP5279694B2 JP5279694B2 JP2009288212A JP2009288212A JP5279694B2 JP 5279694 B2 JP5279694 B2 JP 5279694B2 JP 2009288212 A JP2009288212 A JP 2009288212A JP 2009288212 A JP2009288212 A JP 2009288212A JP 5279694 B2 JP5279694 B2 JP 5279694B2
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- lead frame
- indentations
- frame material
- gas bubbles
- salt solution
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- 238000000034 method Methods 0.000 claims description 57
- 238000007373 indentation Methods 0.000 claims description 30
- 239000000463 material Substances 0.000 claims description 24
- 238000007747 plating Methods 0.000 claims description 21
- 239000012266 salt solution Substances 0.000 claims description 17
- 239000007789 gas Substances 0.000 claims description 13
- 239000012778 molding material Substances 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 10
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 9
- 239000002253 acid Substances 0.000 claims description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 6
- 230000000873 masking effect Effects 0.000 claims description 5
- 238000005553 drilling Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 239000007769 metal material Substances 0.000 claims description 4
- 235000006408 oxalic acid Nutrition 0.000 claims description 3
- 238000003486 chemical etching Methods 0.000 claims description 2
- 239000007921 spray Substances 0.000 claims description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims 2
- 229910001882 dioxygen Inorganic materials 0.000 claims 2
- 239000003792 electrolyte Substances 0.000 claims 1
- 238000005422 blasting Methods 0.000 description 25
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 11
- 238000005530 etching Methods 0.000 description 10
- 239000000126 substance Substances 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 238000005476 soldering Methods 0.000 description 6
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
- 239000010931 gold Substances 0.000 description 5
- 229910052737 gold Inorganic materials 0.000 description 5
- 230000001788 irregular Effects 0.000 description 5
- 229910052763 palladium Inorganic materials 0.000 description 5
- 229910052709 silver Inorganic materials 0.000 description 5
- 239000004332 silver Substances 0.000 description 5
- 238000007664 blowing Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 238000007788 roughening Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000004381 surface treatment Methods 0.000 description 3
- 238000011282 treatment Methods 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000005587 bubbling Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 239000004310 lactic acid Substances 0.000 description 1
- 235000014655 lactic acid Nutrition 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000005488 sandblasting Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49541—Geometry of the lead-frame
- H01L23/49548—Cross section geometry
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4821—Flat leads, e.g. lead frames with or without insulating supports
- H01L21/4835—Cleaning, e.g. removing of solder
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/495—Lead-frames or other flat leads
- H01L23/49579—Lead-frames or other flat leads characterised by the materials of the lead frames or layers thereon
- H01L23/49582—Metallic layers on lead frames
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
- H01L23/3142—Sealing arrangements between parts, e.g. adhesion promotors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/00014—Technical content checked by a classifier the subject-matter covered by the group, the symbol of which is combined with the symbol of this group, being disclosed without further technical details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Geometry (AREA)
- Manufacturing & Machinery (AREA)
- Lead Frames For Integrated Circuits (AREA)
- ing And Chemical Polishing (AREA)
Description
46 くぼみ
48 EMC
50 せん断のロッキング
52 引張りのロッキング
Claims (16)
- ベアリードフレーム材料を提供する段階;、
前記リードフレーム材料を化学的にエッチングするように塩溶液内に前記ベアリードフレーム材料を浸漬する段階;及び、
前記塩溶液内において、ノズルの出口から前記リードフレーム材料の表面に向かって酸素ガスを含むガスバブルを移動させる段階であって、前記ガスバブルが、前記リードフレーム材料の表面と接触し、前記ベアリードフレーム材料と近接してはじけ、前記酸素ガスを前記リードフレーム材料の表面に作用させ、前記リードフレーム材料の表面上において化学反応を引き起こし、これによって、化学的なエッチングおよび機械的な掘削により前記リードフレーム材料の表面上に不規則なサイズの複数のくぼみを形成し、前記複数のくぼみが、成形材料を前記リードフレーム材料とインターロックさせるように構成される、段階;
とを含むことを特徴とするリードフレームの製造方法。 - 前記塩溶液が、水酸化ナトリウム又は水酸化カリウムと酸との反応によって形成されることを特徴とする請求項1に記載の方法。
- 前記酸が、硫酸を含むことを特徴とする請求項2に記載の方法。
- 前記酸が、シュウ酸を含むことを特徴とする請求項2に記載の方法。
- 前記ガスバブルが、圧縮空気、電解、ノズルスプレー若しくはジェット、及び/又は超音波エネルギーから形成されることを特徴とする請求項1に記載の方法。
- 前記ガスバブルが、ノズル出口を通して提供され、
前記ノズル出口が、前記リードフレームの表面に対して45〜90°の角度で前記リードフレームの方に向けられていることを特徴とする請求項1に記載の方法。 - 前記ノズル出口と前記リードフレームの表面との間の間隙が、50mm以下であることを特徴とする請求項6に記載の方法。
- 前記ベアリードフレーム材料と接触する前記ガスバブルを移動させる段階が、10〜50℃のプロセス温度で実行されることを特徴とする請求項1に記載の方法。
- 前記プロセス温度が、15〜40℃であることを特徴とする請求項8に記載の方法。
- 前記塩溶液のpHレベルが、1から9の間であることを特徴とする請求項1に記載の方法。
- 前記塩溶液のpHレベルが、2から8の間であることを特徴とする請求項10に記載の方法。
- プロセス時間が、5〜120秒であることを特徴とする請求項1に記載の方法。
- 前記リードフレームの選択された部分にくぼみが形成されないように、前記リードフレーム材料にガスバブルを移動させる段階の前に、前記ベアリードフレーム材料の選択された部分をマスキングする段階をさらに含むことを特徴とする請求項1に記載の方法。
- 前記くぼみが、第一の組のくぼみ及び第二の組のくぼみを含み、
前記第二の組のくぼみが、前記第一の組のくぼみよりも相対的に高い密度を有し、
前記ガスバブルを移動させる段階が、前記第一の組のくぼみを形成し、前記リードフレームの選択された部分をマスキングし、及びその後、前記リードフレームのマスクされていない部分上に前記第二の組のくぼみを形成する段階をさらに含むことを特徴とする請求項13に記載の方法。 - 前記くぼみが、第一の組のくぼみ及び第二の組のくぼみを含み、
前記第二の組のくぼみが、前記第一の組のくぼみよりも相対的に大きなサイズを有し、
前記ガスバブルを移動させる段階が、前記第一の組のくぼみを形成し、前記リードフレームの選択された部分をマスキングし、及びその後、前記リードフレームのマスクされていない部分上に前記第二の組のくぼみを形成する段階をさらに含むことを特徴とする請求項13に記載の方法。 - 前記複数のくぼみを形成した後で、金属材料の1つ又はそれ以上の層で、前記リードフレームをめっきする段階をさらに含むことを特徴とする請求項1に記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/341,240 US20100155260A1 (en) | 2008-12-22 | 2008-12-22 | Micro-blasting treatment for lead frames |
US12/341,240 | 2008-12-22 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010147479A JP2010147479A (ja) | 2010-07-01 |
JP5279694B2 true JP5279694B2 (ja) | 2013-09-04 |
Family
ID=42264468
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009288212A Active JP5279694B2 (ja) | 2008-12-22 | 2009-12-18 | リードフレームに対するマイクロブラスト処理 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20100155260A1 (ja) |
JP (1) | JP5279694B2 (ja) |
KR (1) | KR101157412B1 (ja) |
CN (1) | CN101901769B (ja) |
MY (1) | MY153943A (ja) |
SG (1) | SG162685A1 (ja) |
TW (1) | TWI433286B (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2012148967A2 (en) | 2011-04-25 | 2012-11-01 | Air Products And Chemicals, Inc. | Cleaning lead-frames to improve wirebonding process |
US20130098659A1 (en) * | 2011-10-25 | 2013-04-25 | Yiu Fai KWAN | Pre-plated lead frame for copper wire bonding |
KR102219198B1 (ko) * | 2013-08-02 | 2021-02-22 | 어플라이드 머티어리얼스, 인코포레이티드 | 기판들을 위한 유지 배열, 및 이를 사용하는 장치 및 방법 |
CN106255324A (zh) * | 2016-08-22 | 2016-12-21 | 景旺电子科技(龙川)有限公司 | 一种提高金属基印制线路板电镀银表面亮度的方法 |
US10914018B2 (en) | 2019-03-12 | 2021-02-09 | Infineon Technologies Ag | Porous Cu on Cu surface for semiconductor packages |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0730685Y2 (ja) * | 1984-08-01 | 1995-07-12 | 三洋電機株式会社 | エツチング装置 |
US5196388A (en) * | 1991-06-10 | 1993-03-23 | Akzo N.V. | Process for the preparation of double metal oxide powders containing a Group IIIA and a Group IVB element and a novel double metal hydroxyl carboxylate useful in preparing same |
JP2947712B2 (ja) * | 1994-09-12 | 1999-09-13 | 義幸 宇野 | リードフレームの加工方法及びリードフレーム並びにリードフレーム加工用エッチング装置 |
KR100230515B1 (ko) * | 1997-04-04 | 1999-11-15 | 윤종용 | 요철이 형성된 리드 프레임의 제조방법 |
TW393748B (en) * | 1997-08-22 | 2000-06-11 | Enomoto Kk | Manufacturing of semiconductor devices and semiconductor lead frame |
US6284309B1 (en) * | 1997-12-19 | 2001-09-04 | Atotech Deutschland Gmbh | Method of producing copper surfaces for improved bonding, compositions used therein and articles made therefrom |
JP2947270B1 (ja) * | 1998-06-09 | 1999-09-13 | 株式会社野村鍍金 | 金属製中空体の内面研磨方法及び研磨装置 |
JP2001040490A (ja) * | 1999-07-27 | 2001-02-13 | Mec Kk | 鉄−ニッケル合金用マイクロエッチング剤およびそれを用いる表面粗化法 |
JP3602453B2 (ja) * | 2000-08-31 | 2004-12-15 | Necエレクトロニクス株式会社 | 半導体装置 |
JP3932193B2 (ja) | 2000-12-27 | 2007-06-20 | 荏原ユージライト株式会社 | 銅および銅合金用のマイクロエッチング剤並びにこれを用いる銅または銅合金の微細粗化方法 |
AU2004200704B2 (en) * | 2003-02-24 | 2010-03-25 | Depuy Products, Inc. | Metallic implants having roughened surfaces and method for producing the same |
US20040167632A1 (en) * | 2003-02-24 | 2004-08-26 | Depuy Products, Inc. | Metallic implants having roughened surfaces and methods for producing the same |
US7049683B1 (en) * | 2003-07-19 | 2006-05-23 | Ns Electronics Bangkok (1993) Ltd. | Semiconductor package including organo-metallic coating formed on surface of leadframe roughened using chemical etchant to prevent separation between leadframe and molding compound |
US7078809B2 (en) * | 2003-12-31 | 2006-07-18 | Dynacraft Industries Sdn. Bhd. | Chemical leadframe roughening process and resulting leadframe and integrated circuit package |
EP1780309B8 (en) * | 2005-10-25 | 2010-12-15 | ATOTECH Deutschland GmbH | Composition and method for improved adhesion of polymeric materials to copper or copper alloy surfaces |
WO2007061112A1 (ja) * | 2005-11-28 | 2007-05-31 | Dai Nippon Printing Co., Ltd. | 回路部材、回路部材の製造方法、及び、回路部材を含む半導体装置 |
JP2007287765A (ja) * | 2006-04-13 | 2007-11-01 | Denso Corp | 樹脂封止型半導体装置 |
JP4180616B2 (ja) * | 2006-06-01 | 2008-11-12 | 株式会社臼田工業 | 金属部品のバリ取り装置 |
US20090302005A1 (en) * | 2008-06-04 | 2009-12-10 | General Electric Company | Processes for texturing a surface prior to electroless plating |
-
2008
- 2008-12-22 US US12/341,240 patent/US20100155260A1/en not_active Abandoned
-
2009
- 2009-11-30 TW TW098140722A patent/TWI433286B/zh active
- 2009-12-03 CN CN2009102240668A patent/CN101901769B/zh active Active
- 2009-12-10 SG SG200908228-0A patent/SG162685A1/en unknown
- 2009-12-18 JP JP2009288212A patent/JP5279694B2/ja active Active
- 2009-12-21 KR KR1020090127646A patent/KR101157412B1/ko active IP Right Grant
- 2009-12-21 MY MYPI20095476A patent/MY153943A/en unknown
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Publication number | Publication date |
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MY153943A (en) | 2015-04-15 |
CN101901769B (zh) | 2011-12-07 |
SG162685A1 (en) | 2010-07-29 |
JP2010147479A (ja) | 2010-07-01 |
KR101157412B1 (ko) | 2012-06-21 |
CN101901769A (zh) | 2010-12-01 |
TW201025539A (en) | 2010-07-01 |
US20100155260A1 (en) | 2010-06-24 |
TWI433286B (zh) | 2014-04-01 |
KR20100074021A (ko) | 2010-07-01 |
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