JP5270345B2 - 太陽電池に用いられる光線透過率を最適化する被覆されたガラス物品及びその製造方法 - Google Patents
太陽電池に用いられる光線透過率を最適化する被覆されたガラス物品及びその製造方法 Download PDFInfo
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- JP5270345B2 JP5270345B2 JP2008529119A JP2008529119A JP5270345B2 JP 5270345 B2 JP5270345 B2 JP 5270345B2 JP 2008529119 A JP2008529119 A JP 2008529119A JP 2008529119 A JP2008529119 A JP 2008529119A JP 5270345 B2 JP5270345 B2 JP 5270345B2
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- 239000011521 glass Substances 0.000 title claims description 54
- 238000002834 transmittance Methods 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 6
- 229910044991 metal oxide Inorganic materials 0.000 claims description 36
- 150000004706 metal oxides Chemical class 0.000 claims description 36
- 239000000758 substrate Substances 0.000 claims description 30
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 13
- 238000005457 optimization Methods 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 10
- 230000005540 biological transmission Effects 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- 239000010703 silicon Substances 0.000 claims description 10
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 7
- 229910001887 tin oxide Inorganic materials 0.000 claims description 7
- 239000000377 silicon dioxide Substances 0.000 claims description 6
- 230000001629 suppression Effects 0.000 claims description 6
- 239000005329 float glass Substances 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 4
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 claims description 3
- 238000005816 glass manufacturing process Methods 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 4
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims 4
- 229910003437 indium oxide Inorganic materials 0.000 claims 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims 1
- 238000010030 laminating Methods 0.000 claims 1
- 239000010410 layer Substances 0.000 description 47
- 239000010408 film Substances 0.000 description 37
- 239000007789 gas Substances 0.000 description 29
- 238000009826 distribution Methods 0.000 description 13
- 238000000576 coating method Methods 0.000 description 12
- 239000002243 precursor Substances 0.000 description 11
- 239000011248 coating agent Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- 230000005855 radiation Effects 0.000 description 9
- 229910006404 SnO 2 Inorganic materials 0.000 description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 238000007507 annealing of glass Methods 0.000 description 7
- 239000011229 interlayer Substances 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 230000003287 optical effect Effects 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- 238000006124 Pilkington process Methods 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 239000005357 flat glass Substances 0.000 description 3
- 239000008246 gaseous mixture Substances 0.000 description 3
- 239000006060 molten glass Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 230000001590 oxidative effect Effects 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 239000005361 soda-lime glass Substances 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 2
- 239000012080 ambient air Substances 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005253 cladding Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/36—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
- H01L31/02168—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0376—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
- H01L31/03762—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12535—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.] with additional, spatially distinct nonmetal component
- Y10T428/12597—Noncrystalline silica or noncrystalline plural-oxide component [e.g., glass, etc.]
- Y10T428/12604—Film [e.g., glaze, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Computer Hardware Design (AREA)
- Sustainable Development (AREA)
- Chemical & Material Sciences (AREA)
- Sustainable Energy (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
- Photovoltaic Devices (AREA)
- Laminated Bodies (AREA)
Description
Claims (17)
- 太陽電池の構成要素としての使用に適した被覆されたガラス物品であって、
透明な絶縁性基板と、
前記絶縁性基板上に積層された、2.0未満の屈折率を有する透明な導電性金属酸化物層と、
前記導電性金属酸化物層上に積層された、2.3〜3.5の屈折率を有し、450〜600Åの平均厚さを有し、かつチタン酸化物を含む光線透過率最適化中間層と、
前記光線透過率最適化中間層上に積層された、少なくとも4.5の屈折率を有するシリコン層とを含む物品。 - 請求項1に記載の被覆されたガラス物品であって、
前記導電性金属酸化物層は、フッ素ドープ金属酸化物を含むことを特徴とする物品。 - 請求項1に記載の被覆されたガラス物品であって、
前記光線透過率最適化中間層は、金属酸化物層を含むことを特徴とする物品。 - 請求項1に記載の被覆されたガラス物品であって、
前記シリコン層は、非晶質シリコンを含むことを特徴とする物品。 - 請求項1に記載の被覆されたガラス物品であって、
前記絶縁性基板と前記導電性金属酸化物層との間に介挿された色抑制膜をさらに含むことを特徴とする物品。 - 請求項5に記載の被覆されたガラス物品であって、
前記色抑制膜は、単一の金属酸化物層、金属酸化物層とシリカ層、及び傾斜層から成る群より選択される1つを含むことを特徴とする物品。 - 請求項5に記載の被覆されたガラス物品であって、
前記色抑制膜は、250〜600Åの厚さを有する酸化スズ層と、250〜350Åの厚さを有するシリカ層とを含むことを特徴とする物品。 - 請求項1に記載の被覆されたガラス物品であって、
前記光線透過率最適化中間層は、450〜500Åの平均厚さを有するチタン酸化物層を含むことを特徴とする物品。 - 請求項2に記載の被覆されたガラス物品であって、
前記導電性金属酸化物層は、5000〜7500Åの厚さを有するフッ素ドープ酸化スズを含むことを特徴とする物品。 - 請求項3に記載の被覆されたガラス物品であって、
前記光線透過率最適化中間層は、2.3〜3.0の屈折率を有することを特徴とする物品。 - 請求項2に記載の被覆されたガラス物品であって、
前記導電性金属酸化物層は、3000〜5500Åの厚さを有するフッ素ドープ酸化スズを含むことを特徴とする物品。 - 請求項1に記載の被覆されたガラス物品であって、
前記シリコン層は、少なくとも5.0の屈折率を有することを特徴とする物品。 - 請求項1に記載の被覆されたガラス物品であって、
前記導電性金属酸化物層は、スズドープ酸化インジウムを含むことを特徴とする物品。 - 太陽電池の構成要素としての使用に適した被覆された物品の製造方法であって、
加熱された絶縁性基板を提供するステップと、
前記絶縁性基板上に、2.0未満の屈折率を有する透明な導電性金属酸化物層を積層させるステップと、
前記導電性金属酸化物層上に、2.3〜3.5の屈折率を有し、450〜600Åの平均厚さを有し、かつチタン酸化物を含む光線透過率最適化中間層を積層させるステップと、
前記光線透過率最適化中間層上に、少なくとも4.5の屈折率を有するシリコン層を積層させるステップとを含む方法。 - 請求項14に記載の方法であって、
各層は、フロートガラス製造プロセス中にオンラインで積層されることを特徴とする方法。 - 請求項14に記載の方法であって、
各層は、大気圧化学気相成長法によって積層されることを特徴とする方法。 - 太陽電池の構成要素としての使用に適した被覆されたガラス物品であって、
透明な絶縁性基板と、
前記絶縁性基板上に積層された、2.0未満の屈折率を有する透明な導電性金属酸化物層と、
前記導電性金属酸化物層上に積層された、2.3〜3.5の屈折率を有し、450〜600Åの平均厚さを有し、かつチタン酸化物を含む光線透過率最適化中間層と、
前記光線透過率最適化中間層上に積層された、少なくとも4.5の屈折率を有するシリコン層とを含み、
5.2〜8.0のガラス面反射率を有することを特徴とする物品。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US71246505P | 2005-08-30 | 2005-08-30 | |
US60/712,465 | 2005-08-30 | ||
PCT/US2006/033078 WO2007027498A1 (en) | 2005-08-30 | 2006-08-24 | Light transmittance optimizing coated glass article for solar cell and method for making |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2009505941A JP2009505941A (ja) | 2009-02-12 |
JP5270345B2 true JP5270345B2 (ja) | 2013-08-21 |
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JP2008529119A Expired - Fee Related JP5270345B2 (ja) | 2005-08-30 | 2006-08-24 | 太陽電池に用いられる光線透過率を最適化する被覆されたガラス物品及びその製造方法 |
Country Status (9)
Country | Link |
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US (1) | US7968201B2 (ja) |
EP (1) | EP1929542A1 (ja) |
JP (1) | JP5270345B2 (ja) |
KR (1) | KR101252322B1 (ja) |
CN (1) | CN100555671C (ja) |
BR (1) | BRPI0614819A2 (ja) |
MY (1) | MY160173A (ja) |
RU (1) | RU2404485C9 (ja) |
WO (1) | WO2007027498A1 (ja) |
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KR101000057B1 (ko) | 2008-02-04 | 2010-12-10 | 엘지전자 주식회사 | 다층 투명전도층을 구비한 태양전지 이의 제조방법 |
KR100988479B1 (ko) * | 2008-08-25 | 2010-10-18 | 대주나노솔라주식회사 | 복합 산화물 층이 형성된 태양전지 모듈용 유리 기판 |
EP2104145A1 (fr) | 2008-03-18 | 2009-09-23 | AGC Flat Glass Europe SA | Substrat de type verrier revêtu de couches minces et procédé de fabrication |
EP2411849A1 (en) * | 2009-03-27 | 2012-02-01 | PPG Industries Ohio, Inc. | Solar reflecting mirror having a protective coating and method of making same |
US20100258174A1 (en) * | 2009-04-14 | 2010-10-14 | Michael Ghebrebrhan | Global optimization of thin film photovoltaic cell front coatings |
CN101567396A (zh) * | 2009-05-27 | 2009-10-28 | 中国南玻集团股份有限公司 | 用于太阳能电池的透明导电基板 |
US9184320B2 (en) | 2010-06-21 | 2015-11-10 | Mitsubishi Electric Corporation | Photoelectric conversion device |
JP2014160689A (ja) * | 2011-06-20 | 2014-09-04 | Asahi Glass Co Ltd | 透明導電性酸化物膜付き基体 |
US20150122319A1 (en) | 2011-07-28 | 2015-05-07 | David A. Strickler | Apcvd of doped titanium oxide and the coated article made thereby |
US9557871B2 (en) | 2015-04-08 | 2017-01-31 | Guardian Industries Corp. | Transparent conductive coating for capacitive touch panel or the like |
US10222921B2 (en) | 2012-11-27 | 2019-03-05 | Guardian Glass, LLC | Transparent conductive coating for capacitive touch panel with silver having increased resistivity |
KR101466621B1 (ko) * | 2013-02-28 | 2014-12-01 | 주식회사 케이씨씨 | 투과율과 내구성이 향상된 다층코팅을 갖는 태양전지용 투명 기판 및 그 제조방법 |
GB201309717D0 (en) * | 2013-05-31 | 2013-07-17 | Pilkington Group Ltd | Interface layer for electronic devices |
WO2015169331A1 (de) * | 2014-05-05 | 2015-11-12 | Masdar Pv Gmbh | Verfahren zum aufbringen von halbleitermaterial, halbleitermodul und substratherstellungsanlage |
US10133108B2 (en) | 2015-04-08 | 2018-11-20 | Guardian Glass, LLC | Vending machines with large area transparent touch electrode technology, and/or associated methods |
CN106584975B (zh) * | 2016-12-05 | 2019-05-03 | 复旦大学 | 一种红外增强的宽带光热转换薄膜器件 |
KR102282988B1 (ko) | 2020-11-24 | 2021-07-29 | 주식회사 지쓰리 | 볼링공 보조주행장치 |
CN112919825A (zh) * | 2021-02-08 | 2021-06-08 | 海控三鑫(蚌埠)新能源材料有限公司 | 一种双层镀膜光伏玻璃的在线降温装置 |
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US4419386A (en) | 1981-09-14 | 1983-12-06 | Gordon Roy G | Non-iridescent glass structures |
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JPS6068663A (ja) | 1983-09-26 | 1985-04-19 | Komatsu Denshi Kinzoku Kk | アモルフアスシリコン太陽電池 |
US4504526A (en) | 1983-09-26 | 1985-03-12 | Libbey-Owens-Ford Company | Apparatus and method for producing a laminar flow of constant velocity fluid along a substrate |
JPS61141185A (ja) * | 1984-12-13 | 1986-06-28 | Fuji Electric Co Ltd | 光起電力素子の製造方法 |
JPS61159771A (ja) | 1985-01-07 | 1986-07-19 | Sanyo Electric Co Ltd | 光起電力装置 |
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US5773086A (en) | 1996-08-13 | 1998-06-30 | Libbey-Owens-Ford Co. | Method of coating flat glass with indium oxide |
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JP4516657B2 (ja) * | 1999-06-18 | 2010-08-04 | 日本板硝子株式会社 | 光電変換装置用基板とその製造方法、およびこれを用いた光電変換装置 |
JP2001148491A (ja) * | 1999-11-19 | 2001-05-29 | Fuji Xerox Co Ltd | 光電変換素子 |
JP4362273B2 (ja) * | 2001-12-03 | 2009-11-11 | 日本板硝子株式会社 | 基板の製造方法 |
WO2005027229A1 (ja) * | 2003-08-29 | 2005-03-24 | Asahi Glass Company, Limited | 透明導電膜付き基体およびその製造方法 |
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2006
- 2006-08-24 CN CNB2006800316544A patent/CN100555671C/zh not_active Expired - Fee Related
- 2006-08-24 EP EP06813706A patent/EP1929542A1/en not_active Withdrawn
- 2006-08-24 RU RU2008111986/28A patent/RU2404485C9/ru not_active IP Right Cessation
- 2006-08-24 MY MYPI20080146A patent/MY160173A/en unknown
- 2006-08-24 JP JP2008529119A patent/JP5270345B2/ja not_active Expired - Fee Related
- 2006-08-24 BR BRPI0614819-0A patent/BRPI0614819A2/pt not_active IP Right Cessation
- 2006-08-24 US US11/990,475 patent/US7968201B2/en not_active Expired - Fee Related
- 2006-08-24 WO PCT/US2006/033078 patent/WO2007027498A1/en active Application Filing
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BRPI0614819A2 (pt) | 2011-04-19 |
WO2007027498A1 (en) | 2007-03-08 |
KR101252322B1 (ko) | 2013-04-08 |
CN101253634A (zh) | 2008-08-27 |
RU2008111986A (ru) | 2009-10-10 |
RU2404485C9 (ru) | 2011-03-20 |
EP1929542A1 (en) | 2008-06-11 |
CN100555671C (zh) | 2009-10-28 |
US20090155619A1 (en) | 2009-06-18 |
KR20080051132A (ko) | 2008-06-10 |
RU2404485C2 (ru) | 2010-11-20 |
US7968201B2 (en) | 2011-06-28 |
JP2009505941A (ja) | 2009-02-12 |
MY160173A (en) | 2017-02-28 |
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