JP5243957B2 - 液浸リソグラフィー用オブジェクティブ - Google Patents

液浸リソグラフィー用オブジェクティブ Download PDF

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Publication number
JP5243957B2
JP5243957B2 JP2008526437A JP2008526437A JP5243957B2 JP 5243957 B2 JP5243957 B2 JP 5243957B2 JP 2008526437 A JP2008526437 A JP 2008526437A JP 2008526437 A JP2008526437 A JP 2008526437A JP 5243957 B2 JP5243957 B2 JP 5243957B2
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Japan
Prior art keywords
optical axis
objective
holding structure
rigidity
immersion lithography
Prior art date
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JP2008526437A
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English (en)
Japanese (ja)
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JP2009505411A (ja
JP2009505411A5 (enExample
Inventor
バーンハルト ゲルリヒ
パウル グレウプナー
ヨイルゲン フィッシャー
アンドレアス ブルムブラント
バウケ ヤンセン
ボブ ストレーフケルク
クリスチャーン アレクサンダー ホーゲンダム
ヨハネス ヤコブス マテウス バゼルマンス
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
エーエスエムエル ネザーランズ ビー．ブイ．
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Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー, エーエスエムエル ネザーランズ ビー．ブイ． filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2009505411A publication Critical patent/JP2009505411A/ja
Publication of JP2009505411A5 publication Critical patent/JP2009505411A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008526437A 2005-08-16 2006-08-16 液浸リソグラフィー用オブジェクティブ Active JP5243957B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US70881005P 2005-08-16 2005-08-16
US60/708,810 2005-08-16
PCT/EP2006/008073 WO2007020067A1 (en) 2005-08-16 2006-08-16 Immersion lithography objective

Publications (3)

Publication Number Publication Date
JP2009505411A JP2009505411A (ja) 2009-02-05
JP2009505411A5 JP2009505411A5 (enExample) 2013-03-07
JP5243957B2 true JP5243957B2 (ja) 2013-07-24

Family

ID=37503663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008526437A Active JP5243957B2 (ja) 2005-08-16 2006-08-16 液浸リソグラフィー用オブジェクティブ

Country Status (3)

Country Link
US (1) US7649702B2 (enExample)
JP (1) JP5243957B2 (enExample)
WO (1) WO2007020067A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008026979B3 (de) * 2008-05-29 2009-12-24 Carl Zeiss Ag Vorrichtung zum Korrigieren von Abbildungsfehlern in einem optischen System
JP5455516B2 (ja) * 2009-09-11 2014-03-26 キヤノン株式会社 支持装置、光学装置、転写装置及びデバイス製造方法
DE102009045163B4 (de) * 2009-09-30 2017-04-06 Carl Zeiss Smt Gmbh Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage
DE102010008756A1 (de) * 2010-02-17 2011-06-30 Carl Zeiss Laser Optics GmbH, 73447 Optische Anordnung
CN102981234A (zh) * 2012-12-12 2013-03-20 中国科学院长春光学精密机械与物理研究所 光学元件轴向调整装置
DE102013201264A1 (de) * 2013-01-28 2014-02-27 Carl Zeiss Smt Gmbh Verbindungselement zur Kompensation unterschiedlicher thermischer Ausdehnung der verbundenen Körper

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4269125A (en) 1979-07-27 1981-05-26 Combustion Engineering, Inc. Pulverizer rejects disposal
US4733945A (en) 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
JPH11337795A (ja) * 1998-05-22 1999-12-10 Canon Inc レンズ鏡筒
US6198576B1 (en) * 1998-07-16 2001-03-06 Nikon Corporation Projection optical system and exposure apparatus
DE19901295A1 (de) * 1999-01-15 2000-07-20 Zeiss Carl Fa Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einem optischen Element
US6239924B1 (en) * 1999-08-31 2001-05-29 Nikon Corporation Kinematic lens mounting with distributed support and radial flexure
JP4809987B2 (ja) * 2000-03-30 2011-11-09 キヤノン株式会社 光学要素の支持構造、それを用いた露光装置及び半導体デバイスの製造方法
KR20030051421A (ko) 2000-03-31 2003-06-25 가부시키가이샤 니콘 광학 부재의 유지 방법 및 장치, 광학 장치, 노광 장치 및디바이스 제조 방법
JP2002048962A (ja) 2000-06-17 2002-02-15 Carl-Zeiss-Stiftung Trading As Carl Zeiss 光学素子装着装置
DE10121346A1 (de) 2001-05-02 2002-11-07 Zeiss Carl Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie
JP2003029116A (ja) * 2001-07-13 2003-01-29 Canon Inc レンズ保持装置、およびレンズ保持装置を組み込んだ投影露光装置
US20030234918A1 (en) * 2002-06-20 2003-12-25 Nikon Corporation Adjustable soft mounts in kinematic lens mounting system
JP4565261B2 (ja) * 2002-06-24 2010-10-20 株式会社ニコン 光学素子保持機構、光学系鏡筒及び露光装置
WO2004086148A1 (de) * 2003-03-26 2004-10-07 Carl Zeiss Smt Ag Vorrichtung zur deformationsarmen austauschbaren lagerung eines optischen elements
KR20180089562A (ko) * 2003-04-10 2018-08-08 가부시키가이샤 니콘 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
JP3805323B2 (ja) * 2003-05-21 2006-08-02 キヤノン株式会社 露光装置、収差低減方法及び光学部材調整機構
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
EP1503244A1 (en) * 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
WO2005054953A2 (en) * 2003-11-24 2005-06-16 Carl-Zeiss Smt Ag Holding device for an optical element in an objective
US7369332B2 (en) 2004-04-13 2008-05-06 Carl Zeiss Smt Gmbh Closing module for an optical arrangement

Also Published As

Publication number Publication date
WO2007020067A1 (en) 2007-02-22
US7649702B2 (en) 2010-01-19
JP2009505411A (ja) 2009-02-05
US20080212211A1 (en) 2008-09-04

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