JP2009505411A5 - - Google Patents

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Publication number
JP2009505411A5
JP2009505411A5 JP2008526437A JP2008526437A JP2009505411A5 JP 2009505411 A5 JP2009505411 A5 JP 2009505411A5 JP 2008526437 A JP2008526437 A JP 2008526437A JP 2008526437 A JP2008526437 A JP 2008526437A JP 2009505411 A5 JP2009505411 A5 JP 2009505411A5
Authority
JP
Japan
Prior art keywords
outer ring
terminal optical
optical element
thermal expansion
holding structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2008526437A
Other languages
English (en)
Japanese (ja)
Other versions
JP5243957B2 (ja
JP2009505411A (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/EP2006/008073 external-priority patent/WO2007020067A1/en
Publication of JP2009505411A publication Critical patent/JP2009505411A/ja
Publication of JP2009505411A5 publication Critical patent/JP2009505411A5/ja
Application granted granted Critical
Publication of JP5243957B2 publication Critical patent/JP5243957B2/ja
Anticipated expiration legal-status Critical
Active legal-status Critical Current

Links

JP2008526437A 2005-08-16 2006-08-16 液浸リソグラフィー用オブジェクティブ Active JP5243957B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US70881005P 2005-08-16 2005-08-16
US60/708,810 2005-08-16
PCT/EP2006/008073 WO2007020067A1 (en) 2005-08-16 2006-08-16 Immersion lithography objective

Publications (3)

Publication Number Publication Date
JP2009505411A JP2009505411A (ja) 2009-02-05
JP2009505411A5 true JP2009505411A5 (enExample) 2013-03-07
JP5243957B2 JP5243957B2 (ja) 2013-07-24

Family

ID=37503663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008526437A Active JP5243957B2 (ja) 2005-08-16 2006-08-16 液浸リソグラフィー用オブジェクティブ

Country Status (3)

Country Link
US (1) US7649702B2 (enExample)
JP (1) JP5243957B2 (enExample)
WO (1) WO2007020067A1 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008026979B3 (de) * 2008-05-29 2009-12-24 Carl Zeiss Ag Vorrichtung zum Korrigieren von Abbildungsfehlern in einem optischen System
JP5455516B2 (ja) * 2009-09-11 2014-03-26 キヤノン株式会社 支持装置、光学装置、転写装置及びデバイス製造方法
DE102009045163B4 (de) * 2009-09-30 2017-04-06 Carl Zeiss Smt Gmbh Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage
DE102010008756A1 (de) * 2010-02-17 2011-06-30 Carl Zeiss Laser Optics GmbH, 73447 Optische Anordnung
CN102981234A (zh) * 2012-12-12 2013-03-20 中国科学院长春光学精密机械与物理研究所 光学元件轴向调整装置
DE102013201264A1 (de) * 2013-01-28 2014-02-27 Carl Zeiss Smt Gmbh Verbindungselement zur Kompensation unterschiedlicher thermischer Ausdehnung der verbundenen Körper

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4269125A (en) 1979-07-27 1981-05-26 Combustion Engineering, Inc. Pulverizer rejects disposal
US4733945A (en) 1986-01-15 1988-03-29 The Perkin-Elmer Corporation Precision lens mounting
JPH11337795A (ja) * 1998-05-22 1999-12-10 Canon Inc レンズ鏡筒
US6198576B1 (en) * 1998-07-16 2001-03-06 Nikon Corporation Projection optical system and exposure apparatus
DE19901295A1 (de) * 1999-01-15 2000-07-20 Zeiss Carl Fa Optische Abbildungsvorrichtung, insbesondere Objektiv, mit wenigstens einem optischen Element
US6239924B1 (en) * 1999-08-31 2001-05-29 Nikon Corporation Kinematic lens mounting with distributed support and radial flexure
JP4809987B2 (ja) * 2000-03-30 2011-11-09 キヤノン株式会社 光学要素の支持構造、それを用いた露光装置及び半導体デバイスの製造方法
KR20030051421A (ko) 2000-03-31 2003-06-25 가부시키가이샤 니콘 광학 부재의 유지 방법 및 장치, 광학 장치, 노광 장치 및디바이스 제조 방법
JP2002048962A (ja) 2000-06-17 2002-02-15 Carl-Zeiss-Stiftung Trading As Carl Zeiss 光学素子装着装置
DE10121346A1 (de) 2001-05-02 2002-11-07 Zeiss Carl Objektiv, insbesondere Projektionsobjektiv für die Halbleiter-Lithographie
JP2003029116A (ja) * 2001-07-13 2003-01-29 Canon Inc レンズ保持装置、およびレンズ保持装置を組み込んだ投影露光装置
US20030234918A1 (en) * 2002-06-20 2003-12-25 Nikon Corporation Adjustable soft mounts in kinematic lens mounting system
JP4565261B2 (ja) * 2002-06-24 2010-10-20 株式会社ニコン 光学素子保持機構、光学系鏡筒及び露光装置
WO2004086148A1 (de) * 2003-03-26 2004-10-07 Carl Zeiss Smt Ag Vorrichtung zur deformationsarmen austauschbaren lagerung eines optischen elements
KR20180089562A (ko) * 2003-04-10 2018-08-08 가부시키가이샤 니콘 액침 리소그래피 장치용 진공 배출을 포함하는 환경 시스템
JP3805323B2 (ja) * 2003-05-21 2006-08-02 キヤノン株式会社 露光装置、収差低減方法及び光学部材調整機構
DE10324477A1 (de) * 2003-05-30 2004-12-30 Carl Zeiss Smt Ag Mikrolithographische Projektionsbelichtungsanlage
EP1503244A1 (en) * 2003-07-28 2005-02-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
WO2005054953A2 (en) * 2003-11-24 2005-06-16 Carl-Zeiss Smt Ag Holding device for an optical element in an objective
US7369332B2 (en) 2004-04-13 2008-05-06 Carl Zeiss Smt Gmbh Closing module for an optical arrangement

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