JP5240563B2 - Ｘｙ軸コアレスリニアモータ及びそれを用いたステージ装置 - Google Patents

Ｘｙ軸コアレスリニアモータ及びそれを用いたステージ装置 Download PDF

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Publication number
JP5240563B2
JP5240563B2 JP2008240956A JP2008240956A JP5240563B2 JP 5240563 B2 JP5240563 B2 JP 5240563B2 JP 2008240956 A JP2008240956 A JP 2008240956A JP 2008240956 A JP2008240956 A JP 2008240956A JP 5240563 B2 JP5240563 B2 JP 5240563B2
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Japan
Prior art keywords
permanent magnet
armature
magnet
linear motor
stage
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Expired - Fee Related
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JP2008240956A
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Japanese (ja)
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JP2010074976A (ja
JP2010074976A5 (enExample
Inventor
俊行 星
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Yaskawa Electric Corp
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Yaskawa Electric Corp
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Priority to JP2008240956A priority Critical patent/JP5240563B2/ja
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Linear Motors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2008240956A 2008-09-19 2008-09-19 Ｘｙ軸コアレスリニアモータ及びそれを用いたステージ装置 Expired - Fee Related JP5240563B2 (ja)

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JP2008240956A JP5240563B2 (ja) 2008-09-19 2008-09-19 Ｘｙ軸コアレスリニアモータ及びそれを用いたステージ装置

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JP2008240956A JP5240563B2 (ja) 2008-09-19 2008-09-19 Ｘｙ軸コアレスリニアモータ及びそれを用いたステージ装置

Publications (3)

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JP2010074976A JP2010074976A (ja) 2010-04-02
JP2010074976A5 JP2010074976A5 (enExample) 2012-02-16
JP5240563B2 true JP5240563B2 (ja) 2013-07-17

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JP2008240956A Expired - Fee Related JP5240563B2 (ja) 2008-09-19 2008-09-19 Ｘｙ軸コアレスリニアモータ及びそれを用いたステージ装置

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210249944A1 (en) * 2020-02-07 2021-08-12 Canon Kabushiki Kaisha Conveyance apparatus and method of manufacturing article

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5488831B2 (ja) 2010-10-07 2014-05-14 株式会社安川電機 リニアモータ及びステージ装置
WO2014192058A1 (ja) * 2013-05-27 2014-12-04 株式会社安川電機 リニアモータ及びステージ装置
NL2016688A (en) 2015-07-09 2017-01-17 Asml Netherlands Bv Movable support and lithographic apparatus
CN213461501U (zh) * 2020-09-04 2021-06-15 瑞声科技（南京）有限公司 直线电机
CN114400829B (zh) * 2022-02-19 2025-10-31 哈尔滨理工大学 一种二自由度磁动式平台及控制方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5863074A (ja) * 1981-10-09 1983-04-14 Takahashi Yoshiteru 直流型半導体リニアモ−タ
JP3155936B2 (ja) * 1997-06-26 2001-04-16 キヤノン株式会社 リニアモータとステージ装置及びこれを用いた走査型露光装置やデバイス製造方法
JP2000078830A (ja) * 1998-09-01 2000-03-14 Nikon Corp リニアモータ及びステージ装置並びに露光装置
JP4304709B2 (ja) * 1999-01-13 2009-07-29 株式会社安川電機 可動巻線型リニアモータ
JP2001112234A (ja) * 1999-10-04 2001-04-20 Nikon Corp モータ装置、ステージ装置、及び露光装置、並びにモータ装置の駆動制御方法
JP2007318823A (ja) * 2006-05-23 2007-12-06 Nikon Corp リニアモータ、ステージ装置、露光装置及びデバイスの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20210249944A1 (en) * 2020-02-07 2021-08-12 Canon Kabushiki Kaisha Conveyance apparatus and method of manufacturing article
US11670998B2 (en) * 2020-02-07 2023-06-06 Canon Kabushiki Kaisha Conveyance apparatus and method of manufacturing article

Also Published As

Publication number Publication date
JP2010074976A (ja) 2010-04-02

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