JP5230875B2 - 光照射装置の光照射方法及び光照射装置 - Google Patents
光照射装置の光照射方法及び光照射装置 Download PDFInfo
- Publication number
- JP5230875B2 JP5230875B2 JP2010523222A JP2010523222A JP5230875B2 JP 5230875 B2 JP5230875 B2 JP 5230875B2 JP 2010523222 A JP2010523222 A JP 2010523222A JP 2010523222 A JP2010523222 A JP 2010523222A JP 5230875 B2 JP5230875 B2 JP 5230875B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- light irradiation
- linear beam
- along
- illuminance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims description 14
- 238000001514 detection method Methods 0.000 claims description 76
- 239000000758 substrate Substances 0.000 claims description 53
- 230000003287 optical effect Effects 0.000 claims description 27
- 239000011347 resin Substances 0.000 claims description 20
- 229920005989 resin Polymers 0.000 claims description 20
- 230000001678 irradiating effect Effects 0.000 claims description 12
- 239000003566 sealing material Substances 0.000 description 58
- 239000004973 liquid crystal related substance Substances 0.000 description 32
- 238000007689 inspection Methods 0.000 description 8
- 238000001723 curing Methods 0.000 description 5
- 238000005286 illumination Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 230000004308 accommodation Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 210000000078 claw Anatomy 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Liquid Crystal (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010523222A JP5230875B2 (ja) | 2009-04-28 | 2010-01-27 | 光照射装置の光照射方法及び光照射装置 |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009110136 | 2009-04-28 | ||
JP2009110135 | 2009-04-28 | ||
JP2009110135 | 2009-04-28 | ||
JP2009110136 | 2009-04-28 | ||
JP2010523222A JP5230875B2 (ja) | 2009-04-28 | 2010-01-27 | 光照射装置の光照射方法及び光照射装置 |
PCT/JP2010/051013 WO2010125836A1 (ja) | 2009-04-28 | 2010-01-27 | 光照射装置の光照射方法及び光照射装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2010125836A1 JPWO2010125836A1 (ja) | 2012-10-25 |
JP5230875B2 true JP5230875B2 (ja) | 2013-07-10 |
Family
ID=43031992
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010523222A Expired - Fee Related JP5230875B2 (ja) | 2009-04-28 | 2010-01-27 | 光照射装置の光照射方法及び光照射装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5230875B2 (ko) |
KR (1) | KR101240367B1 (ko) |
CN (1) | CN101978308B (ko) |
TW (1) | TWI402152B (ko) |
WO (1) | WO2010125836A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018084804A (ja) * | 2016-11-17 | 2018-05-31 | 東京エレクトロン株式会社 | 露光装置、露光装置の調整方法及び記憶媒体 |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5771776B2 (ja) * | 2010-12-21 | 2015-09-02 | パナソニックIpマネジメント株式会社 | 紫外線照射装置 |
JP5732971B2 (ja) * | 2011-03-31 | 2015-06-10 | 東芝ライテック株式会社 | 紫外線照射装置 |
CN102435307B (zh) * | 2011-11-09 | 2013-09-18 | 深圳市华星光电技术有限公司 | Tft-lcd制程中多层uv烘烤炉的uv照度的检测方法及用于实施该方法的取片组合装置 |
JP2013219205A (ja) * | 2012-04-10 | 2013-10-24 | Hoya Candeo Optronics株式会社 | 光照射装置 |
JP6206945B2 (ja) * | 2013-03-07 | 2017-10-04 | 株式会社ブイ・テクノロジー | 走査露光装置及び走査露光方法 |
JP5884776B2 (ja) * | 2013-06-22 | 2016-03-15 | ウシオ電機株式会社 | 光配向用偏光光照射装置 |
JP2015165546A (ja) * | 2014-02-07 | 2015-09-17 | 株式会社ミマキエンジニアリング | 紫外線発光ダイオードユニット、紫外線発光ダイオードユニットのセット、インクジェット装置および三次元造形物製造装置 |
JP6394317B2 (ja) * | 2014-11-21 | 2018-09-26 | 東芝ライテック株式会社 | 光照射装置 |
JP6809188B2 (ja) * | 2016-12-13 | 2021-01-06 | 東京エレクトロン株式会社 | 光照射装置 |
CN108681211A (zh) * | 2018-04-20 | 2018-10-19 | 佛山市鑫东陶陶瓷有限公司 | 一种点光源曝光装置 |
WO2020217288A1 (ja) * | 2019-04-22 | 2020-10-29 | カンタム・ウシカタ株式会社 | 光学系装置 |
DE102022128497A1 (de) | 2022-10-27 | 2024-05-02 | Forschungszentrum Jülich GmbH | Vorrichtung und verfahren zur thermischen behandlung von werkstücken |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005099783A (ja) * | 2003-08-28 | 2005-04-14 | Shibaura Mechatronics Corp | 紫外光照射装置及び照射方法 |
JP2006235617A (ja) * | 2005-01-28 | 2006-09-07 | Shibaura Mechatronics Corp | 紫外光照射装置及び照射方法、基板製造装置及び基板製造方法 |
JP2007057861A (ja) * | 2005-08-25 | 2007-03-08 | Harison Toshiba Lighting Corp | 角形状集光用光学系および液晶パネル用紫外線照射装置 |
JP2007334039A (ja) * | 2006-06-15 | 2007-12-27 | Ulvac Japan Ltd | 光源装置及びこれを用いた基板の貼り合わせ方法 |
JP2008033056A (ja) * | 2006-07-28 | 2008-02-14 | Shibaura Mechatronics Corp | シール剤硬化装置及び基板製造装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006030933A (ja) * | 2004-06-18 | 2006-02-02 | Shin Etsu Chem Co Ltd | 液晶表示セル基板の基板面シール方法及び紫外線照射装置 |
-
2010
- 2010-01-27 CN CN2010800012812A patent/CN101978308B/zh not_active Expired - Fee Related
- 2010-01-27 JP JP2010523222A patent/JP5230875B2/ja not_active Expired - Fee Related
- 2010-01-27 WO PCT/JP2010/051013 patent/WO2010125836A1/ja active Application Filing
- 2010-01-27 KR KR1020107022207A patent/KR101240367B1/ko active IP Right Grant
- 2010-02-23 TW TW099105211A patent/TWI402152B/zh not_active IP Right Cessation
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005099783A (ja) * | 2003-08-28 | 2005-04-14 | Shibaura Mechatronics Corp | 紫外光照射装置及び照射方法 |
JP2006235617A (ja) * | 2005-01-28 | 2006-09-07 | Shibaura Mechatronics Corp | 紫外光照射装置及び照射方法、基板製造装置及び基板製造方法 |
JP2007057861A (ja) * | 2005-08-25 | 2007-03-08 | Harison Toshiba Lighting Corp | 角形状集光用光学系および液晶パネル用紫外線照射装置 |
JP2007334039A (ja) * | 2006-06-15 | 2007-12-27 | Ulvac Japan Ltd | 光源装置及びこれを用いた基板の貼り合わせ方法 |
JP2008033056A (ja) * | 2006-07-28 | 2008-02-14 | Shibaura Mechatronics Corp | シール剤硬化装置及び基板製造装置 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2018084804A (ja) * | 2016-11-17 | 2018-05-31 | 東京エレクトロン株式会社 | 露光装置、露光装置の調整方法及び記憶媒体 |
Also Published As
Publication number | Publication date |
---|---|
JPWO2010125836A1 (ja) | 2012-10-25 |
CN101978308B (zh) | 2012-09-19 |
KR20100132024A (ko) | 2010-12-16 |
WO2010125836A1 (ja) | 2010-11-04 |
KR101240367B1 (ko) | 2013-03-11 |
CN101978308A (zh) | 2011-02-16 |
TWI402152B (zh) | 2013-07-21 |
TW201038384A (en) | 2010-11-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5230875B2 (ja) | 光照射装置の光照射方法及び光照射装置 | |
CN1066907C (zh) | 电子元件装配装置 | |
JP5180439B2 (ja) | 紫外光照射装置及び照射方法、基板製造装置及び基板製造方法 | |
US8925188B2 (en) | Component mounting apparatus | |
KR101196324B1 (ko) | 광 조사 장치 | |
JP5257308B2 (ja) | 光照射装置 | |
TWI543228B (zh) | Light irradiation device | |
US9266312B2 (en) | Bonding apparatus and bonding method | |
JP4480660B2 (ja) | 基板貼り合わせ装置 | |
KR102576187B1 (ko) | 자외선 경화 장치 | |
KR101336923B1 (ko) | 지그 일체형 uv 엘이디 경화장치 | |
JP2013038177A (ja) | 液滴吐出装置及び検査方法 | |
JP2010266616A (ja) | 光照射装置 | |
CN118215572A (zh) | 用于具有多图像投影的增材制造系统的校准系统和方法 | |
KR20230081535A (ko) | 마이크로 led 칩 전사 장치 | |
KR20190044326A (ko) | 경화 장치 및 디스플레이 패널 경화 방법 | |
TW201222109A (en) | Substrate bonding apparatus and substrate bonding method using the same | |
JP5075789B2 (ja) | 光照射装置 | |
JP2009223195A (ja) | 三次元画像表示装置の製造装置及び三次元画像表示装置の製造方法 | |
CN113119458A (zh) | 3d打印设备的标定系统、方法及3d打印设备 | |
US7330308B2 (en) | Alignment method of micro-alignment members and device thereof | |
CN212555058U (zh) | 亮度检测治具及3d打印设备 | |
JP5382373B2 (ja) | 光照射装置 | |
WO2020240968A1 (ja) | カメラモジュールの製造方法及び製造装置、並びに光学モジュールの製造方法 | |
JP2008190905A (ja) | 紫外線照度測定装置、および光学装置の製造装置 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120831 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130305 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130320 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20160329 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5230875 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
LAPS | Cancellation because of no payment of annual fees |