JP5221772B2 - 粒子材料の計量及びその気化 - Google Patents

粒子材料の計量及びその気化 Download PDF

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Publication number
JP5221772B2
JP5221772B2 JP2011536324A JP2011536324A JP5221772B2 JP 5221772 B2 JP5221772 B2 JP 5221772B2 JP 2011536324 A JP2011536324 A JP 2011536324A JP 2011536324 A JP2011536324 A JP 2011536324A JP 5221772 B2 JP5221772 B2 JP 5221772B2
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JP
Japan
Prior art keywords
particulate material
opening
rotatable shaft
flash evaporator
rotatable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011536324A
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English (en)
Japanese (ja)
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JP2012508818A (ja
JP2012508818A5 (enExample
Inventor
パロウン、トマス・ウィリアム
ロング、マイケル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Global OLED Technology LLC
Original Assignee
Global OLED Technology LLC
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Publication date
Application filed by Global OLED Technology LLC filed Critical Global OLED Technology LLC
Publication of JP2012508818A publication Critical patent/JP2012508818A/ja
Publication of JP2012508818A5 publication Critical patent/JP2012508818A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G65/00—Loading or unloading
    • B65G65/30—Methods or devices for filling or emptying bunkers, hoppers, tanks, or like containers, of interest apart from their use in particular chemical or physical processes or their application in particular machines, e.g. not covered by a single other subclass
    • B65G65/34—Emptying devices
    • B65G65/40—Devices for emptying otherwise than from the top
    • B65G65/48—Devices for emptying otherwise than from the top using other rotating means, e.g. rotating pressure sluices in pneumatic systems
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F11/00—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
    • G01F11/10—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation
    • G01F11/12—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements
    • G01F11/20—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements wherein the measuring chamber rotates or oscillates
    • G01F11/24—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements wherein the measuring chamber rotates or oscillates for fluent solid material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
JP2011536324A 2008-11-14 2009-11-12 粒子材料の計量及びその気化 Active JP5221772B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/271,250 2008-11-14
US12/271,250 US7972443B2 (en) 2008-11-14 2008-11-14 Metering of particulate material and vaporization thereof
PCT/US2009/006082 WO2010056325A1 (en) 2008-11-14 2009-11-12 Metering of particulate material and vaporization thereof

Publications (3)

Publication Number Publication Date
JP2012508818A JP2012508818A (ja) 2012-04-12
JP2012508818A5 JP2012508818A5 (enExample) 2012-08-02
JP5221772B2 true JP5221772B2 (ja) 2013-06-26

Family

ID=41479216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011536324A Active JP5221772B2 (ja) 2008-11-14 2009-11-12 粒子材料の計量及びその気化

Country Status (7)

Country Link
US (1) US7972443B2 (enExample)
EP (1) EP2352857B1 (enExample)
JP (1) JP5221772B2 (enExample)
KR (1) KR101224564B1 (enExample)
CN (1) CN102282289B (enExample)
TW (1) TWI377260B (enExample)
WO (1) WO2010056325A1 (enExample)

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US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US8048230B2 (en) * 2008-11-14 2011-11-01 Global Oled Technology Llc Metering and vaporizing particulate material
US8062427B2 (en) * 2008-11-14 2011-11-22 Global Oled Technology Llc Particulate material metering and vaporization
US7972443B2 (en) * 2008-11-14 2011-07-05 Global Oled Technology Llc Metering of particulate material and vaporization thereof
DE102011051261A1 (de) * 2011-06-22 2012-12-27 Aixtron Se Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu
CN106119781B (zh) * 2016-07-27 2018-10-30 京东方科技集团股份有限公司 蒸发装置、蒸镀设备和蒸镀方法
CN110615295A (zh) * 2018-06-19 2019-12-27 曹荣华 动态供粉装置
CN110715697B (zh) * 2019-09-25 2021-02-09 北京控制工程研究所 一种带有密封结构的适用于微克级流量的流量测量组件
CN111206228A (zh) * 2020-02-28 2020-05-29 苏州泓沵达仪器科技有限公司 高效纳米真空蒸发源
EP4340969A1 (de) 2021-05-21 2024-03-27 Merck Patent GmbH Verfahren zur kontinuierlichen aufreinigung von mindestens einem funktionalen material und vorrichtung zur kontinuierlichen aufreinigung von mindestens einem funktionalen material

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Also Published As

Publication number Publication date
CN102282289B (zh) 2013-01-09
JP2012508818A (ja) 2012-04-12
WO2010056325A1 (en) 2010-05-20
TWI377260B (en) 2012-11-21
CN102282289A (zh) 2011-12-14
EP2352857B1 (en) 2014-02-12
KR20110083745A (ko) 2011-07-20
KR101224564B1 (ko) 2013-01-21
US7972443B2 (en) 2011-07-05
EP2352857A1 (en) 2011-08-10
TW201037096A (en) 2010-10-16
US20100122658A1 (en) 2010-05-20

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