JP5221771B2 - 粒子材料の計量及び気化 - Google Patents
粒子材料の計量及び気化 Download PDFInfo
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- JP5221771B2 JP5221771B2 JP2011536322A JP2011536322A JP5221771B2 JP 5221771 B2 JP5221771 B2 JP 5221771B2 JP 2011536322 A JP2011536322 A JP 2011536322A JP 2011536322 A JP2011536322 A JP 2011536322A JP 5221771 B2 JP5221771 B2 JP 5221771B2
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- 239000011236 particulate material Substances 0.000 title claims description 106
- 230000008016 vaporization Effects 0.000 title claims description 38
- 238000009834 vaporization Methods 0.000 title description 34
- 238000005259 measurement Methods 0.000 title description 3
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- 238000007790 scraping Methods 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 3
- 238000005243 fluidization Methods 0.000 claims description 2
- 239000008187 granular material Substances 0.000 claims 2
- 239000000843 powder Substances 0.000 description 18
- 238000001704 evaporation Methods 0.000 description 15
- 230000008020 evaporation Effects 0.000 description 15
- 239000006200 vaporizer Substances 0.000 description 15
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- 238000000151 deposition Methods 0.000 description 6
- 238000013461 design Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000010409 thin film Substances 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000006260 foam Substances 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
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- 238000012360 testing method Methods 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 229910021397 glassy carbon Inorganic materials 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000012254 powdered material Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 230000007723 transport mechanism Effects 0.000 description 2
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 230000002730 additional effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
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- 239000011248 coating agent Substances 0.000 description 1
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- 239000011261 inert gas Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
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- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
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- 238000007789 sealing Methods 0.000 description 1
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- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 230000008542 thermal sensitivity Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
(a)粒子材料を計量するための計量装置であって、
(i)粒子材料を受け取るための貯蔵室と、
(ii)内部容積を有し、前記貯蔵室から前記粒子材料を受け取るための第1の開口部、及び前記粒子材料を吐出するための第2の開口部を有するハウジングと、
(iii)前記内部容積内に配置される回転可能シャフトであって、該シャフトは滑らかな表面と、前記貯蔵室から前記粒子材料を受け取るための前記第1の開口部、及び前記粒子材料を吐出するための前記第2の開口部と位置合わせされる外周溝とを有する、回転可能シャフトと、
(iv)前記貯蔵室内に配置される送達する手段であって、前記粒子材料を流動化して該粒子材料を前記貯蔵室から前記外周溝内に移送するために前記回転可能シャフトと協働する、送達する手段と、
(v)前記回転可能シャフト及び前記内部容積は、前記粒子材料が実質的に前記外周溝によって移送され、前記回転可能シャフトの残りの部分に沿って移送されないように協働し、
(vi)前記第2の開口部に関連して配置される擦り取る手段であって、前記外周溝の中に保持される前記粒子材料を取り除き、該粒子材料を流動化し、前記シャフトが回転するのに応じて、計量された量の粒子材料を、前記第2の開口部を通して、単一の粒子の粒、又は粒子の粒の小さな凝集体の形で送達するように前記溝と協働する、擦り取る手段と、
を備える、計量装置と、
(b)前記計量された粒子材料を受け取り、気化させるフラッシュ蒸発器と、
を備える、装置によって達成される。
7 オーガ胴部
8 オーガ構造
9 ねじ山がない部分
120 フラッシュ蒸発器
150 内部容積
155 第1の開口部
160 第2の開口部
170 回転可能シャフト
175 外周溝
185 固定スクレーパー
190 気化装置
200 気化チャンバ
210 回転可能なフラッシュ蒸発器
220 放射遮蔽体
225 楔形の入口
230 貯留室
235 アクチュエーター
240 ハウジング
250 内部容積
255 第1の開口部
260 第2の開口部
270 回転可能シャフト
275 外周溝
285 振動スクレーパー
290 アジテーター
295 アジテーター棒
315 磁石
320 磁気結合
325 ドライブシャフト
335 ベアリング
340 ドライブラグ
Claims (5)
- 粒子材料を計量し、気化するための装置であって、
(a)粒子材料を計量するための計量デバイスであって、
(i)粒子材料を受け取るための貯蔵室と、
(ii)内部容積を有し、前記貯蔵室から前記粒子材料を受け取るための第1の開口部、及び前記粒子材料を吐出するための第2の開口部を有するハウジングと、
(iii)前記内部容積内に配置される回転可能シャフトであって、該シャフトは滑らかな表面と、前記貯蔵室から前記粒子材料を受け取るための前記第1の開口部、及び前記粒子材料を吐出するための前記第2の開口部と位置合わせされる外周溝とを有する、回転可能シャフトと、
(iv)前記貯蔵室内に配置される送達する手段であって、前記粒子材料を流動化して該粒子材料を前記貯蔵室から前記外周溝内に移送するために前記回転可能シャフトと協働する、手段と、
(v)前記回転可能シャフト及び前記内部容積は、前記粒子材料が前記外周溝によって移送され、前記回転可能シャフトの残りの部分に沿って移送されないように協働し、
(vi)前記第2の開口部に関連して配置される擦り取る手段であって、前記外周溝の中に保持される前記粒子材料を取り除き、該擦り取られた粒子材料を流動化し、前記シャフトが回転するのに応じて、計量された量の粒子材料を、前記第2の開口部を通して、単一の粒子の粒、又は粒子の粒の小さな凝集体の形で送達するように前記溝と協働する、手段と、
を備える、計量デバイスと、
(b)前記計量された粒子材料を受け取り、フラッシュ蒸発させるフラッシュ蒸発器と、
を備える、装置。 - 前記送達する手段は、前記貯蔵室から前記外周溝まで前記粒子材料を移送するための役割を果たす複数の棒を有する回転アジテーターを含む、請求項1に記載の装置。
- 擦り取り、流動化する前記手段は、その端部において、前記回転可能シャフト内の前記溝と実質的に同じ断面を有する振動スクレーパーを含む、請求項1に記載の装置。
- 前記フラッシュ蒸発器は回転可能である、請求項1に記載の装置。
- 前記フラッシュ蒸発器は磁気結合を介して回転する、請求項4に記載の装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/271,211 US8062427B2 (en) | 2008-11-14 | 2008-11-14 | Particulate material metering and vaporization |
US12/271,211 | 2008-11-14 | ||
PCT/US2009/006070 WO2010056319A1 (en) | 2008-11-14 | 2009-11-12 | Particulate material metering and vaporization |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2012508817A JP2012508817A (ja) | 2012-04-12 |
JP5221771B2 true JP5221771B2 (ja) | 2013-06-26 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2011536322A Active JP5221771B2 (ja) | 2008-11-14 | 2009-11-12 | 粒子材料の計量及び気化 |
Country Status (7)
Country | Link |
---|---|
US (1) | US8062427B2 (ja) |
EP (1) | EP2350338B1 (ja) |
JP (1) | JP5221771B2 (ja) |
KR (1) | KR101224562B1 (ja) |
CN (1) | CN102264941B (ja) |
TW (1) | TWI377258B (ja) |
WO (1) | WO2010056319A1 (ja) |
Families Citing this family (6)
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US7883583B2 (en) * | 2008-01-08 | 2011-02-08 | Global Oled Technology Llc | Vaporization apparatus with precise powder metering |
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US8062427B2 (en) * | 2008-11-14 | 2011-11-22 | Global Oled Technology Llc | Particulate material metering and vaporization |
US7972443B2 (en) * | 2008-11-14 | 2011-07-05 | Global Oled Technology Llc | Metering of particulate material and vaporization thereof |
TWI737718B (zh) * | 2016-04-25 | 2021-09-01 | 美商創新先進材料股份有限公司 | 含有瀉流源的沉積系統及相關方法 |
CN115595550B (zh) * | 2022-10-24 | 2024-07-23 | 广东振华科技股份有限公司 | 一种af颗粒膜料自动换料连续蒸发镀膜装置及方法 |
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2008
- 2008-11-14 US US12/271,211 patent/US8062427B2/en active Active
-
2009
- 2009-11-12 WO PCT/US2009/006070 patent/WO2010056319A1/en active Application Filing
- 2009-11-12 KR KR1020117013174A patent/KR101224562B1/ko active IP Right Grant
- 2009-11-12 EP EP09756073.4A patent/EP2350338B1/en active Active
- 2009-11-12 CN CN2009801522453A patent/CN102264941B/zh active Active
- 2009-11-12 JP JP2011536322A patent/JP5221771B2/ja active Active
- 2009-11-13 TW TW098138721A patent/TWI377258B/zh active
Also Published As
Publication number | Publication date |
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US20100122656A1 (en) | 2010-05-20 |
CN102264941A (zh) | 2011-11-30 |
CN102264941B (zh) | 2013-02-20 |
KR20110098733A (ko) | 2011-09-01 |
EP2350338B1 (en) | 2016-02-17 |
WO2010056319A1 (en) | 2010-05-20 |
EP2350338A1 (en) | 2011-08-03 |
TWI377258B (en) | 2012-11-21 |
TW201037093A (en) | 2010-10-16 |
KR101224562B1 (ko) | 2013-01-21 |
US8062427B2 (en) | 2011-11-22 |
JP2012508817A (ja) | 2012-04-12 |
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