KR101224564B1 - 미립자 재료의 계량 및 기화 - Google Patents

미립자 재료의 계량 및 기화 Download PDF

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Publication number
KR101224564B1
KR101224564B1 KR1020117013478A KR20117013478A KR101224564B1 KR 101224564 B1 KR101224564 B1 KR 101224564B1 KR 1020117013478 A KR1020117013478 A KR 1020117013478A KR 20117013478 A KR20117013478 A KR 20117013478A KR 101224564 B1 KR101224564 B1 KR 101224564B1
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South Korea
Prior art keywords
particulate material
metering
rotatable shaft
opening
particulate
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KR1020117013478A
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English (en)
Korean (ko)
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KR20110083745A (ko
Inventor
토마스 윌리엄 폴론
마이클 롱
Original Assignee
글로벌 오엘이디 테크놀러지 엘엘씨
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G65/00Loading or unloading
    • B65G65/30Methods or devices for filling or emptying bunkers, hoppers, tanks, or like containers, of interest apart from their use in particular chemical or physical processes or their application in particular machines, e.g. not covered by a single other subclass
    • B65G65/34Emptying devices
    • B65G65/40Devices for emptying otherwise than from the top
    • B65G65/48Devices for emptying otherwise than from the top using other rotating means, e.g. rotating pressure sluices in pneumatic systems
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • C23C14/246Replenishment of source material
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01FMEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F11/00Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
    • G01F11/10Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation
    • G01F11/12Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements
    • G01F11/20Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements wherein the measuring chamber rotates or oscillates
    • G01F11/24Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements wherein the measuring chamber rotates or oscillates for fluent solid material

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
KR1020117013478A 2008-11-14 2009-11-12 미립자 재료의 계량 및 기화 Active KR101224564B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/271,250 2008-11-14
US12/271,250 US7972443B2 (en) 2008-11-14 2008-11-14 Metering of particulate material and vaporization thereof
PCT/US2009/006082 WO2010056325A1 (en) 2008-11-14 2009-11-12 Metering of particulate material and vaporization thereof

Publications (2)

Publication Number Publication Date
KR20110083745A KR20110083745A (ko) 2011-07-20
KR101224564B1 true KR101224564B1 (ko) 2013-01-21

Family

ID=41479216

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020117013478A Active KR101224564B1 (ko) 2008-11-14 2009-11-12 미립자 재료의 계량 및 기화

Country Status (7)

Country Link
US (1) US7972443B2 (enExample)
EP (1) EP2352857B1 (enExample)
JP (1) JP5221772B2 (enExample)
KR (1) KR101224564B1 (enExample)
CN (1) CN102282289B (enExample)
TW (1) TWI377260B (enExample)
WO (1) WO2010056325A1 (enExample)

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US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US8048230B2 (en) * 2008-11-14 2011-11-01 Global Oled Technology Llc Metering and vaporizing particulate material
US8062427B2 (en) * 2008-11-14 2011-11-22 Global Oled Technology Llc Particulate material metering and vaporization
US7972443B2 (en) * 2008-11-14 2011-07-05 Global Oled Technology Llc Metering of particulate material and vaporization thereof
DE102011051261A1 (de) * 2011-06-22 2012-12-27 Aixtron Se Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu
CN106119781B (zh) * 2016-07-27 2018-10-30 京东方科技集团股份有限公司 蒸发装置、蒸镀设备和蒸镀方法
CN110615295A (zh) * 2018-06-19 2019-12-27 曹荣华 动态供粉装置
CN110715697B (zh) * 2019-09-25 2021-02-09 北京控制工程研究所 一种带有密封结构的适用于微克级流量的流量测量组件
CN111206228A (zh) * 2020-02-28 2020-05-29 苏州泓沵达仪器科技有限公司 高效纳米真空蒸发源
EP4340969A1 (de) 2021-05-21 2024-03-27 Merck Patent GmbH Verfahren zur kontinuierlichen aufreinigung von mindestens einem funktionalen material und vorrichtung zur kontinuierlichen aufreinigung von mindestens einem funktionalen material

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US20070026146A1 (en) * 2005-07-27 2007-02-01 Eastman Kodak Company Vaporizing material at a uniform rate
US20070092645A1 (en) * 2005-10-24 2007-04-26 Eastman Kodak Company Delivering particulate material to a vaporization zone

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US6734142B2 (en) * 2001-04-23 2004-05-11 Monsanto Technology Llc Ammonium glyphosate compositions and process for their preparation
US20070026146A1 (en) * 2005-07-27 2007-02-01 Eastman Kodak Company Vaporizing material at a uniform rate
US20070092645A1 (en) * 2005-10-24 2007-04-26 Eastman Kodak Company Delivering particulate material to a vaporization zone

Also Published As

Publication number Publication date
CN102282289B (zh) 2013-01-09
JP2012508818A (ja) 2012-04-12
WO2010056325A1 (en) 2010-05-20
TWI377260B (en) 2012-11-21
CN102282289A (zh) 2011-12-14
EP2352857B1 (en) 2014-02-12
KR20110083745A (ko) 2011-07-20
JP5221772B2 (ja) 2013-06-26
US7972443B2 (en) 2011-07-05
EP2352857A1 (en) 2011-08-10
TW201037096A (en) 2010-10-16
US20100122658A1 (en) 2010-05-20

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