CN102282289B - 粒料的计量和蒸发 - Google Patents

粒料的计量和蒸发 Download PDF

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Publication number
CN102282289B
CN102282289B CN2009801522519A CN200980152251A CN102282289B CN 102282289 B CN102282289 B CN 102282289B CN 2009801522519 A CN2009801522519 A CN 2009801522519A CN 200980152251 A CN200980152251 A CN 200980152251A CN 102282289 B CN102282289 B CN 102282289B
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CN
China
Prior art keywords
pellet
opening
rotatable spindle
holder
circumferential recess
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Active
Application number
CN2009801522519A
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English (en)
Chinese (zh)
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CN102282289A (zh
Inventor
T·W·帕洛恩
M·龙
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Global OLED Technology LLC
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Global OLED Technology LLC
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Publication date
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Publication of CN102282289A publication Critical patent/CN102282289A/zh
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Publication of CN102282289B publication Critical patent/CN102282289B/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G65/00—Loading or unloading
    • B65G65/30—Methods or devices for filling or emptying bunkers, hoppers, tanks, or like containers, of interest apart from their use in particular chemical or physical processes or their application in particular machines, e.g. not covered by a single other subclass
    • B65G65/34—Emptying devices
    • B65G65/40—Devices for emptying otherwise than from the top
    • B65G65/48—Devices for emptying otherwise than from the top using other rotating means, e.g. rotating pressure sluices in pneumatic systems
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F11/00—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
    • G01F11/10—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation
    • G01F11/12—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements
    • G01F11/20—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements wherein the measuring chamber rotates or oscillates
    • G01F11/24—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements wherein the measuring chamber rotates or oscillates for fluent solid material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
CN2009801522519A 2008-11-14 2009-11-12 粒料的计量和蒸发 Active CN102282289B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US12/271,250 2008-11-14
US12/271,250 US7972443B2 (en) 2008-11-14 2008-11-14 Metering of particulate material and vaporization thereof
PCT/US2009/006082 WO2010056325A1 (en) 2008-11-14 2009-11-12 Metering of particulate material and vaporization thereof

Publications (2)

Publication Number Publication Date
CN102282289A CN102282289A (zh) 2011-12-14
CN102282289B true CN102282289B (zh) 2013-01-09

Family

ID=41479216

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2009801522519A Active CN102282289B (zh) 2008-11-14 2009-11-12 粒料的计量和蒸发

Country Status (7)

Country Link
US (1) US7972443B2 (enExample)
EP (1) EP2352857B1 (enExample)
JP (1) JP5221772B2 (enExample)
KR (1) KR101224564B1 (enExample)
CN (1) CN102282289B (enExample)
TW (1) TWI377260B (enExample)
WO (1) WO2010056325A1 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US8048230B2 (en) * 2008-11-14 2011-11-01 Global Oled Technology Llc Metering and vaporizing particulate material
US8062427B2 (en) * 2008-11-14 2011-11-22 Global Oled Technology Llc Particulate material metering and vaporization
US7972443B2 (en) * 2008-11-14 2011-07-05 Global Oled Technology Llc Metering of particulate material and vaporization thereof
DE102011051261A1 (de) * 2011-06-22 2012-12-27 Aixtron Se Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu
CN106119781B (zh) * 2016-07-27 2018-10-30 京东方科技集团股份有限公司 蒸发装置、蒸镀设备和蒸镀方法
CN110615295A (zh) * 2018-06-19 2019-12-27 曹荣华 动态供粉装置
CN110715697B (zh) * 2019-09-25 2021-02-09 北京控制工程研究所 一种带有密封结构的适用于微克级流量的流量测量组件
CN111206228A (zh) * 2020-02-28 2020-05-29 苏州泓沵达仪器科技有限公司 高效纳米真空蒸发源
EP4340969A1 (de) 2021-05-21 2024-03-27 Merck Patent GmbH Verfahren zur kontinuierlichen aufreinigung von mindestens einem funktionalen material und vorrichtung zur kontinuierlichen aufreinigung von mindestens einem funktionalen material

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US4869292A (en) * 1988-05-09 1989-09-26 Sulwer Michael T Brake bleeder check valve
WO1990015768A1 (de) * 1989-06-14 1990-12-27 Spido Technik Gmbh Entwicklung Dosiervorrichtung für körniges oder pulverförmiges schüttgut
EP0982411A2 (en) * 1998-08-26 2000-03-01 TDK Corporation Evaporation source, apparatus and method for the preparation of organic EL device
CN1646813A (zh) * 2002-04-09 2005-07-27 克特朗技术公司 松散材料进料泵
US20060062919A1 (en) * 2004-09-21 2006-03-23 Eastman Kodak Company Delivering organic powder to a vaporization zone
US20060157322A1 (en) * 2002-04-09 2006-07-20 K-Tron Technologies, Inc. Bulk material pump feeder with reduced disk jamming
US20060177576A1 (en) * 2005-02-04 2006-08-10 Eastman Kodak Company Controllably feeding organic material in making OLEDs
CN101304933A (zh) * 2005-10-12 2008-11-12 克特朗技术公司 盘片堵塞减少的块状材料泵送器、柔性盘片

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US7501151B2 (en) * 2004-09-21 2009-03-10 Eastman Kodak Company Delivering particulate material to a vaporization zone
US7625602B2 (en) * 2005-05-03 2009-12-01 Eastman Kodak Company Controllably feeding powdered or granular material
US7989021B2 (en) * 2005-07-27 2011-08-02 Global Oled Technology Llc Vaporizing material at a uniform rate
US7993459B2 (en) * 2005-10-24 2011-08-09 Global Oled Technology Llc Delivering particulate material to a vaporization zone
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US7883583B2 (en) * 2008-01-08 2011-02-08 Global Oled Technology Llc Vaporization apparatus with precise powder metering
US7972443B2 (en) * 2008-11-14 2011-07-05 Global Oled Technology Llc Metering of particulate material and vaporization thereof
US8062427B2 (en) * 2008-11-14 2011-11-22 Global Oled Technology Llc Particulate material metering and vaporization
US8048230B2 (en) * 2008-11-14 2011-11-01 Global Oled Technology Llc Metering and vaporizing particulate material

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3754529A (en) * 1970-06-08 1973-08-28 Nat Beryllia Corp Apparatus for continuously depositing beryllia through vaporization of a basic formate
US4869292A (en) * 1988-05-09 1989-09-26 Sulwer Michael T Brake bleeder check valve
WO1990015768A1 (de) * 1989-06-14 1990-12-27 Spido Technik Gmbh Entwicklung Dosiervorrichtung für körniges oder pulverförmiges schüttgut
EP0982411A2 (en) * 1998-08-26 2000-03-01 TDK Corporation Evaporation source, apparatus and method for the preparation of organic EL device
CN1646813A (zh) * 2002-04-09 2005-07-27 克特朗技术公司 松散材料进料泵
US20060157322A1 (en) * 2002-04-09 2006-07-20 K-Tron Technologies, Inc. Bulk material pump feeder with reduced disk jamming
CN1826274A (zh) * 2003-07-23 2006-08-30 克特朗技术公司 统装材料的泵给料机
US20060062919A1 (en) * 2004-09-21 2006-03-23 Eastman Kodak Company Delivering organic powder to a vaporization zone
US20060177576A1 (en) * 2005-02-04 2006-08-10 Eastman Kodak Company Controllably feeding organic material in making OLEDs
CN101304933A (zh) * 2005-10-12 2008-11-12 克特朗技术公司 盘片堵塞减少的块状材料泵送器、柔性盘片

Also Published As

Publication number Publication date
JP2012508818A (ja) 2012-04-12
WO2010056325A1 (en) 2010-05-20
TWI377260B (en) 2012-11-21
CN102282289A (zh) 2011-12-14
EP2352857B1 (en) 2014-02-12
KR20110083745A (ko) 2011-07-20
KR101224564B1 (ko) 2013-01-21
JP5221772B2 (ja) 2013-06-26
US7972443B2 (en) 2011-07-05
EP2352857A1 (en) 2011-08-10
TW201037096A (en) 2010-10-16
US20100122658A1 (en) 2010-05-20

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