TWI377260B - Metering of particulate material and vaporization thereof - Google Patents
Metering of particulate material and vaporization thereof Download PDFInfo
- Publication number
- TWI377260B TWI377260B TW098138722A TW98138722A TWI377260B TW I377260 B TWI377260 B TW I377260B TW 098138722 A TW098138722 A TW 098138722A TW 98138722 A TW98138722 A TW 98138722A TW I377260 B TWI377260 B TW I377260B
- Authority
- TW
- Taiwan
- Prior art keywords
- particulate material
- opening
- circumferential groove
- reservoir
- rotatable
- Prior art date
Links
- 239000011236 particulate material Substances 0.000 title claims description 93
- 230000008016 vaporization Effects 0.000 title description 4
- 238000009834 vaporization Methods 0.000 title description 3
- 239000000463 material Substances 0.000 claims description 59
- 238000001704 evaporation Methods 0.000 claims description 43
- 230000008878 coupling Effects 0.000 claims description 15
- 238000010168 coupling process Methods 0.000 claims description 15
- 238000005859 coupling reaction Methods 0.000 claims description 15
- 239000011859 microparticle Substances 0.000 claims description 10
- 238000007599 discharging Methods 0.000 claims description 5
- 230000004044 response Effects 0.000 claims description 2
- 238000007790 scraping Methods 0.000 claims 2
- 230000004520 agglutination Effects 0.000 claims 1
- 230000008020 evaporation Effects 0.000 description 41
- 239000002245 particle Substances 0.000 description 29
- 239000000843 powder Substances 0.000 description 13
- 239000002019 doping agent Substances 0.000 description 8
- 239000011368 organic material Substances 0.000 description 8
- 230000032258 transport Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 238000012546 transfer Methods 0.000 description 5
- 230000009471 action Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 239000012254 powdered material Substances 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- 239000000654 additive Substances 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 238000006731 degradation reaction Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 239000006260 foam Substances 0.000 description 3
- 229910021397 glassy carbon Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000000996 additive effect Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000009969 flowable effect Effects 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 230000002441 reversible effect Effects 0.000 description 2
- 239000004576 sand Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 241000283690 Bos taurus Species 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 241001391944 Commicarpus scandens Species 0.000 description 1
- 102100035353 Cyclin-dependent kinase 2-associated protein 1 Human genes 0.000 description 1
- 241000237858 Gastropoda Species 0.000 description 1
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 239000004990 Smectic liquid crystal Substances 0.000 description 1
- 206010057040 Temperature intolerance Diseases 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 235000013339 cereals Nutrition 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000005243 fluidization Methods 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000008543 heat sensitivity Effects 0.000 description 1
- 230000005525 hole transport Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000011344 liquid material Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000005297 material degradation process Methods 0.000 description 1
- 239000006262 metallic foam Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- NFFIWVVINABMKP-UHFFFAOYSA-N methylidynetantalum Chemical compound [Ta]#C NFFIWVVINABMKP-UHFFFAOYSA-N 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G65/00—Loading or unloading
- B65G65/30—Methods or devices for filling or emptying bunkers, hoppers, tanks, or like containers, of interest apart from their use in particular chemical or physical processes or their application in particular machines, e.g. not covered by a single other subclass
- B65G65/34—Emptying devices
- B65G65/40—Devices for emptying otherwise than from the top
- B65G65/48—Devices for emptying otherwise than from the top using other rotating means, e.g. rotating pressure sluices in pneumatic systems
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F11/00—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it
- G01F11/10—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation
- G01F11/12—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements
- G01F11/20—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements wherein the measuring chamber rotates or oscillates
- G01F11/24—Apparatus requiring external operation adapted at each repeated and identical operation to measure and separate a predetermined volume of fluid or fluent solid material from a supply or container, without regard to weight, and to deliver it with measuring chambers moved during operation of the valve type, i.e. the separating being effected by fluid-tight or powder-tight movements wherein the measuring chamber rotates or oscillates for fluent solid material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- General Physics & Mathematics (AREA)
- Physical Vapour Deposition (AREA)
- Electroluminescent Light Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US12/271,250 US7972443B2 (en) | 2008-11-14 | 2008-11-14 | Metering of particulate material and vaporization thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201037096A TW201037096A (en) | 2010-10-16 |
| TWI377260B true TWI377260B (en) | 2012-11-21 |
Family
ID=41479216
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW098138722A TWI377260B (en) | 2008-11-14 | 2009-11-13 | Metering of particulate material and vaporization thereof |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7972443B2 (enExample) |
| EP (1) | EP2352857B1 (enExample) |
| JP (1) | JP5221772B2 (enExample) |
| KR (1) | KR101224564B1 (enExample) |
| CN (1) | CN102282289B (enExample) |
| TW (1) | TWI377260B (enExample) |
| WO (1) | WO2010056325A1 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7883583B2 (en) * | 2008-01-08 | 2011-02-08 | Global Oled Technology Llc | Vaporization apparatus with precise powder metering |
| US7972443B2 (en) * | 2008-11-14 | 2011-07-05 | Global Oled Technology Llc | Metering of particulate material and vaporization thereof |
| US8062427B2 (en) * | 2008-11-14 | 2011-11-22 | Global Oled Technology Llc | Particulate material metering and vaporization |
| US8048230B2 (en) * | 2008-11-14 | 2011-11-01 | Global Oled Technology Llc | Metering and vaporizing particulate material |
| DE102011051261A1 (de) * | 2011-06-22 | 2012-12-27 | Aixtron Se | Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu |
| CN106119781B (zh) * | 2016-07-27 | 2018-10-30 | 京东方科技集团股份有限公司 | 蒸发装置、蒸镀设备和蒸镀方法 |
| CN110615295A (zh) * | 2018-06-19 | 2019-12-27 | 曹荣华 | 动态供粉装置 |
| CN110715697B (zh) * | 2019-09-25 | 2021-02-09 | 北京控制工程研究所 | 一种带有密封结构的适用于微克级流量的流量测量组件 |
| CN111206228A (zh) * | 2020-02-28 | 2020-05-29 | 苏州泓沵达仪器科技有限公司 | 高效纳米真空蒸发源 |
| WO2022243403A1 (de) | 2021-05-21 | 2022-11-24 | Merck Patent Gmbh | Verfahren zur kontinuierlichen aufreinigung von mindestens einem funktionalen material und vorrichtung zur kontinuierlichen aufreinigung von mindestens einem funktionalen material |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2191255A (en) * | 1934-11-16 | 1940-02-20 | Extractol Process Ltd | Process in continuous extraction systems of continuously removing from solvent-treated materials, solvents of lower specific gravity |
| US2233109A (en) * | 1936-10-01 | 1941-02-25 | Prest O Lite Co Inc | Apparatus for producing gas and a dry residue by the reaction of a solid and a liquid |
| US2241425A (en) * | 1936-12-21 | 1941-05-13 | Universal Royalty And Dev Comp | Apparatus for vaporizing and spraying thick liquids |
| US2190592A (en) * | 1937-12-04 | 1940-02-13 | Clayton Benjamin | Process of and apparatus for producing soap of desired moisture content |
| US2392764A (en) * | 1940-09-14 | 1946-01-08 | Standard Oil Dev Co | Handling pulverulent materials |
| US2743158A (en) * | 1944-05-26 | 1956-04-24 | Albert D Webb | Process for producing uranium pentachloride |
| US2447789A (en) | 1945-03-23 | 1948-08-24 | Polaroid Corp | Evaporating crucible for coating apparatus |
| US2665168A (en) * | 1948-04-19 | 1954-01-05 | Clellan Ross Pleasants | Atmospheric conditioning method and apparatus |
| US2771836A (en) * | 1951-03-31 | 1956-11-27 | Lawrence C Denehie | Corn popping machine |
| US3754529A (en) * | 1970-06-08 | 1973-08-28 | Nat Beryllia Corp | Apparatus for continuously depositing beryllia through vaporization of a basic formate |
| US4517316A (en) * | 1984-01-24 | 1985-05-14 | Dasurat Enterprises Pte Ltd. | Porous irrigation pipe prepared from particulate elastomer and thermoplastic binder containing controlled moisture content |
| US4532272A (en) * | 1984-06-28 | 1985-07-30 | Phillips Petroleum Company | Creation and maintenance of the bed of a particle form evaporator |
| US4885211A (en) | 1987-02-11 | 1989-12-05 | Eastman Kodak Company | Electroluminescent device with improved cathode |
| US4769292A (en) | 1987-03-02 | 1988-09-06 | Eastman Kodak Company | Electroluminescent device with modified thin film luminescent zone |
| US4869292A (en) * | 1988-05-09 | 1989-09-26 | Sulwer Michael T | Brake bleeder check valve |
| WO1990015768A1 (de) | 1989-06-14 | 1990-12-27 | Spido Technik Gmbh Entwicklung | Dosiervorrichtung für körniges oder pulverförmiges schüttgut |
| US5090498A (en) * | 1989-11-10 | 1992-02-25 | M-I Drilling Fluids Company | Water wash/oil wash cyclonic column tank separation system |
| US5709827A (en) * | 1992-08-11 | 1998-01-20 | E. Khashoggi Industries | Methods for manufacturing articles having a starch-bound cellular matrix |
| US6383301B1 (en) * | 1998-08-04 | 2002-05-07 | E. I. Du Pont De Nemours And Company | Treatment of deagglomerated particles with plasma-activated species |
| US6685762B1 (en) * | 1998-08-26 | 2004-02-03 | Superior Micropowders Llc | Aerosol method and apparatus for making particulate products |
| JP2000068055A (ja) | 1998-08-26 | 2000-03-03 | Tdk Corp | 有機ｅｌ素子用蒸発源、この有機ｅｌ素子用蒸発源を用いた有機ｅｌ素子の製造装置および製造方法 |
| IT1310745B1 (it) * | 1999-11-26 | 2002-02-22 | Lawer Spa | Dispositivo per l'erogazione dosata di prodotti scorrevoli. |
| US6734142B2 (en) * | 2001-04-23 | 2004-05-11 | Monsanto Technology Llc | Ammonium glyphosate compositions and process for their preparation |
| JP2003193218A (ja) * | 2001-12-27 | 2003-07-09 | Shin Meiwa Ind Co Ltd | 蒸発材料フィーダ装置 |
| US7044288B2 (en) | 2002-04-09 | 2006-05-16 | K-Tron Technologies, Inc. | Bulk material pump feeder with reduced disk jamming |
| US6832887B2 (en) * | 2002-04-09 | 2004-12-21 | K-Tron Technologies, Inc. | Bulk material pump feeder |
| EP2172107A2 (en) * | 2002-08-31 | 2010-04-07 | Monsanto Technology LLC | Process for the preparation of a dry pesticidal composition containing a dicarboxylate component |
| US7501152B2 (en) * | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
| US7288286B2 (en) * | 2004-09-21 | 2007-10-30 | Eastman Kodak Company | Delivering organic powder to a vaporization zone |
| US7288285B2 (en) * | 2004-09-21 | 2007-10-30 | Eastman Kodak Company | Delivering organic powder to a vaporization zone |
| US7501151B2 (en) * | 2004-09-21 | 2009-03-10 | Eastman Kodak Company | Delivering particulate material to a vaporization zone |
| US7625601B2 (en) * | 2005-02-04 | 2009-12-01 | Eastman Kodak Company | Controllably feeding organic material in making OLEDs |
| US7625602B2 (en) * | 2005-05-03 | 2009-12-01 | Eastman Kodak Company | Controllably feeding powdered or granular material |
| US7989021B2 (en) * | 2005-07-27 | 2011-08-02 | Global Oled Technology Llc | Vaporizing material at a uniform rate |
| JP5478067B2 (ja) * | 2005-10-12 | 2014-04-23 | ケイ−トロン・テクノロジーズ・インコーポレイテッド | ディスクジャムを減じたバルク材ポンプフィーダ、弾性ディスク |
| US7993459B2 (en) * | 2005-10-24 | 2011-08-09 | Global Oled Technology Llc | Delivering particulate material to a vaporization zone |
| US7638168B2 (en) * | 2005-11-10 | 2009-12-29 | Eastman Kodak Company | Deposition system using sealed replenishment container |
| US20090081365A1 (en) * | 2007-09-20 | 2009-03-26 | Cok Ronald S | Deposition apparatus for temperature sensitive materials |
| US7883583B2 (en) * | 2008-01-08 | 2011-02-08 | Global Oled Technology Llc | Vaporization apparatus with precise powder metering |
| US7972443B2 (en) * | 2008-11-14 | 2011-07-05 | Global Oled Technology Llc | Metering of particulate material and vaporization thereof |
| US8062427B2 (en) * | 2008-11-14 | 2011-11-22 | Global Oled Technology Llc | Particulate material metering and vaporization |
| US8048230B2 (en) * | 2008-11-14 | 2011-11-01 | Global Oled Technology Llc | Metering and vaporizing particulate material |
-
2008
- 2008-11-14 US US12/271,250 patent/US7972443B2/en active Active
-
2009
- 2009-11-12 CN CN2009801522519A patent/CN102282289B/zh active Active
- 2009-11-12 EP EP09756588.1A patent/EP2352857B1/en active Active
- 2009-11-12 KR KR1020117013478A patent/KR101224564B1/ko active Active
- 2009-11-12 JP JP2011536324A patent/JP5221772B2/ja active Active
- 2009-11-12 WO PCT/US2009/006082 patent/WO2010056325A1/en not_active Ceased
- 2009-11-13 TW TW098138722A patent/TWI377260B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| WO2010056325A1 (en) | 2010-05-20 |
| JP2012508818A (ja) | 2012-04-12 |
| KR20110083745A (ko) | 2011-07-20 |
| TW201037096A (en) | 2010-10-16 |
| US7972443B2 (en) | 2011-07-05 |
| EP2352857B1 (en) | 2014-02-12 |
| US20100122658A1 (en) | 2010-05-20 |
| CN102282289B (zh) | 2013-01-09 |
| KR101224564B1 (ko) | 2013-01-21 |
| EP2352857A1 (en) | 2011-08-10 |
| JP5221772B2 (ja) | 2013-06-26 |
| CN102282289A (zh) | 2011-12-14 |
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