JP5220121B2 - レーザー加工装置 - Google Patents
レーザー加工装置 Download PDFInfo
- Publication number
- JP5220121B2 JP5220121B2 JP2010533971A JP2010533971A JP5220121B2 JP 5220121 B2 JP5220121 B2 JP 5220121B2 JP 2010533971 A JP2010533971 A JP 2010533971A JP 2010533971 A JP2010533971 A JP 2010533971A JP 5220121 B2 JP5220121 B2 JP 5220121B2
- Authority
- JP
- Japan
- Prior art keywords
- sensor
- laser beam
- detection signal
- outputs
- time
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000012545 processing Methods 0.000 title claims description 25
- 238000001514 detection method Methods 0.000 claims description 68
- 238000000034 method Methods 0.000 claims description 31
- 230000003287 optical effect Effects 0.000 claims description 31
- 230000010355 oscillation Effects 0.000 claims description 20
- 238000013459 approach Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000005224 laser annealing Methods 0.000 description 9
- 239000000758 substrate Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 5
- 210000004209 hair Anatomy 0.000 description 4
- 241001270131 Agaricus moelleri Species 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 238000012937 correction Methods 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/04—Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
- B23K26/042—Automatically aligning the laser beam
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Mechanical Engineering (AREA)
- Lasers (AREA)
- Recrystallisation Techniques (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020070117781A KR100939043B1 (ko) | 2007-11-19 | 2007-11-19 | 레이저 가공장치 |
KR10-2007-0117781 | 2007-11-19 | ||
PCT/KR2008/006783 WO2009066918A2 (en) | 2007-11-19 | 2008-11-18 | Laser processing equipment |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2011505252A JP2011505252A (ja) | 2011-02-24 |
JP5220121B2 true JP5220121B2 (ja) | 2013-06-26 |
Family
ID=40667978
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2010533971A Expired - Fee Related JP5220121B2 (ja) | 2007-11-19 | 2008-11-18 | レーザー加工装置 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5220121B2 (ko) |
KR (1) | KR100939043B1 (ko) |
CN (1) | CN101868887B (ko) |
TW (1) | TWI352002B (ko) |
WO (1) | WO2009066918A2 (ko) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2403172B1 (es) * | 2011-09-22 | 2014-12-12 | Jeanología, S.L. | Método y sistema de ajuste de la alineación de un haz fotónico |
JP6261844B2 (ja) * | 2012-02-20 | 2018-01-17 | 株式会社ディスコ | レーザー加工方法およびレーザー加工装置 |
CN104563976B (zh) * | 2013-10-11 | 2018-04-27 | 中国石油化工股份有限公司 | 激光射孔系统以及激光射孔方法 |
EP3642664A1 (de) * | 2017-06-23 | 2020-04-29 | JENOPTIK Optical Systems GmbH | Verfahren zur unterstützung einer justage eines strahlaufweiters, justageunterstützungsvorrichtung und strahlaufweiter |
EP4056948B1 (en) | 2018-10-26 | 2024-07-03 | Concept Laser GmbH | Determination device for determining an alignment or a misalignment of an energy beam |
KR102688603B1 (ko) | 2019-07-30 | 2024-07-25 | 삼성디스플레이 주식회사 | 레이저 결정화 장치 및 이를 이용한 폴리실리콘층을 갖는 기판 제조방법 |
JP7535687B2 (ja) * | 2020-01-15 | 2024-08-19 | パナソニックIpマネジメント株式会社 | レーザ装置及びそれを用いたレーザ加工装置 |
CN114505578A (zh) * | 2020-11-17 | 2022-05-17 | 大族激光科技产业集团股份有限公司 | 飞行光路的调试方法及装置 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5215107Y2 (ko) * | 1973-09-26 | 1977-04-05 | ||
JPS60130935A (ja) * | 1983-12-19 | 1985-07-12 | Mitsubishi Electric Corp | レ−ザビ−ム伝送装置 |
US4879448A (en) * | 1988-10-24 | 1989-11-07 | Storage Technology Corporation | Apparatus for laser welding and annealing |
US5103082A (en) | 1990-07-12 | 1992-04-07 | Grumman Aerospace Corporation | Automatic laser beam expander-pinhole alignment system |
JPH0780671A (ja) * | 1993-09-16 | 1995-03-28 | Sanyo Mach Works Ltd | レーザ加工機のビーム異常検知方法及び装置 |
JPH09271971A (ja) * | 1996-04-02 | 1997-10-21 | Shinozaki Seisakusho:Kk | レーザ加工装置 |
JP3052928B2 (ja) | 1998-04-01 | 2000-06-19 | 日本電気株式会社 | レーザ加工装置 |
JP2001284281A (ja) * | 2000-03-30 | 2001-10-12 | Sumitomo Heavy Ind Ltd | レーザ加工装置及び方法 |
US7115503B2 (en) | 2000-10-10 | 2006-10-03 | The Trustees Of Columbia University In The City Of New York | Method and apparatus for processing thin metal layers |
JP3903761B2 (ja) | 2001-10-10 | 2007-04-11 | 株式会社日立製作所 | レ−ザアニ−ル方法およびレ−ザアニ−ル装置 |
US7321114B2 (en) * | 2005-03-10 | 2008-01-22 | Hitachi Via Mechanics, Ltd. | Apparatus and method for beam drift compensation |
-
2007
- 2007-11-19 KR KR1020070117781A patent/KR100939043B1/ko active IP Right Grant
-
2008
- 2008-11-18 JP JP2010533971A patent/JP5220121B2/ja not_active Expired - Fee Related
- 2008-11-18 WO PCT/KR2008/006783 patent/WO2009066918A2/en active Application Filing
- 2008-11-18 CN CN2008801167230A patent/CN101868887B/zh not_active Expired - Fee Related
- 2008-11-19 TW TW097144747A patent/TWI352002B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
CN101868887B (zh) | 2012-10-10 |
JP2011505252A (ja) | 2011-02-24 |
WO2009066918A3 (en) | 2009-09-03 |
WO2009066918A2 (en) | 2009-05-28 |
TWI352002B (en) | 2011-11-11 |
TW200930489A (en) | 2009-07-16 |
KR20090051405A (ko) | 2009-05-22 |
KR100939043B1 (ko) | 2010-01-27 |
CN101868887A (zh) | 2010-10-20 |
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