JP5205234B2 - 微小試料採取装置，検査解析システム、および検査解析方法 - Google Patents

微小試料採取装置，検査解析システム、および検査解析方法 Download PDF

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JP5205234B2
JP5205234B2 JP2008306951A JP2008306951A JP5205234B2 JP 5205234 B2 JP5205234 B2 JP 5205234B2 JP 2008306951 A JP2008306951 A JP 2008306951A JP 2008306951 A JP2008306951 A JP 2008306951A JP 5205234 B2 JP5205234 B2 JP 5205234B2
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microscope
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micro sample
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JP2010133710A5 (enExample
JP2010133710A (ja
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馨 梅村
聡 富松
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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JP2008306951A 2008-12-02 2008-12-02 微小試料採取装置，検査解析システム、および検査解析方法 Active JP5205234B2 (ja)

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JP2010133710A5 JP2010133710A5 (enExample) 2011-05-06
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105784437A (zh) * 2015-01-12 2016-07-20 Fei 公司 从显微样品修改样品表面层的方法

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JP5707082B2 (ja) * 2010-10-08 2015-04-22 株式会社日立ハイテクノロジーズ 液体の表面を浮遊する試料の走査電子顕微鏡観察方法
JP2012098229A (ja) * 2010-11-05 2012-05-24 Hitachi Ltd サンプリング装置
JP5723801B2 (ja) * 2012-02-06 2015-05-27 株式会社日立ハイテクノロジーズ 荷電粒子線装置および配線方法
KR101402973B1 (ko) 2012-12-10 2014-06-03 김용균 미세 시료용 프로브 고정홀더 및 이를 구비한 미세 시료 채취 장치
US9821486B2 (en) * 2013-10-30 2017-11-21 Fei Company Integrated lamellae extraction station
WO2021130992A1 (ja) * 2019-12-26 2021-07-01 株式会社日立ハイテク 解析システム、ラメラの検査方法および荷電粒子線装置
WO2022178903A1 (zh) * 2021-02-28 2022-09-01 浙江大学 一种制造微装置的方法和装置

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JPH06122869A (ja) * 1991-06-28 1994-05-06 Texas Instr Inc <Ti> 微細蝕刻における測定のための帯電防止溶液
JP4069545B2 (ja) * 1999-05-19 2008-04-02 株式会社日立製作所 電子顕微方法及びそれを用いた電子顕微鏡並び生体試料検査方法及び生体検査装置
JP2001074621A (ja) * 1999-09-08 2001-03-23 Toshiba Microelectronics Corp 電子顕微鏡用試料の作製方法
JP3850182B2 (ja) * 1999-09-09 2006-11-29 日本電子株式会社 荷電粒子線装置
JP2001147208A (ja) * 1999-11-22 2001-05-29 Canon Inc 試料ホルダおよび分析装置
JP2002150983A (ja) * 2000-11-09 2002-05-24 Jeol Ltd マニピュレータ
IL156027A0 (en) * 2000-12-01 2003-12-23 El Mul Technologies Ltd Device and method for the examination of samples in a non-vacuum environment using a scanning electron microscope
JP3727532B2 (ja) * 2000-12-26 2005-12-14 シャープ株式会社 薄片試料処理装置及び薄片試料処理方法
JP2003194681A (ja) * 2001-12-26 2003-07-09 Toshiba Microelectronics Corp Ｔｅｍ試料作製方法
JP2006030017A (ja) * 2004-07-16 2006-02-02 Sii Nanotechnology Inc プローブ及び微小サンプルピックアップ機構
JP4413746B2 (ja) * 2004-10-28 2010-02-10 株式会社日立ハイテクノロジーズ 荷電粒子ビーム装置
JP2007165283A (ja) * 2005-12-09 2007-06-28 Lee Bing Huan 電子顕微鏡用の超薄液体制御板及び電子顕微鏡用の超薄液体制御板とボックスとの組合せ
EP1978355B1 (en) * 2006-01-20 2016-07-27 Hitachi High-Technologies Corporation Method of observing sample using a liquid medium for preventing charge-up in an electron microscope
EP2130086A4 (en) * 2007-03-02 2012-03-14 Protochips Inc MEMBRANE SUPPORTS WITH REINFORCING FUNCTIONS
JP4834704B2 (ja) * 2008-09-01 2011-12-14 株式会社日立製作所 試料作製方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105784437A (zh) * 2015-01-12 2016-07-20 Fei 公司 从显微样品修改样品表面层的方法
CN105784437B (zh) * 2015-01-12 2018-08-28 Fei 公司 从显微样品修改样品表面层的方法
US10105734B2 (en) 2015-01-12 2018-10-23 Fei Company Method of modifying a sample surface layer from a microscopic sample

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