JP5199068B2 - 光学エレメント調整組立体 - Google Patents

光学エレメント調整組立体 Download PDF

Info

Publication number
JP5199068B2
JP5199068B2 JP2008510485A JP2008510485A JP5199068B2 JP 5199068 B2 JP5199068 B2 JP 5199068B2 JP 2008510485 A JP2008510485 A JP 2008510485A JP 2008510485 A JP2008510485 A JP 2008510485A JP 5199068 B2 JP5199068 B2 JP 5199068B2
Authority
JP
Japan
Prior art keywords
optical element
elastic
elastic means
mount
assembly according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2008510485A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008541160A5 (enExample
JP2008541160A (ja
Inventor
シェパハ，アルミン
シュタインバハ，マンフレト
シュレッテラー，トーマス
ロペツ−レアル，エルネスト
Original Assignee
カール・ツァイス・エスエムティー・ゲーエムベーハー
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by カール・ツァイス・エスエムティー・ゲーエムベーハー filed Critical カール・ツァイス・エスエムティー・ゲーエムベーハー
Publication of JP2008541160A publication Critical patent/JP2008541160A/ja
Publication of JP2008541160A5 publication Critical patent/JP2008541160A5/ja
Application granted granted Critical
Publication of JP5199068B2 publication Critical patent/JP5199068B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/003—Alignment of optical elements
    • G02B7/005—Motorised alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
    • G02B7/023—Mountings, adjusting means, or light-tight connections, for optical elements for lenses permitting adjustment
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lens Barrels (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2008510485A 2005-05-09 2006-05-09 光学エレメント調整組立体 Expired - Fee Related JP5199068B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US67968705P 2005-05-09 2005-05-09
US60/679,687 2005-05-09
PCT/EP2006/004337 WO2006119970A2 (en) 2005-05-09 2006-05-09 Assembly for adjusting an optical element

Publications (3)

Publication Number Publication Date
JP2008541160A JP2008541160A (ja) 2008-11-20
JP2008541160A5 JP2008541160A5 (enExample) 2009-06-25
JP5199068B2 true JP5199068B2 (ja) 2013-05-15

Family

ID=36649826

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008510485A Expired - Fee Related JP5199068B2 (ja) 2005-05-09 2006-05-09 光学エレメント調整組立体

Country Status (3)

Country Link
US (1) US20090207511A1 (enExample)
JP (1) JP5199068B2 (enExample)
WO (1) WO2006119970A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI870022B (zh) * 2022-09-20 2025-01-11 德商卡爾蔡司Ｓｍｔ有限公司 雙腳架、光學系統及投影曝光設備

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007014155A1 (de) 2007-03-20 2008-09-25 Jenoptik Laser, Optik, Systeme Gmbh Optikfassung und optisches Bauelement mit einer derartigen Optikfassung
WO2008122313A1 (en) * 2007-04-05 2008-10-16 Carl Zeiss Smt Ag Optical element module with imaging error and position correction
DE102007045975A1 (de) * 2007-09-25 2009-04-09 Carl Zeiss Smt Ag Optische Einrichtung mit einstellbarer Kraftwirkung auf ein optisches Modul
NL1036701A1 (nl) 2008-04-15 2009-10-19 Asml Holding Nv Apparatus for supporting an optical element, and method of making same.
DE102008029161B3 (de) * 2008-06-19 2009-10-08 Jenoptik Laser, Optik, Systeme Gmbh Lateral verstellbare optische Fassung mit Kniehebelmanipulatoreinheiten
DE102008032853A1 (de) 2008-07-14 2010-01-21 Carl Zeiss Smt Ag Optische Einrichtung mit einem deformierbaren optischen Element
DE102009044957A1 (de) 2008-09-30 2010-04-08 Carl Zeiss Smt Ag Stützelemente für ein optisches Element
DE102008063223B3 (de) 2008-12-23 2010-09-09 Jenoptik Laser, Optik, Systeme Gmbh Monolithische optische Fassung
WO2010098474A1 (ja) * 2009-02-27 2010-09-02 株式会社 ニコン 光学素子保持装置、光学系、露光装置、デバイスの製造方法及び光学素子の交換方法
DE102009031690A1 (de) * 2009-06-26 2010-09-23 Carl Zeiss Laser Optics Gmbh Optische Anordnung
DE102009037133B4 (de) 2009-07-31 2013-01-31 Carl Zeiss Laser Optics Gmbh Haltevorrichtung für ein optisches Element
DE102009037135B4 (de) * 2009-07-31 2013-07-04 Carl Zeiss Laser Optics Gmbh Haltevorrichtung für ein optisches Element
DE102009045163B4 (de) 2009-09-30 2017-04-06 Carl Zeiss Smt Gmbh Optische Anordnung in einer mikrolithographischen Projektionsbelichtungsanlage
US8591048B2 (en) * 2009-10-30 2013-11-26 Flir Systems, Inc. Spatially efficient kinematic mirror mount
TWI542952B (zh) 2010-12-02 2016-07-21 Asml控股公司 圖案化裝置支撐件
WO2012084675A1 (en) 2010-12-20 2012-06-28 Carl Zeiss Smt Gmbh Arrangement for mounting an optical element
DE102012025493A1 (de) 2012-12-21 2014-06-26 Manfred Steinbach Präzisionshalterung
CN105283789A (zh) * 2013-02-13 2016-01-27 齐戈股份有限公司 具有集成弯曲部的整体式光学部件
GB2513927A (en) * 2013-05-10 2014-11-12 Zeiss Carl Smt Gmbh Optical element arrangement with an optical element split into optical sub-elements
CN112068277B (zh) * 2020-08-31 2021-08-20 中国科学院长春光学精密机械与物理研究所 大口径光学透镜的多级柔性支撑结构
DE102020212927A1 (de) * 2020-10-14 2022-04-14 Carl Zeiss Smt Gmbh Abstützung eines optischen elements
CN113341532B (zh) * 2021-06-30 2022-05-17 中国科学院长春光学精密机械与物理研究所 高精度、高稳定性、紧凑的望远镜三镜俯仰调整机构
CN115421271B (zh) * 2022-10-01 2025-05-23 昆明理工大学 一种透镜柔性支撑结构

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5214529A (en) * 1992-05-29 1993-05-25 Eastman Kodak Company Assembly for static and dynamic positional control of an optical element
DE19825716A1 (de) * 1998-06-09 1999-12-16 Zeiss Carl Fa Baugruppe aus optischem Element und Fassung
US6220717B1 (en) * 2000-06-06 2001-04-24 Anthony Pastore Mirror for use with elevated hunter stand
JP4770090B2 (ja) * 2000-08-18 2011-09-07 株式会社ニコン 光学素子保持装置、鏡筒及び露光装置並びにマイクロデバイスの製造方法
ATE352052T1 (de) * 2000-08-18 2007-02-15 Nikon Corp Haltevorrichtung für optisches element
DE10140608A1 (de) * 2001-08-18 2003-03-06 Zeiss Carl Vorrichtung zur Justage eines optischen Elements
US20030234918A1 (en) * 2002-06-20 2003-12-25 Nikon Corporation Adjustable soft mounts in kinematic lens mounting system
JP3805323B2 (ja) * 2003-05-21 2006-08-02 キヤノン株式会社 露光装置、収差低減方法及び光学部材調整機構

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI870022B (zh) * 2022-09-20 2025-01-11 德商卡爾蔡司Ｓｍｔ有限公司 雙腳架、光學系統及投影曝光設備

Also Published As

Publication number Publication date
US20090207511A1 (en) 2009-08-20
WO2006119970A2 (en) 2006-11-16
JP2008541160A (ja) 2008-11-20
WO2006119970A3 (en) 2007-01-04

Similar Documents

Publication Publication Date Title
JP5199068B2 (ja) 光学エレメント調整組立体
JP4361269B2 (ja) リゾグラフィック投影システムにおける変形可能な鏡を成形するための空気圧式制御システムおよび方法
JP4809987B2 (ja) 光学要素の支持構造、それを用いた露光装置及び半導体デバイスの製造方法
US6859337B2 (en) Optical-element mountings exhibiting reduced deformation of optical elements held thereby
US8760777B2 (en) Positioning unit and apparatus for adjustment of an optical element
US8199315B2 (en) Projection objective for semiconductor lithography
US7859641B2 (en) Optical element module
JP2000195788A (ja) 光学システム、特にマイクロリソグラフィ―に用いられる投影照明ユニット
JP2010002904A (ja) 屈曲レバーマニピュレーターユニットを備えた横に調整可能な光学マウント
CN108369386B (zh) 调校组件的装置
JP5128665B2 (ja) 寄生負荷最小化光学素子モジュール
US8134790B2 (en) Optical mounting and optical component comprising said type of optical mounting
WO2008122313A1 (en) Optical element module with imaging error and position correction
JP5243957B2 (ja) 液浸リソグラフィー用オブジェクティブ
US20250059959A1 (en) Actuator assembly
JP5848470B2 (ja) 寄生負荷最小化光学素子モジュール
JP2006078873A (ja) 光軸調整装置
TW202542581A (zh) 用於保持光學元件的裝置、保持設備、佈置、系統和方法；以及微影系統
JP6240142B2 (ja) 寄生負荷最小化光学素子モジュール
JP2005175146A (ja) 露光装置
JP2002350917A (ja) 像ぶれ補正レンズ
CN111665603A (zh) 利用薄片实现运动隔离的光机调节机构
JPH083755B2 (ja) 微細位置決め装置
JP2013080933A (ja) 寄生負荷最小化光学素子モジュール

Legal Events

Date Code Title Description
RD03 Notification of appointment of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7423

Effective date: 20090107

RD04 Notification of resignation of power of attorney

Free format text: JAPANESE INTERMEDIATE CODE: A7424

Effective date: 20090108

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090507

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20090507

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110823

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20111124

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20111201

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120222

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120508

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20120807

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20120814

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120910

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130115

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130207

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20160215

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 5199068

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

LAPS Cancellation because of no payment of annual fees