JP5175009B2 - 電子基材の製造におけるひずみ抑制方法、ラミネート式基材及びマイクロチップ用基材 - Google Patents
電子基材の製造におけるひずみ抑制方法、ラミネート式基材及びマイクロチップ用基材 Download PDFInfo
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- JP5175009B2 JP5175009B2 JP52141498A JP52141498A JP5175009B2 JP 5175009 B2 JP5175009 B2 JP 5175009B2 JP 52141498 A JP52141498 A JP 52141498A JP 52141498 A JP52141498 A JP 52141498A JP 5175009 B2 JP5175009 B2 JP 5175009B2
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- chip
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- thermal expansion
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- package
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4688—Composite multilayer circuits, i.e. comprising insulating layers having different properties
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
- H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
- H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
- H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49822—Multilayer substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
- H01L23/49894—Materials of the insulating layers or coatings
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0271—Arrangements for reducing stress or warp in rigid printed circuit boards, e.g. caused by loads, vibrations or differences in thermal expansion
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/0102—Calcium [Ca]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01025—Manganese [Mn]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01057—Lanthanum [La]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01078—Platinum [Pt]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01079—Gold [Au]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01087—Francium [Fr]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15151—Shape the die mounting substrate comprising an aperture, e.g. for underfilling, outgassing, window type wire connections
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0296—Conductive pattern lay-out details not covered by sub groups H05K1/02 - H05K1/0295
- H05K1/0298—Multilayer circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/18—Printed circuits structurally associated with non-printed electric components
- H05K1/182—Printed circuits structurally associated with non-printed electric components associated with components mounted in the printed circuit board, e.g. insert mounted components [IMC]
- H05K1/185—Components encapsulated in the insulating substrate of the printed circuit or incorporated in internal layers of a multilayer circuit
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0352—Differences between the conductors of different layers of a multilayer
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/06—Thermal details
- H05K2201/068—Thermal details wherein the coefficient of thermal expansion is important
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4673—Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
- H05K3/4676—Single layer compositions
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1089—Methods of surface bonding and/or assembly therefor of discrete laminae to single face of additional lamina
- Y10T156/1092—All laminae planar and face to face
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
- Y10T428/2495—Thickness [relative or absolute]
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Wire Bonding (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/745,972 | 1996-11-08 | ||
| US08/745,972 US5888631A (en) | 1996-11-08 | 1996-11-08 | Method for minimizing warp in the production of electronic assemblies |
| PCT/US1997/018638 WO1998020555A1 (en) | 1996-11-08 | 1997-10-17 | Method for minimizing warp in the production of electronic assemblies |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000505245A JP2000505245A (ja) | 2000-04-25 |
| JP2000505245A5 JP2000505245A5 (enExample) | 2005-06-16 |
| JP5175009B2 true JP5175009B2 (ja) | 2013-04-03 |
Family
ID=24999006
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP52141498A Expired - Lifetime JP5175009B2 (ja) | 1996-11-08 | 1997-10-17 | 電子基材の製造におけるひずみ抑制方法、ラミネート式基材及びマイクロチップ用基材 |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US5888631A (enExample) |
| JP (1) | JP5175009B2 (enExample) |
| AU (1) | AU4904497A (enExample) |
| WO (1) | WO1998020555A1 (enExample) |
Families Citing this family (46)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5778523A (en) * | 1996-11-08 | 1998-07-14 | W. L. Gore & Associates, Inc. | Method for controlling warp of electronic assemblies by use of package stiffener |
| JP2001525120A (ja) * | 1996-11-08 | 2001-12-04 | ダブリュ.エル.ゴア アンド アソシエイツ,インコーポレイティド | ブラインドおよびスルーの両マイクロ―ヴァイアの入口の品質を向上するために吸光コーティングを用いる方法 |
| US5945732A (en) * | 1997-03-12 | 1999-08-31 | Staktek Corporation | Apparatus and method of manufacturing a warp resistant thermally conductive integrated circuit package |
| JP2000216550A (ja) * | 1999-01-25 | 2000-08-04 | Oki Electric Ind Co Ltd | 積層プリント配線基板 |
| JP3619395B2 (ja) * | 1999-07-30 | 2005-02-09 | 京セラ株式会社 | 半導体素子内蔵配線基板およびその製造方法 |
| US6497943B1 (en) | 2000-02-14 | 2002-12-24 | International Business Machines Corporation | Surface metal balancing to reduce chip carrier flexing |
| JP3633435B2 (ja) * | 2000-04-10 | 2005-03-30 | 株式会社村田製作所 | 多層セラミック基板、その製造方法および設計方法、ならびに電子装置 |
| US6399892B1 (en) * | 2000-09-19 | 2002-06-04 | International Business Machines Corporation | CTE compensated chip interposer |
| AUPR336701A0 (en) * | 2001-02-27 | 2001-03-22 | Zurhaar, Armand | Bullet resistant glass panel |
| US7300690B2 (en) | 2001-03-29 | 2007-11-27 | General Electric Company | Radial tilt reduced media |
| DE60220405T2 (de) * | 2001-06-04 | 2008-01-31 | Polymer Group, Inc. | Dreidimensionales vliesstoffsubstrat für leiterplatte |
| US6847527B2 (en) * | 2001-08-24 | 2005-01-25 | 3M Innovative Properties Company | Interconnect module with reduced power distribution impedance |
| US6716505B2 (en) | 2001-08-31 | 2004-04-06 | General Electric Company | Storage medium for data with improved dimensional stability |
| US6992379B2 (en) * | 2001-09-05 | 2006-01-31 | International Business Machines Corporation | Electronic package having a thermal stretching layer |
| US6977436B2 (en) * | 2002-02-14 | 2005-12-20 | Macronix International Co. Ltd. | Semiconductor packaging device |
| US7199304B2 (en) * | 2002-09-04 | 2007-04-03 | Intel Corporation | Configurable microelectronic package using electrically conductive material |
| US20040104463A1 (en) * | 2002-09-27 | 2004-06-03 | Gorrell Robin E. | Crack resistant interconnect module |
| US7495887B2 (en) * | 2004-12-21 | 2009-02-24 | E.I. Du Pont De Nemours And Company | Capacitive devices, organic dielectric laminates, and printed wiring boards incorporating such devices, and methods of making thereof |
| US20060270106A1 (en) * | 2005-05-31 | 2006-11-30 | Tz-Cheng Chiu | System and method for polymer encapsulated solder lid attach |
| US7621041B2 (en) * | 2005-07-11 | 2009-11-24 | E. I. Du Pont De Nemours And Company | Methods for forming multilayer structures |
| US7485968B2 (en) | 2005-08-11 | 2009-02-03 | Ziptronix, Inc. | 3D IC method and device |
| JP4962228B2 (ja) * | 2006-12-26 | 2012-06-27 | 株式会社ジェイテクト | 多層回路基板およびモータ駆動回路基板 |
| JP5367523B2 (ja) * | 2009-09-25 | 2013-12-11 | 新光電気工業株式会社 | 配線基板及び配線基板の製造方法 |
| US8574965B2 (en) * | 2010-10-22 | 2013-11-05 | Ati Technologies Ulc | Semiconductor chip device with liquid thermal interface material |
| US20130251967A1 (en) * | 2012-03-22 | 2013-09-26 | Nvidia Corporation | System, method, and computer program product for controlling warping of a substrate |
| KR102172314B1 (ko) * | 2013-11-12 | 2020-10-30 | 삼성전자주식회사 | 반도체 장치 |
| TWI666749B (zh) * | 2014-02-19 | 2019-07-21 | Siliconware Precision Industries Co., Ltd. | 封裝基板及封裝結構 |
| KR102250997B1 (ko) | 2014-05-02 | 2021-05-12 | 삼성전자주식회사 | 반도체 패키지 |
| US9953844B2 (en) * | 2014-06-09 | 2018-04-24 | Mitsubishi Electric Corporation | Manufacturing method of semiconductor package |
| US9892935B2 (en) | 2015-05-28 | 2018-02-13 | International Business Machines Corporation | Limiting electronic package warpage with semiconductor chip lid and lid-ring |
| US9953941B2 (en) | 2015-08-25 | 2018-04-24 | Invensas Bonding Technologies, Inc. | Conductive barrier direct hybrid bonding |
| WO2017154339A1 (ja) * | 2016-03-11 | 2017-09-14 | 日本碍子株式会社 | 接続基板の製造方法 |
| US10840205B2 (en) | 2017-09-24 | 2020-11-17 | Invensas Bonding Technologies, Inc. | Chemical mechanical polishing for hybrid bonding |
| US11056348B2 (en) | 2018-04-05 | 2021-07-06 | Invensas Bonding Technologies, Inc. | Bonding surfaces for microelectronics |
| US11393779B2 (en) | 2018-06-13 | 2022-07-19 | Invensas Bonding Technologies, Inc. | Large metal pads over TSV |
| EP3807927A4 (en) | 2018-06-13 | 2022-02-23 | Invensas Bonding Technologies, Inc. | TSV AS PAD |
| US11011494B2 (en) | 2018-08-31 | 2021-05-18 | Invensas Bonding Technologies, Inc. | Layer structures for making direct metal-to-metal bonds at low temperatures in microelectronics |
| US10790232B2 (en) * | 2018-09-15 | 2020-09-29 | International Business Machines Corporation | Controlling warp in semiconductor laminated substrates with conductive material layout and orientation |
| US10667398B1 (en) * | 2018-09-26 | 2020-05-26 | United States Of America As Represented By The Administrator Of Nasa | Dual dynamic random (DDR) access memory interface design for aerospace printed circuit boards |
| US11158573B2 (en) | 2018-10-22 | 2021-10-26 | Invensas Bonding Technologies, Inc. | Interconnect structures |
| US11264357B1 (en) | 2020-10-20 | 2022-03-01 | Invensas Corporation | Mixed exposure for large die |
| EP4268273A4 (en) | 2020-12-28 | 2024-10-23 | Adeia Semiconductor Bonding Technologies Inc. | Structures with through-substrate vias and methods for forming the same |
| CN116762163A (zh) | 2020-12-28 | 2023-09-15 | 美商艾德亚半导体接合科技有限公司 | 具有贯穿衬底过孔的结构及其形成方法 |
| US12324093B2 (en) * | 2021-06-04 | 2025-06-03 | Steering Solutions Ip Holding Corporation | Single circuit board assembly with logic and power components |
| US20230389183A1 (en) * | 2022-05-26 | 2023-11-30 | Steering Solutions Ip Holding Corporation | Non-symmetric single circuit board assembly with polytronics dielectric material |
| CN120640514A (zh) * | 2024-03-11 | 2025-09-12 | 奥特斯奥地利科技与系统技术有限公司 | 部件承载件和制造部件承载件的方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SE392582B (sv) * | 1970-05-21 | 1977-04-04 | Gore & Ass | Forfarande vid framstellning av ett porost material, genom expandering och streckning av en tetrafluoretenpolymer framstelld i ett pastabildande strengsprutningsforfarande |
| FR2350697A1 (fr) * | 1976-05-06 | 1977-12-02 | Cii | Structure perfectionnee de circuits multicouches |
| US4201616A (en) * | 1978-06-23 | 1980-05-06 | International Business Machines Corporation | Dimensionally stable laminated printed circuit cores or boards and method of fabricating same |
| US4482516A (en) * | 1982-09-10 | 1984-11-13 | W. L. Gore & Associates, Inc. | Process for producing a high strength porous polytetrafluoroethylene product having a coarse microstructure |
| DE3581293D1 (de) * | 1984-02-09 | 1991-02-21 | Toyota Motor Co Ltd | Verfahren zur herstellung von ultrafeinen keramikpartikeln. |
| US4680220A (en) * | 1985-02-26 | 1987-07-14 | W. L. Gore & Associates, Inc. | Dielectric materials |
| US4888247A (en) * | 1986-08-27 | 1989-12-19 | General Electric Company | Low-thermal-expansion, heat conducting laminates having layers of metal and reinforced polymer matrix composite |
| US4755911A (en) * | 1987-04-28 | 1988-07-05 | Junkosha Co., Ltd. | Multilayer printed circuit board |
| EP0322947B1 (en) * | 1987-12-31 | 1992-07-15 | Structural Laminates Company | Composite laminate of metal sheets and continuous filaments-reinforced synthetic layers |
| US4985296A (en) * | 1989-03-16 | 1991-01-15 | W. L. Gore & Associates, Inc. | Polytetrafluoroethylene film |
| US5100740A (en) * | 1989-09-25 | 1992-03-31 | General Electric Company | Direct bonded symmetric-metallic-laminate/substrate structures |
| JPH07120858B2 (ja) * | 1990-03-30 | 1995-12-20 | 株式会社日立製作所 | 多層プリント回路板およびその製造方法 |
| US5162977A (en) * | 1991-08-27 | 1992-11-10 | Storage Technology Corporation | Printed circuit board having an integrated decoupling capacitive element |
| JPH0575263A (ja) * | 1991-09-13 | 1993-03-26 | Nec Corp | 多層セラミツクス基板の製造方法 |
| JPH05110257A (ja) * | 1991-10-14 | 1993-04-30 | Nec Corp | 多層配線基板 |
| JPH0653684A (ja) * | 1992-07-29 | 1994-02-25 | Hitachi Ltd | 薄膜多層配線基板とそれを用いたモジュール |
| WO1994018701A1 (en) * | 1993-02-05 | 1994-08-18 | W.L. Gore & Associates, Inc. | Stress-resistant semiconductor chip-circuit board interconnect |
| US5458955A (en) * | 1993-10-21 | 1995-10-17 | Monsanto Company | Metal/polymer laminates having an anionomeric polymer film layer |
| US5545473A (en) * | 1994-02-14 | 1996-08-13 | W. L. Gore & Associates, Inc. | Thermally conductive interface |
| US5571608A (en) * | 1994-07-15 | 1996-11-05 | Dell Usa, L.P. | Apparatus and method of making laminate an embedded conductive layer |
-
1996
- 1996-11-08 US US08/745,972 patent/US5888631A/en not_active Expired - Lifetime
-
1997
- 1997-10-17 AU AU49044/97A patent/AU4904497A/en not_active Abandoned
- 1997-10-17 JP JP52141498A patent/JP5175009B2/ja not_active Expired - Lifetime
- 1997-10-17 WO PCT/US1997/018638 patent/WO1998020555A1/en not_active Ceased
-
1998
- 1998-11-20 US US09/196,874 patent/US6183592B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2000505245A (ja) | 2000-04-25 |
| AU4904497A (en) | 1998-05-29 |
| US6183592B1 (en) | 2001-02-06 |
| WO1998020555A1 (en) | 1998-05-14 |
| US5888631A (en) | 1999-03-30 |
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