JP5146821B2 - 反応現像画像形成法 - Google Patents

反応現像画像形成法 Download PDF

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Publication number
JP5146821B2
JP5146821B2 JP2008119448A JP2008119448A JP5146821B2 JP 5146821 B2 JP5146821 B2 JP 5146821B2 JP 2008119448 A JP2008119448 A JP 2008119448A JP 2008119448 A JP2008119448 A JP 2008119448A JP 5146821 B2 JP5146821 B2 JP 5146821B2
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Japan
Prior art keywords
group
carbon atoms
aryl
independently
image forming
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JP2008119448A
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Japanese (ja)
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JP2009271155A5 (https=
JP2009271155A (ja
Inventor
俊幸 大山
忍 山尾
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Idemitsu Kosan Co Ltd
Yokohama National University NUC
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Idemitsu Kosan Co Ltd
Yokohama National University NUC
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Priority to JP2008119448A priority Critical patent/JP5146821B2/ja
Publication of JP2009271155A publication Critical patent/JP2009271155A/ja
Publication of JP2009271155A5 publication Critical patent/JP2009271155A5/ja
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Publication of JP5146821B2 publication Critical patent/JP5146821B2/ja
Expired - Fee Related legal-status Critical Current
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP2008119448A 2008-05-01 2008-05-01 反応現像画像形成法 Expired - Fee Related JP5146821B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008119448A JP5146821B2 (ja) 2008-05-01 2008-05-01 反応現像画像形成法

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Application Number Priority Date Filing Date Title
JP2008119448A JP5146821B2 (ja) 2008-05-01 2008-05-01 反応現像画像形成法

Publications (3)

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JP2009271155A JP2009271155A (ja) 2009-11-19
JP2009271155A5 JP2009271155A5 (https=) 2011-06-16
JP5146821B2 true JP5146821B2 (ja) 2013-02-20

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JP2008119448A Expired - Fee Related JP5146821B2 (ja) 2008-05-01 2008-05-01 反応現像画像形成法

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6612533B2 (ja) * 2015-06-12 2019-11-27 三菱瓦斯化学株式会社 反応現像画像形成法、反応現像画像形成法に用いられる感光性樹脂組成物、および反応現像画像形成方法により製造された基板ならびに構造物
CN111253563B (zh) * 2020-01-14 2020-12-11 浙江大学 一种聚碳酸酯作为紫外光刻胶材料的应用
WO2022050041A1 (ja) * 2020-09-07 2022-03-10 富士フイルム株式会社 硬化物の製造方法、積層体の製造方法、及び、電子デバイスの製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3516968A (en) * 1969-03-17 1970-06-23 Sun Oil Co Polycarbonates from adamantyl bisphenols
JP3965434B2 (ja) * 2001-06-18 2007-08-29 よこはまティーエルオー株式会社 反応現像画像形成法
JP3979855B2 (ja) * 2002-01-28 2007-09-19 出光興産株式会社 芳香族ポリカーボネート樹脂とその製造方法
JP3979851B2 (ja) * 2002-01-23 2007-09-19 出光興産株式会社 芳香族ポリカーボネート樹脂とその製造法

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JP2009271155A (ja) 2009-11-19

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