JP5145083B2 - チタンの電解研磨方法 - Google Patents
チタンの電解研磨方法 Download PDFInfo
- Publication number
- JP5145083B2 JP5145083B2 JP2008057258A JP2008057258A JP5145083B2 JP 5145083 B2 JP5145083 B2 JP 5145083B2 JP 2008057258 A JP2008057258 A JP 2008057258A JP 2008057258 A JP2008057258 A JP 2008057258A JP 5145083 B2 JP5145083 B2 JP 5145083B2
- Authority
- JP
- Japan
- Prior art keywords
- electropolishing
- titanium
- electrochemical deburring
- acid
- electrolytic solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000034 method Methods 0.000 title claims abstract description 45
- 229910052719 titanium Inorganic materials 0.000 title claims abstract description 27
- 239000010936 titanium Substances 0.000 title claims abstract description 27
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 title claims abstract description 26
- 238000005498 polishing Methods 0.000 title claims description 14
- 239000003792 electrolyte Substances 0.000 claims abstract description 26
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims abstract description 24
- 239000002253 acid Substances 0.000 claims abstract description 19
- 150000007513 acids Chemical class 0.000 claims abstract description 13
- 229910045601 alloy Inorganic materials 0.000 claims abstract description 12
- 239000000956 alloy Substances 0.000 claims abstract description 12
- 229940098779 methanesulfonic acid Drugs 0.000 claims abstract description 12
- 239000008151 electrolyte solution Substances 0.000 claims description 19
- 229910001000 nickel titanium Inorganic materials 0.000 claims description 13
- HLXZNVUGXRDIFK-UHFFFAOYSA-N nickel titanium Chemical group [Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ti].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni].[Ni] HLXZNVUGXRDIFK-UHFFFAOYSA-N 0.000 claims description 9
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims description 5
- 125000003277 amino group Chemical group 0.000 claims description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 1
- 150000001335 aliphatic alkanes Chemical class 0.000 abstract 1
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 8
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 6
- 229910001069 Ti alloy Inorganic materials 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 229910001285 shape-memory alloy Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- KVBCYCWRDBDGBG-UHFFFAOYSA-N azane;dihydrofluoride Chemical compound [NH4+].F.[F-] KVBCYCWRDBDGBG-UHFFFAOYSA-N 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- ACKLIRAPAVQACS-UHFFFAOYSA-N ethane-1,2-diol;sulfuric acid Chemical compound OCCO.OS(O)(=O)=O ACKLIRAPAVQACS-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 231100000331 toxic Toxicity 0.000 description 1
- 230000002588 toxic effect Effects 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
- C25F3/22—Polishing of heavy metals
- C25F3/26—Polishing of heavy metals of refractory metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- ing And Chemical Polishing (AREA)
Description
1.過塩素酸および無水酢酸
2.フッ化水素酸、硫酸、酢酸
3.フッ化水素酸、硫酸、無水酢酸
4.硫酸、フッ化水素酸、リン酸およびエチレングリコール
5.硫酸、二フッ化アンモニウムおよびヒドロキシカルボン酸
これらの例は特許文献1および特許文献2に例として記載されている。
寸法が50×50×1.0mmであり、研磨された表面で、Ra=0.8μmの粗さのプレートを、990gの100%メタンスルホン酸と10gの1−ヒドロキシエチル−1,1−ジホスホン酸からなる電解液で電解研磨した。
温度:30℃
電流密度:20A/dm2
研磨時間:7分
0.8mmの長さのニチノールワイヤーを、実施例1と同様の電解液で電解研磨した。
温度:25℃
電流密度:10A/dm2
研磨時間:4分
結果は光沢を持ち、平滑な表面であり、構造上のエッチアタックもなかった。
Claims (11)
- チタン又はチタン含有合金の表面を電解研磨および/又は電気化学的にデバリングする方法において、使用される電解液がメタンスルホン酸と、一種以上のアルカンジホスホン酸を含み、該一種以上のアルカンジホスホン酸は選択的にヒドロキシ基および/又はアミノ基で置換されていてもよいことを特徴とする電解研磨および/又は電気化学的デバリングの方法。
- 前記電解液に含まれるメタンスルホン酸の濃度は、前記電解液の全体量に基づいて少なくとも95wt.%とすることを特徴とする請求項1に記載の電解研磨および/又は電気化学的デバリングの方法。
- 前記一種以上のアルカンジホスホン酸が1−ヒドロキシエタン−1,1−ジホスホン酸を含むことを特徴とする請求項1又は請求項2に記載の電解研磨および/又は電気化学的デバリングの方法。
- 前記一種以上のアルカンジホスホン酸の濃度は、1〜50g/kg電解液とすることを特徴とする請求項1乃至3のいずれか一項に記載の電解研磨および/又は電気化学的デバリングの方法。
- 前記一種以上のアルカンジホスホン酸の濃度は、5〜20g/kg電解液とすることを特徴とする請求項1乃至3のいずれか一項に記載の電解研磨および/又は電気化学的デバリングの方法。
- 前記電解液が、実質的にメタンスルホン酸、一種以上のアルカンジスルホン酸からなることを特徴とする請求項1乃至5のいずれか一項に記載の電解研磨および/又は電気化学的デバリングの方法。
- 20℃〜70℃の温度で行うことを特徴とする請求項1乃至6のいずれか一項に記載の電解研磨および/又は電気化学的デバリングの方法。
- 2〜50A/dm2の陽極電流密度で行うことを特徴とする請求項1乃至7のいずれか一項に記載の電解研磨および/又は電気化学的デバリングの方法。
- 5〜30A/dm2の陽極電流密度で行うことを特徴とする請求項1乃至7のいずれか一項に記載の電解研磨および/又は電気化学的デバリングの方法。
- 前記チタン含有合金は、チタンを少なくとも50mol.%の比率で含むことを特徴とする請求項1乃至9のいずれか一項に記載の電解研磨および/又は電気化学的デバリングの方法。
- 前記チタン含有合金はニチノールとすることを特徴とする請求項10に記載の電解研磨および/又は電気化学的デバリングの方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102007011632.4 | 2007-03-09 | ||
DE102007011632A DE102007011632B3 (de) | 2007-03-09 | 2007-03-09 | Elektropolierverfahren für Titan |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008223139A JP2008223139A (ja) | 2008-09-25 |
JP2008223139A5 JP2008223139A5 (ja) | 2012-11-29 |
JP5145083B2 true JP5145083B2 (ja) | 2013-02-13 |
Family
ID=39365667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008057258A Expired - Fee Related JP5145083B2 (ja) | 2007-03-09 | 2008-03-07 | チタンの電解研磨方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20080217186A1 (ja) |
EP (1) | EP1970473B1 (ja) |
JP (1) | JP5145083B2 (ja) |
AT (1) | ATE522642T1 (ja) |
DE (1) | DE102007011632B3 (ja) |
ES (1) | ES2369942T3 (ja) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8357287B2 (en) * | 2009-11-23 | 2013-01-22 | MetCon LLC | Electrolyte solution and electropolishing methods |
US8580103B2 (en) | 2010-11-22 | 2013-11-12 | Metcon, Llc | Electrolyte solution and electrochemical surface modification methods |
WO2014087414A1 (en) | 2012-12-03 | 2014-06-12 | Amrita Vishwa Vidya Peetham University | Metallic titanium -based cardiovascular stent with nano - structured surface and method of manufacturing thereof |
EP2878713A1 (en) * | 2013-11-28 | 2015-06-03 | Abbott Laboratories Vascular Enterprises Limited | Electrolyte composition and method for the electropolishing treatment of Nickel-Titanium alloys and/or other metal substrates including tungsten, niob and tantal alloys |
CN104668677A (zh) * | 2013-12-02 | 2015-06-03 | 天津大学 | 用于钛合金电解加工的非水基电解液及其制备方法 |
ES2604830B1 (es) | 2016-04-28 | 2017-12-18 | Drylyte, S.L. | Proceso para alisado y pulido de metales por transporte iónico mediante cuerpos sólidos libres, y cuerpos sólidos para llevar a cabo dicho proceso. |
JP6752626B2 (ja) * | 2016-05-31 | 2020-09-09 | 株式会社カネカ | 電解研磨液および電解研磨された金属成形体の製造方法 |
JP2017214614A (ja) * | 2016-05-31 | 2017-12-07 | 株式会社カネカ | 電解研磨された金属成形体の製造方法 |
AT520365B1 (de) * | 2017-08-29 | 2019-10-15 | Hirtenberger Eng Surfaces Gmbh | Elektrolyt zum elektropolieren von metalloberflächen |
US11549194B2 (en) | 2016-12-09 | 2023-01-10 | Hirtenberger Engineered Surfaces Gmbh | Electropolishing method and electrolyte for same |
ES2734499B2 (es) | 2018-11-12 | 2020-06-03 | Drylyte Sl | Uso de ácidos sulfónicos en electrolitos secos para pulir superficies metálicas a través del transporte de iones |
US11492723B2 (en) * | 2019-11-05 | 2022-11-08 | Cilag Gmbh International | Electrolyte solutions for electropolishing of nitinol needles |
DE102021120263A1 (de) * | 2021-08-04 | 2023-02-09 | Bayerische Motoren Werke Aktiengesellschaft | Verfahren und Vorrichtung zum Herstellen eines beschichteten Strukturbauteils |
WO2023157410A1 (ja) | 2022-02-15 | 2023-08-24 | 日本軽金属株式会社 | 表面平滑化金属部材及びその製造方法 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3667505D1 (de) * | 1986-06-20 | 1990-01-18 | Poligrat Gmbh | Elektrolyt zum elektrochemischen polieren von metalloberflaechen. |
JPH0762280B2 (ja) * | 1990-07-11 | 1995-07-05 | 山口県 | チタン又はチタン合金の電解研磨法 |
GB9022996D0 (en) * | 1990-10-23 | 1990-12-05 | Leonard Ian | Prosthesis and methods and apparatus for making same |
SE511209C2 (sv) * | 1994-12-12 | 1999-08-23 | Sandvik Ab | Metod för att erhålla väldefinierade eggradier på skär med elektropoleringsteknik |
FR2795433B1 (fr) | 1999-06-25 | 2001-08-31 | Org Europeene De Rech | Composition de bain pour le polissage electrolytique du titane, et son procede d'utilisation |
US6332970B1 (en) * | 1999-10-22 | 2001-12-25 | Barry W. Coffey | Electrolytic method of and compositions for stripping electroless nickel |
DE10037337A1 (de) * | 2000-03-14 | 2001-09-20 | Nmi Univ Tuebingen | Verfahren und Vorrichtung zum Elektropolieren von Körpern aus Nickel-Titan-Legierungen |
SG87194A1 (en) * | 2000-08-17 | 2002-03-19 | Samsung Techwin Co Ltd | Lead frame and method of manufacturing the lead frame |
US7316603B2 (en) * | 2002-01-22 | 2008-01-08 | Cabot Microelectronics Corporation | Compositions and methods for tantalum CMP |
EP1354986A3 (de) * | 2002-04-09 | 2004-01-02 | Olivier Piotrowski | Vorrichtung und Verfahren zum Elektropolieren von Oberflächen von Titan |
ATE405695T1 (de) * | 2002-07-17 | 2008-09-15 | Maillefer Instr Holding S A R | Verfahren zum elektrolytischen polieren von zahnärztlichen instrumenten aus nickel-titan legierungen |
DE10320909A1 (de) | 2003-05-09 | 2004-11-18 | Poligrat Holding Gmbh | Elektrolyt zum elektrochemischen Polieren von Metalloberflächen |
WO2004101860A1 (en) * | 2003-05-12 | 2004-11-25 | Arkema Inc. | High purity electrolytic sulfonic acid solutions |
US7510641B2 (en) * | 2003-07-21 | 2009-03-31 | Los Alamos National Security, Llc | High current density electropolishing in the preparation of highly smooth substrate tapes for coated conductors |
US20060163083A1 (en) * | 2005-01-21 | 2006-07-27 | International Business Machines Corporation | Method and composition for electro-chemical-mechanical polishing |
DE102005037563B3 (de) * | 2005-08-09 | 2006-09-28 | Poligrat Gmbh | Elektropolierverfahren |
US7776189B2 (en) * | 2006-03-07 | 2010-08-17 | Abbott Laboratories | Method and apparatus for electropolishing metallic stents |
-
2007
- 2007-03-09 DE DE102007011632A patent/DE102007011632B3/de not_active Expired - Fee Related
-
2008
- 2008-03-04 ES ES08003975T patent/ES2369942T3/es active Active
- 2008-03-04 AT AT08003975T patent/ATE522642T1/de active
- 2008-03-04 EP EP08003975A patent/EP1970473B1/de active Active
- 2008-03-07 JP JP2008057258A patent/JP5145083B2/ja not_active Expired - Fee Related
- 2008-03-10 US US12/073,793 patent/US20080217186A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JP2008223139A (ja) | 2008-09-25 |
ES2369942T3 (es) | 2011-12-09 |
DE102007011632B3 (de) | 2008-06-26 |
EP1970473A2 (de) | 2008-09-17 |
US20080217186A1 (en) | 2008-09-11 |
ATE522642T1 (de) | 2011-09-15 |
EP1970473A3 (de) | 2010-08-25 |
EP1970473B1 (de) | 2011-08-31 |
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