JP5143076B2 - 窒化物半導体発光素子の製造方法 - Google Patents
窒化物半導体発光素子の製造方法 Download PDFInfo
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- JP5143076B2 JP5143076B2 JP2009095113A JP2009095113A JP5143076B2 JP 5143076 B2 JP5143076 B2 JP 5143076B2 JP 2009095113 A JP2009095113 A JP 2009095113A JP 2009095113 A JP2009095113 A JP 2009095113A JP 5143076 B2 JP5143076 B2 JP 5143076B2
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- nitride semiconductor
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009095113A JP5143076B2 (ja) | 2009-04-09 | 2009-04-09 | 窒化物半導体発光素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2009095113A JP5143076B2 (ja) | 2009-04-09 | 2009-04-09 | 窒化物半導体発光素子の製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2010245444A JP2010245444A (ja) | 2010-10-28 |
| JP2010245444A5 JP2010245444A5 (enExample) | 2011-12-01 |
| JP5143076B2 true JP5143076B2 (ja) | 2013-02-13 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2009095113A Expired - Fee Related JP5143076B2 (ja) | 2009-04-09 | 2009-04-09 | 窒化物半導体発光素子の製造方法 |
Country Status (1)
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| JP (1) | JP5143076B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2013098232A (ja) * | 2011-10-28 | 2013-05-20 | Sharp Corp | 窒化物半導体レーザ素子 |
| JP2013128103A (ja) * | 2011-11-17 | 2013-06-27 | Sanken Electric Co Ltd | 窒化物半導体装置及び窒化物半導体装置の製造方法 |
| CN103460411A (zh) | 2012-03-05 | 2013-12-18 | 松下电器产业株式会社 | 氮化物半导体发光元件、光源及其制造方法 |
| CN104641476B (zh) | 2012-06-25 | 2017-09-05 | 首尔伟傲世有限公司 | 制备m面氮化物基发光二极管的方法 |
| JP2014143255A (ja) * | 2013-01-23 | 2014-08-07 | Mitsubishi Chemicals Corp | 窒化物系発光ダイオードの製造方法 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3864735B2 (ja) * | 2000-12-28 | 2007-01-10 | ソニー株式会社 | 半導体発光素子およびその製造方法 |
| JP4388720B2 (ja) * | 2001-10-12 | 2009-12-24 | 住友電気工業株式会社 | 半導体発光素子の製造方法 |
| WO2003063215A1 (en) * | 2002-01-21 | 2003-07-31 | Matsushita Electric Industrial Co., Ltd. | Nitride semiconductor device manufacturing method |
| JP3951973B2 (ja) * | 2003-06-27 | 2007-08-01 | 日亜化学工業株式会社 | 窒化物半導体素子 |
| JP2007227652A (ja) * | 2006-02-23 | 2007-09-06 | Rohm Co Ltd | 2波長半導体発光装置及びその製造方法 |
| JP2008034659A (ja) * | 2006-07-28 | 2008-02-14 | Rohm Co Ltd | 窒化物半導体 |
| JP5366518B2 (ja) * | 2007-12-28 | 2013-12-11 | ローム株式会社 | 半導体発光素子およびその製造方法 |
| US8084763B2 (en) * | 2008-10-31 | 2011-12-27 | The Regents Of The University Of California | Optoelectronic device based on non-polar and semi-polar aluminum indium nitride and aluminum indium gallium nitride alloys |
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2009
- 2009-04-09 JP JP2009095113A patent/JP5143076B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2010245444A (ja) | 2010-10-28 |
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