JP5118407B2 - 光学系、露光装置及びデバイス製造方法 - Google Patents

光学系、露光装置及びデバイス製造方法 Download PDF

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Publication number
JP5118407B2
JP5118407B2 JP2007199894A JP2007199894A JP5118407B2 JP 5118407 B2 JP5118407 B2 JP 5118407B2 JP 2007199894 A JP2007199894 A JP 2007199894A JP 2007199894 A JP2007199894 A JP 2007199894A JP 5118407 B2 JP5118407 B2 JP 5118407B2
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Japan
Prior art keywords
refractive optical
optical system
refractive
optical
optical member
Prior art date
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Expired - Fee Related
Application number
JP2007199894A
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English (en)
Japanese (ja)
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JP2009038152A (ja
JP2009038152A5 (enrdf_load_stackoverflow
Inventor
周 渡辺
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2007199894A priority Critical patent/JP5118407B2/ja
Priority to TW097120267A priority patent/TWI397781B/zh
Priority to KR1020080074836A priority patent/KR100992302B1/ko
Publication of JP2009038152A publication Critical patent/JP2009038152A/ja
Publication of JP2009038152A5 publication Critical patent/JP2009038152A5/ja
Application granted granted Critical
Publication of JP5118407B2 publication Critical patent/JP5118407B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
JP2007199894A 2007-07-31 2007-07-31 光学系、露光装置及びデバイス製造方法 Expired - Fee Related JP5118407B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007199894A JP5118407B2 (ja) 2007-07-31 2007-07-31 光学系、露光装置及びデバイス製造方法
TW097120267A TWI397781B (zh) 2007-07-31 2008-05-30 Optical system, exposure apparatus and apparatus manufacturing method
KR1020080074836A KR100992302B1 (ko) 2007-07-31 2008-07-31 광학계, 노광장치 및 디바이스 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007199894A JP5118407B2 (ja) 2007-07-31 2007-07-31 光学系、露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009038152A JP2009038152A (ja) 2009-02-19
JP2009038152A5 JP2009038152A5 (enrdf_load_stackoverflow) 2010-09-16
JP5118407B2 true JP5118407B2 (ja) 2013-01-16

Family

ID=40439798

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007199894A Expired - Fee Related JP5118407B2 (ja) 2007-07-31 2007-07-31 光学系、露光装置及びデバイス製造方法

Country Status (3)

Country Link
JP (1) JP5118407B2 (enrdf_load_stackoverflow)
KR (1) KR100992302B1 (enrdf_load_stackoverflow)
TW (1) TWI397781B (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP6041541B2 (ja) * 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP7005364B2 (ja) * 2018-01-29 2022-01-21 キヤノン株式会社 投影光学系、露光装置、物品の製造方法及び調整方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142501A (ja) * 1996-11-06 1998-05-29 Nikon Corp 投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法
JP2002250865A (ja) * 2000-06-14 2002-09-06 Nikon Corp 投影光学系、露光装置、およびそれらの製造方法
US6975385B2 (en) 2002-11-08 2005-12-13 Canon Kabushiki Kaisha Projection optical system and exposure apparatus
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
JP2005024814A (ja) * 2003-07-01 2005-01-27 Nikon Corp 投影光学系、露光装置および露光方法
EP1513019B1 (en) 2003-09-02 2012-07-25 Canon Kabushiki Kaisha Projection optical system, exposure apparatus and device fabricating method

Also Published As

Publication number Publication date
KR100992302B1 (ko) 2010-11-05
TW200912562A (en) 2009-03-16
JP2009038152A (ja) 2009-02-19
KR20090013132A (ko) 2009-02-04
TWI397781B (zh) 2013-06-01

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