KR100992302B1 - 광학계, 노광장치 및 디바이스 제조방법 - Google Patents

광학계, 노광장치 및 디바이스 제조방법 Download PDF

Info

Publication number
KR100992302B1
KR100992302B1 KR1020080074836A KR20080074836A KR100992302B1 KR 100992302 B1 KR100992302 B1 KR 100992302B1 KR 1020080074836 A KR1020080074836 A KR 1020080074836A KR 20080074836 A KR20080074836 A KR 20080074836A KR 100992302 B1 KR100992302 B1 KR 100992302B1
Authority
KR
South Korea
Prior art keywords
refractive optical
distortion
refractive
optical system
optical member
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020080074836A
Other languages
English (en)
Korean (ko)
Other versions
KR20090013132A (ko
Inventor
수 와타나베
Original Assignee
캐논 가부시끼가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 캐논 가부시끼가이샤 filed Critical 캐논 가부시끼가이샤
Publication of KR20090013132A publication Critical patent/KR20090013132A/ko
Application granted granted Critical
Publication of KR100992302B1 publication Critical patent/KR100992302B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)
KR1020080074836A 2007-07-31 2008-07-31 광학계, 노광장치 및 디바이스 제조방법 Expired - Fee Related KR100992302B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2007-00199894 2007-07-31
JP2007199894A JP5118407B2 (ja) 2007-07-31 2007-07-31 光学系、露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
KR20090013132A KR20090013132A (ko) 2009-02-04
KR100992302B1 true KR100992302B1 (ko) 2010-11-05

Family

ID=40439798

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020080074836A Expired - Fee Related KR100992302B1 (ko) 2007-07-31 2008-07-31 광학계, 노광장치 및 디바이스 제조방법

Country Status (3)

Country Link
JP (1) JP5118407B2 (enrdf_load_stackoverflow)
KR (1) KR100992302B1 (enrdf_load_stackoverflow)
TW (1) TWI397781B (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5595001B2 (ja) * 2009-10-06 2014-09-24 キヤノン株式会社 投影光学系、露光装置及びデバイス製造方法
JP5595015B2 (ja) * 2009-11-16 2014-09-24 キヤノン株式会社 投影光学系、露光装置およびデバイス製造方法
JP6041541B2 (ja) * 2012-06-04 2016-12-07 キヤノン株式会社 露光装置及びデバイス製造方法
JP7005364B2 (ja) * 2018-01-29 2022-01-21 キヤノン株式会社 投影光学系、露光装置、物品の製造方法及び調整方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100514063B1 (ko) 2002-11-08 2005-09-13 캐논 가부시끼가이샤 투영광학계와 노광장치
KR100566261B1 (ko) 2003-09-02 2006-03-29 캐논 가부시끼가이샤 투영광학계, 노광장치 및 디바이스의 제조방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10142501A (ja) * 1996-11-06 1998-05-29 Nikon Corp 投影露光装置および該投影露光装置を用いた半導体デバイスの製造方法
JP2002250865A (ja) * 2000-06-14 2002-09-06 Nikon Corp 投影光学系、露光装置、およびそれらの製造方法
US7158215B2 (en) * 2003-06-30 2007-01-02 Asml Holding N.V. Large field of view protection optical system with aberration correctability for flat panel displays
JP2005024814A (ja) * 2003-07-01 2005-01-27 Nikon Corp 投影光学系、露光装置および露光方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100514063B1 (ko) 2002-11-08 2005-09-13 캐논 가부시끼가이샤 투영광학계와 노광장치
KR100566261B1 (ko) 2003-09-02 2006-03-29 캐논 가부시끼가이샤 투영광학계, 노광장치 및 디바이스의 제조방법

Also Published As

Publication number Publication date
TWI397781B (zh) 2013-06-01
KR20090013132A (ko) 2009-02-04
TW200912562A (en) 2009-03-16
JP2009038152A (ja) 2009-02-19
JP5118407B2 (ja) 2013-01-16

Similar Documents

Publication Publication Date Title
KR100285030B1 (ko) 투영노광장치 및 소자제조방법
JP4717974B2 (ja) 反射屈折光学系及び該光学系を備える投影露光装置
JP3303758B2 (ja) 投影露光装置及びデバイスの製造方法
EP0736789A2 (en) Catadioptric optical system and exposure apparatus having the same
JP3459773B2 (ja) 投影露光装置及びデバイスの製造方法
JP2001185480A (ja) 投影光学系及び該光学系を備える投影露光装置
US7232233B2 (en) Catoptric reduction projection optical system and exposure apparatus using the same
KR20040075764A (ko) 카톱트릭형 투영광학계와 노광장치
CA2215750C (en) Magnification correction for small field scanning
US8009271B2 (en) Projection optical system, exposure apparatus, exposure system, and exposure method
KR20080091182A (ko) 반사 굴절 결상 광학계, 노광 장치 및 디바이스의 제조방법
WO2015041335A1 (ja) 投影光学系、投影光学系の調整方法、露光装置、露光方法、およびデバイス製造方法
JP2010166007A (ja) 投影光学系、露光装置及びデバイス製造方法
KR100992302B1 (ko) 광학계, 노광장치 및 디바이스 제조방법
KR100331063B1 (ko) 역운동을 갖는 스캐닝 리소그래피 시스템
WO2009133704A1 (ja) 露光装置及び露光方法、並びにデバイス製造方法
JP5360529B2 (ja) 投影光学系、露光装置、およびデバイス製造方法
KR20080009629A (ko) 투영 노광 장치
KR20050024260A (ko) 투영광학계, 노광장치 및 디바이스의 제조방법
JP2007287885A (ja) 照明光学装置、露光装置、およびデバイス製造方法
JP2005079470A (ja) 照明光学系の調整方法、露光装置及び方法、並びにデバイス製造方法
US10222293B2 (en) Optical characteristic measuring method, optical characteristic adjusting method, exposure apparatus, exposing method, and exposure apparatus manufacturing method by detecting a light amount of measuring light
US7435984B2 (en) Imaging optical system and exposure apparatus
KR20080091014A (ko) 반사형 투영광학계, 노광장치, 및 디바이스의 제조방법
JP2004029458A (ja) 投影光学系及び縮小投影露光装置

Legal Events

Date Code Title Description
A201 Request for examination
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U11-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20130926

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20140924

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20150923

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

FPAY Annual fee payment

Payment date: 20160926

Year of fee payment: 7

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

FPAY Annual fee payment

Payment date: 20170925

Year of fee payment: 8

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 8

FPAY Annual fee payment

Payment date: 20180928

Year of fee payment: 9

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 9

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20191030

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20191030