JP5105474B2 - 露光装置及びデバイス製造方法 - Google Patents

露光装置及びデバイス製造方法 Download PDF

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Publication number
JP5105474B2
JP5105474B2 JP2007273092A JP2007273092A JP5105474B2 JP 5105474 B2 JP5105474 B2 JP 5105474B2 JP 2007273092 A JP2007273092 A JP 2007273092A JP 2007273092 A JP2007273092 A JP 2007273092A JP 5105474 B2 JP5105474 B2 JP 5105474B2
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JP
Japan
Prior art keywords
characteristic value
adjustment amount
optical characteristic
value
optical system
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Expired - Fee Related
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JP2007273092A
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English (en)
Japanese (ja)
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JP2009105097A (ja
JP2009105097A5 (enrdf_load_stackoverflow
Inventor
勇治 品野
俊幸 吉原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Tokyo University of Agriculture and Technology NUC
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Canon Inc
Tokyo University of Agriculture and Technology NUC
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Application filed by Canon Inc, Tokyo University of Agriculture and Technology NUC filed Critical Canon Inc
Priority to JP2007273092A priority Critical patent/JP5105474B2/ja
Priority to TW097138552A priority patent/TW200931192A/zh
Priority to US12/251,780 priority patent/US8102503B2/en
Priority to KR1020080101807A priority patent/KR101124776B1/ko
Publication of JP2009105097A publication Critical patent/JP2009105097A/ja
Publication of JP2009105097A5 publication Critical patent/JP2009105097A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007273092A 2007-10-19 2007-10-19 露光装置及びデバイス製造方法 Expired - Fee Related JP5105474B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007273092A JP5105474B2 (ja) 2007-10-19 2007-10-19 露光装置及びデバイス製造方法
TW097138552A TW200931192A (en) 2007-10-19 2008-10-07 Exposure apparatus and method of manufacturing device
US12/251,780 US8102503B2 (en) 2007-10-19 2008-10-15 Exposure apparatus and method of manufacturing device
KR1020080101807A KR101124776B1 (ko) 2007-10-19 2008-10-17 노광 장치 및 디바이스 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007273092A JP5105474B2 (ja) 2007-10-19 2007-10-19 露光装置及びデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2009105097A JP2009105097A (ja) 2009-05-14
JP2009105097A5 JP2009105097A5 (enrdf_load_stackoverflow) 2010-12-24
JP5105474B2 true JP5105474B2 (ja) 2012-12-26

Family

ID=40563168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007273092A Expired - Fee Related JP5105474B2 (ja) 2007-10-19 2007-10-19 露光装置及びデバイス製造方法

Country Status (4)

Country Link
US (1) US8102503B2 (enrdf_load_stackoverflow)
JP (1) JP5105474B2 (enrdf_load_stackoverflow)
KR (1) KR101124776B1 (enrdf_load_stackoverflow)
TW (1) TW200931192A (enrdf_load_stackoverflow)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008042356A1 (de) 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
EP2219077A1 (en) * 2009-02-12 2010-08-18 Carl Zeiss SMT AG Projection exposure method, projection exposure system and projection objective
JP2010278034A (ja) * 2009-05-26 2010-12-09 Canon Inc 露光装置及びデバイス製造方法
JP5418768B2 (ja) * 2009-06-26 2014-02-19 キヤノン株式会社 露光装置、調整方法及びデバイスの製造方法
CN102540745B (zh) * 2010-12-22 2014-01-22 上海微电子装备有限公司 一种基于空间像主成分控制的曝光系统
JP5969848B2 (ja) * 2012-07-19 2016-08-17 キヤノン株式会社 露光装置、調整対象の調整量を求める方法、プログラム及びデバイスの製造方法
KR101668984B1 (ko) * 2013-09-14 2016-10-24 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피 투영 장치의 동작 방법
DE102013225381A1 (de) * 2013-12-10 2014-11-06 Carl Zeiss Smt Gmbh Verfahren zur Kalibrierung eines Manipulators
US9671673B2 (en) * 2014-11-17 2017-06-06 Singapore University Of Technology And Design Optical device for dispersion compensation
NL2022112A (en) * 2017-12-19 2019-06-26 Asml Netherlands Bv Lithographic Method and Apparatus
US10627727B2 (en) * 2018-06-13 2020-04-21 Taiwan Semiconductor Manufacturing Co., Ltd. Lens control for lithography tools

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3190844B2 (ja) * 1996-12-20 2001-07-23 日本電気株式会社 コンピュータ演算処理方法
JP3673633B2 (ja) 1997-12-16 2005-07-20 キヤノン株式会社 投影光学系の組立調整方法
JP2001037087A (ja) * 1999-07-14 2001-02-09 Mitsubishi Electric Corp 発電機出力決定装置及び発電機出力決定方法
KR100893516B1 (ko) * 2000-12-28 2009-04-16 가부시키가이샤 니콘 결상특성 계측방법, 결상특성 조정방법, 노광방법 및노광장치, 프로그램 및 기록매체, 그리고 디바이스 제조방법
JP4689081B2 (ja) 2001-06-06 2011-05-25 キヤノン株式会社 露光装置、調整方法、およびデバイス製造方法
JP4574198B2 (ja) * 2004-03-17 2010-11-04 キヤノン株式会社 露光装置、その調整方法及びデバイス製造方法
JP2006221676A (ja) * 2006-05-25 2006-08-24 Hitachi Ltd 最適ポートフォリオ決定装置
JP2010278034A (ja) * 2009-05-26 2010-12-09 Canon Inc 露光装置及びデバイス製造方法

Also Published As

Publication number Publication date
JP2009105097A (ja) 2009-05-14
KR20090040228A (ko) 2009-04-23
TW200931192A (en) 2009-07-16
US20090103065A1 (en) 2009-04-23
US8102503B2 (en) 2012-01-24
KR101124776B1 (ko) 2012-03-23

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