JP5103060B2 - 冷却装置及び基板の処理装置 - Google Patents
冷却装置及び基板の処理装置 Download PDFInfo
- Publication number
- JP5103060B2 JP5103060B2 JP2007148793A JP2007148793A JP5103060B2 JP 5103060 B2 JP5103060 B2 JP 5103060B2 JP 2007148793 A JP2007148793 A JP 2007148793A JP 2007148793 A JP2007148793 A JP 2007148793A JP 5103060 B2 JP5103060 B2 JP 5103060B2
- Authority
- JP
- Japan
- Prior art keywords
- main body
- cooling device
- substrate
- cooling
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67109—Apparatus for thermal treatment mainly by convection
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
Claims (4)
- 扁平ボックス状をなす本体と、この本体内に挿入される冷却媒体供給管と、この冷却媒体供給管に取り付けられるとともに前記本体の内表面に向けて冷却媒体を噴出するノズルとを備えた冷却装置であって、前記ノズルは前記本体内の内表面に対して同一方向に斜めに配置され、また本体内の一端寄りに挿入された冷却媒体供給管には前記ノズルとは逆方向に傾斜したノズルも取り付けられていることを特徴とする冷却装置。
- 請求項1に記載の冷却装置において、前記本体は厚みが0.5mm〜1mmのステンレス、アルミニウム合金、銅合金などの金属板を接合してなり、上面の裏側にリブが形成されていることを特徴とする冷却装置。
- 請求項1に記載の冷却装置において、前記本体は上下に離間して配置され、これら上下に離間して配置される本体で基板を上下から冷却することを特徴とする冷却装置。
- 基板の搬送ラインの途中に露光装置を配置し、この露光装置の直前に、請求項1乃至請求項3の何れかに記載の冷却装置を配置したことを特徴とする基板の処理装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007148793A JP5103060B2 (ja) | 2007-06-05 | 2007-06-05 | 冷却装置及び基板の処理装置 |
US12/156,896 US8189169B2 (en) | 2007-06-05 | 2008-06-05 | Cooling apparatus and substrate treating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007148793A JP5103060B2 (ja) | 2007-06-05 | 2007-06-05 | 冷却装置及び基板の処理装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008305818A JP2008305818A (ja) | 2008-12-18 |
JP5103060B2 true JP5103060B2 (ja) | 2012-12-19 |
Family
ID=40095570
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007148793A Expired - Fee Related JP5103060B2 (ja) | 2007-06-05 | 2007-06-05 | 冷却装置及び基板の処理装置 |
Country Status (2)
Country | Link |
---|---|
US (1) | US8189169B2 (ja) |
JP (1) | JP5103060B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20100070888A (ko) * | 2008-12-18 | 2010-06-28 | 삼성전자주식회사 | 기판 처리 장치 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10312943A (ja) * | 1997-05-12 | 1998-11-24 | Komatsu Ltd | 温度制御装置 |
JP2002064133A (ja) * | 2000-03-30 | 2002-02-28 | Ibiden Co Ltd | 支持容器および半導体製造・検査装置 |
JP4153781B2 (ja) * | 2002-01-31 | 2008-09-24 | 大日本スクリーン製造株式会社 | 熱処理装置および基板処理装置 |
JP4115873B2 (ja) | 2003-04-14 | 2008-07-09 | 大日本スクリーン製造株式会社 | 熱処理装置および基板処理装置 |
JP2004207750A (ja) | 2004-02-12 | 2004-07-22 | Dainippon Screen Mfg Co Ltd | 基板処理装置 |
KR100543711B1 (ko) * | 2004-06-19 | 2006-01-20 | 삼성전자주식회사 | 열처리장치 |
US8550372B2 (en) * | 2005-03-02 | 2013-10-08 | Wisconsin Alumni Research Foundation | Full coverage spray and drainage system and method for orientation-independent removal of high heat flux |
JP4815847B2 (ja) | 2005-04-11 | 2011-11-16 | 株式会社ニコン | 基板処理装置及び露光装置 |
JP4535499B2 (ja) * | 2005-04-19 | 2010-09-01 | 東京エレクトロン株式会社 | 加熱装置、塗布、現像装置及び加熱方法 |
JP2007142190A (ja) * | 2005-11-18 | 2007-06-07 | Canon Inc | 露光装置及びデバイス製造方法 |
-
2007
- 2007-06-05 JP JP2007148793A patent/JP5103060B2/ja not_active Expired - Fee Related
-
2008
- 2008-06-05 US US12/156,896 patent/US8189169B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20080304027A1 (en) | 2008-12-11 |
US8189169B2 (en) | 2012-05-29 |
JP2008305818A (ja) | 2008-12-18 |
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