JP5052638B2 - 成膜方法 - Google Patents
成膜方法 Download PDFInfo
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- JP5052638B2 JP5052638B2 JP2010060091A JP2010060091A JP5052638B2 JP 5052638 B2 JP5052638 B2 JP 5052638B2 JP 2010060091 A JP2010060091 A JP 2010060091A JP 2010060091 A JP2010060091 A JP 2010060091A JP 5052638 B2 JP5052638 B2 JP 5052638B2
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- 238000000151 deposition Methods 0.000 title 1
- 239000007789 gas Substances 0.000 claims description 171
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 claims description 128
- 239000001272 nitrous oxide Substances 0.000 claims description 63
- 239000000758 substrate Substances 0.000 claims description 63
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 53
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 50
- 229910000077 silane Inorganic materials 0.000 claims description 50
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 34
- 229910052760 oxygen Inorganic materials 0.000 claims description 34
- 239000001301 oxygen Substances 0.000 claims description 34
- 238000000034 method Methods 0.000 claims description 26
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 46
- 229910052710 silicon Inorganic materials 0.000 description 46
- 239000010703 silicon Substances 0.000 description 46
- 230000015572 biosynthetic process Effects 0.000 description 23
- 238000005530 etching Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 4
- MWUXSHHQAYIFBG-UHFFFAOYSA-N nitrogen oxide Inorganic materials O=[N] MWUXSHHQAYIFBG-UHFFFAOYSA-N 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004020 conductor Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
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- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02263—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase
- H01L21/02271—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition
- H01L21/02274—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process deposition from the gas or vapour phase deposition by decomposition or reaction of gaseous or vapour phase compounds, i.e. chemical vapour deposition in the presence of a plasma [PECVD]
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- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45523—Pulsed gas flow or change of composition over time
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/022—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being a laminate, i.e. composed of sublayers, e.g. stacks of alternating high-k metal oxides
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- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02211—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
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- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14683—Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L2224/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
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- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
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- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14665—Imagers using a photoconductor layer
Description
成膜ガスをプラズマ化して、穴又は溝の側壁及び底面を含む基板の表面に酸化膜を形成する成膜方法であって、
前記穴又は溝の側壁及び底面を除いた前記基板の表面に形成される酸化膜の膜厚の、前記穴又は溝の底面に形成される酸化膜の膜厚に対する膜厚比が所定の膜厚比となるように、前記穴又は溝の側壁及び底面を除く前記基板の表面に、前記穴又は溝の底面よりも厚い膜厚の酸化膜を形成する成膜方法において、
第1ガスを前記成膜ガスとして用いたときの、前記膜厚比と前記穴又は溝のアスペクト比との関係を表す直線と、前記第1ガスよりも高い膜厚比が得られる第2ガスを前記成膜ガスとして用いたときの、前記膜厚比と前記穴又は溝のアスペクト比との関係を表す直線とによって囲まれた領域内に、目標とする膜厚比がある場合には、前記第1ガスと第2ガスとの2つのガスを用いて、前記目標とする膜厚比の酸化膜を形成するようにしたことを特徴とする成膜方法に係る。
c=a(0.5288×X+1)+b(2.7576×X+1)
(但し、b=(1−a)である。)
c=a(0.4×X+1)+b(3.4×X+1)
(但し、b=(1−a)である。)
11 処理チャンバ
12 下部電極
14 上部電極
25 ガス供給装置
81 シリコン基板
87 穴
88 酸化膜
K 構造体
Claims (3)
- 成膜ガスをプラズマ化して、穴又は溝の側壁及び底面を含む基板の表面に酸化膜を形成する成膜方法であって、
前記穴又は溝の側壁及び底面を除いた前記基板の表面に形成される酸化膜の膜厚の、前記穴又は溝の底面に形成される酸化膜の膜厚に対する膜厚比が所定の膜厚比となるように、前記穴又は溝の側壁及び底面を除く前記基板の表面に、前記穴又は溝の底面よりも厚い膜厚の酸化膜を形成する成膜方法において、
前記成膜ガスとして第1ガスを用いたときの、前記膜厚比と前記穴又は溝のアスペクト比との関係を表す直線と、前記第1ガスよりも高い膜厚比が得られる第2ガスを前記成膜ガスとして用いたときの、前記膜厚比と前記穴又は溝のアスペクト比との関係を表す直線とによって囲まれた領域内に、目標とする膜厚比がある場合には、前記第1ガスと第2ガスとの2つのガスを用いて、前記目標とする膜厚比の酸化膜を形成するようにしたことを特徴とする成膜方法。 - 前記第1ガスを、テトラエトキシシラン及び酸素を含む混合ガスとし、前記第2ガスを、シラン及び亜酸化窒素を含む混合ガスとするとともに、前記第1ガス及び第2ガスのいずれか一方を用いて酸化膜を形成した後、他方のガスを用いて酸化膜を形成し、テトラエトキシシラン及び酸素から形成される酸化膜と、シラン及び亜酸化窒素から形成される酸化膜とによって、前記目標とする膜厚比の酸化膜を形成するようにしたことを特徴とする請求項1記載の成膜方法。
- 前記第1ガスを、テトラエトキシシラン及び亜酸化窒素を含む混合ガスとし、前記第2ガスを、シラン及び亜酸化窒素を含む混合ガスとするとともに、前記第1ガス及び第2ガスを同時に用いて酸化膜を形成し、テトラエトキシシラン及び亜酸化窒素から形成される酸化膜と、シラン及び亜酸化窒素から形成される酸化膜とによって、前記目標とする膜厚比の酸化膜を形成するようにしたことを特徴とする請求項1記載の成膜方法。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010060091A JP5052638B2 (ja) | 2010-03-17 | 2010-03-17 | 成膜方法 |
PCT/JP2010/070971 WO2011114581A1 (ja) | 2010-03-17 | 2010-11-25 | 成膜方法 |
EP10847987.4A EP2549527B1 (en) | 2010-03-17 | 2010-11-25 | Deposition method |
US13/517,193 US8598049B2 (en) | 2010-03-17 | 2010-11-25 | Deposition method |
KR1020127016018A KR101312002B1 (ko) | 2010-03-17 | 2010-11-25 | 성막 방법 |
CN201080061492.5A CN102812539B (zh) | 2010-03-17 | 2010-11-25 | 沉积方法 |
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JP2010060091A JP5052638B2 (ja) | 2010-03-17 | 2010-03-17 | 成膜方法 |
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JP2011192938A JP2011192938A (ja) | 2011-09-29 |
JP5052638B2 true JP5052638B2 (ja) | 2012-10-17 |
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JP2010060091A Active JP5052638B2 (ja) | 2010-03-17 | 2010-03-17 | 成膜方法 |
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US (1) | US8598049B2 (ja) |
EP (1) | EP2549527B1 (ja) |
JP (1) | JP5052638B2 (ja) |
KR (1) | KR101312002B1 (ja) |
CN (1) | CN102812539B (ja) |
WO (1) | WO2011114581A1 (ja) |
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JP6616094B2 (ja) * | 2015-04-16 | 2019-12-04 | 株式会社iMott | 保護膜の製造方法 |
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EP2549527A1 (en) | 2013-01-23 |
JP2011192938A (ja) | 2011-09-29 |
US8598049B2 (en) | 2013-12-03 |
EP2549527B1 (en) | 2015-06-24 |
EP2549527A4 (en) | 2013-09-25 |
CN102812539B (zh) | 2014-10-22 |
CN102812539A (zh) | 2012-12-05 |
KR101312002B1 (ko) | 2013-09-27 |
US20120258604A1 (en) | 2012-10-11 |
WO2011114581A1 (ja) | 2011-09-22 |
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