JP5047462B2 - フラットパネルディスプレイ用基板のための低密度ガラス - Google Patents
フラットパネルディスプレイ用基板のための低密度ガラス Download PDFInfo
- Publication number
- JP5047462B2 JP5047462B2 JP2004532844A JP2004532844A JP5047462B2 JP 5047462 B2 JP5047462 B2 JP 5047462B2 JP 2004532844 A JP2004532844 A JP 2004532844A JP 2004532844 A JP2004532844 A JP 2004532844A JP 5047462 B2 JP5047462 B2 JP 5047462B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- glass material
- composition
- less
- range
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000011521 glass Substances 0.000 title claims description 129
- 239000000758 substrate Substances 0.000 title description 25
- 239000000203 mixture Substances 0.000 claims description 34
- 239000000463 material Substances 0.000 claims description 32
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 31
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 11
- 239000005357 flat glass Substances 0.000 claims description 9
- 229910000272 alkali metal oxide Inorganic materials 0.000 claims description 7
- 238000003286 fusion draw glass process Methods 0.000 claims description 7
- 230000004580 weight loss Effects 0.000 claims description 7
- 229910021193 La 2 O 3 Inorganic materials 0.000 claims description 4
- 230000003746 surface roughness Effects 0.000 claims description 4
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- 239000004973 liquid crystal related substance Substances 0.000 description 18
- 238000004519 manufacturing process Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 13
- 238000007499 fusion processing Methods 0.000 description 7
- 230000005684 electric field Effects 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 229910017855 NH 4 F Inorganic materials 0.000 description 4
- 238000004630 atomic force microscopy Methods 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- 238000002844 melting Methods 0.000 description 4
- 230000008018 melting Effects 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000001312 dry etching Methods 0.000 description 3
- 230000010287 polarization Effects 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000006124 Pilkington process Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 229910052785 arsenic Inorganic materials 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 238000007088 Archimedes method Methods 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910018068 Li 2 O Inorganic materials 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- IKWTVSLWAPBBKU-UHFFFAOYSA-N a1010_sial Chemical compound O=[As]O[As]=O IKWTVSLWAPBBKU-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 229910000413 arsenic oxide Inorganic materials 0.000 description 1
- 229960002594 arsenic trioxide Drugs 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 210000004027 cell Anatomy 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 210000002858 crystal cell Anatomy 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000006025 fining agent Substances 0.000 description 1
- FXOFAYKVTOLJTJ-UHFFFAOYSA-N fluoridooxygen(.) Chemical class F[O] FXOFAYKVTOLJTJ-UHFFFAOYSA-N 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 238000005816 glass manufacturing process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000003283 slot draw process Methods 0.000 description 1
- 238000010583 slow cooling Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
- C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
- C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/232,500 US6992030B2 (en) | 2002-08-29 | 2002-08-29 | Low-density glass for flat panel display substrates |
| US10/232,500 | 2002-08-29 | ||
| PCT/US2003/024038 WO2004020356A1 (en) | 2002-08-29 | 2003-08-01 | Low-density glass for flat panel display substrates |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2005537209A JP2005537209A (ja) | 2005-12-08 |
| JP2005537209A5 JP2005537209A5 (enExample) | 2006-08-31 |
| JP5047462B2 true JP5047462B2 (ja) | 2012-10-10 |
Family
ID=31977022
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004532844A Expired - Fee Related JP5047462B2 (ja) | 2002-08-29 | 2003-08-01 | フラットパネルディスプレイ用基板のための低密度ガラス |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6992030B2 (enExample) |
| EP (1) | EP1534641B1 (enExample) |
| JP (1) | JP5047462B2 (enExample) |
| KR (1) | KR20050059148A (enExample) |
| TW (1) | TWI253441B (enExample) |
| WO (1) | WO2004020356A1 (enExample) |
Families Citing this family (50)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI245026B (en) * | 2003-05-23 | 2005-12-11 | Picvue Optoelectronics Interna | Composition for producing glass substrate |
| JP4737709B2 (ja) | 2004-03-22 | 2011-08-03 | 日本電気硝子株式会社 | ディスプレイ基板用ガラスの製造方法 |
| EP3296274B1 (en) * | 2005-06-28 | 2023-04-26 | Corning Incorporated | Fining of boroalumino silicate glasses |
| KR100674860B1 (ko) * | 2005-08-10 | 2007-01-29 | 삼성전기주식회사 | 저온 소결용 글라스 프릿트 |
| TWI327559B (en) * | 2005-12-08 | 2010-07-21 | Corning Inc | Method of eliminating blisters in a glass making process |
| KR101399745B1 (ko) | 2006-02-10 | 2014-05-26 | 코닝 인코포레이티드 | 고온 및 화학적 안정성을 갖는 유리 조성물 및 그 제조방법 |
| JP5703535B2 (ja) * | 2006-05-23 | 2015-04-22 | 日本電気硝子株式会社 | 無アルカリガラス基板 |
| DE102006042620B4 (de) * | 2006-09-04 | 2012-01-26 | Schott Ag | Verwendung eines Aluminoborosilikatglases als Substratglas |
| US20080125014A1 (en) * | 2006-11-29 | 2008-05-29 | William Rogers Rosch | Sub-aperture deterministric finishing of high aspect ratio glass products |
| JP5808069B2 (ja) * | 2007-02-16 | 2015-11-10 | 日本電気硝子株式会社 | 太陽電池用ガラス基板 |
| FR2916198A1 (fr) * | 2007-05-16 | 2008-11-21 | Saint Gobain | Substrats de verre pour ecrans de visualisation |
| JP5435394B2 (ja) * | 2007-06-08 | 2014-03-05 | 日本電気硝子株式会社 | 強化ガラス基板及びその製造方法 |
| DE102008005857A1 (de) | 2008-01-17 | 2009-07-23 | Schott Ag | Alkalifreies Glas |
| US8445394B2 (en) | 2008-10-06 | 2013-05-21 | Corning Incorporated | Intermediate thermal expansion coefficient glass |
| US8975199B2 (en) | 2011-08-12 | 2015-03-10 | Corsam Technologies Llc | Fusion formable alkali-free intermediate thermal expansion coefficient glass |
| US8713967B2 (en) * | 2008-11-21 | 2014-05-06 | Corning Incorporated | Stable glass sheet and method for making same |
| JP2009167098A (ja) * | 2009-03-30 | 2009-07-30 | Nippon Electric Glass Co Ltd | ガラス基板 |
| US9637408B2 (en) * | 2009-05-29 | 2017-05-02 | Corsam Technologies Llc | Fusion formable sodium containing glass |
| US9371247B2 (en) * | 2009-05-29 | 2016-06-21 | Corsam Technologies Llc | Fusion formable sodium free glass |
| US8647995B2 (en) * | 2009-07-24 | 2014-02-11 | Corsam Technologies Llc | Fusion formable silica and sodium containing glasses |
| US20120135853A1 (en) * | 2010-11-30 | 2012-05-31 | Jaymin Amin | Glass articles/materials for use as touchscreen substrates |
| US9309146B2 (en) | 2011-02-22 | 2016-04-12 | Guardian Industries Corp. | Vanadium-based frit materials, binders, and/or solvents and methods of making the same |
| US9359247B2 (en) | 2011-02-22 | 2016-06-07 | Guardian Industries Corp. | Coefficient of thermal expansion filler for vanadium-based frit materials and/or methods of making and/or using the same |
| US9458052B2 (en) | 2011-02-22 | 2016-10-04 | Guardian Industries Corp. | Coefficient of thermal expansion filler for vanadium-based frit materials and/or methods of making and/or using the same |
| US9290408B2 (en) | 2011-02-22 | 2016-03-22 | Guardian Industries Corp. | Vanadium-based frit materials, and/or methods of making the same |
| US8802203B2 (en) | 2011-02-22 | 2014-08-12 | Guardian Industries Corp. | Vanadium-based frit materials, and/or methods of making the same |
| US9240568B2 (en) | 2011-11-10 | 2016-01-19 | Corning Incorporated | Opal glasses for light extraction |
| TWI564262B (zh) | 2012-02-29 | 2017-01-01 | 康寧公司 | 高ｃｔｅ之硼矽酸鉀核心玻璃與包含其之玻璃物件 |
| CN102690056B (zh) * | 2012-04-01 | 2015-09-16 | 东旭集团有限公司 | 一种平板显示器用的玻璃基板的配方 |
| CN105121371A (zh) | 2013-04-29 | 2015-12-02 | 康宁公司 | 光伏模块封装 |
| KR102255630B1 (ko) | 2013-08-15 | 2021-05-25 | 코닝 인코포레이티드 | 중간 내지 높은 ｃｔｅ 유리 및 이를 포함하는 유리 물품 |
| EP3831785A1 (en) * | 2013-08-15 | 2021-06-09 | Corning Incorporated | Alkali-doped and alkali-free boroaluminosilicate glass |
| US9593527B2 (en) | 2014-02-04 | 2017-03-14 | Guardian Industries Corp. | Vacuum insulating glass (VIG) unit with lead-free dual-frit edge seals and/or methods of making the same |
| US9988302B2 (en) | 2014-02-04 | 2018-06-05 | Guardian Glass, LLC | Frits for use in vacuum insulating glass (VIG) units, and/or associated methods |
| JP6691315B2 (ja) * | 2014-04-03 | 2020-04-28 | 日本電気硝子株式会社 | ガラス |
| US9902644B2 (en) * | 2014-06-19 | 2018-02-27 | Corning Incorporated | Aluminosilicate glasses |
| KR20170139680A (ko) | 2015-04-28 | 2017-12-19 | 코닝 인코포레이티드 | 출구 희생 커버 층을 사용하여 기판에 쓰루 홀을 레이저 드릴링하는 방법 및 이에 상응하는 피가공재 |
| MY194570A (en) * | 2016-05-06 | 2022-12-02 | Corning Inc | Laser cutting and removal of contoured shapes from transparent substrates |
| US10410883B2 (en) | 2016-06-01 | 2019-09-10 | Corning Incorporated | Articles and methods of forming vias in substrates |
| US10134657B2 (en) | 2016-06-29 | 2018-11-20 | Corning Incorporated | Inorganic wafer having through-holes attached to semiconductor wafer |
| US10794679B2 (en) | 2016-06-29 | 2020-10-06 | Corning Incorporated | Method and system for measuring geometric parameters of through holes |
| JP6714884B2 (ja) | 2016-09-13 | 2020-07-01 | Ａｇｃ株式会社 | 高周波デバイス用ガラス基板と高周波デバイス用回路基板 |
| US10580725B2 (en) | 2017-05-25 | 2020-03-03 | Corning Incorporated | Articles having vias with geometry attributes and methods for fabricating the same |
| US11078112B2 (en) | 2017-05-25 | 2021-08-03 | Corning Incorporated | Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same |
| US12180108B2 (en) | 2017-12-19 | 2024-12-31 | Corning Incorporated | Methods for etching vias in glass-based articles employing positive charge organic molecules |
| US11554984B2 (en) | 2018-02-22 | 2023-01-17 | Corning Incorporated | Alkali-free borosilicate glasses with low post-HF etch roughness |
| TWI814817B (zh) | 2018-05-01 | 2023-09-11 | 美商康寧公司 | 低鹼金屬高透射玻璃 |
| DK3887329T3 (da) | 2018-11-26 | 2024-04-29 | Owens Corning Intellectual Capital Llc | Højydelsesglasfibersammensætning med forbedret elasticitetskoefficient |
| WO2020112396A2 (en) | 2018-11-26 | 2020-06-04 | Ocv Intellectual Capital, Llc | High performance fiberglass composition with improved specific modulus |
| CN114685043A (zh) * | 2022-03-30 | 2022-07-01 | 彩虹显示器件股份有限公司 | 一种高液相线粘度的电子玻璃和制备方法 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3338696A (en) | 1964-05-06 | 1967-08-29 | Corning Glass Works | Sheet forming apparatus |
| BE757057A (fr) | 1969-10-06 | 1971-04-05 | Corning Glass Works | Procede et appareil de controle d'epaisseur d'une feuille de verre nouvellement etiree |
| US5374595A (en) | 1993-01-22 | 1994-12-20 | Corning Incorporated | High liquidus viscosity glasses for flat panel displays |
| US5459109A (en) | 1994-09-19 | 1995-10-17 | Corning Incorporated | Substrate glasses for plasma displays |
| EP0714862B1 (en) | 1994-11-30 | 1999-03-31 | Asahi Glass Company Ltd. | Alkali-free glass and flat panel display |
| JP3901757B2 (ja) * | 1994-11-30 | 2007-04-04 | 旭硝子株式会社 | 無アルカリガラス、液晶ディスプレイパネルおよびガラス板 |
| US6508083B1 (en) * | 1996-08-21 | 2003-01-21 | Nippon Electric Glass Co., Ltd. | Alkali-free glass and method for producing the same |
| US6060168A (en) | 1996-12-17 | 2000-05-09 | Corning Incorporated | Glasses for display panels and photovoltaic devices |
| US6468933B1 (en) * | 1998-09-22 | 2002-10-22 | Nippon Electric Glass Co., Ltd. | Alkali-free glass and method of producing the same |
| EP1152990B1 (en) | 1998-11-30 | 2012-10-10 | Corning Incorporated | Glasses for flat panel displays |
| US6537937B1 (en) * | 1999-08-03 | 2003-03-25 | Asahi Glass Company, Limited | Alkali-free glass |
| JP4576680B2 (ja) * | 1999-08-03 | 2010-11-10 | 旭硝子株式会社 | 無アルカリガラス |
| DE19939789A1 (de) * | 1999-08-21 | 2001-02-22 | Schott Glas | Alkalifreie Aluminoborosilicatgläser und deren Verwendungen |
| JP2001151534A (ja) * | 1999-11-25 | 2001-06-05 | Nippon Electric Glass Co Ltd | 液晶ディスプレイ用ガラス基板 |
| DE10000837C1 (de) * | 2000-01-12 | 2001-05-31 | Schott Glas | Alkalifreie Aluminoborosilicatgläser und ihre Verwendungen |
| JP2001348247A (ja) * | 2000-05-31 | 2001-12-18 | Asahi Glass Co Ltd | 無アルカリガラス |
| JP2002193636A (ja) * | 2000-12-25 | 2002-07-10 | Nippon Sheet Glass Co Ltd | 無アルカリガラスとその製造方法をそれを用いて得られるフラットディスプレーパネル |
| JP2002308643A (ja) | 2001-02-01 | 2002-10-23 | Nippon Electric Glass Co Ltd | 無アルカリガラス及びディスプレイ用ガラス基板 |
| JP4453240B2 (ja) * | 2002-05-16 | 2010-04-21 | 日本電気硝子株式会社 | 無アルカリガラス及びこれを用いたディスプレイ用ガラス基板 |
-
2002
- 2002-08-29 US US10/232,500 patent/US6992030B2/en not_active Expired - Lifetime
-
2003
- 2003-08-01 WO PCT/US2003/024038 patent/WO2004020356A1/en not_active Ceased
- 2003-08-01 KR KR1020057003324A patent/KR20050059148A/ko not_active Ceased
- 2003-08-01 EP EP03791625.1A patent/EP1534641B1/en not_active Expired - Lifetime
- 2003-08-01 JP JP2004532844A patent/JP5047462B2/ja not_active Expired - Fee Related
- 2003-08-05 TW TW092121445A patent/TWI253441B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1534641B1 (en) | 2015-04-01 |
| US20040043887A1 (en) | 2004-03-04 |
| KR20050059148A (ko) | 2005-06-17 |
| JP2005537209A (ja) | 2005-12-08 |
| TWI253441B (en) | 2006-04-21 |
| TW200417528A (en) | 2004-09-16 |
| EP1534641A1 (en) | 2005-06-01 |
| WO2004020356A1 (en) | 2004-03-11 |
| US6992030B2 (en) | 2006-01-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5047462B2 (ja) | フラットパネルディスプレイ用基板のための低密度ガラス | |
| JP4547093B2 (ja) | フラットパネルディスプレイ用ガラス | |
| KR101431846B1 (ko) | 보로알루미노 실리케이트 유리 | |
| JP2001506223A (ja) | ディスプレイパネル用ガラスおよび光電圧装置 | |
| JP7396413B2 (ja) | ガラス | |
| JP2024028446A (ja) | 無アルカリガラス | |
| JP2014501682A (ja) | フラットパネルディスプレイ用の無アルカリガラスとその溶融工程 | |
| KR100813772B1 (ko) | 평평한 패널 디스플레이용 유리 | |
| HK1070639B (en) | Glasses for flat panel displays |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20060707 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20060707 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090707 |
|
| A601 | Written request for extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A601 Effective date: 20091007 |
|
| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20091015 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091109 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100302 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120718 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150727 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 5047462 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |