JP5037137B2 - 接着力の向上した新規アンダーフィル材料 - Google Patents
接着力の向上した新規アンダーフィル材料 Download PDFInfo
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- JP5037137B2 JP5037137B2 JP2006545646A JP2006545646A JP5037137B2 JP 5037137 B2 JP5037137 B2 JP 5037137B2 JP 2006545646 A JP2006545646 A JP 2006545646A JP 2006545646 A JP2006545646 A JP 2006545646A JP 5037137 B2 JP5037137 B2 JP 5037137B2
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- JP
- Japan
- Prior art keywords
- anhydride
- epoxy
- group
- colloidal silica
- aryl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000000463 material Substances 0.000 title description 29
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 92
- 239000000203 mixture Substances 0.000 claims description 82
- 239000004593 Epoxy Substances 0.000 claims description 68
- 229920000647 polyepoxide Polymers 0.000 claims description 63
- 239000008119 colloidal silica Substances 0.000 claims description 59
- 239000003822 epoxy resin Substances 0.000 claims description 55
- -1 siloxane anhydrides Chemical class 0.000 claims description 49
- 239000003795 chemical substances by application Substances 0.000 claims description 36
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 claims description 29
- 230000001588 bifunctional effect Effects 0.000 claims description 27
- 125000003118 aryl group Chemical group 0.000 claims description 24
- 125000000217 alkyl group Chemical group 0.000 claims description 17
- 239000000945 filler Substances 0.000 claims description 15
- 150000008064 anhydrides Chemical class 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 11
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 claims description 10
- 239000000565 sealant Substances 0.000 claims description 9
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 8
- 239000002245 particle Substances 0.000 claims description 8
- 125000003342 alkenyl group Chemical group 0.000 claims description 6
- 125000003545 alkoxy group Chemical group 0.000 claims description 6
- 239000007787 solid Substances 0.000 claims description 6
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 claims description 5
- 229910052739 hydrogen Inorganic materials 0.000 claims description 4
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 claims description 3
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 claims description 3
- 229910052736 halogen Inorganic materials 0.000 claims description 3
- 150000002367 halogens Chemical class 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 claims description 2
- AGULWIQIYWWFBJ-UHFFFAOYSA-N 3,4-dichlorofuran-2,5-dione Chemical compound ClC1=C(Cl)C(=O)OC1=O AGULWIQIYWWFBJ-UHFFFAOYSA-N 0.000 claims description 2
- WVRNUXJQQFPNMN-VAWYXSNFSA-N 3-[(e)-dodec-1-enyl]oxolane-2,5-dione Chemical compound CCCCCCCCCC\C=C\C1CC(=O)OC1=O WVRNUXJQQFPNMN-VAWYXSNFSA-N 0.000 claims description 2
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 claims description 2
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 claims description 2
- FLBJFXNAEMSXGL-UHFFFAOYSA-N het anhydride Chemical compound O=C1OC(=O)C2C1C1(Cl)C(Cl)=C(Cl)C2(Cl)C1(Cl)Cl FLBJFXNAEMSXGL-UHFFFAOYSA-N 0.000 claims description 2
- MUTGBJKUEZFXGO-UHFFFAOYSA-N hexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21 MUTGBJKUEZFXGO-UHFFFAOYSA-N 0.000 claims description 2
- KNRCVAANTQNTPT-UHFFFAOYSA-N methyl-5-norbornene-2,3-dicarboxylic anhydride Chemical compound O=C1OC(=O)C2C1C1(C)C=CC2C1 KNRCVAANTQNTPT-UHFFFAOYSA-N 0.000 claims description 2
- AUHHYELHRWCWEZ-UHFFFAOYSA-N tetrachlorophthalic anhydride Chemical compound ClC1=C(Cl)C(Cl)=C2C(=O)OC(=O)C2=C1Cl AUHHYELHRWCWEZ-UHFFFAOYSA-N 0.000 claims description 2
- 239000004215 Carbon black (E152) Substances 0.000 claims 2
- 229930195733 hydrocarbon Natural products 0.000 claims 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 2
- 150000002431 hydrogen Chemical class 0.000 claims 2
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 claims 1
- 229920005989 resin Polymers 0.000 description 38
- 239000011347 resin Substances 0.000 description 38
- 239000006185 dispersion Substances 0.000 description 28
- 238000009472 formulation Methods 0.000 description 23
- 229910000679 solder Inorganic materials 0.000 description 21
- 238000000034 method Methods 0.000 description 17
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 14
- 239000003054 catalyst Substances 0.000 description 14
- 150000001875 compounds Chemical class 0.000 description 14
- 239000000126 substance Substances 0.000 description 14
- 239000000047 product Substances 0.000 description 13
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 12
- 239000000178 monomer Substances 0.000 description 12
- IISBACLAFKSPIT-UHFFFAOYSA-N Bisphenol A Natural products C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 10
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- 239000002904 solvent Substances 0.000 description 10
- 238000009835 boiling Methods 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 9
- 239000011342 resin composition Substances 0.000 description 9
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 8
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 8
- 238000002360 preparation method Methods 0.000 description 8
- 230000008569 process Effects 0.000 description 8
- 150000001412 amines Chemical class 0.000 description 7
- 238000005336 cracking Methods 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- 235000012239 silicon dioxide Nutrition 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 6
- 125000003700 epoxy group Chemical group 0.000 description 6
- 230000009477 glass transition Effects 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 229930185605 Bisphenol Natural products 0.000 description 5
- XINAQPROOGNKIN-UHFFFAOYSA-N C1C(C(=O)O)CCC=C1CC1=CCCCC1 Chemical compound C1C(C(=O)O)CCC=C1CC1=CCCCC1 XINAQPROOGNKIN-UHFFFAOYSA-N 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 5
- 239000003085 diluting agent Substances 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 239000004848 polyfunctional curative Substances 0.000 description 5
- 239000011541 reaction mixture Substances 0.000 description 5
- 239000000725 suspension Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 125000002723 alicyclic group Chemical group 0.000 description 4
- 239000002585 base Substances 0.000 description 4
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 4
- 239000003153 chemical reaction reagent Substances 0.000 description 4
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical compound C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 4
- 239000008393 encapsulating agent Substances 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 150000002894 organic compounds Chemical class 0.000 description 4
- 229920001568 phenolic resin Polymers 0.000 description 4
- 150000002989 phenols Chemical class 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 229910052697 platinum Inorganic materials 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- 239000003352 sequestering agent Substances 0.000 description 4
- 238000005382 thermal cycling Methods 0.000 description 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 description 3
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 239000005909 Kieselgur Substances 0.000 description 3
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 3
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 3
- 239000011353 cycloaliphatic epoxy resin Substances 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 125000003709 fluoroalkyl group Chemical group 0.000 description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 238000006459 hydrosilylation reaction Methods 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical class [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 229920002717 polyvinylpyridine Polymers 0.000 description 3
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 3
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- UNMJLQGKEDTEKJ-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methanol Chemical compound CCC1(CO)COC1 UNMJLQGKEDTEKJ-UHFFFAOYSA-N 0.000 description 2
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 2
- LVLNPXCISNPHLE-UHFFFAOYSA-N 2-[(4-hydroxyphenyl)methyl]phenol Chemical compound C1=CC(O)=CC=C1CC1=CC=CC=C1O LVLNPXCISNPHLE-UHFFFAOYSA-N 0.000 description 2
- GJYCVCVHRSWLNY-UHFFFAOYSA-N 2-butylphenol Chemical compound CCCCC1=CC=CC=C1O GJYCVCVHRSWLNY-UHFFFAOYSA-N 0.000 description 2
- UZFMOKQJFYMBGY-UHFFFAOYSA-N 4-hydroxy-TEMPO Chemical group CC1(C)CC(O)CC(C)(C)N1[O] UZFMOKQJFYMBGY-UHFFFAOYSA-N 0.000 description 2
- RBHIUNHSNSQJNG-UHFFFAOYSA-N 6-methyl-3-(2-methyloxiran-2-yl)-7-oxabicyclo[4.1.0]heptane Chemical compound C1CC2(C)OC2CC1C1(C)CO1 RBHIUNHSNSQJNG-UHFFFAOYSA-N 0.000 description 2
- 229920003319 Araldite® Polymers 0.000 description 2
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
- OWYWGLHRNBIFJP-UHFFFAOYSA-N Ipazine Chemical compound CCN(CC)C1=NC(Cl)=NC(NC(C)C)=N1 OWYWGLHRNBIFJP-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- YTEISYFNYGDBRV-UHFFFAOYSA-N [(dimethyl-$l^{3}-silanyl)oxy-dimethylsilyl]oxy-dimethylsilicon Chemical compound C[Si](C)O[Si](C)(C)O[Si](C)C YTEISYFNYGDBRV-UHFFFAOYSA-N 0.000 description 2
- LAUIXFSZFKWUCT-UHFFFAOYSA-N [4-[2-(4-phosphonooxyphenyl)propan-2-yl]phenyl] dihydrogen phosphate Chemical compound C=1C=C(OP(O)(O)=O)C=CC=1C(C)(C)C1=CC=C(OP(O)(O)=O)C=C1 LAUIXFSZFKWUCT-UHFFFAOYSA-N 0.000 description 2
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000005233 alkylalcohol group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- FSIJKGMIQTVTNP-UHFFFAOYSA-N bis(ethenyl)-methyl-trimethylsilyloxysilane Chemical compound C[Si](C)(C)O[Si](C)(C=C)C=C FSIJKGMIQTVTNP-UHFFFAOYSA-N 0.000 description 2
- 229940106691 bisphenol a Drugs 0.000 description 2
- 239000002981 blocking agent Substances 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 2
- 239000007859 condensation product Substances 0.000 description 2
- 125000006159 dianhydride group Chemical group 0.000 description 2
- 239000003063 flame retardant Substances 0.000 description 2
- 239000005350 fused silica glass Substances 0.000 description 2
- 150000004678 hydrides Chemical class 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 2
- 230000014759 maintenance of location Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 229910000000 metal hydroxide Inorganic materials 0.000 description 2
- 150000004692 metal hydroxides Chemical class 0.000 description 2
- 239000002105 nanoparticle Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 125000000466 oxiranyl group Chemical group 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- DNIAPMSPPWPWGF-VKHMYHEASA-N (+)-propylene glycol Chemical compound C[C@H](O)CO DNIAPMSPPWPWGF-VKHMYHEASA-N 0.000 description 1
- BGGGMYCMZTXZBY-UHFFFAOYSA-N (3-hydroxyphenyl) phosphono hydrogen phosphate Chemical compound OC1=CC=CC(OP(O)(=O)OP(O)(O)=O)=C1 BGGGMYCMZTXZBY-UHFFFAOYSA-N 0.000 description 1
- CIRMGZKUSBCWRL-LHLOQNFPSA-N (e)-10-[2-(7-carboxyheptyl)-5,6-dihexylcyclohex-3-en-1-yl]dec-9-enoic acid Chemical compound CCCCCCC1C=CC(CCCCCCCC(O)=O)C(\C=C\CCCCCCCC(O)=O)C1CCCCCC CIRMGZKUSBCWRL-LHLOQNFPSA-N 0.000 description 1
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 1
- HCNHNBLSNVSJTJ-UHFFFAOYSA-N 1,1-Bis(4-hydroxyphenyl)ethane Chemical compound C=1C=C(O)C=CC=1C(C)C1=CC=C(O)C=C1 HCNHNBLSNVSJTJ-UHFFFAOYSA-N 0.000 description 1
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- 150000005207 1,3-dihydroxybenzenes Chemical class 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- YDIZFUMZDHUHSH-UHFFFAOYSA-N 1,7-bis(ethenyl)-3,8-dioxatricyclo[5.1.0.02,4]oct-5-ene Chemical compound C12OC2C=CC2(C=C)C1(C=C)O2 YDIZFUMZDHUHSH-UHFFFAOYSA-N 0.000 description 1
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- 125000001624 naphthyl group Chemical group 0.000 description 1
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- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 238000013386 optimize process Methods 0.000 description 1
- 238000012536 packaging technology Methods 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 150000002978 peroxides Chemical class 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920000166 polytrimethylene carbonate Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 239000010948 rhodium Substances 0.000 description 1
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- SCPYDCQAZCOKTP-UHFFFAOYSA-N silanol Chemical compound [SiH3]O SCPYDCQAZCOKTP-UHFFFAOYSA-N 0.000 description 1
- 229910052990 silicon hydride Inorganic materials 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- CCEKAJIANROZEO-UHFFFAOYSA-N sulfluramid Chemical group CCNS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F CCEKAJIANROZEO-UHFFFAOYSA-N 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MDDUHVRJJAFRAU-YZNNVMRBSA-N tert-butyl-[(1r,3s,5z)-3-[tert-butyl(dimethyl)silyl]oxy-5-(2-diphenylphosphorylethylidene)-4-methylidenecyclohexyl]oxy-dimethylsilane Chemical compound C1[C@@H](O[Si](C)(C)C(C)(C)C)C[C@H](O[Si](C)(C)C(C)(C)C)C(=C)\C1=C/CP(=O)(C=1C=CC=CC=1)C1=CC=CC=C1 MDDUHVRJJAFRAU-YZNNVMRBSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- LZWMWONAYYGKMP-UHFFFAOYSA-N trimethyl-[methyl-bis[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silyl]oxysilane Chemical compound C1CC2OC2CC1CC[Si](C)(O[Si](C)(C)C)CCC1CC2OC2CC1 LZWMWONAYYGKMP-UHFFFAOYSA-N 0.000 description 1
- 239000005051 trimethylchlorosilane Substances 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 150000004072 triols Chemical class 0.000 description 1
- XZZNDPSIHUTMOC-UHFFFAOYSA-N triphenyl phosphate Chemical compound C=1C=CC=CC=1OP(OC=1C=CC=CC=1)(=O)OC1=CC=CC=C1 XZZNDPSIHUTMOC-UHFFFAOYSA-N 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/423—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof containing an atom other than oxygen belonging to a functional groups to C08G59/42, carbon and hydrogen
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/38—Polysiloxanes modified by chemical after-treatment
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
- Y10T428/31515—As intermediate layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31652—Of asbestos
- Y10T428/31663—As siloxane, silicone or silane
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Epoxy Resins (AREA)
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
Description
MaM′bDcD′dTeT′fQg
式中、下付文字a、b、c、d、e、f及びgはゼロ又は正の整数であるが、下付文字b、d及びfの合計は1以上である。また、Mは式R1 3SiO1/2を有し、M′は式(Z)R2 2SiO1/2を有し、Dは式R3 2SiO2/2を有し、D′は式(Z)R4SiO2/2を有し、Tは式R5SiO3/2を有し、T′は式(Z)SiO3/2を有し、Qは式SiO4/2を有する。これらの式中、各R1、R2、R3、R4、R5は独立に水素原子、C1−22アルキル、C1−22アルコキシ、C2−22アルケニル、C6−14アリール、C6−22アルキル置換アリール、又はC6−22アリールアルキルであり、これらの基はハロゲン化、例えばフッ素化されてC1−22フルオロアルキルのようなフルオロカーボンを含有していてもよいし、又はアミノ基を含有してアミノアルキル、例えばアミノプロピル若しくはアミノエチルアミノプロピルを形成していてもよく、又は式(CH2CHR6O)kのポリエーテル単位を含有していてもよく、この式中のR6はCH3又はHであり、kは約4〜20の範囲である。さらに、上記式中のZは独立にエポキシ基を含有する基を表す。本発明の様々な実施形態で使用する用語「アルキル」はノルマルアルキル、枝分かれアルキル、アラルキル、及びシクロアルキル基を表す。ノルマル及び枝分かれアルキル基は好ましくは約1〜約12個の範囲の炭素原子を含有するものであり、具体的な非限定的な例としてはメチル、エチル、プロピル、イソプロピル、ブチル、tert−ブチル、ペンチル、ネオペンチル、及びヘキシルがある。表されるシクロアルキル基は好ましくは約4〜約12個の範囲の環炭素原子を含有するものである。これらのシクロアルキル基の幾つかの具体的な非限定的な例としては、シクロブチル、シクロペンチル、シクロヘキシル、メチルシクロヘキシル、及びシクロヘプチルがある。好ましいアラルキル基は約7〜約14個の範囲の炭素原子を含有するものであり、特に限定されないが、ベンジル、フェニルブチル、フェニルプロピル、及びフェニルエチルがある。本発明の様々な実施形態で使用するアリール基は好ましくは約6〜約14個の範囲の環炭素原子を含有するものである。これらのアリール基の幾つかの具体的な非限定的な例としては、フェニル、ビフェニル、及びナフチルがある。適切なハロゲン化部分の具体的な非限定的な例が3,3,3−トリフルオロプロピルである。
H−SiR″2−[O−SiR′2]X−O−SiR″2−H (4)
式中、Xは0〜50であることができ、好ましくはXは0〜10であることができ、最も好ましくはXは1〜6であることができ、R′、R″=メチル、エチル、又はフェニル、最も好ましくはメチルである。ヒドロシリル化工程は触媒量の白金、ロジウム又はイリジウムのような貴金属の存在下で実施する。Karstedt触媒といわれ米国特許第3775442号に記載されているPt0とジビニルテトラメチルジシロキサンとの錯体が好ましい。これらの二無水物の合成の一例を以下のスキーム1に示す。
(R7)aSi(OR8)4−a
式中、R7は独立にC1−18一価炭化水素基であり、場合によりさらにアルキルアクリレート、アルキルメタクリレート、エポキシド基、又はC6−14アリール若しくはアルキル基で官能化されていてもよく、R8は独立にC1−18一価炭化水素基又は水素基であり、「a」は1〜3に等しい整数である。好ましくは、本発明に包含されるオルガノアルコキシシランは、2−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、3−グリシドキシプロピルトリメトキシシラン、フェニルトリメトキシシラン、及びメタクリルオキシプロピルトリメトキシシランである。官能性の組合せも可能である。
二官能性シロキサン無水物の調製
メカニカルスターラー、温度計、凝縮器、添加 漏斗及び窒素導入口を備えた500ミリリットル(ml)のフラスコに、127グラム(0.77mol)の5−ノルボルネン−2,3−ジカルボン酸無水物、150グラムのトルエン及び20ppmの白金(Karstedt触媒、すなわち米国特許第3775442号に記載のPt0とジビニルテトラメチルジシロキサンの錯体として)を仕込んだ。この溶液を80℃まで加熱し、その時点で反応混合物に84.3グラム(0.4mol)の1,1,3,3,5,5−ヘキサメチルトリシロキサンを滴下して加えた。穏やかな発熱が起こり、温度が100℃まで上昇した。シリコーンヒドリドの添加は1時間で完了した。反応混合物をさらに1時間80℃で撹拌した。Avatar 370 FT−IR(Thermo Electron Corporation製)を用いて赤外(IR)分析を行った。その結果、Si−H基の75%の変換が示された。20ppmの白金触媒を追加して加え、反応混合物を80℃に加熱し、窒素下で一晩撹拌した。翌朝、再びIR分析したところ、結果は99%より多くのSi−Hの消費を示した。この時点で反応混合物を室温まで冷却した。
官能化コロイダルシリカ予備分散物の調製
以下の手順を用いて官能化コロイダルシリカ予備分散物(予備分散物1)を調製した。すなわち、約34重量%の20nm粒子のシリカを含有する465グラムの水性コロイダルシリカ(Nalco 1034A、Nalco Chemical社)を、800グラムのイソプロパノール(Aldrich)及び56.5グラムのフェニルトリメトキシシラン(Aldrich)と撹拌することによって混合した。この混合物を2時間60〜70℃に加熱して透明な懸濁液を得た。得られた予備分散物1を室温に冷却し、ガラス瓶に保存した。
安定化された官能化コロイダルシリカを含有する樹脂1の調製
1000mlのフラスコに、実施例2で得られた300グラムのコロイダルシリカ予備分散物1、溶媒として150グラムの1−メトキシ−2−プロパノール(Aldrich)、及び0.5グラムの架橋ポリビニルピリジンを仕込んだ。この混合物を70℃で撹拌した。1時間後、懸濁液を4グラムのCelite(登録商標)545(市販のケイ藻土ろ過助剤)とブレンドし、室温に冷却し、ろ過した。得られた官能化コロイダルシリカの分散物を、40グラムの3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート(UVR6105、Dow Chemical社)とブレンドし、一定の重量になるまで75℃、1トルで真空ストリッピングして87.9グラムの粘稠な液状樹脂(樹脂1)を得た。
安定化された官能化コロイダルシリカを含有する樹脂2の調製
1000−ミリリットル(ml)のフラスコに、実施例2で得られた300グラムのコロイダルシリカ予備分散物1、溶媒として150グラムの1−メトキシ−2−プロパノール(Aldrich)、及び0.5グラムの架橋ポリビニルピリジンを仕込んだ。混合物を70℃で撹拌した。1時間後、懸濁液を4グラムのCelite(登録商標)545(市販のケイ藻土ろ過助剤)とブレンドし、室温に冷却し、ろ過した。得られた官能化コロイダルシリカの分散物を、30グラムの3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート(UVR6105、Dow Chemical社)、及び10グラムのビスフェノール−Fエポキシ樹脂(RSL−1739、Resolution Performance Product)とブレンドし、一定の重量になるまで75℃、1トルで真空ストリッピングして、88.7グラムの粘稠な液状樹脂(樹脂2)を得た。
安定化された官能化コロイダルシリカを含有する樹脂3の調製
1000−ミリリットル(ml)のフラスコに、実施例2で得られた300グラムのコロイダルシリカ予備分散物1、溶媒として150グラムの1−メトキシ−2−プロパノール(Aldrich)、及び0.5グラムの架橋ポリビニルピリジンを仕込んだ。混合物を70℃で撹拌した。1時間後、懸濁液を4グラムのCelite(登録商標)545(市販のケイ藻土ろ過助剤)とブレンドし、室温に冷却し、ろ過した。得られた官能化コロイダルシリカの分散物を、30グラムの3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート(UVR6105、Dow Chemical社)、及び10グラムのEpon824エポキシ樹脂(Resolution Performance Product)とブレンドし、一定の重量になるまで75℃、1トルで真空ストリッピングして、88.0グラムの粘稠な液状樹脂(樹脂3)を得た。
封鎖された官能化コロイダルシリカを含有する樹脂4の調製
丸底フラスコに、実施例2で得られた100グラムのコロイダルシリカ予備分散物2、及び100グラムの1−メトキシ−2−プロパノールを仕込んだ。100グラムの全混合物を50トルの低い真空下60℃で蒸留した。2グラムのヘキサメチルジシラザン(HMDZ)を官能化コロイダルシリカの濃縮分散物に滴下して加えた。混合物を1時間還流下で撹拌した。1時間後、混合物を室温に冷却し、Celite(登録商標)545をフラスコに加え、ろ過した。官能化コロイダルシリカの透明な分散物を、10.5グラムのUVR6105(Dow Chemical社)、及び3.5グラムのRSL−1739(Resolution Performance Product)とブレンドし、一定の重量になるまで75℃、1トルで真空ストリッピングして、28グラムの粘稠な液状樹脂(樹脂4)を得た。
硬化性エポキシ配合物の調製
実施例3、4、5及び6の官能化コロイダルシリカ樹脂を、室温で、所望の量の4−メチル−ヘキサヒドロフタル酸無水物(MHHPA)(Aldrich製)及び5,5′−(1,1,3,3,5,5−ヘキサメチル−1,5−トリシロキサンジイル)ビス[ヘキサヒドロ−4,7−メタノイソベンゾフラン−1,3−ジオン](TriSDA)(実施例1の二官能性シロキサン無水物生成物)と別々にブレンドした。(これらの配合物に関する詳細は下記表に示す。)所望の量の触媒(Polycat SA−1、Air Products)及び下記表に示す任意の添加剤を室温で加えた。配合物を室温で約10分ブレンドした後、配合物を高真空下室温で20分間脱ガスした。得られた物質を−40℃で保存した。
Claims (8)
- 1種以上のエポキシ樹脂を1種以上のエポキシ硬化剤と共に含んでなるアンダーフィル組成物であって、該1種以上のエポキシ硬化剤が1種以上の二官能性シロキサン無水物を含み、
さらに、オルガノアルコキシシランで官能化された粒径1〜500nmのコロイダルシリカ充填材を含み、
前記コロイダルシリカがシリル化剤で末端封鎖されている、
アンダーフィル組成物。 - 1種以上の二官能性シロキサン無水物が次式を有する、請求項1記載のアンダーフィル組成物。
- さらに、メチルヘキサヒドロフタル酸無水物(MHHPA)、メチルテトラヒドロフタル酸無水物、1,2−シクロヘキサンジカルボン酸無水物、ビシクロ[2.2.1]ヘプト−5−エン−2,3−ジカルボン酸無水物、メチルビシクロ[2.2.1]ヘプト−5−エン−2,3−ジカルボン酸無水物、フタル酸無水物、ピロメリト酸二無水物、ヘキサヒドロフタル酸無水物、ドデセニルコハク酸無水物、ジクロロマレイン酸無水物、クロレンド酸無水物、テトラクロロフタル酸無水物、及びこれらの混合物からなる群から選択される1種以上の無水物エポキシ硬化剤を含む、請求項1記載のアンダーフィル組成物。
- さらに、メチルヘキサヒドロフタル酸無水物、ヘキサヒドロフタル酸無水物、及びテトラヒドロフタル酸無水物からなる群から選択される液状エポキシ硬化剤を含む、請求項1記載のアンダーフィル組成物。
- 封止剤が、さらに、メチルヘキサヒドロフタル酸無水物、ヘキサヒドロフタル酸無水物、及びテトラヒドロフタル酸無水物からなる群から選択される液状エポキシ硬化剤を含む、請求項6記載のパッケージされた固体素子。
- コロイダルシリカがシリル化剤で末端封鎖されている、請求項6記載のパッケージされた固体素子。
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US10/737,453 US7279223B2 (en) | 2003-12-16 | 2003-12-16 | Underfill composition and packaged solid state device |
US10/737,453 | 2003-12-16 | ||
PCT/US2004/038009 WO2005061588A1 (en) | 2003-12-16 | 2004-11-15 | Novel underfill material having enhanced adhesion |
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JP (1) | JP5037137B2 (ja) |
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WO2022173725A1 (en) * | 2021-02-10 | 2022-08-18 | Dow Silicones Corporation | Silicone elastomer compositions |
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WO2005061588A1 (en) | 2005-07-07 |
US7279223B2 (en) | 2007-10-09 |
TWI374159B (en) | 2012-10-11 |
EP1697441A1 (en) | 2006-09-06 |
TW200533697A (en) | 2005-10-16 |
KR20060123335A (ko) | 2006-12-01 |
MY145804A (en) | 2012-04-30 |
JP2007516331A (ja) | 2007-06-21 |
CN100543067C (zh) | 2009-09-23 |
KR101258709B1 (ko) | 2013-04-26 |
CN1918216A (zh) | 2007-02-21 |
EP1697441B1 (en) | 2012-05-02 |
US20050129956A1 (en) | 2005-06-16 |
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