JP5031038B2 - 有機溶液を用いた廃印刷回路基板から金属を回収する方法 - Google Patents
有機溶液を用いた廃印刷回路基板から金属を回収する方法 Download PDFInfo
- Publication number
- JP5031038B2 JP5031038B2 JP2009541240A JP2009541240A JP5031038B2 JP 5031038 B2 JP5031038 B2 JP 5031038B2 JP 2009541240 A JP2009541240 A JP 2009541240A JP 2009541240 A JP2009541240 A JP 2009541240A JP 5031038 B2 JP5031038 B2 JP 5031038B2
- Authority
- JP
- Japan
- Prior art keywords
- printed circuit
- metal
- waste printed
- circuit board
- organic solvent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 229910052751 metal Inorganic materials 0.000 title claims description 53
- 239000002184 metal Substances 0.000 title claims description 52
- 239000002699 waste material Substances 0.000 title claims description 49
- 238000000034 method Methods 0.000 title claims description 32
- 150000002739 metals Chemical class 0.000 title description 9
- 239000003960 organic solvent Substances 0.000 claims description 28
- 239000004033 plastic Substances 0.000 claims description 26
- 229920003023 plastic Polymers 0.000 claims description 26
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 24
- 238000000926 separation method Methods 0.000 claims description 16
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 claims description 15
- 238000003756 stirring Methods 0.000 claims description 13
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 7
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 6
- -1 HCON (CH 3 ) 2 ) Chemical compound 0.000 claims description 3
- 238000001035 drying Methods 0.000 claims description 3
- 238000001914 filtration Methods 0.000 claims description 3
- 238000005406 washing Methods 0.000 claims description 3
- 238000005520 cutting process Methods 0.000 description 8
- 239000000126 substance Substances 0.000 description 7
- 238000011084 recovery Methods 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 4
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 229910000510 noble metal Inorganic materials 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 208000006558 Dental Calculus Diseases 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000013522 chelant Substances 0.000 description 3
- 239000003365 glass fiber Substances 0.000 description 3
- 229910052755 nonmetal Inorganic materials 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000013019 agitation Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 238000007873 sieving Methods 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000002893 slag Substances 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229920000049 Carbon (fiber) Polymers 0.000 description 1
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 238000003723 Smelting Methods 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000004917 carbon fiber Substances 0.000 description 1
- 238000003763 carbonization Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000003480 eluent Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000012943 hotmelt Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical group [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/306—Chemical or electrical treatment, e.g. electrolytic etching
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
- C22B7/005—Separation by a physical processing technique only, e.g. by mechanical breaking
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B7/00—Working up raw materials other than ores, e.g. scrap, to produce non-ferrous metals and compounds thereof; Methods of a general interest or applied to the winning of more than two metals
- C22B7/006—Wet processes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0779—Treatments involving liquids, e.g. plating, rinsing characterised by the specific liquids involved
- H05K2203/0783—Using solvent, e.g. for cleaning; Regulating solvent content of pastes or coatings for adjusting the viscosity
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/105—Using an electrical field; Special methods of applying an electric potential
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/17—Post-manufacturing processes
- H05K2203/178—Demolishing, e.g. recycling, reverse engineering, destroying for security purposes; Using biodegradable materials
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49751—Scrap recovering or utilizing
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Geology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Environmental & Geological Engineering (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Processing Of Solid Wastes (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Separation, Recovery Or Treatment Of Waste Materials Containing Plastics (AREA)
- Electric Connection Of Electric Components To Printed Circuits (AREA)
Description
Claims (2)
- (a)破鎖された廃印刷回路基板を、N,N‐ジメチルホルムアミド(N,N‐Dimethylformamide,HCON(CH 3 ) 2 )、メチルエチルケトン(Methylethylketone、CH 3 COC 2 H 5 )、テトラヒドロフラン(Tetrahydrofuran、C 4 H 8 O)、またはこれらの混合物である有機溶剤に投入した後、110乃至140℃の温度で撹拌して金属とプラスチックを単体分離(Liberation)する段階;
(b)フィルタリング(filtering)を用いて前記有機溶剤から前記単体分離された金属とプラスチックを分離した後、分離された金属とプラスチックとの混合物を洗浄及び乾燥する段階;及び
(c)前記乾燥した金属とプラスチックとの混合物を静電選別して金属を分離回収する段階;
とを含んで行われる廃印刷回路基板から金属を回収する方法。 - 前記有機溶剤1リットル当たり、70乃至120gの切削された廃印刷回路基板が投入されることを特徴とする請求項1に記載の廃印刷回路基板から金属を回収する方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2007-0116992 | 2007-11-16 | ||
KR20070116992A KR100889315B1 (ko) | 2007-11-16 | 2007-11-16 | 유기용액을 이용한 폐인쇄회로기판으로부터 금속을회수하는 방법 |
PCT/KR2008/004391 WO2009064063A1 (en) | 2007-11-16 | 2008-07-28 | Novel pre-treatment process for liberation of metals from waste printed circuit boards using organic solution |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010502034A JP2010502034A (ja) | 2010-01-21 |
JP5031038B2 true JP5031038B2 (ja) | 2012-09-19 |
Family
ID=40638881
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009541240A Expired - Fee Related JP5031038B2 (ja) | 2007-11-16 | 2008-07-28 | 有機溶液を用いた廃印刷回路基板から金属を回収する方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7867317B2 (ja) |
JP (1) | JP5031038B2 (ja) |
KR (1) | KR100889315B1 (ja) |
CN (1) | CN101601124B (ja) |
WO (1) | WO2009064063A1 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101322083B1 (ko) | 2007-05-30 | 2013-10-25 | 주식회사 케이씨씨 | 납석으로부터 철분 제거 방법 |
GB0905324D0 (en) * | 2009-03-27 | 2009-05-13 | Univ Birmingham | Metal recovery |
SG10201502960YA (en) | 2010-04-15 | 2015-06-29 | Entegris Inc | Method for recycling of obsolete printed circuit boards |
WO2012132962A1 (ja) * | 2011-03-31 | 2012-10-04 | 三井金属鉱業株式会社 | タンタル回収方法 |
HU229898B1 (hu) | 2011-06-10 | 2014-12-29 | Ewr Hungary Kft | Eljárás és berendezés elektronikai hulladékok feldolgozására |
BR112014014495A2 (pt) * | 2011-12-15 | 2017-06-13 | Advanced Tech Materials | aparelho e método para decapar metais de solda durante a reciclagem de equipamento elétrico e eletrônico de refugo |
CN104384168A (zh) * | 2014-09-12 | 2015-03-04 | 中节能六合天融环保科技有限公司 | 一种废旧线路板的处理方法 |
FR3025806B1 (fr) * | 2014-09-15 | 2019-09-06 | Bigarren Bizi | Procede de traitement et d'extraction de dechets electroniques en vue de la recuperation des constituants inclus dans de tel dechets |
KR102243077B1 (ko) * | 2020-05-21 | 2021-04-22 | 전북대학교산학협력단 | 폐인쇄회로기판의 중요 금속 회수방법 |
EP4008444A1 (en) | 2020-12-07 | 2022-06-08 | Universidade Do Porto | Eco-friendly method for recycling electronic waste |
WO2022123438A1 (en) | 2020-12-07 | 2022-06-16 | Universidade Do Porto | Eco-friendly method for recycling electronic waste |
NL1043973B1 (nl) * | 2021-03-19 | 2022-09-29 | Circular Ind B V | Werkwijze voor het terugwinnen van elementen uit printplaten en inrichting voor het uitvoeren van dergelijke werkwijze |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5841097B2 (ja) * | 1977-08-01 | 1983-09-09 | 住友ベークライト株式会社 | 金属張積層板の切粉の成分分離回収方法 |
US5232489A (en) * | 1990-09-13 | 1993-08-03 | Rwe Entsorgung Aktiengesellschaft | Process for the recovery of metals and coating materials from composite materials |
JPH09271748A (ja) * | 1996-04-09 | 1997-10-21 | Matsushita Electric Ind Co Ltd | プリント基板の処理方法 |
JPH10147819A (ja) * | 1996-11-20 | 1998-06-02 | Matsushita Electric Ind Co Ltd | プリント基板からの金属の回収方法 |
JP3544834B2 (ja) * | 1997-03-17 | 2004-07-21 | 株式会社東芝 | 混合廃棄物の処理装置 |
KR100250061B1 (ko) | 1998-02-18 | 2000-04-01 | 이상한 | 전로 및 전기로슬래그를 이용한 폐 인쇄회로기판의 귀금속원소 추출방법 |
US5979033A (en) * | 1998-05-05 | 1999-11-09 | Cleanevi' Engineering Consultant Co., Ltd. | Method of recycling waste printed circuit boards |
EP1008395A3 (en) * | 1998-12-11 | 2003-05-02 | Matsushita Electric Industrial Co., Ltd. | Method for separating metallic material from waste printed circuit boards, and dry distilation apparatus used for waste treatment |
JP2001046975A (ja) * | 1999-08-17 | 2001-02-20 | Matsushita Electric Ind Co Ltd | 複合廃棄物の処理方法及び処理装置 |
JP2001096255A (ja) * | 1999-10-01 | 2001-04-10 | Matsushita Electric Ind Co Ltd | 銅粉の再生法 |
KR100395400B1 (ko) | 2001-02-27 | 2003-08-25 | (주)아이티그린 | 킬레이트 수지를 이용하여 전자폐기물에서 백금족 원소를 회수하는 방법 |
KR100421937B1 (ko) * | 2001-07-16 | 2004-03-12 | 오치정 | 폐 인쇄회로기판으로부터 유가금속을 회수하는 방법 |
CN1214872C (zh) * | 2001-12-18 | 2005-08-17 | 株式会社电装 | 印刷电路板的再生方法和装置 |
JP2005324176A (ja) | 2004-05-12 | 2005-11-24 | Katsuhiro Ito | Pcb廃棄物の超高温溶融分解方法とそれに用いる超高温溶融分解装置 |
CN100503061C (zh) * | 2004-12-08 | 2009-06-24 | 浙江丰利粉碎设备有限公司 | 一种废旧电子线路板的粉碎回收处理工艺及其设备 |
JP5095094B2 (ja) * | 2005-09-29 | 2012-12-12 | パナソニック株式会社 | 電気電子機器用回路基板から金属を回収する方法 |
CN100592939C (zh) | 2006-01-20 | 2010-03-03 | 巫协森 | 回收废弃印刷电路板的方法 |
US9685368B2 (en) | 2015-06-26 | 2017-06-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Interconnect structure having an etch stop layer over conductive lines |
-
2007
- 2007-11-16 KR KR20070116992A patent/KR100889315B1/ko active IP Right Grant
-
2008
- 2008-07-28 WO PCT/KR2008/004391 patent/WO2009064063A1/en active Application Filing
- 2008-07-28 US US12/310,324 patent/US7867317B2/en not_active Expired - Fee Related
- 2008-07-28 JP JP2009541240A patent/JP5031038B2/ja not_active Expired - Fee Related
- 2008-07-28 CN CN2008800006104A patent/CN101601124B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2009064063A1 (en) | 2009-05-22 |
CN101601124B (zh) | 2011-01-26 |
US20100071507A1 (en) | 2010-03-25 |
JP2010502034A (ja) | 2010-01-21 |
US7867317B2 (en) | 2011-01-11 |
CN101601124A (zh) | 2009-12-09 |
KR100889315B1 (ko) | 2009-03-18 |
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