JP5020079B2 - 均一なエッチング特性を有する層を提供する方法及び組成物 - Google Patents

均一なエッチング特性を有する層を提供する方法及び組成物 Download PDF

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Publication number
JP5020079B2
JP5020079B2 JP2007527859A JP2007527859A JP5020079B2 JP 5020079 B2 JP5020079 B2 JP 5020079B2 JP 2007527859 A JP2007527859 A JP 2007527859A JP 2007527859 A JP2007527859 A JP 2007527859A JP 5020079 B2 JP5020079 B2 JP 5020079B2
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Japan
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composition
silicon
component
acrylic acid
trimethylsiloxy
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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JP2007527859A
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English (en)
Japanese (ja)
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JP2008509815A (ja
JP2008509815A5 (enExample
Inventor
シュ，フランク・ワイ
ステイシー，ニコラス・エイ
Original Assignee
モレキュラー・インプリンツ・インコーポレーテッド
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Priority claimed from US10/919,062 external-priority patent/US7282550B2/en
Priority claimed from US10/919,224 external-priority patent/US7939131B2/en
Application filed by モレキュラー・インプリンツ・インコーポレーテッド filed Critical モレキュラー・インプリンツ・インコーポレーテッド
Publication of JP2008509815A publication Critical patent/JP2008509815A/ja
Publication of JP2008509815A5 publication Critical patent/JP2008509815A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
JP2007527859A 2004-08-16 2005-08-05 均一なエッチング特性を有する層を提供する方法及び組成物 Expired - Lifetime JP5020079B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US10/919,062 2004-08-16
US10/919,062 US7282550B2 (en) 2004-08-16 2004-08-16 Composition to provide a layer with uniform etch characteristics
US10/919,224 2004-08-16
US10/919,224 US7939131B2 (en) 2004-08-16 2004-08-16 Method to provide a layer with uniform etch characteristics
PCT/US2005/027933 WO2006023297A1 (en) 2004-08-16 2005-08-05 Method and composition to provide a layer with uniform etch characteristics

Publications (3)

Publication Number Publication Date
JP2008509815A JP2008509815A (ja) 2008-04-03
JP2008509815A5 JP2008509815A5 (enExample) 2011-03-03
JP5020079B2 true JP5020079B2 (ja) 2012-09-05

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Family Applications (1)

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JP2007527859A Expired - Lifetime JP5020079B2 (ja) 2004-08-16 2005-08-05 均一なエッチング特性を有する層を提供する方法及び組成物

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Country Link
JP (1) JP5020079B2 (enExample)
TW (1) TWI291204B (enExample)
WO (1) WO2006023297A1 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8142850B2 (en) * 2006-04-03 2012-03-27 Molecular Imprints, Inc. Patterning a plurality of fields on a substrate to compensate for differing evaporation times
US8707890B2 (en) * 2006-07-18 2014-04-29 Asml Netherlands B.V. Imprint lithography
WO2008154059A2 (en) 2007-04-02 2008-12-18 Regents Of The University Of California Rotating frame gradient fields for mri and nmr in low polarizing magnetic fields
JP4908369B2 (ja) * 2007-10-02 2012-04-04 株式会社東芝 インプリント方法及びインプリントシステム
US20090212012A1 (en) * 2008-02-27 2009-08-27 Molecular Imprints, Inc. Critical dimension control during template formation
NL2003875A (en) * 2009-02-04 2010-08-05 Asml Netherlands Bv Imprint lithography method and apparatus.
JP5887871B2 (ja) * 2011-11-24 2016-03-16 富士通株式会社 被膜形成材料及びパターン形成方法
JP6071255B2 (ja) * 2012-06-04 2017-02-01 キヤノン株式会社 光硬化物
US10892167B2 (en) * 2019-03-05 2021-01-12 Canon Kabushiki Kaisha Gas permeable superstrate and methods of using the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5170192A (en) * 1990-11-29 1992-12-08 Pilkington Visioncare, Inc. Oxygen permeable bifocal contact lenses and their manufacture
US6143433A (en) * 1994-09-14 2000-11-07 Mitsui Chemicals, Inc. Organic electroluminescent device and process for producing the same
US20030124853A1 (en) * 1998-06-25 2003-07-03 Mitsubishi Materials Silicon Corporation Anisotropic etching method and apparatus
JP4551620B2 (ja) * 2001-05-29 2010-09-29 エシロール アテルナジオナール カンパニー ジェネラーレ デ オプティック 現場で被覆された光学物品を形成させる方法
MY144124A (en) * 2002-07-11 2011-08-15 Molecular Imprints Inc Step and repeat imprint lithography systems

Also Published As

Publication number Publication date
TW200612492A (en) 2006-04-16
TWI291204B (en) 2007-12-11
JP2008509815A (ja) 2008-04-03
WO2006023297A1 (en) 2006-03-02

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