JP5010351B2 - 半導体装置の作製方法 - Google Patents

半導体装置の作製方法 Download PDF

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Publication number
JP5010351B2
JP5010351B2 JP2007147170A JP2007147170A JP5010351B2 JP 5010351 B2 JP5010351 B2 JP 5010351B2 JP 2007147170 A JP2007147170 A JP 2007147170A JP 2007147170 A JP2007147170 A JP 2007147170A JP 5010351 B2 JP5010351 B2 JP 5010351B2
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Prior art keywords
electrode
film
layer
light
insulating layer
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Expired - Fee Related
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JP2007147170A
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Japanese (ja)
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JP2008021640A5 (https=
JP2008021640A (ja
Inventor
照幸 藤井
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2007147170A priority Critical patent/JP5010351B2/ja
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Publication of JP2008021640A5 publication Critical patent/JP2008021640A5/ja
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  • Electroluminescent Light Sources (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007147170A 2006-06-14 2007-06-01 半導体装置の作製方法 Expired - Fee Related JP5010351B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007147170A JP5010351B2 (ja) 2006-06-14 2007-06-01 半導体装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006164873 2006-06-14
JP2006164873 2006-06-14
JP2007147170A JP5010351B2 (ja) 2006-06-14 2007-06-01 半導体装置の作製方法

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JP2008021640A JP2008021640A (ja) 2008-01-31
JP2008021640A5 JP2008021640A5 (https=) 2010-07-08
JP5010351B2 true JP5010351B2 (ja) 2012-08-29

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JP2007147170A Expired - Fee Related JP5010351B2 (ja) 2006-06-14 2007-06-01 半導体装置の作製方法

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5115277B2 (ja) * 2008-03-31 2013-01-09 Ｔｄｋ株式会社 発光素子
JP6157804B2 (ja) * 2011-04-29 2017-07-05 株式会社半導体エネルギー研究所 発光素子
WO2013164881A1 (ja) * 2012-05-01 2013-11-07 信越エンジニアリング株式会社 表示装置の製造方法及びその製造装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3305212B2 (ja) * 1995-11-09 2002-07-22 キヤノン株式会社 液晶素子用の基板、液晶素子、およびそれらの製造方法
JP3187742B2 (ja) * 1996-04-15 2001-07-11 キヤノン株式会社 配線基板の製造方法、液晶素子の製造方法、及び配線基板の製造装置
JP3884564B2 (ja) * 1998-05-20 2007-02-21 出光興産株式会社 有機ｅｌ発光素子およびそれを用いた発光装置
JP2005013985A (ja) * 2003-05-30 2005-01-20 Seiko Epson Corp 膜パターン形成方法、デバイス及びその製造方法、電気光学装置、並びに電子機器、アクティブマトリクス基板の製造方法、アクティブマトリクス基板
JP2005097371A (ja) * 2003-09-22 2005-04-14 Fuji Photo Film Co Ltd フッ素含有樹脂組成物及び光学物品、並びにそれを用いた画像表示装置
JP4549751B2 (ja) * 2004-06-17 2010-09-22 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2006007546A (ja) * 2004-06-24 2006-01-12 Matsushita Electric Works Ltd 成形転写方法
JP4506460B2 (ja) * 2004-12-28 2010-07-21 セイコーエプソン株式会社 有機エレクトロルミネッセンス装置の製造方法及び電子機器

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JP2008021640A (ja) 2008-01-31

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